• 제목/요약/키워드: Nitrogen plasma treatment

검색결과 187건 처리시간 0.025초

The Effect of Nitrogen Plasma Treatment on Tribological Behaviors of Plasma-sprayed Zirconia Coatings

  • Lim, Dae-Soon;Shin, Jong-Han;Lee, Jung-Yeob;Cho, Chang-Hee
    • 한국세라믹학회지
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    • 제38권7호
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    • pp.602-607
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    • 2001
  • Zirconia powder containing 3 mol% yttria (3Y-PSZ) was casted on the cast iron substrate by plasma spraying method. Coated specimens were then heat treated at 500$\^{C}$ in nitrogen plasma. Wear tests were performed on nitrogen heat treated and non heat treated samples at temperatures from 25$\^{C}$ to 600$\^{C}$. Wear results showed that the friction coefficient and the wear loss of both the treated and the non-treated samples showed maximum value at 400$\^{C}$. These results were explained by low temperature thermal degradation due to the monoclinic transformation. Nitrogen plasma treatment significantly improved the tribological performance. The effect of nitrogen heat treatment on tribological behavior was explained by the increased micro-hardness and decreased monoclinic faction.

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Treatment of Refractory Melasma with Microwave-generated, Atmospheric-pressure, Non-thermal Nitrogen Plasma

  • Kim, Hyun-Jo;Kim, Heesu;Kim, Young Koo;Cho, Sung Bin
    • Medical Lasers
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    • 제8권2호
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    • pp.74-79
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    • 2019
  • Periorbital melasma is often refractory to treatment and highly associated with rebound hyperpigmentation or mottled hypopigmentation after laser treatment in Asian patients. In this report, we describe 2 patients with cluster-1 periorbital melasma and 1 patient with cluster-2 periorbital melasma who experienced remarkable clinical improvements after microwave-generated, atmospheric-pressure, non-thermal nitrogen plasma treatments. All patients exhibited limited clinical responses after combination treatments with topical bleaching agents, systemic oral tranexamic acid, and low-fluenced Q-switched neodymium (Nd):yttrium-aluminum-garnet (YAG) lasers. Low-energy nitrogen plasma treatment at 0.75 J elicited remarkable clinical improvement in the periorbital melasma lesions without post-laser therapy rebound hyperpigmentation and mottled hypopigmentation. We deemed that a single pass of nitrogen plasma treatment at 0.75 J induces mild microscopic thermal tissue coagulation and modification within the epidermis while preserving the integrity of the basement membrane in patients with periorbital melasma. Accordingly, nitrogen plasma-induced dermal tissue regeneration could play a role in the treatment of melasma lesions.

Therapeutic Effect of Low-Energy Nitrogen Plasma Pulses on Tinea Pedis

  • Kim, Heesu;Kim, Hyun-Jo;Cho, Sung Bin
    • Medical Lasers
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    • 제8권1호
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    • pp.28-31
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    • 2019
  • Superficial fungal infections with dermatophytes, nondermatophyte molds, or yeasts are treated primarily with topical and/or systemic antifungal agents. Additional or alternative treatment modalities, particularly energy-delivering modalities, however, are used widely to induce fungicidal effects via selective photothermal reactions. In addition to light- or laser-based devices, plasma therapy also has antifungal properties. This report describes a Korean male patient with mycologically confirmed tinea pedis that was treated effectively with two sessions of nitrogen plasma treatment at one-week intervals using a plasma delivering system. Nitrogen plasma was prepared by loading a 0.28-ml inert nitrogen gas/pulse that was activated by a microwave generator. The other treatment settings were a nozzle diameter of 5 mm, pulse energy of 0.75 J, pulse duration of 7 msec, and two passes. One week after the first session of nitrogen plasma treatment, the patient exhibited marked reductions in scale and inflammation. One month after the final treatment, no clinical features of recurrence were found, and successive potassium hydroxide testing revealed negative results.

암모니아 플라즈마 표면처리를 통한 그래핀의 질소도핑 (Graphene Doping by Ammonia Plasma Surface Treatment)

  • 이병주;정구환
    • 한국표면공학회지
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    • 제48권4호
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    • pp.163-168
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    • 2015
  • Graphene has attracted much attention due to its remarkable physical properties and potential applications in many fields. In special, the electronic properties of graphene are influenced by the number of layer, stacking sequence, edge state, and doping of foreign elements. Recently, many efforts have been dedicated to alter the electronic properties by doping of various species, such as hydrogen, oxygen, nitrogen, ammonia and etc. Here, we report our recent results of plasma doping on graphene. We prepared mechanically exfoliated graphene, and performed the plasma treatment using ammonia gas for nitrogen doping. The direct-current plasma system was used for plasma ignition. The doping level was estimated from the number of peak shift of G-band in Raman spectra. The upshift of G-band was observed after ammonia plasma treatment, which implies electron doping to graphene.

플라즈마질화에서 발생기 질소와 질화 속도에 관한 연구 (The Effect of Activated Nitrogen Species for Diffusion Rate during a Plasma Nitriding Process)

  • 김상권;김성완
    • 열처리공학회지
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    • 제23권3호
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    • pp.150-155
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    • 2010
  • Generally, plasma nitriding process has composed with a nitriding layer within glow discharge region occurred by energy exchange. The dissociations of nitrogen molecules are very difficult to make neutral atoms or ionic nitrogen species via glow discharge area. However, the captured electrons in which a double-folded screen with same potential cathode can stimulate and come out some single atoms or activated ionic species. It was showed an important thing that is called "hat is a dominant component in this nitriding process?" in plasma nitriding process and it can take an effective species for without compound layer. During a plasma nitriding process, it was able to estimate with analyzing and identification by optical emission spectroscopy (OES) study. And then we can make comparative studies on the nitrogen transfer with plasma nitriding and ATONA process using plasma diagnosis and metallurgical observation. From these observations, we can understand role of active species of nitrogen, like N, $N^+$, ${N_2}^+$, ${N_2}^*$ and $NH_x$-radical, in bulk plasma of each process. And the same time, during DC plasma nitriding and other processes, the species of FeN atom or any ionic nitride species were not detected by OES analyzing.

SCM440강의 마이크로 펄스 플라즈마 질화 및 후산화처리시 질소농도에 따른 특성변화 (Effects of Nitrogen Contents on the Nitriding Characteristics of the Micro-Pulse Plasma and Post Oxidation Treated SCM440 Steel)

  • 이상기;정인상;이재식
    • 열처리공학회지
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    • 제12권2호
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    • pp.117-128
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    • 1999
  • This study was carried out to investigate the surface characteristics of SCM440 steel nitrided with various nitrogen contents for 7 hours at $520^{\circ}C$ by using micro-pulse plasma nitriding apparatus of hot wall type. The effects of oxidation treatment was also investigated on plasma nitrided in 30% nitrogen and post oxidized SCM440 steel at $500^{\circ}C$ in $H_2O$ atmosphere. The ${\gamma}^{\prime}-Fe_4N$ and ${\varepsilon}-Fe_{2-3}N$ phases were detected in compound layer of the nitrided steel. As the content of nitrogen in plasma gas increased with 30, 50, 70% on the micro-pulse plasma nitriding for SCM440 steel, the thickness of compound, diffusion layer and the surface hardness were increased. From the wear test results, the best wear resistance was appeared in the condition of ductile ${\gamma}^{\prime}-Fe_4N$ phase formed specimen at 30% nitrogen, whereas that of the treated with 50% and 70% nitrogen decreased owing to the exfoliation of brittle ${\varepsilon}-Fe_{2-3}N$ phase in the compound layer. On the nitrided and subsequently oxidized SCM440 steel, the surface layer consisted of $Fe_3O_4$, ${\gamma}^{\prime}-Fe_4N$, and ${\varepsilon}-Fe_{2-3}N$ phases. In these treatments, the dissolution of nitrides affect hardness and hardening depth in compound and diffusion layers. For the nitrided in 30% nitrogen and post oxidized specimen at $500^{\circ}C$ for 1 hour, the wear resistance was lower than that of the only nitrided one in 30% nitrogen but higher than those of the nitrided ones in 50 and 70% nitrogen.

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플렉서블 디스플레이 적용을 위한 저온 실리콘 질화막의 N2 플라즈마 처리 영향 (Influence of Nitrogen Plasma Treatment on Low Temperature Deposited Silicon Nitride Thin Film for Flexible Display)

  • 김성종;김문근;권광호;김종관
    • 한국전기전자재료학회논문지
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    • 제27권1호
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    • pp.39-44
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    • 2014
  • Silicon nitride thin film deposited with Plasma Enhanced Chemical Vapor Deposition was treated by a nitrogen plasma generated by Inductively Coupled Plasma at room temperature. The treatment was investigated by Fourier Transform Infrared Spectroscopy and Atomic Force Microscopy on the surface at various RF source powers at two RF bias powers. The amount of hydrogen was reduced and the surface roughness of the films was decreased remarkably after the plasma treatment. In order to understand the causes, we analyzed the plasma diagnostics by Optical Emission Spectroscopy and Double Langmuir Probe. Based on these analysis results, we show that the nitrogen plasma treatment was effective in the improving of the properties silicon nitride thin film for flexible display.

한우 수란우의 임신율에 대한 hCG 영향과 혈장 요소태질소 수준과의 관계 (Relationship of Plasma Urea Nitrogen Level and Influence of hCG on Pregnancy Rates in Hanwoo Recipients)

  • 박수봉;임석기;우제석;김일화;최선호;이장희;김인철;손동수
    • 한국수정란이식학회지
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    • 제15권2호
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    • pp.115-120
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    • 2000
  • This study was undertaken to test the hypothesis the hypothesis that treatment with hCG (5,000 IU) at the time of embryo transfer would enhance pregnancy rates in recipients, and the concentration of plasma urea nitrogen(PUN) in recipients was related to the effect of hCG on the reproductive performance. Blood samples were taken according to experimental condition for the assessment of the endogenous plasma progesterone concentration and plasma urea nitrogen. Concentrations of progesterone in plasma were higher in cows treated with hCG on day 7(estrus=day 0) than in those untreated during 7∼43 days after insemination. The pregnancy rates were 65.5 and 54.6% for the hCG treated and untreated groups, respectively. In recipient group categorized with PUN concentration of <12 mg/이, the pregnancy rates were 68.8 and 46.7% for the hCG treated and untreated groups, respectively. The results suggest that hCG treatment at 7 days after insemination could be used to increase the pregnancy rate of embryo transfer, and transfer, and only the recipients with PUN concentration of <12 mg/dl were influenced by treatment with hCG.

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질소 플라즈마 표면처리가 쌀겨 기반 활성탄소의 전기 이중층 커패시터 성능에 미치는 영향 (Effect of Nitrogen Plasma Surface Treatment of Rice Husk-Based Activated Carbon on Electric Double-Layer Capacitor Performance)

  • 이란은;곽철환;이혜련;김석진;이영석
    • 공업화학
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    • 제33권1호
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    • pp.71-77
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    • 2022
  • 바이오매스 활용을 높이기 위하여, 쌀겨 기반 활성탄소(RHAC)를 제조한 뒤 질소 플라즈마 표면처리를 수행하여 전기이중층 커패시터(EDLC) 성능을 고찰하였다. 질소 플라즈마 표면처리를 통하여, RHAC 표면에 최대 2.17%의 질소가 도입되었으며 특히, 5 min 동안 반응한 샘플의 경우 pyrrolic/pyridine계 N 작용기의 형성이 우세하였다. 또한, 실리카 제거에 의해 쌀겨 기반 탄소재에 메조기공이 형성되었고 질소 플라즈마 표면처리에 의해 탄소재 표면 거칠기가 증가하여 미세기공이 많이 형성되는 것을 확인할 수 있었다. 순환전압전류법 측정 실험으로부터, 5 mV/s의 전압 주사 속도에서 질소 플라즈마 처리된 RHAC의 비정전용량은 최대 200 F/g로, 미처리 RHAC (111 F/g)에 비교하여 80.2% 향상된 값을 나타내었다. 이러한 결과는 질소 플라즈마 표면처리로 인해 탄소재 표면에 도입된 pyrrolic/pyridine계 질소 작용기 도입과 탄소재 표면 미세기공 부피 향상으로 인한 시너지 효과인 것으로 판단된다. 본 연구는 폐기 자원을 재활용하고, 플라즈마 표면처리법을 통해 이종원소 도입을 한다는 점에서 환경적으로 긍정적인 영향을 미칠 것으로 사료된다.

질소 플라즈마 처리된 활성탄소를 이용한 테트라사이클린의 물리 및 화학 흡착 특성 (Physical and Chemical Adsorption Properties for Tetracycline Using Activated Carbon with Nitrogen Plasma Treatment)

  • 이인우;명성재;민충기;하성민;천서영;이영석
    • 공업화학
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    • 제35권1호
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    • pp.8-15
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    • 2024
  • 본 연구에서는 활성탄소의 테트라사이클린 흡착성능을 향상시키기 위해 5, 10, 및 15분의 시간에 따른 질소 플라즈마 처리를 실시하였다. 모든 질소 플라즈마 처리된 활성탄소는 미처리 활성탄소와 비교하여 테트라사이클린 흡착성능이 개선되었다. 이는 활성탄소에 도입된 질소 작용기가 테트라사이클린과 π-π 상호작용 및 수소 결합을 통하여 화학흡착을 야기하기 때문이다. 특히, 80 W 및 50 kHz의 질소 플라즈마 처리에서, 10분 동안 처리된 활성탄소가 가장 우수한 흡착성능을 가졌다. 이 때, 활성탄소 표면의 질소 함량은 2.03%이며 비표면적은 1,483 m2/g까지 증가하였다. 이렇게 질소플라즈마 처리에 의해 개선된 활성탄소는 물리 및 화학 흡착성능이 향상되었다. 또한, 흡착 실험 결과가 Langmuir 흡착등온식과 유사 2차 반응속도식에 잘 부합하므로, 질소 플라즈마 처리된 활성탄소의 테트라사이클린 흡착은 단분자층으로 이루어지는 화학 흡착이 주도적으로 일어나는 것으로 판단하였다. 결과적으로, 질소 플라즈마 처리된 활성탄소는 주도적인 화학 흡착과 더불어 물리 흡착의 시너지 효과로 수중에서 테트라사이클린을 효율적으로 제거하는 흡착재로 사용될 수 있다.