• 한국표면공학회지
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• 제25권4호
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• pp.189-206
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• 1992

The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

• 한국표면공학회지
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• 제19권3호
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• pp.109-120
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• 1986

The electroless nickel plating on high alumina ceramics was performed in the bath containing nickel chloride, sodium hypophosphite and mono- or bi-carboxylic acid as a complexing agent in order to examine the empirical rate law as well as the effects of the complexing agent, plating temperature and pH on the rate of deposition. Adding the carboxylic acid to the plating bath, the rate of deposition was increased considerably, and each of the complexing agents showed a maximum deposition rate plateau around a particular concentration of the complexing agent. The rate of deposition was increased with increasing either temperature or pH, but microstructure of the surface became more rough. Furthermore, empirical rate law of the elecltroless nickel deposition on high alumina ceramics was discussed with the activation energy and other rate parameters calculated.

• Carbon letters
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• 제9권2호
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• pp.105-107
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• 2008

In this work, we employed an electroless nickel plating on glass fibers in order to enhance the electric conductivity of fibers. And the effects of metal content and plating time on the conductivity of fibers were investigated. From the results, island-like metal clusters were found on the fiber surfaces in initial plating state, and perfect metallic layers were observed after 10 min of plating time. The thickness of metallic layers on fiber surfaces was proportion to plating time, and the electric conductivity showed similar trends. The nickel cluster sizes on fibers decreased with increasing plating time, indicating that surface energetics of the fibers could become more homogeneous and make well-packed metallic layers, resulting in the high conductivity of Ni/glass fibers.

• Corrosion Science and Technology
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• 제7권1호
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• pp.61-67
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• 2008

In this paper, electrochemical and microstructural characteristics of nickel-plated Alloy 600 were investigated in order to identify the performance of electroless Ni-plating on Alloy 600 in high-temperature aqueous condition with the comparison of electrolytic nickel-plating. For high temperature corrosion test of nickel-plated Alloy 600, specimens were exposed for 770 hours to typical PWR primary water condition. During the test, open circuit potentials (OCP's) of all specimens were measured using a reference electrode. Also, resistance to flow accelerated corrosion (FAC) test was examined in order to check the durability of plated layers in high-velocity flow environment at high temperature. After exposures to high flow rate aqueous condition, the integrity of surfaces was confirmed by using both scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). For the field application, a remote process for electroless nickel-plating was demonstrated using a plate specimen with narrow gap on a laboratory scale. Finally, a practical seal design was suggested for more convenient application.

• 한국표면공학회지
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• 제15권1호
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• pp.1-10
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• 1982

Electroless plating is the continious formation of metallic coatings from metal ions by che-mical reduction without the use of electrical current. This is, however, more expansive than the conventional electroplating but is often used because of certain adventage. Here, general description of past research on electroless nickel plating, especially about the merits of each research was given. Part(Ⅰ) is for the conposition of solution, pretreatment and facilities of electroless nickel plating.

• 공업화학
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• 제19권2호
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• pp.228-235
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• 2008

니켈 표면처리 공정에서 전류밀도에 따라 니켈의 전착두께가 증가되었으며, 증가폭은 $6{\sim}10A/dm^2$에서 저전류보다 높게 나타났다. 전류밀도를 측정하기 위해 Hull-cell 분석을 수행 하였다. 최적 공정온도는 $60^{\circ}C$, pH는 3.5~4.0이었고, 전해용액 중 니켈이온의 농도는 300 g/L 이상에서 농도에 따라 전착두께가 증가되었다. 전류밀도에 따라 용액 중 니켈이온 감소 속도가 증가되었는데, 이는 음극표면에서 니켈 전착 량에 따른 전착두께의 증가를 나타낸다. 그러나 전착속도가 빠를 경우 니켈 전착 층의 치밀성은 저하되며, 표면의 상태는 불규칙하게 변화된다. 니켈이온의 전착과정이 불규칙하게 일어나 조직의 pin hole 등을 야기해 표면특성을 저하시키는 것으로 확인되었다. 광택니켈 전착 후 25 h 내식을 유지한 결과, 낮은 전류밀도를 유지하는 것이 내식특성이 우수한 것으로 나타났다. 프로그램모사 결과, 전류밀도가 높아질수록 확산 층의 두께는 증가하며, 음극표면의 농도는 낮아진다. 농도분포는 낮은 전류밀도에서 고른 분포를 나타내었으며 이는 일정한 전착두께를 예측할 수 있다. 생산성 저하를 예방하기 위해 공정시간은 크게 변화시키지 않았으며, 전류밀도와 전착두께를 변화시키면서 공정변수를 조절하였다. 본 연구의 표면분석 결과 조직특성이나 내식성 등의 표면 물성이 낮은 전류밀도를 사용할 경우에 더욱 우수한 것으로 나타났다.

• 대한금속재료학회지
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• 제48권1호
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• pp.90-100
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• 2010

Micro-conductive patterns were microfabricated on an insulating substrate ($SiO_2$) surface by a selective electroless nickel plating process in order to investigate the formation of seed layers. To fabricate micro-conductive patterns, a thin layer of metal (Cu.Cr) was deposited in the desired micropattern using laser-induced forward transfer (LIFT). and above this layer, a second layer was plated by selective electroless plating. The LIFT process. which was carried out in multi-scan mode, was used to fabricate micro-conductive patterns via electroless nickel plating. This method helps to improve the deposition process for forming seed patterns on the insulating substrate surface and the electrical conductivity of the resulting patterns. This study analyzes the effect of seed pattern formation by LIFT and key parameters in electroless nickel plating during micro-conductive pattern fabrication. The effects of the process variables on the cross-sectional shape and surface quality of the deposited patterns are examined using field emission scanning electron microscopy (FE-SEM) and an optical microscope.

• 폴리머
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• 제34권1호
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• pp.25-31
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• 2010

무전해 니켈 도금법을 사용하여 단분산 폴리스티렌 입자 표면에 니켈이 도금된 고분자 코어/금속 쉘의 복합 입자를 제조하였다. 단분산 입자는 분산중합으로 제조하였는데 사용한 분산매질의 종류에 따라 다양한 크기의 단분산 폴리스티렌 입자를 제조할 수 있었다. 그 중 직경 $3.4\;{\mu}m$ 크기의 단분산 폴리스티렌 입자를 선택하여 무전해 니켈 도금을 시도하였다. 니켈 도금에 영향을 미치는 도금 조건을 파악하기 위하여 활성화제인 $PdCl_2$의 농도, 착화제인 glycine의 농도와 니켈 도금액의 투여 시간에 따른 니켈 도금된 폴리스티렌 복합 입자의 모폴로지를 관찰하였다. 본 연구조건하에서는 $PdCl_2$의 농도 0.4 g/L, glycine 농도 1 M 이상인 경우 폴리스티렌 입자 위에 균일한 두께의 니켈층을 형성하였고 석출되는 니켈도 적었다. 도금 시간 2 시간 중에서 동일양의 도금액을 투여 속도를 달리하며 도금한 경우 모폴로지 상의 뚜렷한 차이는 없었으나 0.15 mL/min 속도로 1시간 동안 투여한 경우가 상대적으로 균일한 도금 특성을 보여 주었다.

• 한국표면공학회지
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• 제15권3호
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• pp.127-137
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• 1982

In chemical plating of nickel and chromium on steel, studies on various factors affect-ing the plating operations were carried out. The optimum bath compositions and operat-ing conditions were obtained. The structure and properties of the as deposits or deposits after heat treatment were investigated. (1) The most optimum conditions for the chemical nickel and chromium plating were; 〔Ni2+〕/〔H2PO2-〕; 0.5∼0.8, 〔Cr3+〕/〔H2PO2-〕; 0.6∼0.9 PH;5.0∼5.5, temperature; 90∼95$^{\circ}C$ (2) In the case of nickel deposition, the hardness of deposits increased with increasing phosphorous contents. Heat-treating at the temperature range 200$^{\circ}C$ to 600$^{\circ}C$, the maximum hardness of deposits was obtained at 400$^{\circ}C$ and decreased at temperature above 400$^{\circ}C$ due to growth of Ni3P. (3) Corrosion resistance of chemical nickel deposits was improved with increasing of p-hosphorous contents and heat treating temperature.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.625-628
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• 1999

Recently. high-density printed circuit boards(PCB) become indispensable with the minaturization of components. Nickel is deposited on the copper patterns and followed by the gold deposition for improving connection reliability between the printed circuit boards and electronic components. Conventionally electrodeposition has been applied to metalization of copper patterns. However metalization by this method is not applicable for the isolated fine and concentrated patterns. Therefore, metalization technology of the fine patterns by electroless plating is required in place of electrodeposition. The application of electroless nickel plating for interconnection with solder strongly relies on the solderability and the interactions between nickel and solder. Factors such as phosphorus content of the deposit additive and bath temperature may influence solderability of the electroless nickel deposit. So solderability of electroless nickel/ gold deposits was investigated with substrates plated changing the condition of nickel solution.