• Title/Summary/Keyword: Nickel Thin Film

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Optical Transmittance Variation to Thickness of Nickel Thin Films (니켈박막의 두께에 따른 광투과율변화)

  • Yang, Ki-Won;Son, Jeong-Sik;Kwak, Ho-Weon;Lee, Haeng Ki;Park, Sang Chul
    • Journal of Korean Ophthalmic Optics Society
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    • v.13 no.1
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    • pp.49-52
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    • 2008
  • To study the optical transmittance through nickel thin films with various thicknesses. Methods: We measured the optical transmittance through thin nickel film with various thicknesses. Results: The thickness dependence of the optical transmittance through nickel thin films deposited by thermal evaporation had been investigated. The optical transmittance rapidly decreased with the Ni film thickness less than 70 nm while it slightly decreased with the thickness more than 70 nm. In the experiment of optical dispersion, most of the light transmitted in the incidence direction. The result of experiment showed that optical dispersion was negligibly. Conclusions: Optical transmittance exponentially decreased as nickel thin film thickness increased.

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Preparation of Thin Nickel Foam for Nickel-Metal Hydride Battery (Ni-MH 전지용 thin nickel foam의 제조)

  • 신준호;김기원
    • Journal of the Korean institute of surface engineering
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    • v.28 no.2
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    • pp.83-91
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    • 1995
  • A new method for preparation of thin nickel foam for Ni-MH battery was investigated. In this method, fine graphite powders of $1\mu\textrm{m}$$2\mu\textrm{m}$ diameter were pasted into pores of thin polyurethane foam film in order to supply electric conducting seeds for nickel deposition by electroless plating reaction. After electroless plating, remaining polyurethane foam was removed chemically by organic solvent treatment and graphite particles also removed by ultrasonic cleaning. Porosity of formed nickel foam was about 85% During electroplating, porosity of the nickel foam decreased less than 5% up to $30\mu\textrm{m}$ coating thickness. And then it was electroplated and heat-treated to improve mechanical strength and ductility. Finally, thin nickel foam for Ni electrode of Ni-MH battery with 80% porosity and $350\mu\textrm{m}$~X$400\mu\textrm{m}$ thickness was obtained.

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Crystallization of a-Si Induced by Ni-Si oxide source

  • Meng, Z.;Liu, Z.;Zhao, S.;Wu, C.;Wong, M.;Kwok, H.;Xiong, S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.985-988
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    • 2008
  • Metal induced crystallization of a-Si with a source of Ni/Si oxide was studied. Its mechanism to induce crystallization was discussed. It was found that new source behaves an effect of self-released nickel and reducing nickel residua, so can provide a wider process tolerance; improve the uniformity and stability of TFTs.

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A Study of cut off effect of ultraviolet in sunglasses lens coated with nickel-ferrite thin film NxFe3-xO4 (니켈페라이트 박막 NxFe3-xO4를 이용한 선글라스 렌즈의 자외선 차단효과에 대한 연구)

  • Ha, T.W.;Lee, Y.H.;Choi, K.S.;Cha, J.W.
    • Journal of Korean Ophthalmic Optics Society
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    • v.8 no.2
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    • pp.25-29
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    • 2003
  • Nickel-ferrite $Ni_xFe_{3-x}O_4$ thin films with several composition for Ni on glass substrate was prepared by ferrite plating method in order to make sunglass which cut off ultraviolet and shield electromagnetic field. It has single phase of polycrystalline spinel structure and has gloss as mirror and has high hardness which is no scratch while scraping by using nail. The transmittance of nickel-ferrite thin film is lowered to zero below 400 nm manifestly. And it shows that the nickel-ferrite thin film in nickel composition rate x = 0.09 was most cut oil ultraviolet when compared with goods of other company in the cut off effect of ultraviolet. Therefore, sunglasses coated with $Ni_xFe_{3-x}O_4$ thin film can be used in removing ultraviolet and electromagnetic field.

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An Experimental Technique with Pattern Recognition for Deformation Measurement of Small Structures (패턴 인식을 통한 미소 구조물의 변형 측정 기법 개발)

  • 박태상;백동천;이순복
    • Transactions of Materials Processing
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    • v.11 no.7
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    • pp.614-619
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    • 2002
  • For an accurate measurement of the material behavior of small structures, a new optical experimental technique is proposed to measure the deformation. The test method uses the dual microscope that can measure the relative deformation of two adjacent regions. The magnified view is captured by CCD cameras and the relative deformation can be measured by the pattern matching and tracing method. Using this experimental technique, the deformation of solder joints in electronic packaging and the strain of the nickel thin film are measured.

Nickel Doping on Cobalt Oxide Thin Film Using by Sputtering Process-a Route for Surface Modification for p-type Metal Oxide Gas Sensors

  • Kang, Jun-gu;Park, Joon-Shik;An, Byeong-Seon;Yang, Cheol-Woong;Lee, Hoo-Jeong
    • Journal of the Korean Physical Society
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    • v.73 no.12
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    • pp.1867-1872
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    • 2018
  • This study proposes a route for surface modification for p-type cobalt oxide-based gas sensors. We deposit a thin layer of Ni on the Co oxide film by sputtering process and annealed at $350^{\circ}C$ for 15 min in air, which changes a typical sputtered film surface into one interlaced with a high density of hemispherical nanoparticles. Our in-depth materials characterization using transmission electron microscopy discloses that the microstructure evolution is the result of an extensive inter-diffusion of Co and Ni, and that the nanoparticles are nickel oxide dissolving some Co. Sensor performance measurement unfolds that the surface modification results in a significant sensitivity enhancement, nearly 200% increase for toluene (at $250^{\circ}C$) and CO (at $200^{\circ}C$) gases in comparison with the undoped samples.

A study of Nickel Oxide thin film deposited by DC magnetron and RF sputtering method (DC magnetron 방법과 RF 스퍼터링 방법으로 제작된 Nickel Oxide 박막의 특성 연구)

  • Choi, Kwang-Nam;Park, Jun-Woo;Baek, Seoung-Ho;Lee, Ho-Sun;Kwak, Sung-Kwan;Chung, Kwan-Soo
    • Proceedings of the IEEK Conference
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    • 2007.07a
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    • pp.441-442
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    • 2007
  • We deposited nickel oxide(NiO) thin films on silicon(Si) substrates at Room temperature and $500^{\circ}C$ using a nickel target by reactive DC and RF sputtering. In addition, we anneal to NiO thin films deposited at room temperature. Using spectroscopic eillipsometry, we obtained optical characteristics of every films. We discussed relations of the optical and structural properties of NiO thin films with the oxygen flow rate, substrate temperature and annealing temperatures. Refraction was decreased and defect was increased when NiO thin films was annealed. We also analyzed the electrical characteristics of NiO films which deposited DC and RF sputtering method.

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A Study on Laser Micro Joining of Small Diameter Gold Wires to Nickel Thin Films (미소 직경 골드 와이어와 니켈 박막의 레이저 마이크로 접합에 관한 연구)

  • Park, K.W.;Na, S.J.
    • Laser Solutions
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    • v.10 no.2
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    • pp.25-28
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    • 2007
  • Rapidity and flexibility are very important in the electronic components industry. The laser process provides the industry with more rapidity and flexibility. For this reason, the laser process is considered as an acceptable method in terms of rapidity and flexibility. In this study, a wide range of experiments have been carried out on the gold wire-to-nickel thin film joining using the continuous wave fiber laser. In particular, changes in the shape of joint depending on the changes of a target point have been observed.

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Post-annealing Effect of NiO Thin Film Grown by RF Sputtering System on 4H-SiC Substrate (4H-SiC 기판 위에 RF Sputter로 증착된 NiO 박막의 후열처리 효과)

  • Soo-Young Moon;Min-Yeong Kim;Dong-Wook Byun;Geon-Hee Lee;Sang-Mo Koo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.2
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    • pp.170-174
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    • 2023
  • Nickel oxide is a nonstoichiometric transparent conductive oxide with p-type conductivity, a wide-band energy gap of 3.4~4.0 eV, and excellent chemical stability, making it a very important candidate as a material for bipolar devices. P-type conductivity in Transparent Conductive Oxides (TCO) is controlled by the oxygen vacancy concentration. During the TCO film deposition process, additional oxygen diffusing into the NiO structure causes the formation of Ni 3p ions and Ni vacancies. This eventually affects the hole concentration of the p-type oxide thin film. In this work, the surface morphology and the electrical characteristics were confirmed in accordance with the annealing atmosphere of the nickel oxide thin film.

Electrochromic Performance of NiOx Thin Film on Flexible PET/ITO Prepared by Nanocrystallite-Dispersion Sol

  • Kwak, Jun Young;Jung, Young Hee;Park, Juyun;Kang, Yong-Chul;Kim, Yeong Il
    • Journal of the Korean Chemical Society
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    • v.65 no.2
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    • pp.125-132
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    • 2021
  • An electrochromic nickel oxide thin film was fabricated on a flexible PET/ITO substrate using a nanocrystallite- dispersed coating sol and bar coater. Nanocrystalline NiOx of 3-4 nm crystallite size was first synthesized by base precipitation and thermal conversion. This NiOx nanocrystallite powder was mechanically dispersed in an alcoholic solvent mixed with a silane binder to prepare a coating sol for thin film. This sol method is different from the normal sol-gel method in that it does not require the conversion of precursor by heat treatment. Therefore, this method provides a very facile method to prepare NiOx thin films on any kind of substrate and it can be easily applied to mass production. The electrochromic performance of this NiOx thin film on PET/ITO electrode with a thickness of about 400 nm was investigated in a nonaqueous LiClO4 electrolyte solution by cyclic voltammetric and repeated chronoamperometric measurements in conjunction with spectrophotometry. The visible light modulation of 44% and the colorization efficiency of 41 ㎠/C at 550 nm were obtained at the step potentials of -0.8/+1.2 V vs Ag and a duration of 30 s.