• 제목/요약/키워드: Nickel (Ni)

검색결과 1,508건 처리시간 0.03초

Nickel(II) nitrate hexahydrate를 전구체로 사용한 산화니켈(NiO) 나노입자의 합성 (Synthesis of Nickel Oxide (NiO) nanoparticles using nickel(II) nitrate hexahydrate as a precursor)

  • 김수종
    • 문화기술의 융합
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    • 제9권3호
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    • pp.593-599
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    • 2023
  • 질산니켈육수화물염(nickel(II) nitrate hexahydrate) 수용액을 공업용 펄프에 함침시킨 전구체를 이용하여 세라믹스 분말을 제조하는 간단한 액상 합성법으로 산화니켈(NiO) 나노입자를 성공적으로 합성하였다. 질산니켈육수화물염 수용액이 함침된 전구체의 미세구조를 주사전자현미경(SEM)으로 확인하였고, 전구체의 열처리온도 증가에 따라 생성되는 산화니켈(NiO) 입자의 결정구조 및 입자크기를 X선회절분석(XRD) 및 SEM으로 분석하였다. 그 결과 전구체의 유기물질이 완전하게 열분해 되는 온도는 495-500℃이며, 열처리 온도의 증가에 따라 생성되는 산화니켈 입자의 크기 및 결정성이 증가하는 것을 XRD, SEM 분석을 통하여 확인하였다. 500-800℃에서 각각 1시간 동안 열처리하여 얻어진 산화니켈 입자의 크기는 50-200nm였다. 열처리 온도 380℃에서 NiO 결정상이 형성되고, 800℃까지는 NiO 단일상만 존재하며, 열처리 온도가 높아짐에 따라 생성되는 입자의 크기가 커지고 있음을 XRD 및 SEM 분석으로 확인하였다.

Synthesis and Characterization of Bis(5,6-dihydro-1,4-dithiin-2,3-dithiolato)nickel(II), nickel(III) and of Related Dialkyl Nickel(III) Dithiolene Complexes

  • 김영진;최성낙;오영희
    • Bulletin of the Korean Chemical Society
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    • 제18권9호
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    • pp.1022-1028
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    • 1997
  • The reaction between Ni(Ⅱ) and sodium salt of 5,6-dihydro-1,4-dithiin-2,3-dithiolate (DDDT2-) in the presence of oxygen results in the formation of Ni(Ⅲ) species, Ni(DDDT)2-, which is isolated as tetraalkylammonium salt. The same reaction performed in the absence of oxygen yields dianionic Ni(Ⅱ) species, Ni(DDDT)22-, which is also isolated as the tetraethylammonium salt. The bis(5,6-dihydro-1,4-dithiin-2,3-dithiolato) nickelate (Ⅱ) dianion, Ni(DDDT)22-, reacts with methyl iodide to yield unusually stable bis(methylthio)dithiolene complex, Ni(CH3)2C8H8S8. All the isolated dithiolato-nickel(Ⅱ) and nickel(Ⅲ) complexes are characterized by 1H NMR, UV/Vis, IR and mass spectroscopic methods. The internal redox reaction of the nickel(Ⅱ)-dithiolate has been studied by spectro-electrochemical method and the results were compared with those of other metal-dithiolenes. The alkylated nickel(dithiolene) complex presumably undergoes cis-trans isomerization reaction in solution, judging from the experimental results of variable-temperature 1H NMR measurements.

무 유식물에서의 니켈내성과 히스티딘의 작용 (Nickel Tolerance and the Complexing Role of Histidine in Raphanus sativus)

  • 김태윤;홍정희
    • 한국환경과학회지
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    • 제13권8호
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    • pp.711-719
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    • 2004
  • The effect of nickel (Ni) on growth and some tolerance strategies with regard to heavy metal tolerance mechanism was investigated in radish (Raphanus sativus) seedlings. The protective effect of histidine on nickel stress conditions was also monitored. The seedling growth decreased with an increase in metal concentrations. The inhibitory effect was more pronounced in the root elongation than in the shoot elongation. Increasing Ni supply showed a progressive increase of Ni concentrations in the roots and shoots. Ni content was higher in the shoots than in the roots. In the presence of nickel, radish exhibited an antioxidative defense mechanism, as evidenced by the elevated malondialdehyde(MDA), showing that nickel is an efficient inducer of lipid peroxidation. Exposure of radish to elevated concentrations of nickel was accompanied by an increase in the proline content. Supplemental histidine in the presence of Ni ameliorated metal-induced growth inhibition and lipid peroxidation. Combinations of Ni and histidine resulted in a significant decline in proline content compared with Ni stress alone, indicating that histidine may provide protection against the adverse effect of Ni stress. From the results it is suggested that histidine is an efficient chelator by complexing metal ion within the plant and may playa role in nickel tolerance implicated in metal detoxification.

니켈 MHP로부터 제조된 염화니켈을 이용한 탄산니켈 제조연구 (Study on the Preparation of Nickel Cabonate Using Nickel Chloride Prepared from Nickel MHP)

  • 강용호;신기웅;현승균
    • 자원리싸이클링
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    • 제27권5호
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    • pp.23-29
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    • 2018
  • 일반적으로 탄산니켈을 제조하기 위한 원료로 $NiSO_4$$NiCl_2$가 사용되었다. 제조된 탄산니켈의 경우 표면 및 내부에 있어 $Na_2SO_4$ 및 NaCl이 생성되어 탄산니켈의 순도를 감소시키는 원인이 되고 있으며, 이러한 불순물의 제거정도에 따라 고순도 탄산니켈을 제조할 수 있다. 본 연구에서는 니켈MHP 용매추출 공정으로 제조된 $NiCl_2$를 이용하여 탄산니켈제조 연구를 진행하였다. 실험은 니켈염과 탄산염 당량비에 따른 제조, 탄산니켈 수세에 따른 탄산니켈 내 Na 및 Cl 감소 및 수세용수의 온도에 따른 Na 및 Cl의 감소에 대한 조건을 실험하여 고순도 탄산니켈을 제조할 수 있었다.

Ni-MH 전지용 thin nickel foam의 제조 (Preparation of Thin Nickel Foam for Nickel-Metal Hydride Battery)

  • 신준호;김기원
    • 한국표면공학회지
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    • 제28권2호
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    • pp.83-91
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    • 1995
  • A new method for preparation of thin nickel foam for Ni-MH battery was investigated. In this method, fine graphite powders of $1\mu\textrm{m}$$2\mu\textrm{m}$ diameter were pasted into pores of thin polyurethane foam film in order to supply electric conducting seeds for nickel deposition by electroless plating reaction. After electroless plating, remaining polyurethane foam was removed chemically by organic solvent treatment and graphite particles also removed by ultrasonic cleaning. Porosity of formed nickel foam was about 85% During electroplating, porosity of the nickel foam decreased less than 5% up to $30\mu\textrm{m}$ coating thickness. And then it was electroplated and heat-treated to improve mechanical strength and ductility. Finally, thin nickel foam for Ni electrode of Ni-MH battery with 80% porosity and $350\mu\textrm{m}$~X$400\mu\textrm{m}$ thickness was obtained.

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CBD(Chemical Bath Deposition) 법으로 제조된 전기화학식 캐패시터용 NiO 나노박편 필름 (Nickel Oxide Nano-Flake Films Synthesized by Chemical Bath Deposition for Electrochemical Capacitors)

  • 김영하;박수진
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.163.2-163.2
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    • 2010
  • In this work, nano-flake shaped nickel oxide (NiO) films were synthesized by chemical bath deposition technique for electrochemical capacitors. The deposition was carried out for 1 and 2 h at room temperature using nickel foam as the substrate and the current collector. The structure and morphology of prepared NiO film were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). And, electrochemical properties were characterized by cyclic voltammetry, galvanostatic charge-discharge, and AC impedence measurement. It was found that the NiO film was constructed by many interconnected NiO nano-flakes which arranged vertically to the substrate, forming a net-like structure with large pores. The open macropores may facilitate the electrolyte penetration and ion migration, resulted in the utilization of nickel oxide due to the increased surface area for electrochemical reactions. Furthermore, it was found that the deposition onto nickel foam as substrate and curent collector led to decrease of the ion transfer resistance so that its specific capacitance of a NiO film had high value than NiO nano flake powder.

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Highly Active Catalyst of Nickel Sulfate Supported on Titania for Ethylene Dimerization

  • 손종락;박원천
    • Bulletin of the Korean Chemical Society
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    • 제22권12호
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    • pp.1303-1308
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    • 2001
  • A series of catalysts, NiSO4/TiO2, for ethylene dimerization was prepared by the impregnation method using aqueous solution of nickel sulfate. On the basis of the results obtained from X-ray diffraction, the addition of NiSO4 shifted the transition of TiO2 from the anatase to the rutile phase toward higher temperatures due to the interaction between NiSO4 and TiO2. Nickel sulfate supported on titania was found to be very active even at room temperature. The high catalytic activity of NiSO4/TiO2 closely correlated with the increase of acidity and acid strength due to the addition of NiSO4. It is suggested that the active sites responsible for ethylene dimerization consist of low valent nickel, Ni+, with an acid.

결정질 실리콘 태양전지에 적용하기 위한 도금법으로 형성환 Ni/Cu 전극에 관한 연구 (Investigation of Ni/Cu Contact for Crystalline Silicon Solar Cells)

  • 김범호;최준영;이은주;이수홍
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2007년도 춘계학술대회
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    • pp.250-253
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    • 2007
  • An evaporated Ti/Pd/Ag contact system is most widely used to make high-efficiency silicon solar cells, however, the system is not cost effective due to expensive materials and vacuum techniques. Commercial solar cells with screen-printed contacts formed by using Ag paste suffer from a low fill factor and a high shading loss because of high contact resistance and low aspect ratio. Low-cost Ni and Cu metal contacts have been formed by using electroless plating and electroplating techniques to replace the Ti/Pd/Ag and screen-printed Ag contacts. Ni/Cu alloy is plated on a silicon substrate by electro-deposition of the alloy from an acetate electrolyte solution, and nickel-silicide formation at the interface between the silicon and the nickel enhances stability and reduces the contact resistance. It was, therefore, found that nickel-silicide was suitable for high-efficiency solar cell applications. The Ni contact was formed on the front grid pattern by electroless plating followed by anneal ing at $380{\sim}400^{\circ}C$ for $15{\sim}30$ min at $N_{2}$ gas to allow formation of a nickel-silicide in a tube furnace or a rapid thermal processing(RTP) chamber because nickel is transformed to NiSi at $380{\sim}400^{\circ}C$. The Ni plating solution is composed of a mixture of $NiCl_{2}$ as a main nickel source. Cu was electroplated on the Ni layer by using a light induced plating method. The Cu electroplating solution was made up of a commercially available acid sulfate bath and additives to reduce the stress of the copper layer. The Ni/Cu contact was found to be well suited for high-efficiency solar cells and was successfully formed by using electroless plating and electroplating, which are more cost effective than vacuum evaporation. In this paper, we investigated low-cost Ni/Cu contact formation by electroless and electroplating for crystalline silicon solar cells.

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폐 Ni 촉매로 부터 Nickel Yellow의 조성에 관한 연구 (A study on the Preparation of Hickel Yellow from Waste Ni-Catalyst)

  • 김성빈
    • 한국인쇄학회지
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    • 제2권1호
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    • pp.71-75
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    • 1984
  • NiNH$_{4}PO_{4}$ was Prepared from waste Ni catalyst used in hydrogenation of oil and fat, NiNH$_{4}PO_{4}$ was calcined at different temperature respectly 800, 1000, 1100$^{\circ}$C to prepare Nickel yellow. The results from this experiment are summerized as follow: 1) Nickel yellow formed at 1100$^{\circ}$C was most clearness yellow color from color analyzer data. 2) Nickel yellow was consist of ${\alpha}-Ni_{2}P_{2}O_{7}$, $Ni_{3}(PO_{4})_{2}$ from X-ray diffraction analysis. 3) The endothermic pick at 100$^{\circ}$C and exotherwic pick about 1050$^{\circ}$C on calcination of NiNH$_{4}PO_{4}$ were checked in DTA (difference thermal analysis data)

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Nickel silicide에 대한 Pd 첨가 효과 : ab initio 계산 (Effect of Pd addition on nickel silicide : ab initio calculation)

  • 김대희;서화일;김영철
    • 반도체디스플레이기술학회지
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    • 제7권1호
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    • pp.7-10
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    • 2008
  • Effect of Pd addition on crystal structures of two nickel silicides, NiSi and $NiSi_2$, is investigated by using an ab initio calculation. A Pd atom substitutes a Ni and Si site, respectively, to evaluate the preferable site between them. Pd prefers Ni site to Si site in NiSi, while it prefers Si site to Ni site in $NiSi_2$. The calculated total energy also indicates that the Pd substitution to Si site stabilizes the $NiSi_2$ structure. This calculated data matches well with the experimental data obtained from Atom probe.

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