Nickel Tolerance and the Complexing Role of Histidine in Raphanus sativus

The effect of nickel (Ni) on growth and some tolerance strategies with regard to heavy metal tolerance mechanism was investigated in radish (Raphanus sativus) seedlings. The protective effect of histidine on nickel stress conditions was also monitored. The seedling growth decreased with an increase in metal concentrations. The inhibitory effect was more pronounced in the root elongation than in the shoot elongation. Increasing Ni supply showed a progressive increase of Ni concentrations in the roots and shoots. Ni content was higher in the shoots than in the roots. In the presence of nickel, radish exhibited an antioxidative defense mechanism, as evidenced by the elevated malondialdehyde(MDA), showing that nickel is an efficient inducer of lipid peroxidation. Exposure of radish to elevated concentrations of nickel was accompanied by an increase in the proline content. Supplemental histidine in the presence of Ni ameliorated metal-induced growth inhibition and lipid peroxidation. Combinations of Ni and histidine resulted in a significant decline in proline content compared with Ni stress alone, indicating that histidine may provide protection against the adverse effect of Ni stress. From the results it is suggested that histidine is an efficient chelator by complexing metal ion within the plant and may playa role in nickel tolerance implicated in metal detoxification.

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