• New & Renewable Energy
• /
• v.1 no.1 s.1
• /
• pp.37-43
• /
• 2005

High-efficiency silicon solar cells have potential applications on mobile electronics and electrical vehicles. The fabrication processes of the high efficiency cells necessitate com placated fabrication precesses and expensive materials. Ti/Pd/Ag metal contact has been used only for limited area In spite of good stability and low contact resistance because of Its expensive material cost and precesses. Screen printed contact formed by Ag paste causes a low fill factor and a high shading loss of commercial solar cells because of high contact resistance and a low aspect ratio. Low cost Ni/Cu metal contact has been formed by using a low cost electroless and electroplating. Nickel silicide formation at the interface enhances stability and reduces the contact resistance resulting In an energy conversion efficiency of $20.2\%\;on\;0.50{\Omega}cm$ FZ wafer. Tapered contact structure has been applied to large area solar cells with $6.7\times6.7cm^2$ in order to reduce power losses by the front contact The tapered front metal contact Is easily formed by the electroplating technique producing $45cm^2$ solar cells with an efficiency of $21.4\%$ on $21.4\%\;on\;2{\Omega}cm$ FZ wafer.

• 한국태양에너지학회:학술대회논문집
• /
• 2009.04a
• /
• pp.225-229
• /
• 2009

The front metal contact is one of the most important element influences in efficiency in the silicon solar cell. First of all selective of the material and formation method is important in metal contacts. Commercial solar cells with screen-printed contacts formed by using Ag paste process is simple relatively and mass production is easy. But it suffer from a low fill factor and a high shading loss because of high contact resistance. Besides Ag paste too expensive. because of depends income. This paper applied for Ni/Cu metallization replace for paste of screen printing front metal contact. Low cost Ni and Cu metal contacts have been formed by using electroless plating and electroplating techniques to replace the screen-printed Ag contacts. Ni has been proposed as a suitable silicide for the salicidation process and is expected to replace conventional silicides. Copper is a promising material for the electrical contacts in solar cells in terms of conductivity and cost. In experiments Ni/Cu metal contact applied same grid formation of screen-printed solar cell. And it has variation of different grid spacing. It was verified that the wide spacing of grid finger could increase the series resistance also the narrow spacing of grid finger also implies a grid with a higher density of grid fingers. Through different grid spacing found alteration of efficiency.

• Nano
• /
• v.13 no.11
• /
• pp.1850134.1-1850134.10
• /
• 2018

Increasing active sites and enhancing electric conductivity are critical factors to improve sensing performance toward phenol. Herein, Ni nanoparticle was successfully anchored on acidified multiwalled carbon nanotube (a-MWCNT) surface by electroless plating technique to avoid Ni nanoparticle agglomeration and guarantee high conductivity. The crystal structure, phase composition and surface morphology were characterized by XRD, SEM and TEM measurement. The as-prepared Ni/a-MWCNT nanohybrid was immobilized onto glassy carbon electrode (GCE) surface for constructing phenol sensor. The phenol sensing performance indicated that Ni/a-MWCNT/GCE exhibited an amazing detection performance with rapid response time of 4 s, a relatively wide detection range from 0.01 mM to 0.48 mM, a detection limit of $7.07{\mu}M$ and high sensitivity of $566.2{\mu}A\;mM^{-1}\;cm^{-2}$. The superior selectivity, reproducibility, stability and applicability in real sample of Ni/a-MWCNT/GCE endowed it with potential application in discharged wastewater.

• Korean Journal of Materials Research
• /
• v.6 no.10
• /
• pp.1007-1016
• /
• 1996

무전해도금법에 의한 퍼멀로이 박막의 도금 최적조건 규명 및 자기적 특성 향상을 위하여 퍼멀로이 박막의 미세구조 및 자기적 특성 등을 연구하였다. 소지는 알루미나를 사용하였으며, 환원제는 boron을 포함하는 Ni-Fe-B도금막이 형성되는 DMAB(dimethylamine borane)를 사용하였다. 도금시 인가된 도금막이 무자장하에서 도금된 도금막과 비교하여 기공이 적고, 조밀한 막이 형성됨을 SEM을 통하여 확인하였다. 도금속도는 온도, pH, DMAB 농도가 증가할수록 증가하였다. 도금막에 함유되는 boron의 함량은 pH가 감소할수록, 온도와 DMAB농도가 증가할수록 증가하였다. 도금막 보자력값은 30$0^{\circ}C$에서 1시간 열처리하였을 때 약 4.5Oe로 감소하였고, 포화자기유도값은 3-5kG 정도 증가하였다. 이때 포화자기유도값은 자장하에서 도금된 후 열처리한 도금막이 무자장하에서 도금된 후 열처리한 도금막에 비하여 1.7kG 정도 높았다. 또한 열처리 후의 도금막이 열처리 전의 도금막에 비하여 기공이 적고 조밀한 도금막을 형성함을 볼 수 있었다.

• Journal of Hydrogen and New Energy
• /
• v.4 no.2
• /
• pp.23-28
• /
• 1993

The $(LM)Ni_{4.5}Co_{0.1}Mn_{0.2}Al_{0.2}$ hydrogen storage alloy powders were conducted 25wt% electroless copper plating in an acidic bath. For the preparation of a hydride electrodes, the copper coated alloy powder was mixed with Si-sealant(organosilicon) and compacted with $6t/cm^2$ at room temperature. The electrode characteristics were examined through electrochemical measurements in a half cell. As a sealant contents increased, the initial discharge capacity of si-sealant bounded electrode was lower and the activation rate in high current density was slower. For extended cycles, however, the electrodes with the Si-sealant were superior in a high rate discharge and useful range of temperature over the sealant-free electrode. In addition, the cycle life increased with increasing the amount of Si-sealant added. It can be suggested from the results that the Si-sealant as a binder could be applied to the preparation of the metal hydride electrode.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2015.11a
• /
• pp.316-317
• /
• 2015

무전해 도금은 금속이온을 수용액 상태에서 석출시키는 방법으로서 전기를 사용하지 않고 환원제의 자기촉매 방법에 의해 금속을 도금하는 방법이다. 두께를 확보하기 위한 화학적 무전해 도금에서는 환원제를 사용하지만 선택적 도금에서는 환원제를 사용하지 않는 치환도금법이 주로 사용되고 있다. 최근 전자파 차폐, 포장기술의 응용이 확대되면서 정보 통신 스마트폰, 전자기술과 자동차 산업에 많은 고분자 복합도금이 널리 확대되고 있다. 최근 해외에서도 고분자와 비금속재료의 복합도금 기술이 관심을 끌고 있다. 2013년 중국의 J. B. Fei 등은 Ag나노체인 합성물에 필요한 비대칭형의 공유결합으로써 나선형의 자기배열 $AgNO_3$와 멜라민 특성을 보고하였다. 무전해 니켈 복합도금은 내마모성, 내식성과 비금속재료의 선택적인 첨가로 다양한 고분자 첨가물을 적용할 수 있다. 유전상수가 낮고 열적 안정성이 우수하여 노트북 컴퓨터나 스마트폰 표면에 니켈-폴리이미드 복합도금도 개발되고 있다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.322-322
• /
• 2013

최근 전자제품들의 소형화, 경량화, 다기능화가 활발히 진행됨에 따라, 고성능의 고출력용 인쇄회로기판(PCB)의 개발이 요구되고 있다. PCB는 전자제품의 각 부품을 전기적으로 연결하는 통로로서 전자제품의 소형화, 다기능화에 따라 고집적화가 요구되고 있다. 하지만 모든 전자장비의 고장의 85% 정도가 발열에 의한 것으로, PCB의 고집적화에 따른 발열문제가 매우 중요한 이슈가 되고 있다. 최근에는 이러한 문제점을 해결하기 위해 PCB의 방열층으로 양극 산화막을 금속 기판 위에 형성하고 이 절연층 위에 금속층을 회로로서 형성하는 방열 PCB 기판에 대한 연구가 활발히 진행되고 있다. 최근까지, 금속층 회로 형성을 위해 무전해 Ni 도금에 대한 연구가 활발히 이루어져 왔다. 하지만 주로 화학적, 전기화학적 관점에서 많은 연구자들에 의해 조사 연구되어 왔다. 본 실험에서는 anodized Al 절연층 위의 회로전극 부분으로 스크린 방법으로 Ag paste를 패턴 인쇄한 뒤, 무전해도금 방식으로 저렴한 Ni 전면 회로전극을 형성하여 전기전도도를 높이고, 저항을 낮출 수 있는 회로로서 기판의 손상을 최소화하고 선택적으로 Ag 패턴에만 Ni 전극회로를 형성시키는 것을 목표로 연구하였다. Ni-B 무전해 도금시 도금조의 온도는 $65^{\circ}C$, 무전해 도금액의 pH는 ~7 (중성)로 유지하였다. Al2O3 기판을 이용한 Ag Paste 패턴 위에 증착된 Ni-B 박막의 특성을 분석하기 위해 X-ray diffraction (XRD), AFM (Atomic Force Microscopy), SEM (Scanning Electron Microscope), XPS (X-ray Photoelectron Spectroscopy)을 이용하여 Ni-B 박막의 특성을 분석하였다.

• Proceedings of the KAIS Fall Conference
• /
• 2004.06a
• /
• pp.69-71
• /
• 2004

새로운 기술인 Momentary mold surface heating(MmSH)은 기존의 사출성형법으로 제조된 Acrylonitrile Butadiene Styrene(ABS)의 단점을 개선한 사출성형법이다. MmSH로 제조된 ABS와 기존의 사출성형법으로 제조된 ABS의 도금특성을 도금욕 pH 변화에 따라 연구하였다. Sodium hypophosphite가 첨가된 무전해 Ni 도금욕의 PH가 증가할수록 도금 두께가 증가하였고 기존의 사출성형법으로 제조된 ABS의 경우 pH 5이상에서 4B의 밀착력을 가졌다. MmSH로 제조된 ABS의 경우 pH 6이상에서 5B인 12.3N/25mm 이상의 가장 우수한 밀착력을 나타내었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.339-339
• /
• 2007

Metal coating on ceramic powder has long been attracting interest for various applications such as superconductor where the brittle nature of high temperature ceramic superconductor was complemented by silver coating and metalloceramics where mechanical property improvement was achieved via electroless plating. More recently it has become of great interest in embedded passive device applications since metal coating on ceramic particles may result in the enhancement of the dielectric properties of ceramic-polymer composite capacitors. In our study, nickel ion-containing solution was used for coating commercial capacitor-grade $BaTiO_3$ powder. After filtering process, the powder was dried and heat-treated in 5% forming gas at $900^{\circ}C$. XRD and TEM were utilized for the observation of crystallization behavior and morphology of the particles. It was found that the nickel coating characteristics were strongly dependent on the several parameters and processing variables, such as starting $BaTiO_3$ particle size, nickel source, solution chemistry, coating temperature and time. In this paper, the effects of these variables on the coating characteristics will be presented in some detail.

• Applied Chemistry for Engineering
• /
• v.22 no.6
• /
• pp.672-678
• /
• 2011

In this work, carbon fibers were electrolessly Ni-plated in order to investigate the effect of metal plating on the electromagnetic shielding effectiveness (EMI-SE) of Ni-coated carbon fibers-reinforced epoxy matrix composites. The surfaces of carbon fibers were characterized by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Electric resistance of the composites was tested using a 4-point-probe electric resistivity tester. The EMI-SE of the composites was evaluated by means of the reflection and adsorption methods. From the results, it was found that the EMI-SE of the composites enhanced with increasing Ni plating time and content. In high frequency region, the EMI-SE didn't show further increasing with high Ni content (Ni-CF 10 min) compared to the Ni-CF 5 min sample. In conclusion, Ni content on the carbon fibers can be a key factor to determine the EMI-SE of the composites, but there can be an optimized metal content at a specific electromagnetic frequency region in this system.