• 제목/요약/키워드: Nd:glass

검색결과 196건 처리시간 0.033초

Nd:YAG 레이저빔에 의한 PDP 방전셀의 구조 형성 (Formation of PDP cell structure using Nd:YAG laser beam)

  • 안민영;이경철;이홍규;이천
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 춘계학술대회 논문집 디스플레이 광소자 분야
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    • pp.129-132
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    • 2000
  • The PDP(Plasma Display Panel) barrier rib material on the glass substrate was patterned for fabrication of the PDP cell using Nd:YAG laser(1064 nm) which can generate the second(532 nm) and forth(266 nm) harmonic wave by HGM(harmonic generation modules). At a scan speed of 20 ${\mu}m/s$ with the second harmonic wave(532 nm) of Nd:YAG laser, the etching threshold laser fluence of the PDP material was 6.5 $mJ/cm^2$ and a sample(thickness = 180 ${\mu}m$) on the glass substrate was removed clearly at a laser fluence of 19.5 $mJ/cm^2$. In order to increase the throughput of the fabrication we divided a single-beam into multi-beams by using a metal mask between the sample and the focusing lens. As a result, 10 lines of PDP cell were formed by one laser beam scanning at a scan speed of 200 ${\mu}m/s$ and a laser fluence of 2.86 $J/cm^2$.

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Effect of Nd:YVO4 Laser Beam Direction on Direct Patterning of Indium Tin Oxide Film

  • Ryu, Hyungseok;Lee, Dong Hyun;Kwon, Sang Jik;Cho, Eou Sik
    • 반도체디스플레이기술학회지
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    • 제18권3호
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    • pp.72-76
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    • 2019
  • A Q-switched diode-pumped neodymium-doped yttrium vanadate (YVO4, λ =1064nm) laser was used for the direct patterning of indium tin oxide (ITO) films on glass substrate. During the laser direct patterning, the laser beam was incident on the two different directions of glass substrate and the laser ablated patterns were compared and analyzed. At a low scanning speed of laser beam, the larger laser etched lines were obtained by laser beam incident in reverse side of glass substrate. On the contrary, at a higher scanning speed, the larger etched pattern sizes were found in case of the beam incidence from front side of glass substrate. Furthermore, it was impossible to find no ablated patterns in some laser beam conditions for the laser beam from reverse side at a much higher scanning speed and repetition rate of laser beam. The laser beam is expected to be transferred and scattered through the glass substrate and the laser beam energy is thought to be also dispersed and much more influenced by the overlapping of each laser beam spot.

Application of 532 nm YAG-Laser Annealing to Crystallization of Amorphous Si Thin Films Deposited on Glass Substrates

  • Lee, Jong-Won;So, Byung-Soo;Chung, Ha-Seung;Hwang, Jin-Ha
    • 한국재료학회지
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    • 제18권3호
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    • pp.113-116
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    • 2008
  • A 532 nm Nd-YAG laser was applied to crystallize amorphous Si thin films in order to evaluate the applicability of a Nd-YAG laser to low-temperature polycrystalline Si technology. The irradiation of a green laser was controlled during the crystallization of amorphous Si thin films deposited onto glass substrates in a sophisticated process. Raman spectroscopy and UV-Visible spectrophotometry were employed to quantify the degree of crystallization in the Si thin films in terms of its optical transmission and vibrational characteristics. The effectiveness of the Nd-YAG laser is suggested as a feasible alternative that is capable of crystallizing the amorphous Si thin films.

BaO-B2O3-SiO2-K2O-xTiO2 Glass의 첨가에 의한BaNd2Ti5O14-Glass 복합체의 마이크로파 유전특성 (Microwave Dielectric Properties of BaNd2Ti5O14−BaO−B2O3-K2O-SiO2-xTiO2 Glass Composites)

  • 김동은;이성민;김형태;김형순
    • 한국세라믹학회지
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    • 제44권2호
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    • pp.110-115
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    • 2007
  • The effects of $TiO_2$ in the glasses on the shrinkage and dielectric properties of BNT-glass composites have been investigated. Without $TiO_2$ addition, BNT-glass composite showed two humps in the shrinkage curve, which are related with crystallization of $BaTi(BO_3)_2\;and\;Bi_4Ti_3O_{12}$. However, the increase of $TiO_2$ addition resulted in the decrease of 2nd hump in the shrinkage. The increased dielectric constant with $TiO_2$ addition might be due to the reduced crystallization of $Bi_4Ti_3O_{12}$. A dielectric constant of 52, a quality factor of 5088 GHz, and a temperature coefficient of resonant frequency of $-0.16ppm/^{\circ}C$ were obtained for a specimen containing $TiO_2$-added glasses, without sacrificing the benefits of high ${\varepsilon}_r$ and low TCF of BNT ceramics.

플라즈마 디스플레이 패널을 위한 레이저 직접 패터닝 (Laser-Direct Patterning for Plasma Display Panel)

  • 안민영;이경철;이홍규;이천
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.99-102
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    • 1999
  • A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

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플라즈마 기반연구를 위한 1 kJ 급 Nd:Glass 레이저 구축 (Design and development of 1 kJ Md:Glass laser for the basic research of plasma)

  • 홍성기;임창환;위상봉
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1457-1458
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    • 2006
  • 좁은 공간에 고출력 고에너지 레이저를 집속할 때 발생하는 고밀도, 고에너지 플라즈마 연구는 상태방정식, 실험실 천체물리, 전자가속 둥 기초 분야 뿐 아니라 X-선 및 극자외선 광원 개발, 원전 유지보수 등 다양한 산업 활용 분야를 갖고 있어 최근 미국, 프랑스, 일본, 중국 등 선진강대국에서 크게 주목 받고 있는 연구 분야이다. 한국원자력연구소는 물리나 광학의 원천기술 뿐 아니라 미래 산업에 파급효과 큰 플라즈마 기반 연구를 위하여 1 kJ급 고에너지 Nd:Glass 레이저 시설을 구축하고 있다.

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분할디스크형 글라스레이저 증폭기의 온도분포특성에 관한 연구 (Study on the properties of temperature distribution at the split-disk geometry glass laser amplifier)

  • 김병태
    • 한국광학회지
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    • 제3권4호
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    • pp.227-233
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    • 1992
  • 분할디스크형 글라스레이저 증폭기를 개발하기 위하여 이를 해석 설계할 수 있는 시뮬레이션 코드를 작성했다. 레이저매질에서의 열부하를 감소시키고, 플래시램프의 방사스펙트럼과 레이저글라스의 흡수 스펙트럼 간의 결합효율을 높이기 위해서는 전류밀도를 2000-4000A/$\textrm{cm}^{2}$로 유지하여 단파장에서의 방사에너지를 줄여야 한다. 디스크 증폭기에서 같은 부피를 갖는 매질을 3등분하여 냉각표면적을 3배로 늘렸을 때 온도상승치는 30% 정도로 떨어졌다. 단면펌핑 분할 디스크형 증폭기의 설계에서는 각 글라스 간의 $Nd^{3+}$ 도핑율에 차등을 주어야 하고 플래시램프 앞에 있는 매질의 흡수계수 $\alpha$ 와 두께 d의 곱인 $\alpha$d가 0.26 전후가 적절하다는 것을 알았다.

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