• Biotechnology and Bioprocess Engineering:BBE
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• v.9 no.2
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• pp.76-85
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• 2004

Biodevices composed of biomolecular layer have been developed in various fields such as medical diagnosis, pharmaceutical screening, electronic device, photonic device, environmental pollution detection device, and etc. The biomolecules such as protein, DNA and pigment, and cells have been used to construct the biodevices such as biomolecular diode, biostorage device, bioelectroluminescence device, protein chip, DNA chip, and cell chip. Substantial interest has focused upon thin film fabrication or the formation of biomaterials mono- or multi-layers on the solid surfaces to construct the biodevices. Based on the development of nanotechnology, nanoscale fabrication technology for biofilm has been emerged and applied to biodevices due to the various advantages such as high density immobilization and orientation control of immoblized biomolecules. This review described the nanoscale fabrication of biomolecular film and its application to bioelectronic devices and biochips.

• Journal of Sensor Science and Technology
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• v.32 no.4
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• pp.252-256
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• 2023

A one-step method for nanoscale patterning of silver ionic ink on a substrate is developed using a microscale, elastic mold deformation. This method yields unique micro/nanoscale metallic structures that differ from those produced using the original molds. The linewidth of these metallic structures is significantly reduced (approximately 10 times) through the sidewall deformation of the original mold cavity on a thin liquid film, as verified by finite element analysis. The process facilitates the fabrication of various, isolated and complex micro/nanoscale metallic structures with negligible residual layers at low cost and high throughput. These structures can be utilized for various applications, including optoelectronics, wearable sensors, and metaverse-related devices. Our approach offers a promising tool for manipulation and fabrication of micro/nanoscale structures of various functional materials.

• Proceedings of the Korean Magnestics Society Conference
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• 2007.05a
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• pp.197.1-197.1
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• 2007

• Journal of the Korean Society for Precision Engineering
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• v.22 no.2
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• pp.194-201
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• 2005

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

• International Journal of Precision Engineering and Manufacturing
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• v.7 no.4
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• pp.8-13
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• 2006

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.426-428
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• 2007

A simple method is presented for fabricating micro/nanoscale combined hierarchical structures using a two-step UV-assisted capillary molding technique. This lithographic method consists of two steps: (i) fabrication of partially cured polymer microstructures using a PDMS mold and (ii) subsequent nanofabrication using a high-resolution polyurethane acrylate (PUA) mold on top of the pre-formed microstructures. Using this technique, various micro/nano hierarchical structures were fabricated with minimum resolution down to 70 nm over a large area with very good reproducibility.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.105.2-105.2
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• 2016

For the rational design and facile fabrication of novel nanostructures, we present a new approach to generating arrays of three-dimensionally tunable nanostructures by exploiting light-matter interaction. To create controlled three-dimensional (3D) nanostructures, we utilize the 3D spatial distribution of light, induced by the light-matter interaction, within the matter to be patterned. As a systematic approach, we establish 3D modeling that integrates the physical and chemical effects of the photolithographic process. Based on a comprehensive analysis of structural formation process and nanoscale features through this modeling, we are able to realize three-dimensionally tunable nanostructures using facile photolithographic process. Here we first demonstrate the arrays of three-dimensionally controlled, stacked nanostructures with nanoscale, tunable layers. We expect that the promising strategy would open new opportunities to produce the arrays of tunable 3D nanostructures using more accessible and facile fabrication process for various biomedical applications ranging from biosensors to drug delivery devices.

• Journal of the Korean Society for Precision Engineering
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• v.33 no.4
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• pp.265-270
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• 2016

Recently, many studies have been conducted on the nano-scale fabrication technology using twophoton- absorbed polymerization induced by a femtosecond laser. The nano-stereolithography process has many advantages as a technique for direct fabrication of true three-dimensional shapes in the range over several microns with sub-100 nm resolution, which might be difficult to obtain by using general nano/microscale fabrication technologies. Therefore, two-photon induced nano-stereolithography has been recently recognized as a promising candidate technology to fabricate arbitrary 3D structures with sub-100 nm resolution. Many research works for fabricating novel 3D nano/micro devices using the two-photon nano-stereolithography process, which can be utilized in the NT/BT/IT fields, are rapidly advancing.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.247-247
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• 2012

Plasmon subwavelength nanostructures enable the structurally modulated color due to the resonance conditions for the specific wavelength range of light with the nanoscale hole arrays on a metal layer. While the unique properties offered from a single layer of metal may open up the potential applications of integrated devices to displays and sensors, fabrication requirements in nanoscale, typically on the order of or smaller than the wavelength of light in a corresponding medium can limit the cost-effective implementation of the plasmonic nanostructures. Simpler nanoscale replication technologies based on the soft lithography or roll-to-roll nanoimprinting can introduce economically feasible manufacturing process for these devices. Such replication requires an optimal design of a master template to produce a stamp that can be applied for a roll-to-roll nanoimprinting. In this paper, a master mold with subwavelength nanostructures is fabricated and optimized using focused ion beam for the applications to nanoimprinting process. Au thin film layer is deposited by sputtering on a glass that serves as a dielectric substrate. Focused ion beam milling (FIB, JEOL JIB-4601F) is used to fabricate surface plasmon subwavelength nanostructures made of periodic hole arrays. The light spectrum of the fabricated nanostructures is characterized by using UV-Vis-NIR spectrophotometer (Agilent, Cary 5000) and the surface morphology is measured by using atomic force microscope (AFM, Park System XE-100) and scanning electron microscope (SEM, JEOL JSM-7100F). Relationship between the parameters of the hole arrays and the corresponding spectral characteristics and their potential applications are also discussed.

• Journal of the Korean Society for Precision Engineering
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• v.31 no.3
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• pp.207-213
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• 2014

A study was carried out to fabricate the cutting tool geometry with micro/nanoscale on the single crystal diamond tool by using the FIB. The FIB technique is an ideal tool for TEM sample preparation that allows for the fabrication of electron-transparent foils. The FIB is appropriate techniques to sample and subsequently define the chemical composition and the structural state of mineral inclusion on the micro/nanoscale. The combination of FIB with a SEM allows for 3D information to be obtained from samples including 3D imaging. Cutting strategies were demonstrated to improve the performance of cutting tool geometry and to generate high aspect ratio micro cutting tool. A finely focused beam of 30keV Ga+ ions was used to mill cutting tool shapes for various micro patterns. Therefore FIB sputtering is used to shape a variety of cutting tools with dimensions in the $1-5{\mu}m$ range and cutting edge radii of curvature of under 50nm.