• Rapid Communication in Photoscience
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• 제1권2호
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• pp.62-62
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• 2012

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2016년도 임시총회 및 하계학술연구발표회
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• pp.130-130
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• 2016

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2004년도 추계학술대회논문집
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• pp.125-128
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• 2004

AFM(Atomic Force Microscope) becomes a versatile tool in the nanoscale measurements and processes. Especially the tapping mode is a very useful mode in AFM operation to measure and process at the nanoscale. Although the tapping mode has a great potential for the novel techniques such as phase imaging, however, it is not clearly known the fundamental mechanics affected by complex tip-sample interactions. This paper shows the various nonlinear dynamic features in tapping mode AFM microcantilevers including hysteretic jumps and period doublings of the microcantilevers. Also it is discussed the complex dynamics of CNT(Carbon Nanotube) probes and the opportunities on the nanoscale nonlinear dynamics.

• Bulletin of the Korean Chemical Society
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• 제35권9호
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• pp.2625-2629
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• 2014

Platelets are anuclear discoid-shaped blood cells with key roles in human body. To understand the mechanisms of their activation process, it is required to have analytical imaging techniques capable of acquiring platelet images under fully hydrated conditions. Herein, for the first time, we demonstrate the capability of synchrotron-based transmission X-ray microscopy (TXM) to study platelets (resting and ADP activated) under hydrated and air-dried conditions. To confirm the biological imaging capability of TXM, fixed platelets were imaged and compared with whole mount electron microscopy (EM) images. TXM provided morphological information with sufficient spatial resolution with simple and quick sample preparation procedure. We also observed temporal changes during the platelet activation, which initially had a discoid shape (0 s), formed pseudopodia (30 s) and generated a network of fibrin (5 min). Our results clearly demonstrate the potential of TXM technique to study fully hydrated biological samples under in situ conditions.

• 반도체디스플레이기술학회지
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• 제15권2호
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• pp.32-37
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• 2016

Sidewall angle (SWA) of an absorber stack in extreme ultraviolet lithography mask is considered to be $90^{\circ}$ ideally, however, it is difficult to obtain $90^{\circ}$ SWA because absorber profile is changed by complicated etching process. As the imaging performance of the mask can be varied with this SWA of the absorber stack, more complicated optical proximity correction is required to compensate for the variation of imaging performance. In this study, phase shift mask (PSM) is suggested to reduce the variation of imaging performance due to SWA change by modifying mask material and structure. Variations of imaging performance and lithography process margin depending on SWA were evaluated through aerial image and developed resist simulations to confirm the advantages of PSM over the binary intensity mask (BIM). The results show that the variations of normalized image log slope and critical dimension bias depending on SWA are reduced with PSM compared to BIM. Process margin for exposure dose and focus was also improved with PSM.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2004년도 춘계학술대회논문집
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• pp.83-86
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• 2004

Carbon nanotube (CNT) tips in tapping mode atomic force microscopy (AFM) enable very high-resolution imaging, measurements, and manipulation at the nanoscale. We present recent results based on experimental analysis that yield new insights into the dynamics of CNT probe tips in tapping mode AFM. Experimental measurements are presented of the frequency response and dynamic amplitude-distance data of a high-aspect-ratio multi-walled (MW) CNT tip to demonstrate the non-linear features including tip amplitude saturation preceding the dynamic buckling of the MWCNT. Surface scanning is performed using a MWCNT tip on a SiO$_2$ grating to verify the imaging instabilities associated with MWCNT buckling when used with normal control schemes in the tapping mode. Lastly, the choice of optimal setpoints for tapping mode control using CNT probe tip are discussed using the experimental results.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2006년도 춘계학술대회논문집
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• pp.1391-1395
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• 2006

In non-contact mode atomic force microscopy, the response of a resonating tip is used to measure the nanoscale topography and other properties of a sample surface. However, the tip-surface interactions can affect the tip response and destabilize the non-contact mode control. Especially it is difficult to obtain a good scanned image of high adhesion surfaces such as polymers using conventional hard NCHR tip and non-contact mode control. In this study, experimental investigation is made on the non-contact mode imaging and we report the microcantilever having low stiffness (OMCL) is useful to measure the properties of samples such as elasticity. In addition, we proved that it was adequate to use low stiffness microcantilever to obtain a good scanned image in AFM for the soft and high adhesion sample.

• 한국식물병리학회:학술대회논문집
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• 한국식물병리학회 2005년도 한국식물병리학회 임시총회 및 춘계학술발표회
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• pp.92.1-92.1
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• 2005

• 반도체디스플레이기술학회지
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• 제14권3호
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• pp.1-5
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• 2015

In photolithography process, resolution enhancement techniques such as optical proximity correction (OPC) and phase shift mask (PSM) have been applied to improve resolution. Especially, sub-resolution assist feature (SRAF) is one of the most important OPC to enhance image quality including depth of focus (DOF). However, imaging performance of the mask could be varied with the diffraction order amplitude changed by inserting SRAF. Therefore, in this study, we investigated the imaging properties and process margin of attenuated PSM with SRAF. Reflectivities of attenuated PSMs at 13.5 nm were 3, 6, 9% and simulation was performed by $PROLITH^{TM}$. As a result, aerial image properties and DOF as well as diffraction efficiency were improved by increasing the reflectivity of attenuated PSM. Additionally, printed critical dimension variations depending on SRAF width and space error were also reduced for attenuated PSM with high reflectivity. However, SRAF could be printed when reflectivity of attenuated PSM is high enough. In conclusion, optimization of reflectivity of attenuated PSM and SRAF to prevent side-lobe from being printed is needed to be considered.

• 반도체디스플레이기술학회지
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• 제15권3호
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• pp.1-5
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• 2016

In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.