Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet Mask |
Jang, Yong Ju
(Department of Nanoscale Semiconductor Engineering)
Kim, Jung Sik (Department of Nanoscale Semiconductor Engineering) Hong, Seongchul (Department of Materials Science and Engineering, Hanyang University) Ahn, Jinho (Department of Materials Science and Engineering, Hanyang University) |
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