• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.84-84
• /
• 2010

In this study, we report on the novel lithographic patterning method to fabricate organic-semiconductor devices based on photo and e-beam lithography with well-known silicon technology. The method is applied to fabricate pentacene-based organic field effect transistors. Owing to their solubility, sub-micron sized patterning of P3HT and PEDOT has been well established via micromolding in capillaries (MIMIC) and inkjet printing techniques. Since the thermally deposited pentacene cannot be dissolved in solvents, other approach was done to fabricate pentacene FETs with a very short channel length (~30nm), or in-plane orientation of pentacene molecules by using nanometer-scale periodic groove patterns as an alignment layer for high-performance pentacene devices. Here, we introduce the atomic layer deposition of $Al_2O_3$ film on pentacene as a passivation layer. $Al_2O_3$ passivation layer on OTFTs has some advantages in preventing the penetration of water and oxygen and obtaining the long-term stability of electrical properties. AZ5214 and ma N-2402 were used as a photo and e-beam resist, respectively. A few micrometer sized lithography patterns were transferred by wet and dry etching processes. Finally, we fabricated sub-micron sized pentacene FETs and measured their electrical characteristics.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.12-12
• /
• 2010

By using scanning tunneling microscopy/spectroscopy (STM/S), we can make images of various physical properties in nanometer-scale spatial resolutions. Here, I demonstrate imaging of two electron-correlated subjects; screening and superconductivity by STM/S. The electrostatic potential around a charge is described with the Coulomb potential. When the charge is located in a metal, the potential is modified because of the free electrons in the host. The potential modification, called screening, is one of the fundamental phenomena in the condensed matter physics. Using low-temperature STM we have developed a method to measure electrostatic potential in high spatial and energy resolutions, and observed the potential around external charges screened by two-dimensional surface electronic states. Characteristic potential decay and the Friedel oscillation were clearly observed around the charges [1]. Superconductivity of nano-size materials, whose dimensions are comparable with the coherence length, is quite different from their bulk. We investigated superconductivity of ultra-thin Pb islands by directly measuring the superconducting gaps using STM. The obtained tunneling spectra exhibit a variation of zero bias conductance (ZBC) with a magnetic field, and spatial mappings of ZBC revealed the vortex formation [2]. Size dependence of the vortex formation will be discussed at the presentation.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.144.1-144.1
• /
• 2013

Recently, we have developed the local oxidization and hydrogenization method for graphene layer using atomic force microscope(AFM) tip at room temperature and ambient pressure. With this method we could create locally oxidized or hydrogenized area on the graphene layer with various size from nanometer to micrometer scale, by controlling the amplitude and polarity of the voltage supplied between conducting AFM tip and the graphene layer. We investigated the chemical states of functionalized C atoms in the graphene layer using scanning photoelectron microscopy. By measuring C 1s core level X-ray Photoemission Spectra of the C atoms and suitable fitting process carried on the measured spectra, we could obtain the fraction of oxidization and hydrogenization under various condition, and the evolution of each chemical state during thermal annealing process.

• Korean Journal of Materials Research
• /
• v.12 no.7
• /
• pp.517-521
• /
• 2002

Europium-activated $Ga_2$$O_3$ phosphor powders were prepared by Pechini method from the mixed aqueous solutions of gallium(III) nitrate, europium(III) nitrate, ethylene glycol and citric acid. The phase formation process and particle shape of the powders obtained were investigated by means of TG/DTA, XRD and SEM. It was found that the powders were amorphous or ${\gamma}$-$Ga_2$$O_3$-like phase up to $500^{\circ}C$ and then transformed into $\beta$- $Ga_2$$O_3$ phase above $600 ^{\circ}C$. The powders calcined below $1000^{\circ}C$ were spherical and nanometer-sized. Photoluminescence spectra measured at room temperature showed that the highest luminescence intensity was obtained for the sample synthesized under the conditions of 2 mol% Eu concentration and heat treatment at $1000^{\circ}C$.

• Transactions of Materials Processing
• /
• v.12 no.7
• /
• pp.640-646
• /
• 2003

The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

• Journal of the Korean Society for Precision Engineering
• /
• v.23 no.8 s.185
• /
• pp.39-46
• /
• 2006

Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin mask layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The mask layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2005.10a
• /
• pp.326-329
• /
• 2005

As a flexible method to fabricate sub-micrometer patterns, Focused Ion Beam (FIB) instrument and Self-Assembled Monolayer (SAM) resist are introduced in this work. FIB instrument is known to be a very precise processing machine that is able to fabricate micro-scale structures or patterns, and SAM is known as a good etch resistance resist material. If SAM is applied as a resist in FIB processing fur fabricating nano-scale patterns, there will be much benefit. For instance, low energy ion beam is only needed for machining SAM material selectively, since ultra thin SAM is very sensitive to $Ga^+$ ion beam irradiation. Also, minimized beam spot radius (sub-tens nanometer) can be applied to FIB processing. With the ultimate goal of optimizing nano-scale pattern fabrication process, interaction between SAM coated specimen and $Ga^+$ ion dose during FIB processing was observed. From the experimental results, adequate ion dose for machining SAM material was identified.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.29 no.4 s.235
• /
• pp.512-518
• /
• 2005

Polymeric fibers with nanometer-scale diameters are produced by electrospinning. When the electrical forces at the surface of a polymer solution or melt overcome the surface tension then electrospinning occurs. Polycarbonate has been electrospun. Electrospun fibers are observed by scanning electron microscopy and transmission electron microscopy. The surface morphology of e-spun fiber has been studied by many variables that are involved in different polymer concentrations, solvent mixing ratios and ambient parameters. The average diameters of the electrospun fibers range from 200 nm to 4,570 nm when the PC concentration is decreasing from 15.5\;wt{\%}\;to\;25\;wt{\%}.$ The higher concentration of the polymer solution makes the fibers thicker due to preventing the fiber stretching. With respect evaporation effects, the solvent mixing ratios cause significant changes of the fiber size distribution. As a matter of fact the fiber diameter steadily increases with increasing amount of DMF until the solvent mixture is at THF:DMF ratio of 60:40.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.08a
• /
• pp.65-65
• /
• 2010

Extreme ultraviolet lithography (EUVL) is expected to be applied for making patterns below 32 nm in device industry. An ultrathin EUV photoresist (PR) of a few nm in thickness is required to reduce minimum feature size further. Here, we show that pentacene molecular layers can be employed as a new EUV resist for the first time. Dots and lines in nm scale are successfully realized using the new molecular resist. We clearly provide the mechanism for forming the nanopatterns with scanning photoemission microscope (SPEM), EUV interference lithography (EUV-IL), atomic force microscope (AFM), photoemission spectroscopy (PES), etc. The molecular PR has several advantages over traditional polymer EUV PRs; for example, high thermal/chemical stability, negligible outgassing, ability to control the height and width on the nanometer scale, leaving fewer residuals, no need for a chemical development process and thus reduction of chemical waste to make the nanopatterns. Besides, it could be applied to any substrate to which pentacene bonds chemically, such as $SiO_2$, SiN, and SiON, which is of importance in the device industry.

• Nano
• /
• v.13 no.12
• /
• pp.1850142.1-1850142.9
• /
• 2018

Modified titanate nanotubes (TNT) were tested for their adsorption of methylene blue (MB) from water solutions. They were obtained from the $TiO_2$ nanopowder using a standard alkaline hydrothermal method but in the stage of acid washing, when the titanate flakes begin to roll into nanotubes, magnetite nanoparticles were added. The $Fe_3O_4$ magnetic nanoparticles with diameter of around 2 nm and 12 nm were used in the tests. Significantly stronger adsorption of MB was observed when smaller nanoparticles were used compared to using larger nanoparticles and compared to the case of unmodified nanotubes. It was shown that the increased adsorption of MB is associated with a more negative value of ${\zeta}$-potential for titanates modified by the ultra-small nanoparticles. In the adsorption experiment, pH 7 was selected. These results may prove to be of great importance in the case of potential applications corresponding to the use of such material for wastewater purification.