• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2007.06a
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• pp.230-233
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• 2007

A system of anodic process of aluminum thin film has implemented for nanofabrication. The manufactured equipment consists of three main parts: chiller, reaction bath and power supply. The chiller module consists of refrigeration compressor, copper tube and coolant with a thermostat. The reaction bath has kept in same temperature as a thermodynamic canonical ensemble system during the anodic reaction process. The magnetic bar has stirred oxalic acid in bath for uniform reaction. The DC power supply has applied into two electrodes, aluminum for anode and platinum for cathode in the oxalic acid. The anodization process results in the formation of nanoporous thin films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.12
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• pp.1271-1276
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• 2004

Two-dimensionally arrayed nanocolumn lattices were fabricated by using double-exposure laser holographic method. The hexagonal lattice was formed by rotating the sample with 60 degree while the square lattice by 90 degree before the second laser-exposure. The reactive ion etching for a typical time of 30 min using CH$_4$/H$_2$ plasma enhanced the aspect-ratio by more than 1.5 with a slight increase of the bottom width of columns. The etch-damage was observed by photoluminescence (PL) spectroscopy which was removed by the wet chemical etching using HBr/$H_2O$$_2$/$H_2O$ solution, leading into the enhanced PL intensities of the PCs.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1069-1072
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A $5{\times}5{\times}0.09$ inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and discuss the results including SEM images.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.199-202
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a 5$\times$5$\times$0.09 in. quartz stamp whose critical dimension is 377 nm was fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply tile fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer Experiments have shown that the multi-dispensing method can enable UV-NIL rising a large-area stamp.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2003.04a
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• pp.50-55
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• 2003

Atomic force microscope(AFM) techniques are increasingly used for tribological studies of engineering surfaces at scales ranging from atomic and molecular to microscale. AFM with suitable tips is being used for nanofabrication nanomachining purposes. In this paper, machining characteristics of silicon have been investigated by nano indentation and nano scratch. Mechanisms of material removal on the microscale are studied and the Taguchi method is introduced to acquire optimum parameters for nanomachining. This work shows effectiveness of the Taguchi method in nanomachining. Also, Acoustic Emission(AE) is introduced for the monitoring of nanomachining.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.23 no.4
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• pp.361-367
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• 2014

Ultra-precision positioning plays a crucial role in emerging technologies such as electronics, bioengineering, optics, and various nanofabrication technologies. As a result, various nanopositioning methods have been presented. In particular, nanopositioning using a flexure mechanism and piezo-electric actuator is one of the most valuable methods because of its friction-free motion and subnanometer-scale motion resolution. In this study, a rotational nanoactuator based on a right-circular flexure mechanism and piezo-electric actuator was developed through a consideration of the kinematics and structural deformation. An experimental setup was constructed to verify the performance expectation. Consequently, it was demonstrated that the developed system had a maximum rotational angle of about 0.01 rad, as well as sufficient linearity with respect to the input voltage.

• Journal of the Korean Chemical Society
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• v.56 no.5
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• pp.591-596
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• 2012

Preparation of $AlPMo_{12}O_{40}$ (AlPMo) salts, supported on mesostructured SBA-15 silica, by the reaction deposition strategy causes the formation of isolated AlPMo nanocrystals inside the nanotubular channels. The remarkable characteristic of the SBA-15 structure is that all the cylindrical pores are connected by some small channels. This makes the whole pore system in SBA-15 three-dimensional. We have used 2D hexagonal SBA-15 silicas as hard templates for the nanofabrication of AlPMo salt nanocrystal. The oxidation of alcohols occurs effectively and selectively with $H_2O_2$ as the oxidant. AlPMo salt nanocrystal was used as the catalyst.

• Journal of the Semiconductor & Display Technology
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• v.12 no.4
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• pp.15-20
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• 2013

Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1727-1732
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• 2008

We present a facile, yet versatile carbon nanofabrication method using electron beam lithography and resist pyrolysis. Various resist nanopatterns were fabricated using a negative electron beam resist, SAL-601, and were then subjected to heat treatment in an inert atmosphere to obtain carbon nanopatterns. Suspended carbon nanostructures were fabricated by wet-etching of an underlying sacrificial oxide layer. Free-standing carbon nanostructures, which contain 122 nm-wide, 15 nm-thick, and 2 ${\mu}m$-long nanobridges, were fabricated by resist pyrolysis and nanomachining processes. Electron beam exposure dose effects on resist thickness and pattern widening were studied. The thickness of the carbon nanostructures was thinned down by etching with oxygen plasma. An electrical biosensor utilizing carbon nanostructures as a conducting channel was studied. Conductance modulations of the carbon device due to streptavidin-biotin binding and pH variations were observed.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.475-476
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• 2006

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, HS(CH2)nX, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the well-known diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser.