• Title/Summary/Keyword: Nano-stage

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Effect of Nano Particles on Fertilized Egg of Crossostrea gigas (참굴(Crassostrea gigas) 수정란에 미치는 나노입자의 영향)

  • Lee, Byeong-Woo;Park, Chan-Il;Choi, Kwang-Soo;Kim, Mu-Chan
    • Journal of the Korean Society of Marine Environment & Safety
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    • v.14 no.1
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    • pp.9-14
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    • 2008
  • A Nano particle is a small particle with at least one dimension less than 100 nm Nanoparticle is currently used in an area cf intense scientific research, due to a wide variety cf potential applications in biomedical, optical, and electronic fields. In order to know the biological effect of the nine Nano particles on fertilized egg of Crassostrea gigas experiments were performed Development rates of control (free Nano particles) C. gigas to a particular larval stage (D-shape) was 78%. Development rate of C gigas to a parcicular larval stage (D-shape) after 24 hours exposure to 0.05ppm of AGZ020, Nano silver, P-25 and SnO were 22%, 52%, 58% and 76%, respectively. However, all fertilized eggs were destructed within 8 hours afters exposure to 20ppm of respective particles. On the other hand, All fertilized eggs were not affected after 24 hours respective exposure to 0.05ppm of In, Sb, Sn, Zn, and Ag-$TiO_2$ particles. However, development rates of C. gigas after 24 hours exposure to 20ppm of In, Sb, Sn, Zn, Ag-$TiO_2$ were 57%, 60%, 50%, 65%, and 64% respectively.

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Design of the LDO Regulator with 2-stage wide-band OTA for High Speed PMIC (고속 PMIC용 2단 광대역 OTA방식의 LDO 레귤레이터 설계)

  • Kwon, Bo-Min;Song, Han-Jung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.11 no.4
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    • pp.1222-1228
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    • 2010
  • This paper presents a design of the CMOS LDO regulator with a fast transient response for a high speed PMIC(power management integrated circuit). Proposed LDO regulator circuit consists of a reference voltage circuit, an error amplifier and a power transistor. 2-stage wide-band OTA buffer between error amplifier and power transistor is added for a good output stability. Although conventional source follower buffer structure is simple, it has a narrow output swing and a low S/N ratio. In this paper, we use a 2-stage wide-band OTA instead of source follower structure for a buffer. From HSPICE simulation results using a $0.5{\mu}m$ CMOS standard technology, simulation results were 16 mV/V line regulation and 0.007 %/mA load regulation.

Bimetallic Co/Zn-ZIF as an Efficient Photocatalyst for Degradation of Indigo Carmine

  • Nguyen, Thanh Nhan;Nguyen, Hoang Phuc;Kim, Tae-Ho;Lee, Soo Wohn
    • Korean Journal of Materials Research
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    • v.28 no.1
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    • pp.68-74
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    • 2018
  • Cobalt-incorporated zeolitic imidazolate framework ZIF-8 was synthesized by a simple one-pot synthesis method at room temperature. Powder X-ray diffraction patterns and energy dispersive X-ray spectrum confirmed the formation of the bimetallic Co/Zn-ZIF structure. UV-Vis diffuse reflectance spectra revealed that the bimetallic ZIF had a lower HOMO-LUMO gap compared with ZIF-8 due to the charge transfer process from organic ligands to cobalt centers. A hydrolytic stability test showed that Co/Zn-ZIF is very robust in aqueous solution - the most important criterion for any material to be applied in photodegradation. The photocatalytic efficiency of the synthesized samples was investigated over the Indigo Carmine (IC) dye degradation under solar simulated irradiation. Cobalt incorporated ZIF-8 exhibited high efficiency over a wide range of pH and initial concentration. The degradation followed through three distinct stages: a slow initial stage, followed by an accelerated stage and completed with a decelerated stage. Moreover, the photocatalytic performance of the synthesized samples was highly improved in alkaline environment rather than in acidic or neutral environments, which may have been because in high pH medium, the increased concentration of hydroxyl ion facilitated the formation of hydroxyl radicals, a reactive species responsible for the breaking of the Indigo Carmine structure. Thus, Co/Zn-ZIF is a promising and green material for solving the environmental pollution caused by textile industries.

Effects of TiN and ZrN Coating on Surface Characteristics of Orthodontic Wire (교정용 와이어의 표면특성에 미치는 TiN 및 ZrN 코팅영향)

  • Kim, W.G.;Kim, D.Y.;Choe, H.C.
    • Journal of the Korean institute of surface engineering
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    • v.41 no.4
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    • pp.147-155
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    • 2008
  • The dental orthodontic wire provides a good combination of strength, corrosion resistance and moderate cost. The purpose of this study was to investigate the effects of TiN and ZrN coating on corrosion resistance and physical property of orthodontic wire using various instruments. Wires(round type and rectangular type) were used, respectively, for experiment. Ion plating was carried out for wire using Ti and Zr coating materials with nitrogen gas. Ion plated surface of each specimen was observed with field emission scanning electron microscopy(FE-SEM), energy dispersive X-ray spectroscopy(EDS), atomic force microscopy(AFM), vickers hardness tester, and electrochemical tester. The surface of TiN and ZrN coated wire was more smooth than that of other kinds of non-coated wire. TiN and ZrN coated surface showed higher hardness than that of non-coated surface. The corrosion potential of the TiN coated wire was comparatively high. The current density of TiN coated wire was smaller than that of non-coated wire in 0.9% NaCl solution. Pit nucleated at scratch of wire. The pitting corrosion resistance $|E_{pit}-E_{rep}|$ increased in the order of ZrN coated(300 mV), TiN coated(120 mV) and non-coated wire(0 mV).

Electrochemical Characteristics of Osteoblast Cultured Ti-Ta Alloy for Dental Implant (골아세포가 배양된 치과 임플란트용 Ti-Ta합금의 전기화학적 특성)

  • Kim, W.G.;Choe, H.C.;Ko, Y.M.
    • Journal of the Korean institute of surface engineering
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    • v.41 no.2
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    • pp.69-75
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    • 2008
  • Electrochemical behaviors of surface modified and MC3T3-E1 cell cultured Ti-30Ta alloys have been investigated using various electrochemical methods. The Ti alloys containing Ta were melted by using a vacuum furnace and then homogenized for 6 hrs at $1000^{\circ}C$. MC3T3-E1 cell culture was performed with MC3T3-E1 mouse osteoblasts for 2 days. The microstructures and corrosion resistance were measured using FE-SEM, XRD, EIS and potentiodynamic test in artificial saliva solution at $36.5{\pm}1^{\circ}C$. Ti-Ta alloy showed the martensite structure of ${\alpha}+{\beta}$ phase and micro-structure was changed from lamellar structure to needle-like structure as Ta content increased. Corrosion resistance increased as Ta content increased. Corrosion resistance of cell cultured Ti-Ta alloy increased predominantly in compared with non cell cultured Ti- Ta alloy due to inhibition of the dissolution of metal ion by covered cell. $R_p$ value of MC3T3-E1 cell cultured Ti-40 Ta alloy showed $1.60{\times}10^6{\Omega}cm^2$ which was higher than those of other Ti alloy. Polarization resistance of cell-cultured Ti-Ta alloy increased in compared with non-cell cultured Ti alloy.

Electrochemical Properties of Ti-30Ta-(3~15)Nb Alloys Coated by HA/Ti Compound Layer (HA/Ti 복합층 코팅한 Ti-30Ta-(3~15)Nb 합금의 전기화학적 특성)

  • Jeong, Yong-Hoon;Choe, Han-Cheol;Ko, Yeong-Mu
    • Journal of the Korean institute of surface engineering
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    • v.41 no.2
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    • pp.57-62
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    • 2008
  • Electrochemical properties of Ti-30Ta-$(3{\sim}15)$Nb alloys coated by HA/Ti compound layer have been studied by various electrochemical method. Ti-30Ta binary alloys contained 3, 7, 10, and 15 wt% Nb contents were manufactured by the vacuum furnace system. The specimens were homogenized for 24 hrs at $1000^{\circ}C$. The samples were cut and polished for corrosion test and coating. It was coated with HA/Ti compound layer by magnetron sputter. The HA/Ti non-coated and coated morphology of Ti alloy were analyzed by x-ray diffractometer(XRD) and filed emission scanning electron microscope(FE-SEM). The corrosion behaviors were investigated using potentiodynamic method in 0.9% NaCl solution at $36.5{\pm}1^{\circ}C$. The homoginazed Ti-30Ta-$(3{\sim}15wt%$)Nb alloys showed the ${\alpha}+{\beta}$ phase, and ${\beta}$ phase peak was predominantly appeared with increasing Nb content. The microstructure of Ti alloy was transformed from needle-like structure to equiaxed structure as Nb content increased. HA/Ti composite surface showed uniform coating layer with 750 nm thickness. The corrosion resistance of HA/Ti composite coated Ti-alloys were higher than those of the non-coated samples in 0.9% NaCl solution at $36.5{\pm}1^{\circ}C$. Especially, corrosion resistance of Ti-Ta-Nb system increased as Nb content increased.

Design of the Low Hunting Controller for the Reticle Stage for Lithography (VCM을 이용한 노광기용 정밀 레티클 스테이지의 저진동 제어시스템 개발)

  • Kim, Mun-Su;Oh, Min-Taek;Kim, Jung-Han
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.4
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    • pp.51-58
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    • 2008
  • This paper presents a new design of the precision stage for the reticle in lithography process and a low hunting control method for the stage. The stage has three axes for X, Y, ${\theta}_z$ those actuated by three voice coil motors individually. The designed reticle stage system has three gap sensors and voice coil motors, and supported by four air bearings and the forward/inverse kinematics of the stage were solved to get an accurate reference position. When a stage is in regulating control mode, there always exist small fluctuations(stage hunting) in the stage movement. Because the low stage hunting characteristic is very important in recent lithography and nano-level applications, a special regulating controller for ultra low hunting is proposed in this paper. Also this research proposed the 2-step transmission system for preventing the noise infection from environmental devices. The experimental results showed the proposed regulating control system reduced hunting noise as 35nm(rms) when a conventional PID generates 77nm(rms) in the same mechanical system. Besides the reticle stage has 100nm linear accuracy and $1{\mu}rad$ rotation accuracy at the control frequency of 8kHz.

Fundamental Process Development of a Ultramicro-Stereolithography using a Femto-second Laser for Manufacturing Nano-scaled Features (펨토초 레이저를 이용한 극미세 광조형 기반공정 개발)

  • 박상후;임태우;정창균;이신욱;이성구;공홍진;양동열
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.3
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    • pp.180-187
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    • 2004
  • The miniaturization technologies are perceived as potential key technologies of the future. They will bring about completely different ways in which people and machines interact with the physical world. However, at the present time, the primary technologies used fur miniaturization are dependent on the microelectronic fabrication techniques. The principal shortcomings associated with such techniques are related to the inability of to produce arbitrary three-dimensional features not only in electronics but also in a wide range of metallic materials. In this paper, a ultramicro-stereolithography system assisted with a femto-second laser was developed to fabricate the arbitrary three-dimensional nano/micro-scaled features. In the developed process, a femto-second laser is projected according to CAD data on a photosensitive monomer resin, it induces polymerization of the liquid resin. After the polymerization, a droplet of ethanol is dropped to remove the liquid resin and then the polymerized nano-scaled features only remain. By a newly developed process, miniature devices for an extremely wide range of applications would become a technologically feasible reality. Some of nano/micro-scaled features as examples were fabricated to prove the usefulness of this study at the fundamental stage.