• Journal of the Semiconductor & Display Technology
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• v.20 no.2
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• pp.34-42
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• 2021

Recent cleaning technologies of mask in extremely ultraviolet semiconductor processes were reviewed, focused on newly developed issues such as particle size determination or hydrocarbon and tin contaminations. In detail, critical particle size was defined and proposed for mask cleaning where nanosized particles and its various shapes would result in surface atomic ratio increase vigorously. A new cleaning model also was proposed with amphoteric behavior of electrolytically ionized water which had already shown excellent particle removing efficiency. Having its non-equilibrium and amphoteric properties, electrolyzed ion water seemed to oxidize contaminant surface selectively in nano-scale and then to lift up oxidized ones from mask surface very effectively. This assumption should be further investigated in future in junction with hydrogen bonding and cluster of water molecules.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.27 no.4
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• pp.524-533
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• 2003

DBD(Dielectric Barrier Discharge) plasma in air is well established for the production of large quantities of ozone and is more recently being applied to aftertreatment processes for HAPs(Hazardous Air Pollutants). Aim of this work is to determine design and operating parameters of a hybrid air cleaning system. DBD and ESP(Electrostatic Precipitator) are used as nano particle charger and collector, respectively. Pelletized MnO$_2$ catalyst or activated carbon is used fer ozone decomposition or adsorption material. AC voltage of 7～10 KV(rms) and 60 Hz is used as DBD plasma source. DC - 8 KV is applied to the ESP for particle collection. The overall particle collection efficiency for the hybrid system is over 85 % under 0.64 m/s face velocity. Ozone decomposition efficiency with pelletized MnO$_2$ catalyst or activated carbon packed bed is over 90 % when the face velocity is under 0.4 m/s in dry air.

• International Journal of Advanced Culture Technology
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• v.3 no.1
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• pp.13-20
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• 2015

The self-cleaning properties of nano-zinc oxide on cotton fabrics have been investigated. The cotton fabric has been prepared by pad-dry method. The nano-zinc oxide was encapsulated in the polystyrene particle by mini-emulsion process prior used. The loading amount of zinc oxide particles into the mini-emulsion were various from 1% wt to 40%wt. The particles sizes of ZnO-encapsulated polystyrene mini-emulsion were determined using dynamic light scattering. It was showed that the particle size of the mini-emulsion was in the range of 124-205 nm. The topography and morphology of ZnO-encapsulated polystyrene which coated on cotton fabrics was observed using scanning electron microscopy. The crystal structure of ZnO-coated on cotton fabrics was explored by X-ray diffraction spectroscopy. The photocatalytic activities of zinc oxide were present through the self-cleaning properties. The presents of the zinc oxide on cotton fabrics significantly showed the improving of the self-cleaning properties under UV radiation.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.5
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• pp.150-156
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• 2009

The removal of tiny particles adhered to surfaces is one of the crucial prerequisite for a further increase in IC fabrication, large area displays and for the process in nanotechnology. Various cleaning techniques (wet chemical cleaning, scrubbing, pressurized jets and ultrasonic processes) currently used to clean critical surfaces are limited to removal of micrometer-sized particles. Therefore the removal of sub-micron sized particles from silicon wafers is of great interest. For this purpose various cleaning methods are currently under investigation. In this paper, we report on experiments on the cleaning effect of 100nm sized fluorescence particles on silicon wafer using the plasma shockwave occurred by femtosecond laser. The plasma shockwave is main effect of femtosecond laser cleaning to remove particles. The removal efficiency was dependent on the gap distance between laser focus and surface but in some case surface was damaged by excessive laser intensity. These experiments demonstrate the feasibility of femtosecond laser cleaning using 100nm size fluorescence particles on wafer.

• Journal of the Korean Society for Precision Engineering
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• v.31 no.12
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• pp.1107-1113
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• 2014

In this article, the megasonic cleaning system for cleaning micro/nano particles from flat panel display (FPD) surfaces was developed. A piezoelectric actuator and a waveguide were designed by finite element method (FEM) analysis. The calculated peak frequency value of the quartz waveguide was 1002 kHz, which agreed well with the measured value of 1003 kHz. The average acoustic pressure of the megasonic cleaning system was 43.1 kPa, which is three times greater than that of the conventional type of 13.9 kPa. Particle removal efficiency (PRE) tests were performed, and the cleaning efficiency of the developed system was proven to be 99%. The power consumption of the developed system was 64% lower than that of the commercial system. These results show that the developed megasonic cleaning system can be an effective solution in particle removing from FPD substrate with higher energy efficiency and lower chemical and ultra pure water (UPW) consumption.

• Textile Coloration and Finishing
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• v.21 no.6
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• pp.1-11
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• 2009

Super-hydrophobic surface, with a water contact angle greater than $150^{\circ}$, has a self cleaning effect termed 'lotus effect'. We introduced super-hydrophobicity onto aramid/rayon mixture fabric with dual-scale structure by assembling silica nano-sol. Mixture fabric was treated with silica nano-sol, fluoric polymer using various parameters such as particle size, concentration. Silica nano-sol size were measured using particle size analyzer. Morphological changes by particle size were observed using field emission scanning electron microscopy(FE-SEM), contact angle measurement equipment. The contact angle of water was about $134.0^{\circ}$, $137.0^{\circ}$, $143.0^{\circ}$, $139.5^{\circ}$ and $139.0^{\circ}$ for mixture fabric coated with 100.2nm, 313.7nm, 558.2nm, 628.5nm and 965.4nm silica nano-sol, compared with about $120.0^{\circ}$ for mixture fabric coated with fluoric polymer. When we mixed particle sizes of 100.2nm and 558.2nm by 7:3 volume ratio, the contact angle of water was about $146.2^{\circ}$. And we mixed particle sizes of 313.7nm and 558.2nm by 7:3 volume ratio, the contact angle of water was about $141.8^{\circ}$. Also we mixed particle sizes of 558.2nm and 965.4nm by 7:3 volume ratio, the best super-hydrophobicity was obtained. In this paper, we fabricated the water-repellent surfaces with various surface structures by using four types of silica nano-sol, and we found that the dual-scale structure was very important for the super-hydrophobicity.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1810-1814
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• 2008

A small L-type megasonic module for nano-pattern cleaning was designed and manufactured. The impedance graph of the quartz waveguide with a piezoelectric actuator was predicted using finite element method (FEM). The peak value of the piezoelectric actuator alone was 3.373 MHz, which was the same as the experimentally measured value of 3.373 MHz (0.0% error). In addition, the maximum impedance value of the quartz waveguide with the actuator was 3.373 MHz, which agreed well with the measured value of 3.362 MHz (0.3% error). The acoustic pressures of a conventional megasonic system (3 MHz) and the developed system under similar conditions were measured and compared. The results showed that the maximum values and standard deviations of the developed system decreased by 29% and 18%, respectively, compared with the conventional type. This suggests that the small L-type would have higher particle removal efficiency with lower possibilities of pattern damages.

• Journal of the Semiconductor & Display Technology
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• v.22 no.2
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• pp.17-23
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• 2023

In semiconductor manufacturing processes, a cleaning process is important that can remove sub-micron particles. Conventional wet cleaning methods using chemical have limits in removing nano-particles. Thus, physical forces of a mechanical vibration up to 1 MHz frequency, was tried to aid in detaching them from the substrates. In this article, we developed a 1 MHz quartz megasonic for a bare wafer cleaning using finite element analysis. At first, a 1 MHz megasonic prototype was manufactured. Using the results, a main product which can improve a particle removal performance, was analyzed and designed. The maximum impedance frequency was 992 kHz, which agreed well with the experimental value of 986 kHz (0.6% error). Acoustic pressure distributions were measured, and the result showed that maximum / average was 400.0~432.4%, and standard deviation / average was 46.4~47.3%. Finally, submicron particles were deposited and cleaned for the assessment of the system performance. As a result, the particle removal efficiency (PRE) was proved to be 92% with 11 W power. Reflecting these results, the developed product might be used in the semiconductor cleaning process.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.845-846
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• 2012

• International Journal of Advanced Culture Technology
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• v.3 no.1
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• pp.129-137
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• 2015

The study of photocatalysis of nano titanium dioxideon the cotton fabrics have been investigatedthrough self-cleaning properties. The mini-emulsion technique was employed to prepare the encapsulation of titanium dioxide nano particles in polystyrene beads prior used. The mini-emulsion was coated on the cotton fabrics using Pad-dry method.The loading amount of TiO2particles into the mini-emulsion were various from 1%wt to 40%wt. The particles sizes of the TiO2-encapsulated polystyrene mini-emulsion were investigated by dynamic light scattering. It was noticed that the particle size of the mini-emulsion was in the range of 100- 200 nm. The morphology of treated cotton fabrics were investigated using scanning electron microscopy. The crystal structure of TiO2-encapsulated PS mini emulsion which coated on cotton fabrics were examined by X-ray diffraction spectroscopy. In order to investigate the photocatalytic activities of TiO2 through the selfcleaning characteristics of the cotton fabrics, colorant stains were created on the samples. Coffee stains were used as colorant organic stains. The result shown that the coffee stained on the cotton fabrics significantly showed the improving of the self-cleaning properties under UV radiation.