• Title/Summary/Keyword: Nano-$Si_3N_4$

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An Experimental Study on the Nano-adhesion of Octadecyltrichlorosilane SAM on the Si Surface (OTS SAM의 미소 응착 특성에 관한 실험적 연구)

  • 윤의성;박지현;양승호;한흥구;공호성
    • Tribology and Lubricants
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    • v.17 no.4
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    • pp.276-282
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    • 2001
  • Nano adhesion between SPM (scanning probe microscope) tips and 075 (octadecyltrichlorosilane) SAM (self-assembled monolayer) was experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes in various conditions of relative humidity. OTS SAM was formed on Si-wafer (100) surfaces, and Si$_3$N$_4$ tips of different radius of curvature were used. When the surface was hydrophobic, the adhesion and friction forces were found lower than those of bare Si-wafer. Results also showed that micro-adhesion force increased as the relative humidity and the tip radius of curvature increased. The main parameter for affecting the micro-adhesion was found absorbed humidity on the contact surface. These results were discussed with the JKR model and a capillary force caused by absorbed water.

Influence of thickness ratio and substrate bias voltage on mechanical properties of AlCrN/AlCrSiN double-layer coating (두께 비율과 기판 바이어스 전압이 AlCrN/AlCrSiN 이중층 코팅의 기계적 특성에 미치는 영향)

  • Kim, Hoe-Geun;Ra, Jeong-Hyeon;Lee, Sang-Yul;Han, Hui-Deok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.162-162
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    • 2017
  • AlCrN 코팅은 높은 경도, 낮은 표면 조도 등의 상온에서의 우수한 기계적 특성 이외에 고온에서 안정한 합금상의 형성으로 인하여 우수한 내열성을 보이는 코팅이며, Si을 첨가하여 나노복합구조를 갖는 AlCrSiN 코팅은 고경도 특성을 나타내는 나노결정립과 고내열성을 나타내는 $Si_3N_4$ 비정질이 동시에 존재함으로써 뛰어난 고온 특성까지 보유하여 공구 코팅으로의 적용 가능성이 크다. 본 연구에서는, 가혹화된 공구사용 환경 대응 하는 더욱 우수한 내마모성 및 내열성을 보이는 코팅막을 개발하기 위해 AlCrN/AlCrSiN 이중층 코팅을 합성하였다. 합성된 코팅의 구조 및 물성을 분석하기 위해 field emission scanning electron microscopy(FE-SEM), nano-indentation, atomic force microscopy(AFM) 및 ball-on-disk wear tester를 사용하였다. 내열성을 확인하기 위하여 코팅을 furnace에 넣어 500, 600, 700, 800, 900도에서 30분 동안 annealing한 후에 nano-indentation을 사용하여 경도를 측정을 하였다. 5:5, 7:3, 9:1의 두께 비율로 AlCrN/AlCrSiN 이중층 코팅을 합성하였으며 모든 코팅의 두께는 $3{\mu}m$로 제어되었다. AlCrN 코팅층의 두께가 증가할수록, 이중층 코팅의 경도 및 내마모성은 점차 향상되었지만 코팅의 밀착력은 감소하였다. 일반적으로 AlCrN 코팅은 상대적으로 높은 잔류응력을 갖고 있으므로, AlCrN 층의 두께비율이 증가함에 따라 코팅내의 잔류응력이 높아져 코팅의 경도는 증가하고 밀착특성은 낮아진 것으로 판단된다. AlCrSiN 상부층 공정시 기판 바이어스 전압을 -50 ~ -200V 로 증가시키면서 이중층 코팅을 합성하였다. XRD 분석 결과, 공정 바이어스 전압이 증가함에 따라 AlCrSiN 상부층은 점차 비정질화 되었고, 코팅의 경도와 표면 특성이 향상되는 것을 확인하였다. 이러한 특성 향상은 높은 바이어스 인가가 이온 충돌효과의 증가를 야기시켰으, 이로 인해 치밀한 코팅층 합성에 의한 결과로 판단된다. AlCrN/AlCrSiN 이중층 코팅을 어닐링 한 후 경도 분석 결과, -150, -200V에서 합성한 코팅은 900도 이상에서 26GPa 이상의 높은 경도를 보인 것으로 보아 우수한 내열성을 갖는 것으로 확인 되었다. 이는 AlCrSiN 상부층의 높은 Si 함량 (11at.%) 으로 인한 충분한 $Si_3N_4$ 비정질상의 형성과, 고바이어스 인가로 인한 AlCrN 결정상과 $Si_3N_4$ 비정질상의 고른 분배가 코팅의 내열성을 향상시키는데 기여를 한 결과로 판단된다.

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Fabrication and sintering of nano $TiN_x$ and its composites (Nano $TiN_x$와 그 복합체의 제조 및 소결)

  • Kim, Dong-Sik;Kim, Sung-Jin;Rahno, Khamidova;Park, Sung-Bum;Park, Seung-Sik;Lee, Hye-Jeong;Lee, Sang-Woo;Cho, Kyeong-Sik;Woo, Heung-Sik;Ahn, Joong-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.16 no.3
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    • pp.101-105
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    • 2006
  • We fabricated the nano $TiN_x$ by making of reaction between titanium powder and $Si_3N_4$ during planetary milling. The $TiN_x$ powder was sintered by spark plasma sintering machine after mixing with 50 wt% of titanium powder, and the sintered body was heat-treated at $850^{\circ}C$ in order to investigate its hardness property at the elevated temperature. We analyzed crystal structure by XRD. We observed the peaks of $TiN_{0.26}$ and TiN after 10 hours milling, and we observed TiN peak mainly after 20 hours milling. The reacted particle size distribution was investigated by FE-SEM. Increase of milling time, the size of reacted particles was decreased and the $10{\sim}20nm$ size of $TiN_x$ on the surface of titanium and $TiN_x$ was observed after 20 hours milling. The micro-Vickers hardness of mixed sintered body was about $1050kgf/mm^2$.

A study on the Nano adhesion and Friction at Different Contact Conditions using SPM (SPM을 이용한 접촉조건 변화에 따른 미소응착 및 마찰특성에 관한 연구)

  • 윤의성;박지현;양승호;공호성
    • Tribology and Lubricants
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    • v.17 no.3
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    • pp.191-197
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    • 2001
  • Nano adhesion and friction characteristics between SPM(scanning electron microscope) tips and flat plates of different materials were experimentally studied. Tests were performed to measure adhesion and friction in AFM(atomic force microscope) and LFM(lateral force microscope) modes in different conditions of relative humidity. Three different Si$_3$N$_4$ tips (rdaii : 15nm, 22nm and 50 nm) and three different flat plates of Si-wafer(100), W-DLC(tungsten-incorporated diamond-like carbon) and DLC were used. Results generally showed that adhesion and friction increased with the tip radius, and W-DLC and DLC surfaces were superior to Si-wafer. But the adhesion force of Si-wafer showed non linearity with the tip radius while W-DLC and DLC surfaces showed good correlation to the “JKR model”. It was found that high adhesion force between Si-wafer and a large radius of tip was caused by a capillary action due to the condensed water.

Nanotribological characteristics of silicon surfaces modified by IBAD (IBAD로 표면개질된 실리콘표면의 나노 트라이볼로지적 특성)

  • 윤의성;박지현;양승호;공호성;장경영
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2001.06a
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    • pp.127-134
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    • 2001
  • Nano adhesion and friction between a Sj$_3$N$_4$ AFM tip and thin silver films were experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes in various ranges of normal load. Thin silver films deposited by IBAD (ion beam assisted deposition) on Si-wafer (100) and Si-wafer of different surface roughness were used. Results showed that nano adhesion and friction decreased as the surface roughness increased. When the Si surfaces were coated by pure silver, the adhesion and friction decreased. But the adhesion and friction were not affected by the thickness of IBAD silver coating. As the normal force increased, the adhesion forces of bare Si-wafer and IBAD silver coating film remained constant, but the friction forces increased linearly. Test results suggested that the friction was mainly governed by the adhesion as long as the normal load was low.

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Synthesis and Luminescence Properties of Sr/SmSi5N8:Eu2+ Phosphor for White Light-Emitting-Diode

  • Luong, Van Duong;Lee, Hong-Ro
    • Journal of Surface Science and Engineering
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    • v.47 no.4
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    • pp.192-197
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    • 2014
  • Red-emitting nitride phosphors recently attracted considerable attention because of their high thermal stability and high color rendering index properties. For excellent phosphor of white light-emitting-diode, ternary nitride phosphor of $Sr/SmSi_5N_8:Eu^{2+}$ with different $Eu^{2+}$ ion concentration were synthesized by solid state reaction method. In this work, red-emitting nitride $Sr/SmSi_5N_8:Eu^{2+}$ phosphor was successfully synthesized by using multi-step high frequency induction heat treatment. The effects of molar ratio of component and experimental conditions on luminescence property of prepared phosphors have been investigated. The structure and luminescence properties of prepared $Sr/SmSi_5N_8:Eu^{2+}$ phosphors were investigated by XRD and photoluminescence spectroscopy. The excitation spectra of $Sr/SmSi_5N_8:Eu^{2+}$ phosphors indicated broad excitation wavelength range of 300 - 550 nm, namely from UV to visible area with distinct enhanced emission peaks. With an increase of $Eu^{2+}$ ion concentration, the peak position of emission in spectra was red-shifted from 613 to 671 nm. After via multi-step heat treatment, prepared phosphor showed excellent luminescence properties, such as high emission intensity and low thermal quenching, better than commercial phosphor of $Y_3Al_5O_{12}:Ce^{3+}$. Using $Eu_2O_3$ as a raw material for $Eu^{2+}$ dopant with nitrogen gas flowing instead of using commercial EuN chemical for $Sr/SmSi_5N_8:Eu^{2+}$ synthesis is one of characteristic of this work.

Low-temperature synthesis of nc-Si/a-SiNx: H quantum dot thin films using RF/UHF high density PECVD plasmas

  • Yin, Yongyi;Sahu, B.B.;Lee, J.S.;Kim, H.R.;Han, Jeon G.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.341-341
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    • 2016
  • The discovery of light emission in nanostructured silicon has opened up new avenues of research in nano-silicon based devices. One such pathway is the application of silicon quantum dots in advanced photovoltaic and light emitting devices. Recently, there is increasing interest on the silicon quantum dots (c-Si QDs) films embedded in amorphous hydrogenated silicon-nitride dielectric matrix (a-SiNx: H), which are familiar as c-Si/a-SiNx:H QDs thin films. However, due to the limitation of the requirement of a very high deposition temperature along with post annealing and a low growth rate, extensive research are being undertaken to elevate these issues, for the point of view of applications, using plasma assisted deposition methods by using different plasma concepts. This work addresses about rapid growth and single step development of c-Si/a-SiNx:H QDs thin films deposited by RF (13.56 MHz) and ultra-high frequency (UHF ~ 320 MHz) low-pressure plasma processing of a mixture of silane (SiH4) and ammonia (NH3) gases diluted in hydrogen (H2) at a low growth temperature ($230^{\circ}C$). In the films the c-Si QDs of varying size, with an overall crystallinity of 60-80 %, are embedded in an a-SiNx: H matrix. The important result includes the formation of the tunable QD size of ~ 5-20 nm, having a thermodynamically favorable <220> crystallographic orientation, along with distinct signatures of the growth of ${\alpha}$-Si3N4 and ${\beta}$-Si3N4 components. Also, the roles of different plasma characteristics on the film properties are investigated using various plasma diagnostics and film analysis tools.

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Diffusion Barrier Properties of W-C-N Thin Film between La0.67Sr0.33MnO3 and Si

  • So, J.S.;Kim, S.Y.;Kang, K.B.;Song, M.K.;Lee, C.W.
    • Journal of the Korean Magnetics Society
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    • v.15 no.2
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    • pp.130-132
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    • 2005
  • Tungsten carbon nitride (W-C-N) thin films were produced by reactive radio frequency (RF) magnetron sputter-ing of tungsten in $Ar-N_2$ gas mixture. The effects of the variation of nitrogen partial pressure on the composition, and structural properties of these films as well as the influence of post-deposition annealing have been studied. When $La_{0.67}Sr_{0.33}MnO_3$ was coated on the W-C-N/Si substrate, coercivity ($H_c$) and magnetization at room temperature shows 58.73 Oe, and 29.4 emu/cc, respectively. In order to improve the diffusion barrier characteristics, we have studied the impurity behaviors to control the ratios of nitrogen and carbon concentrations.

Nano-Sized Mullite(3Al2O3.42SiO2) Colloids Fabricated by Spray Combustion Synthesis (SCS) Technique (분무연소합성(SCS)법에 의한 나노크기 물라이트(3Al2O3.42SiO2) 콜로이드 제조)

  • Lee, Sang-Jin;Jun, Byung-Sei
    • Journal of the Korean Ceramic Society
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    • v.41 no.4
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    • pp.297-301
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    • 2004
  • Nano-sized mullite (3Al$_2$O$_3$$.$2SiO$_2$) colloids were prepared by use of the spray combustion method. For combustion reaction, Al(NO$_3$)$_3$$.$9$H_2O$, and CH$_{6}$N$_4$O were used as an oxidizer and a fuel respectively, and then colloidal silica was also added as 2SiO$_2$source for mullite. The temperature of the reaction chamber was kept at 80$0^{\circ}C$ to initiate the ignition of droplets of the mixed precursors. For preventing droplet coagulation, the droplet number concentration was reduced using the metal screen filter, and the residence time of aerosol was kept at 2.5 seconds for laminar flow. The synthesized colloidal particles had an uniform spherical shape with 130 nanometer size and the crystalline phase showed the mullite with stoichiometry in the observations of XRD and TEM.