• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.240-245
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• 2005

In order to implement nano-level accuracy of precision equipments, a nano control system is one of the key components. The control system consists of a controller, actuators and sensors having nano-level resolution. In this paper, application area and technical trend on the nano control system are introduced. Some required techniques for realizing nano-level resolution of a controller or actuator are presented. Technical innovation of a control system by IT-fusion and its effect are also described. Finally, domestic research activities for development of the IT-based nano control system are introduced.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.57 no.10
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• pp.1876-1882
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• 2008

Nano manipulator is used to manufacture Carbon NanoTube(CNT) tips. Using nano manipulator, operator attaches a CNT at the apex of Atomic Force Microscope(AFM) tip, which requires a mastery of mechanics and long manufacture time. Nano manipulator is installed inside a Scanning Electron Microscope(SEM) chamber to observe the operation. This paper presents a control scheme for horizontal axes of nano manipulator via processing SEM image. Edges of AFM tip and CNT are first detected, and the position information so obtained is fed to control horizontal axes of nano manipulator. That is, a visual servoing loop is realized to control the axes more precisely in nano scale.

• Proceedings of the KIEE Conference
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• 2007.10a
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• pp.251-252
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• 2007

Nano manipulator is used to manufacture Carbon NanoTube(CNT) tips. Using nano manipulator operator attaches a CNT at the end of Atomic Force Microscopy(AFM) tip, which requires a master mechanic and long manufacture time. Nano manipulator is installed inside Scanning Electron Microscopy (SEM) chamber to observe the operation. This paper presents a control of horizontal axis of nano manipulator via processing SEM image. Edges of AFM tip and CNT are first detected, the position information so obtained is fed to control horizontal axis of nano manipulator. To be specific, visual servoing loop was realized to control the axis more precisely.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.6
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• pp.478-481
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• 2013

Diameter controlled carbon nanotubes (CNTs) were grown using surface modified iron nano-particle catalysts with aminpropyltriethoxysilane (APS). Iron nano-particles were synthesized by thermal decomposition of iron pentacarbonyl-oleic acid complex. Subsequently, APS modification was done using the iron nano-particles synthesized. Agglomeration of the iron nano-particles during the CNT growth process was effectively prevented by the surface modification of nano-particles with the APS. APS plays as a linker material between Fe nano-particles and $SiO_2$ substrate resulting in blocking the migration of nano-particles. APS also formed siliceous material covering the iron nano-particles that prevented the agglomeration of iron nano-particles at the early stages of the CNT growth. Therefore we could obtain the diameter controlled CNTs by blocking agglomeration of the iron nano-particles.

• Transactions of the Society of Information Storage Systems
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• v.10 no.1
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• pp.1-6
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• 2014

Plasmonic lithography is the latest technique to overcome diffraction limit of previous optical lithography. In the plasmonic lithography, the nano gap between nano metal wave guide and photoresist should be in sub-wavelength region. SIL-based plasmonic lithography is the one of the solutions to maintain small air gap. However, the nano gap control is so sensitive that a little disturbance is able to have a large effect on the nano gap control. So, we analyzed the characteristics of disturbance, and then modified the previous controller to suppress the disturbance. We applied two peak filters which were fixed one and adaptively changeable one. We experimentally confirmed the improvement of the nano gap control, which reduced nano gap error by 30 %. The proposed control will improve the quality of lithography pattern.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.4
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• pp.32-38
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• 2008

This paper describes a fast tool control (FTC)-based diamond turning process for fabricating large-area high-quality micro-lens arrays. The developed FTC unit has a stroke of $48{\mu}m$ and a resonance frequency of 4.9 kHz. Micro-lens arrays were fabricated using a micro-cutting tool with a nose radius of $50{\mu}m$. The FTC unit was integrated with a force sensor so that the initial position of the micro-cutting tool with respect to the workpiece surface could be detected through monitoring the contacting force. The length and depth of the designed parabolic micro-lens profile were $190{\mu}m$ and $20{\mu}m$, respectively. A micro-lens array was fabricated on a cylinder surface over an area of ${\phi}55 mm{\times}40 mm$.

• Proceedings of the KSME Conference
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• 2003.11a
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• pp.1888-1891
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• 2003

In this paper, we proposed a new method to control the length of carbon nano tube in the single CNT probe. A single CNT probe was composed of a tungsten tip made by the electrochemical etching and carbon nano tube which was grown by CVD and prepared through the sonication. The two components were attached with the carbon tape. Since the length of CNT can not be controlled during the manufacturing, the post process is needed to shorten the CNT. In this paper, we proposed the method of electrochemical process. The process was done under the optical microscope and the results were checked by SEM. The diameter of the carbon nano tube used in this paper was about 130nm because the above process had to be done with the optical microscope. Using the method proposed in this paper, we can control the length of the nano tube tip.

• Journal of Institute of Control, Robotics and Systems
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• v.14 no.4
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• pp.332-335
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• 2008

PMMA light guiding plate with nano pattern was fabricated by nano imprint lithography method. A silicon mold for electroplating of nickel was fabricated by conventional photolithography process. A nickel stamp for nano imprint lithography was fabricated by electroplating process using silicon mold. The nano imprint lithography was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM. It is shown that the patterns were well transferred for several steps and the nano imprint lithography method could be applied for fabricating patterns of light guiding plate.

• Proceedings of the Optical Society of Korea Conference
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• 2008.07a
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• pp.185-186
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• 2008

In this paper, the nano-grating was measured by Scanning Probe Microscopy (SPM) system using digital Proportion, Integration and Derivative (PID) control. Through this measurement, we could confirm the improvement of the vertical resolution compared with analog Proportion and Integration (PI) control method.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.6 s.171
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• pp.7-14
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• 2005