• Title/Summary/Keyword: Nano

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TP53I11 suppresses epithelial-mesenchymal transition and metastasis of breast cancer cells

  • Xiao, Tongqian;Xu, Zhongjuan;Zhang, Hai;Geng, Junsa;Qiao, Yong;Liang, Yu;Yu, Yanzhen;Dong, Qun;Suo, Guangli
    • BMB Reports
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    • v.52 no.6
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    • pp.379-384
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    • 2019
  • Epithelial-mesenchymal transition (EMT) is widely-considered to be a modulating factor of anoikis and cancer metastasis. We found that, in MDA-MB-231 cells, TP53I11 (tumor protein P53 inducible protein 11) suppressed EMT and migration in vitro, and inhibited metastasis in vivo. Our findings showed that hypoxic treatment upregulated the expression of $HIF1{\alpha}$, but reduced TP53I11 protein levels and TP53I11 overexpression reduced $HIF1{\alpha}$ expression under normal culture and hypoxicconditions, and in xenografts of MDA-MB-231 cells. Considering $HIF1{\alpha}$ is a master regulator of the hypoxic response and that hypoxia is a crucial trigger of cancer metastasis, our study suggests that TP53I11 may suppress EMT and metastasis by reducing $HIF1{\alpha}$ protein levels in breast cancer cells.

Development of 3D Micro-Nano Hybrid Patterns Using Anodized Aluminum and Micro-Indentation (양극산화된 알루미늄과 마이크로 인덴데이션을 이용한 3차원 마이크로-나노 하이브리드 패턴 제작)

  • Kwon, Jong-Tae;Shin, Hong-Gue;Kim, Byeong-Hee;Seo, Young-Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.31 no.12
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    • pp.1139-1143
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    • 2007
  • A simple method for the fabrication of 3D micro-nano hybrid patterns was presented. In conventional fabrication methods of the micro-nano hybrid patterns, micro-patterns were firstly fabricated and then nano-patterns were formatted on the micro-patterns. Moreover, these micro-nano hybrid patterns could be fabricated on the flat substrate. In this paper, we suggested the fabrication method of 3D micro-nano hybrid patterns using micro-indentation on the anodized aluminum substrate. Since diameter of the hemispherical nano-pattern can be controlled by electrolyte and applied voltage in the anodizing process, we can easily fabricated nano-patterns of diameter of loom to 300nm. Nano-patterns were firstly formatted on the aluminum substrate, and then micro-patterns were fabricated by deforming the nano-patterned aluminum substrate. Hemispherical nano-patterns of diameter of 150nm were fabricated by anodizing process, and then micro-pyramid patterns of the side-length of $50{\mu}m$ were formatted on the nano-patterns using micro-indentation. Finally we successfully replicated 3D micro-nano hybrid patterns by hot-embossing process. 3D micro-nano hybrid patterns can be applied to nano-photonic device and nano-biochip application.

Hardware implementation of a CMOS image sensor pixel using complemental signal path (상보형 신호경로 방식의 CMOS 이미지 센서 픽셀의 하드웨어 구현)

  • Jung, Jin-Woo;Kwon, Bo-Min;Kim, Ji-Man;Park, Ju-Hong;Park, Yong-Su;Lee, Je-Won;Song, Han-Jung
    • Journal of Sensor Science and Technology
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    • v.18 no.6
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    • pp.475-484
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    • 2009
  • In this paper, an analysis of the complementary CMOS active pixel and readout circuit is carried out. Complementary pixel structure which is different from conventional 3TR APS structure consists of photo diode, reset PMOS, several NMOSs and PMOSs sets for complementary signals. Proposed CMOS image sensors pixel has been fabricated using 0.5 standard CMOS process. Measured results show that the output signal range is from 0.8 V to 3.8 V. This output signal range increased 125 % compared to conventional 3TR pixel in the condition of 5 V power supply.

Excellent properties of Indium Tin Oxide-Carbon Nano tube Nano composites at low temperatures by Nano Cluster Deposition technique

  • Pammi, S.V.N.;Park, Jong-Hyun;Chanda, Anupama;Park, Yeon-Woong;Ahn, Jun-Ku;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.7-7
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    • 2010
  • Indium tin oxide (ITO) - SWNT nano crystalline composites was synthesized at low temperature(${\sim}250^{\circ}C$)using Nano Cluster Deposition technique by Metal Orhoganic Chemical Vapor Deposition method. XRD patterns of ITO- SWNT composite shows pure cubic phases without any secondary phase. I-V measurement gives resistance of 12 ohms for Sn doped (3 wt %) indium oxide-SWNT composites. The electrical conductivity of the nano composites is significantly enhanced compared to the SWNT.

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Replication of High Density Patterned Media (고밀도 패턴드 미디어 성형에 관한 연구)

  • Lee, Nam-Seok;Choi, Yong;Kang, Shin-Ill
    • Transactions of the Society of Information Storage Systems
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    • v.1 no.2
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    • pp.192-196
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    • 2005
  • In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. The nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. In nano-injection molding process, since the solidified layer, generated during the polymer filling, deteriorates transcribability of nano patterns by preventing the polymer melt from filling the nano cavities, an injection-mold system was constructed to actively control the stamper surface temperature using MEMS heater and sensors. The replicated polymeric patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth. The replicated polymeric patterns can be applied to high density patterned media.

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Development of Continuous UV Nano Imprinting Process Using Pattern Roll Stamper (패턴 롤 스템퍼를 이용한 연속 UV 나노 임프린팅 공정기술 개발)

  • Cha, J.;Ahn, S.;Han, J.;Bae, H.;Myoung, B.;Kang, S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2006.05a
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    • pp.105-108
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    • 2006
  • It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

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