• Journal of the Korean Electrochemical Society
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• v.7 no.2
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• pp.108-123
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• 2004

Imaging of surfaces and structures by near-field scanning optical microscopy (NSOM) has matured and is routinely used for studies ranging from biology to materials science. Of interest in this review paper is a versatility of modified or multi-functional NSOM (mf-NSOM) to enable high resolution imaging in several modes: (1) Concurrent fluorescence and Topographical Imaging (gases) (2) Microspectroscopy (gases) (3) Concurrent Scanning Electrochemical and Topographical Imaging (SECM) (liquids) (4) Concurrent Photoelectrochemical and Topographical Imaging (PEM) (liquids) The present study will summarize some of the recent advances in mf-NSOM work confirmed and supported by the results from several other imaging techniques of optical, fluorescence, electron and electrochemical microscopy. The studies are directed at providing local information on pitting precursor sites and vulnerable areas on metal and semiconductor surfaces, and at reactive sites on heterogeneous, catalytic substrates, especially on Al 2024 alloy and polycrystalline Ti. In addition, we will introduce some results related to the laser-induced nanometal (Ag) synthesis using mf-NSOM.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.75-75
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• 1999

100nm 공간 분해능을 갖는 NSOM 장치를 자체 제작하고 computer를 이용하여 측정을 자동화 하였다. 압전소자의 인가된 전압에 대한 이동거리를 x, y, z 축에 따라 측정 및 보정하고 NSOM topography 사진을 얻는데 성공하였다. 이때 이동거리는 x, y 축은 약 20nm/V이고, z 축은 2.5nm/V 이었다. 하지만 압전소자의 인가된 전압에 따른 이동거리의 비선형성에 대한 보정 및 feedback 제어의 안정화 등은 앞으로 해결해야할 문제로 남아 있다. 자체제작된 NSOM을 이용하여 GaAs/AlGaAs MQWs와 InAs/GaAs QDs 시료에 대한 PL, photocurrent 및 reflectance 등 분광 실험을 성공적으로 수행하였다. PL 실험의 경우 첨예한 광 섬유에 보내진 레이저 광의 세기가 매우 미약하기 (수십 nW) 때문에 탐침 크기가 약 500nm 일 때 측정되었다. 하지만 photocurrent 실험에서는 시료를 검출기로 사용하기 때문에 신호대 잡음비가 PL에 비하여 100배 이상 좋아지는 것을 발견하였다. 따라서 NSOM을 이용한 photocurrent 방법은 앞으로 NSOM의 공간 분해능을 높이는데 하나의 돌파구를 마련해 줄 것으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.559-559
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• 2012

We developed a new scheme for the highly sensitive near-field scanning optical microscope (NSOM) by using a dithering sample stage rather than a dithering probe. In the proposed scheme, the sample is directly loaded on one prong surface of a dithering bare tuning fork. Gap control between probe and sample is performed by detecting the shear force between an immobile fiber probe and the dithering sample. In a conventional NSOM, the Q factor drastically decreases from 7783 to 1000 or even to 100 by attaching a probe to the tuning fork. In our proposed NSOM, on the contrary, the Q factor does not change significantly, 7783 to 7480, when the sample is loaded directly to the tuning fork instead of attaching a probe. Consequently, the graphene sheets that cannot be observed by a conventional NSOM were clearly observed by the proposed method with sub-nanometer vertical resolution due to the extremely high Q factor.

• Proceedings of the Optical Society of Korea Conference
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• 1999.08a
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• pp.162-163
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• 1999

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1539-1542
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• 2005

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, $HS(CH_2)_nX$, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the wellknown diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser coupled to a near-field scanning optical microscope (NSOM).

• Journal of the Korean Vacuum Society
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• v.8 no.4B
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• pp.530-535
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• 1999

W made a near-field optical microscope(NSOM) apparatus and evaluated it. To control the distance between a tip and a sample, we used a piezoelectric translator and a He-Ne laser, and consequently obtained the spatial resolution better than 100nm. For the semiconductor spectroscopic applications, we performed photoluminescence and photocurrent experiments on the GaAs/AlGaAs MQWs samples. In the case of PL experiment, we obtained the low signal to nose ration due to the extremely small power of a light source passing through the nanometric optical fiber tip. However photocurrent experiment shows a hundred times better signal to noise than that of PL experiment. This suggests that photocurrent experiment using NSOM have the possibility to provide the spatial resolution better than 10nm.

• Proceedings of the IEEK Conference
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• 2006.06a
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• pp.183-184
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• 2006

The simulation on the mechanism of terahertz NSOM(near-field scanning optical microscopy) have been investigated. Based on experimental results, we have demonstrated the antenna effects on the coupling between a metal tip and substrate for an emission-type terahertz NSOM. It has been found that the lateral resolution can be estimated by a simplified model using an infinitesimal dipole in the substrate.

• Journal of the Optical Society of Korea
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• v.9 no.1
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• pp.16-21
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• 2005

Using a cantilever type nanoprobe having a 100㎚m aperture at the apex of the pyramidal tip of a near-field scanning optical microscope (NSOM), nanopatterning of polymer films are conducted. Two different types of polymer, namely a positive photoresist (DPR-i5500) and an azopolymer (Poly disperse orange-3), spincoated on a silicon wafer are used as the substrate. A He-Cd laser with a wavelength of 442㎚ is employed as the illumination source. The optical near-field produced at the tip of the nanoprobe induces a photochemical reaction on the irradiated region, leading to the fabrication of nanostructures below the diffraction limit of the laser light. By controlling the process parameters properly, nanopatterns as small as 100㎚ are produced on both the photoresist and azopolymer samples. The shape and size variations of the nanopatterns are examined with respect to the key process parameters such as laser beam power, irradiation time or scanning speed of the probe, operation modes of the NSOM (DC and AC modes), etc. The characteristic features during the fabrication of ordered structures such as dot or line arrays using NSOM lithography are investigated. Not only the direct writing of nano array structures on the polymer films but also the fabrication of NSOM-written patterns on the silicon substrate were investigated by introducing a passivation layer over the silicon surface. Possible application of thereby developed NSOM lithography technology to the fabrication of data storage is discussed.

• Proceedings of the Optical Society of Korea Conference
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• 2007.07a
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• pp.341-342
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• 2007

• Proceedings of the Optical Society of Korea Conference
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• 2006.07a
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• pp.195-196
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• 2006