• 한국산학기술학회논문지
• /
• 제11권3호
• /
• pp.827-834
• /
• 2010

발광층에 도펀트가 도핑된 다층 유기발광다이오드 소자 구조에서의 발광 메카니즘을 검증하기 위해 전기적인 특성요인들을 수치해석 하였다. 본 논문에 적용한 유기발광다이오드 소자는 ITO/NPB/$Alq_3$:C545T(%)/$Alq_3$/LiF/Al으로 이루어져 있으며 도펀트인 C545T의 도핑 농도를 변화시킨 4종류의 소자 구조에 대해 특성 변화를 검토하였다. 그 결과 도펀트의 도핑 농도 변화에 따라서 전압-전류 특성이 변화되어짐을 확인하였고, 이는 참고 문헌에 제시되어 있는 전압-전류밀도 실험 데이터와 매우 잘 일치되었다. 또한 도펀트를 도핑시킨 소자 구조들에서 전압-휘도 특성이 대폭 향상되어 발광효율이 3배정도 향상되었다. 이와 같은 guest-host system이 적용된 유기발광다이오드 소자의 동작 메카니즘을 분석하기 위하여 소자 내부에서의 전계분포, 전하분포, 재결합율 등의 전기적인 항목들에 대한 특성의 변화를 관찰하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2009년도 제38회 동계학술대회 초록집
• /
• pp.380-380
• /
• 2010

Currently, organic light-emitting diodes (OLEDs) have been proven of their readiness for commercialization in terms of lifetime and efficiency. In accordance with emerging new technologies, enhancement of light efficiency and extension of application fields are required. Particularly inverted structures, in which electron injection occurs at bottom and hole injection on top, show crucial advantages due to their easy integration with Si-based driving circuits for active matrix OLED as well as large open area for brighter illumination. In order to get better performance and process reliability, usually a proper buffer layer for carrier injection is needed. In inverted top emission OLED, the buffer layer should protect underlying organic materials against destructive particles during the electrode deposition, in addition to increasing their efficiency by reducing carrier injection barrier. For hole injection layers, there are several requirements for the buffer layer, such as high transparency, high work function, and reasonable electrical conductivity. As a buffer material, a few kinds of transition metal oxides for inverted OLED applications have been successfully utilized aiming at efficient hole injection properties. Among them, we chose 2 nm of $WO_3$ between NPB [N,N'-bis(1-naphthyl)-N,N'-diphenyl-1,1'-biphenyl-4,4'-diamine] and Au (or Al) films. The interfacial energy-level alignment and chemical reaction as a function of film coverage have been measured by using in-situ ultraviolet and X-ray photoelectron spectroscopy. It turned out that the $WO_3$ interlayer substantially reduces the hole injection barrier irrespective of the kind of electrode metals. It also avoids direct chemical interaction between NPB and metal atoms. This observation clearly validates the use of $WO_3$ interlayer as hole injection for inverted OLED applications.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
• /
• pp.154-155
• /
• 2012

The promise of nano-crystalites (nc) as a technological material, for applications including display backplane, and solar cells, may ultimately depend on tailoring their behavior through doping and crystallinity. Impurities can strongly modify electronic and optical properties of bulk and nc semiconductors. Highly doped dopant also effect structural properties (both grain size, crystal fraction) of nc-Si thin film. As discussed in several literatures, P atoms or radicals have the tendency to reside on the surface of nc. The P-radical segregation on the nano-grain surfaces that called self-purification may reduce the possibility of new nucleation because of the five-coordination of P. In addition, the P doping levels of ${\sim}2{\times}10^{21}\;at/cm^3$ is the solubility limitation of P in Si; the solubility of nc thin film should be smaller. Therefore, the non-activated P tends to segregate on the grain boundaries and the surface of nc. These mechanisms could prevent new nucleation on the existing grain surface. Therefore, most researches shown that highly doped nc-thin film by using conventional PECVD deposition system tended to have low crystallinity, where the formation energy of nucleation should be higher than the nc surface in the intrinsic materials. If the deposition technology that can make highly doped and simultaneously highly crystallized nc at low temperature, it can lead processes of next generation flexible devices. Recently, we are developing a novel CVD technology with a neutral particle beam (NPB) source, named as neutral beam assisted CVD (NBaCVD), which controls the energy of incident neutral particles in the range of 1~300eV in order to enhance the atomic activation and crystalline of thin films at low temperatures. During the formation of the nc-/pm-Si thin films by the NBaCVD with various process conditions, NPB energy directly controlled by the reflector bias and effectively increased crystal fraction (~80%) by uniformly distributed nc grains with 3~10 nm size. In the case of phosphorous doped Si thin films, the doping efficiency also increased as increasing the reflector bias (i.e. increasing NPB energy). At 330V of reflector bias, activation energy of the doped nc-Si thin film reduced as low as 0.001 eV. This means dopants are fully occupied as substitutional site, even though the Si thin film has nano-sized grain structure. And activated dopant concentration is recorded as high as up to 1020 #/$cm^3$ at very low process temperature (＜ $80^{\circ}C$) process without any post annealing. Theoretical solubility for the higher dopant concentration in Si thin film for order of 1020 #/$cm^3$ can be done only high temperature process or post annealing over $650^{\circ}C$. In general, as decreasing the grain size, the dopant binding energy increases as ratio of 1 of diameter of grain and the dopant hardly be activated. The highly doped nc-Si thin film by low-temperature NBaCVD process had smaller average grain size under 10 nm (measured by GIWAXS, GISAXS and TEM analysis), but achieved very higher activation of phosphorous dopant; NB energy sufficiently transports its energy to doping and crystallization even though without supplying additional thermal energy. TEM image shows that incubation layer does not formed between nc-Si film and SiO2 under later and highly crystallized nc-Si film is constructed with uniformly distributed nano-grains in polymorphous tissues. The nucleation should be start at the first layer on the SiO2 later, but it hardly growth to be cone-shaped micro-size grains. The nc-grain evenly embedded pm-Si thin film can be formatted by competition of the nucleation and the crystal growing, which depend on the NPB energies. In the evaluation of the light soaking degradation of photoconductivity, while conventional intrinsic and n-type doped a-Si thin films appeared typical degradation of photoconductivity, all of the nc-Si thin films processed by the NBaCVD show only a few % of degradation of it. From FTIR and RAMAN spectra, the energetic hydrogen NB atoms passivate nano-grain boundaries during the NBaCVD process because of the high diffusivity and chemical potential of hydrogen atoms.

• 한국전기전자재료학회논문지
• /
• 제23권8호
• /
• pp.638-644
• /
• 2010

We have carry out numerical simulation of the electric-optical characteristics of organic light emitting diodes with gradient-doped emitting layer which were reported to be effective in improving luminous efficiency and lifetime. In this paper, the basic structure is comprised of ITO/NPB/$Alq_3$:C545T[%]/$Alq_3$/LiF/Al, six devices by separating the emitting layer of $Alq_3$:C545T[%] were studied. As the result, the uniformly-doped devices exhibited superior luminous efficiency-current density characteristics over conventional undoped device. In the case of gradient-doped devices, electric-optical characteristics were improved similar to uniformed-doped devices, unusually the distribution of traped-charge density in the OLED devices was shown as the staircase.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
• /
• pp.230.1-230.1
• /
• 2016

본 연구에서는 Host-Dopant system 기반 적색 인광 OLED의 Emitting layer(EML)에서 doping 위치에 따른 특성 변화를 분석하였다. EML은 host 물질로 60 nm 두께의 CBP를 사용하고, 적색 발광을 위해 10 %의 $Ir(btp)_2$를 CBP의 Front, Middle, Back side에 각각 20 nm씩 doping하였다. 본 구조의 적색 인광 OLED는 current density, luminance, efficiency, EL spectrum 등을 통해 전기적, 광학적 특성 변화를 확인하였다. Front, Back side에 doping으로 인한 CBP의 Energy level이 3.6 eV에서 1.9 eV로 감소하여 각각 HTL/EML, EML/HBL의 경계에 carrier direct injection이 활성화 되었고, 이로 인한 charge balance의 저하를 확인하였다. EL spectrum결과 각 소자는 CBP의 618 nm 파장 외에도, 추가적으로 TPBi의 398 nm, NPB의 456 nm의 파장을 보였다. 이를 통해 doping 위치에 따라 exciton이 형성되는 recombination zone이 이동하고 있음을 확인하였고, Front side는 6 V의 인가전압에서는 발광 파장이 398 nm에서 높은 값을 보이나 8 V, 10 V, 12 V에서 618 nm에서 높은 값을 보이는 것으로 인가전압에 의해 recombination zone이 HTL쪽으로 이동되는 것 또한 확인하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
• /
• pp.149-149
• /
• 2015

본 연구에서는 Host 물질 Alq3와 Dopant 물질 Ir(piq)3, Zn(BTZ)2를 사용한 ITO/NPB/Alq3+ metal complexes/Alq3/LiF/Al 다층 구조의 PHOLED 소자를 제작하고 특성 변화를 파악하였다. Dopant Ir(piq)3를 발광 영역에 도핑하였을 경우에는 소자의 발광 효율이 감소하였다. 이는 Co-deposition 조건에 따른 분자간의 거리가 충분히 가까워지지 않았기 때문이다. 분자간의 거리가 Co-deposition 조건보다 멀게 되면 Host - Dopant 간의 에너지 전달이 제대로 일어날 수 없게 되며, 결과적으로 Host 영역과 Dopant영역에서 각각 발광을 하게 된다. Dopant Zn(BTZ)2를 도핑하였을 경우에는 Host - Dopant 간의 에너지 전달에 의한 효과로 인해, J-V 특성은 50% 이상, L-V 특성은 20% 이상, L-J 특성은 10% 이상 효율이 증가하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
• /
• pp.151.2-151.2
• /
• 2015

본 연구에서는 indium-tin-oxide(ITO)/1,4,5,8,9,11-hexaazatriphenylene-hexacarbonitrile(HAT-CN)/N,N'-di(naphthalene-lyl)-N,N'-diphenyl-benzidine(NPB)/4,4'-Bis(N-carbazolyl)-1,1'-biphenyl(CBP)/2,2',2"-(1,3,5-Benzinetriyl)-tris(1-phenyl-1-H-benzimidazole)TPBi/tris-(8-hydroxyquinoline) aluminum($Alq_3$)/LiF/Al 구조를 가진 유기 발광 다이오드 소자의 발광층에 $Ir(ppy)_3$(2% wt)을 도핑하여 소자의 특성 변화를 살펴보았다. $Ir(ppy)_3$의 두께는 5nm이고 도핑 위치는 정공 수송층과 발광층 계면의 0nm에서부터 25nm까지 5nm간격으로 도핑을 하였다. 실험 결과 소자의 효율은 도핑 위치가 정공 수송층에서 25nm떨어진 위치일 때 가장 높았고, 10nm일 때 가장 낮았다. 이는 도핑 부분의 위치가 정공 차단층에 가까워질수록 정공과 전자의 균형이 좋아지는 것이 소자 성능을 향상시키는 원인으로 추측된다.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
• /
• pp.620-622
• /
• 2004

In this study, a mono-chelated compound as novel blue light emitting material, $BPh_2$(pbi) (pbi = 2-(2-Pyridyl)benzimidazole) was synthesized Organic light emitting Diodes (OLEDs), which has a ITO/NPB(40 nm)/Boron(30 nm)/$Alq_3$(1 nm)/Liq(3 nm)/Al(150 nm) structure, has been fabricated. The maximum brightness of the device is up to about 900 cd/$m^2$ and 0.54 cd/A at 11.5 V. The EL peaks and CIE coordinates of our OLEDs is 457 nm and (0.26, 0.29), respectively.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2006년도 학술대회 논문집 전문대학교육위원
• /
• pp.171-174
• /
• 2006

본 연구에서 새로 합성한 적색 도판트 Red-1을 Physical vapor Deposition (PVD) 법을 이용하여 다층구조의 유기 발광 다이오드를 제작하였다. 적층된 유기물 층으로 정공주입층은 4,4',4"-tri [2-naphthyl(phenyl)amino]triphenylamine(2-TNATA) 정공 수송층으로4-4bis [N-(1-napthyl-N-phenyl-amino)biphenyl] (NPB)를 사용하였으며 전자 수송층은 tris (8-quinolinolato)-aluminum ($Alq_3$), 발광층에서의 host 재료로 사용한 물질은 $Alq_3$. 4,4'- N-N'-dicarba zole-biphenyl (CBP), 게스트재료는 Red-1, 정공저지층으로 2,9-dimethyl-4, 7-diphenyl -1 10-phen antroline (BCP), 전자 주입층으로는 lithiumquinolate (Liq)를 사용하여 보다 향상된 전기적, 발광특성을 보이는 소자를 제작하였다. 전하를 주입하는 전극으로 일함수가 큰 투명전극인 ITO (indium-tin-oxide)를 양전극으로, Al을 음전극으로 사용하였다. 그리하여, 발광층 내에서의 host재료 $Alq_3$와 CBP와의 energy transfer의 관점에서 그 특성을 연구하였다.

• Communications for Statistical Applications and Methods
• /
• 제5권2호
• /
• pp.503-515
• /
• 1998

When a neutral particle beam(NPB) aimed at the object and receive a small number of neutron signals at the detector, it follows approximately Poisson distribution. Under the four assumptions in the presence of errors and uncertainties for the Poisson parameters, an exact probability distribution of neutral particles have been derived. The probability distribution for the neutron signals received by a detector averaged over the three sources of errors is expressed as a four-dimensional integral of certain data. Two of the four integrals can be evaluated analytically and thereby the integral is reduced to a two-dimensional integral. The monotone likelihood ratio(MLR) property of the distribution is proved by using the Cauchy mean value theorem for the univariate distribution and multivariate distribution. Its MLR property can be used to find a criteria for the hypothesis testing problem related to the distribution.