• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.7
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• pp.1294-1297
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• 2007

In this paper, fabrication techniques for nanoscale metallic nanobeam specimens have been proposed, and mechanical properties of the fabricated gold nanobeams have been evaluated by nanoindentation techniques and nanobeam bending test. Elastic modulus and hardness of gold nanobeams were measured to be $109.6\;{\pm}\;10\;GPa\;and\;1.73\;{\pm}\;0.3\;GPa$, respectively, from the nanoindentation test, while elastic modulus was $241\;{\pm}\;7\;GPa$ from the nanobeam bending test.

• Smart Structures and Systems
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• v.25 no.4
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• pp.501-514
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• 2020

This article presents a comprehensive model to investigate a free vibration and resonance frequencies of nanostructure perforated beam element as nano-resonator. Nano-scale size dependency of regular square perforated beam is considered by using nonlocal differential form of Eringen constitutive equation. Equivalent mass, inertia, bending and shear rigidities of perforated beam structure are developed. Kinematic displacement assumptions of both Timoshenko and Euler-Bernoulli are assumed to consider thick and thin beams, respectively. So, this model considers the effect of shear on natural frequencies of perforated nanobeams. Equations of motion for local and nonlocal elastic beam are derived. After that, analytical solutions of frequency equations are deduced as function of nonlocal and perforation parameters. The proposed model is validated and verified with previous works. Parametric studies are performed to illustrate the influence of a long-range atomic interaction, hole perforation size, number of rows of holes and boundary conditions on fundamental frequencies of perforated nanobeams. The proposed model is supportive in designing and production of nanobeam resonator used in nanoelectromechanical systems NEMS.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2007.06a
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• pp.183-187
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• 2007

The magnetron reactive ion etching (RIE) characteristics of polycrystalline (poly) 3C-SiC grown on $SiO_2$/Si substrate by APCVD were investigated. Poly 3C-SiC was etched by $CHF_3$ gas, which can form a polymer as a function of side wall protective layers, with additive $O_2$ and Ar gases. Especially, it was performed in magnetron RIE, which can etch SiC at lower ion energy than a commercial RIE system. Stable etching was achieved at 70 W and the poly 3C-SiC was undamaged. The etch rate could be controlled from $20\;{\AA}/min$ to $400\;{\AA}/min$ by the manipulation of gas flow rates, chamber pressure, RF power, and electrode gap. The best vertical structure was improved by the addition of 40 % $O_2$ and 16 % Ar with the $CHF_3$ reactive gas. Therefore, poly 3C-SiC etched by magnetron RIE can expect to be applied to M/NEMS applications.

• Smart Structures and Systems
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• v.17 no.5
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• pp.837-857
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• 2016

In the present study, for first time the size dependent vibration behavior of a rotating functionally graded (FG) Timoshenko nanobeam based on Eringen's nonlocal theory is investigated. It is assumed that the physical and mechanical properties of the FG nanobeam are varying along the thickness based on a power law equation. The governing equations are determined using Hamilton's principle and the generalized differential quadrature method (GDQM) is used to obtain the results for cantilever boundary conditions. The accuracy and validity of the results are shown through several numerical examples. In order to display the influence of size effect on first three natural frequencies due to change of some important nanobeam parameters such as material length scale, angular velocity and gradient index of FG material, several diagrams and tables are presented. The results of this article can be used in designing and optimizing elastic and rotary type nano-electro-mechanical systems (NEMS) like nano-motors and nano-robots including rotating parts.

• KSTLE International Journal
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• v.9 no.1_2
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• pp.10-12
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• 2008

Silicon micro-patterns were fabricated on Si (100) wafers using photolithography and DRIE (Deep Reactive Ion Etching) fabrication techniques. The patterned shapes included micro-pillars and micro-channels. After the fabrication of the patterns, the patterned surfaces were chemically modified by coating Z-DOL (perfluoropolyether, PFPE) thin films. The surfaces were then evaluated for their micro-friction behavior in comparison with those of bare Si (100) flat, Z-DOL coated Si (100) flat and uncoated Si patterns. Experimental results showed that the chemically treated (Z-DOL coated) patterned surfaces exhibited the lowest values of coefficient of friction when compared to the rest of the test materials. The results indicate that a combination of both the topographical and chemical modification is very effective in reducing the friction property. Combined surface treatments such as these could be useful for tribological applications in miniaturized devices such as Micro/Nano-Electro-Mechanical-Systems (MEMS/NEMS).

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.18 no.4
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• pp.369-374
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• 2009

In micro/nano-scale contacts in MEMS and NEMS, capillary and van der Waals forces generated around contacting micro-asperities significantly influence the performance of concerning device as they are closely related to adhesion and stiction of interacting surfaces. In this regard, it is of prime importance to accurately estimate the magnitude of surface forces so that an optimal solution for reducing friction and adhesion of micro/nano-surfaces may be obtained We introduced an effective method to calculate these surface forces based on topography information obtained from an atomic force microscope. This method was used to calculate surface forces generated in the contact interface formed between diamond-like carbon coating and $Si_3N_4$ ball. This method is shown to effectively demonstrate the influence of capillary force in the contact area, especially in humid atmosphere.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2014.10a
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• pp.550-554
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• 2014

Regarding thin films in MEMS/NEMS structures, the exact evaluation of mechanical properties is very essential to enhance the reliability of their design and manufacturing. However, such methods as a tensile test and a resonance test, general methods to measure elastic moduli, cannot be applied to thin films since its thickness is so small. This work concerns guided wave based elastic modulus measurement method. To this end, guided wave excitation and detection system using a pulsed laser and a laser interferometry has been established. Also an elastic modulus extraction algorithm from the measured guided wave signal was developed. Finally, it was applied to actual thin film structures such as Ni-Si and Al-Si multilayers. From experimental results, we confirm that the proposed method has considerable feasibility to measure elastic properties of thin films.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.05a
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• pp.14-14
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• 2004

전자 공학 분야의 발전으로 인해 작은 구조물을 제작할 수 있는 리소그라피 (lithography) 기술이 급속하게 발전하고 있으며, 보다 작은 구조물에 대한 수요도 빠르게 증가하고 있다. 지난 수십 년간 반도체 분야에 적용 되어온 Moore's law에 의하면, 수년 내에 수십 나노 미터 크기의 특성 길이 (Critical Dimension)를 지닌 구조물을 이용하여 소자가 제작될 것 이 예견되고 있다. 반도체 공정을 응용하여 작은 구조물을 제작하는 기술은, 전자 공학 분야뿐만 아니라 광전자공학(optoelectronics) 분야, 양자 계산(quantum computing) 분야, 양자 계산(quantum computing) 분야, MEMS/NEMS, 바이오 센서(biosensor)분야 등에 다양한 응용성을 가질 것으로 예상된다.(중략)

• Particle and aerosol research
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• v.5 no.3
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• pp.95-109
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• 2009

A low temperature plasma process has been widely used for semiconductor fabrication and can also be applied for the preparation of solar cell, MEMS or NEMS, but they are notorious in the point of particle contamination. The nano-sized particles can be generated in the low temperature plasma process and they can induce several serious defects on the performance and quality of microelectronic devices and also on the cost of final products. For the preparation of high quality thin films of high efficiency by the low temperature plasma process, it is desirable to increase the deposition rate of thin films with reducing the particle contamination in the plasmas. In this paper, we introduced the studies on the generation and growth of nanoparticles in the low temperature plasmas and tried to introduce the recent interesting studies on nanoparticle generation in the plasma reactors.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.2
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• pp.112-115
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• 2011

To stabilize the electric characteristic of Silicon Thin Film Transistor, reducing the current leakage is most important issue. To reduce the current leakage, many ideas were suggested. But the increase of mask layer also increased the cost. On this research Bird's Beak process was use to present element. Using Silvaco simulator, it was proven that it was able to reduce current leakage without mask layer. As a result, it was possible to suggest the structure that can reduce the current leakage to 1.39nA without having mask layer increase. Also, I was able to lead the result that electric characteristic (on/off current ratio) was improved compare from conventional structure.