• 한국연소학회:학술대회논문집
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• 한국연소학회 2002년도 제24회 KOSCO SYMPOSIUM 논문집
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• pp.185-191
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• 2002

The influence of N2 addition on soot formation, flame temperature and NOx emissions is investigated experimentally with methane fuel co-flow diffusion flames. The motivation of the present investigation is the differences in NOx reduction reported between fuel-side and oxidizer-side introduction of N2. To determine the influence of dilution alone, fuel was diluted with nitrogen while keeping the adiabatic flame temperature fixed by changing the temperature of the reactants. And to see the thermal effect only, air was supplied at different temperature without N2 addition. N2 addition into fuel side suppressed the soot formation than the case of oxidizer-side, while flame temperature enhanced the soot formation almost linearly. These results reveals the relative influences of the thermal, concentration effects of N2 additives on soot formation In accordance with experimental study, numerical simulation using CHEMKIN code was carried out to compare the temperature results with those acquired by CARS measurement, and we could find that there is good agreement between those results. Emission test revealed that NOx emissions were affected by not only flame temperature but also N2 addition.

• 한국세라믹학회지
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• 제45권12호
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• pp.827-831
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• 2008

Spark plasma sintering (SPS) of AlN ceramics were carried out with ${Y_2}{O_3}$ as sintering additive at a sintering temperature $1,550{\sim}1,700^{\circ}C$. The effect of ${Y_2}{O_3}$ addition on sintering behavior and thermal conductivity of AlN ceramics was studied. ${Y_2}{O_3}$ added AlN showed higher densification rate than pure AlN noticeably, but the formation of yttrium aluminates phases by the solid-state reaction of ${Y_2}{O_3}$ and ${Al_2}{O_3}$ existed on AlN surface could delay the densification during the sintering process. The thermal conductivity of AlN specimens was promoted by the addition of ${Y_2}{O_3}$ up to 3 wt% in spite of the formation of YAG secondary phase in AlN grain boundaries because ${Y_2}{O_3}$ addition could reduced the oxygen contents in AlN lattice which is primary factor of thermal conductivity. However, the thermal conductivity rather decreased over 3 wt% addition because an immoderate formation of YAG phases in grain boundary could decrease thermal conductivity by a phonon scattering surpassing the contribution of ${Y_2}{O_3}$ addition.

• 한국전기전자재료학회논문지
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• 제21권12호
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• pp.1051-1056
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• 2008

In this study, the investigations of the TiN etching characteristics were carried out with addition of $Cl_2$ gas in an inductively coupled $BCl_3$-base plasma system. Dry etching of the TiN was studied by varying the etching parameters including $Cl_2$ gas addition ratio, RF power, DC-bias voltage and pressure. The etch rate of TiN thin film was maximum when the $Cl_2$ gas addition flow was 2 sccm with fixed other conditions. As the RF power DC-bias voltage were increased, the etch rate of TiN thin film showed increasing tendency. $BCl_3/Cl_2$/Ar plasmas were characterized by optical emission spectroscopy (OES) analysis. The chemical reaction on the surface of the etched TiN films was investigated with X-ray photoelectron spectroscopy (XPS).

• 한국조리학회지
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• 제3권
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• pp.239-257
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• 1997

This study investigated the effect of the addition of alcohol on the quality change of Chungkukjang during the aging, The Cung-kuk-jang was made by the degree of 3, 5, 10%, respectively, and determined NH2-N, NH3-N, total acidity, cell numbers, lactate, succinate and phenolic acid to measure the change of flavor component in the aging of 2$0^{\circ}C$. 1. In the treatment groups of different amount of alcohol and salt added and aging period of Chung-kuk-hang, NH2-N was more decreased with more addition of alcohol and salt in the 3-and 10-day of aging. NH3-N was increased gradually in the addition of up to 2.0% alcohol and then decreased in the 3-and 10-day of aging. 2. In the treatment groups of different amount of alcohol added and aging period Chung-kuk-hang, the total acidity was more decreased with more addition of alcohol and higher degree of salt. Cell number was decreased rapidly with the addition of 1.0% alcohol in the 3-day and then decreased relatively and in the 10-day of aging, and it was increased with the addition of alcohol 3. With the addition of alcohol and the different growing temperature, the content of phenolic acid was more browning changed at 3$0^{\circ}C$ than that of at 2$0^{\circ}C$ and the phenol content of each group was decreased with increasing the addition amount of alcohol. Thus, the more addition of alcohol amount would the more extend the period of Chung-kuk-hang aging.

• 대한화학회지
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• 제13권3호
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• pp.221-228
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• 1969

Nucleophile의 親核性 添加反應性을 정량적으로 연구하고자 전보에 이어 3,4-methylenedioxy-${\beta}$-nitrostyrene에 대한 n-amyl, n-hexyl, n-Octyl, n-decylamercaptanㅓ의 添加反應速度常數를 측정한 결과 n-amylmercaptide, n-hexylmercaptide, n-octylmercaptide, n-decylmercaptide ino에 대해 각각 2.82${\times}10^8$, 100${\times}10^8$, 2.23${\times}10^8$과 1.77${\times}10^8$ $M^{-2} .sec^{-1}$를 얻었고, n-amyl, n-hexyl, n-Octyl, n-decylmercaptan분자에 대해서는 각각 2.82${\times}10^{-2}$, 1.95${\times}10^{-2}$, 7.08${\times}10^{-2}$과 5.63${\times}10^{-2}$$M^{-1} . sec^{-1}$를 얻었으며, 염기성뿐만 아니라 산성용매 속에서도 그의 반응메카니즘을 잘 설명할 수 있는 반응속도 식도 구하였다.

• 한국세라믹학회지
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• 제33권5호
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• pp.524-530
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• 1996

TiB2-BN-AlN composite was fabricated with the addition of 0~12 wt% WC by HP-sintering. Their sinterability. microstructure mechanical and electrical properties were studied as a function of the WC content. The addition of WC up to 12 wt% increased the flexural strength and decreased electrical resistivity as compared with those of the TiB2-BN-AlN composites. The electrical resistivity of TiB2-BN-AlN composite with 4.3 wt% WC was 640$\mu$$\Omega$-cm. It was found that the TiB2-BN-AlN composites with WC addition more than 4wt% was suitable for the application to the Al evaporation boat.

• 한국연소학회:학술대회논문집
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• 대한연소학회 2003년도 제27회 KOSCO SYMPOSIUM 논문집
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• pp.209-214
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• 2003

Numerical simulations are performed at atmospheric pressure in order to understand the effect of additives on flame speed, flame temperature, the radical concentration, the NOx formation in freely propagating $CH_4/O_2/N_2$ flames. The additives used are carbon dioxide and hydrogen chloride which have a combination of physical and chemical behavior on hydrocarbon flame. In the flame established with the same mole of methane and additive, $CO_2$ addition significantly contributes toward the reduction of flame speed and flame temperature by the physical effect, whereas addition of HCl mainly does by the chemical effect. The impact of HCl addition on the decrease of the radical concentration is about 1.6-1.8 times as large as $CO_2$ addition. Hydrogen chloride addition is higher on the reduction of EINO than $CO_2$ addition because of the chemical effect of HCl.

• 한국전기전자재료학회논문지
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• 제29권12호
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• pp.791-795
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• 2016

The effects of $TiO_2$ addition on the electrical insulation of AlN ceramics with 1 wt% $Y_2O_3$ as a sintering aid have been investigated. Some of $TiO_2$ has reacted with AlN powders and transformed to fine TiN particles during sintering, which was uniformly dispersed along grain boundaries of AlN. At a high electrical field (500 V/mm), the resistivity of AlN ceramics with $TiO_2$ addition of 0.2 wt% increased about 1000 times from $3{\times}10^{10}{\Omega}cm$ to $3.1{\times}10^{13}{\Omega}cm$. Based on the impedance spectroscopy measurement, it was found that $TiO_2$ addition increased dramatically electrical resistivity of AlN grains much more than that of grain boundaries. Thus, $TiO_2$ was believed to dissolve inside AlN grains to suppress ionic conduction of Al vacancies. This suppressed ionic conduction by Ti incorporation into AlN grains seems to contribute to more electrically insulating AlN ceramics.

• Journal of Microbiology and Biotechnology
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• 제26권7호
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• pp.1290-1302
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• 2016

Microalgae are being researched for their potential as attractive biofuel feedstock, particularly for their lipid production. For maximizing biofuel production, it is necessary to explore the effects of environmental factors on algal lipid-producing potential. In this study, the effects of nitrogen (N) sources (NO₂-N, NO₃-N, urea-N, NH₄-N, and N-deficiency) and carbon-to-nitrogen ratios (C/N= 0, 1.0, 3.0, and 5.0) on algal lipid-producing potential of Chlorella sp. HQ were investigated. The results showed that for Chlorella growth and lipid accumulation potential, NO₂-N was the best amongst the nitrogen sources, and NO₃-N and urea-N also contributed to algal growth and lipid accumulation potential, but NH₄-N and N-deficiency instead caused inhibitory effects. Moreover, the results indicated that algal lipid-producing potential was related to C/N ratios. With NO₂-N treatment and carbon addition (C/N = 1.0, 3.0, and 5.0), total lipid yield was enhanced by 12.96-20.37%, but triacylglycerol (TAG) yields decreased by 25.52-94.31%. As for NO₃-N treatment, carbon addition led to a 17.82-57.43%/25.86-82.67% reduction of total lipid/TAG yields. When NH₄-N was used as the nitrogen source, total lipid/TAG yields were increased by 46.67-113.33%/28.99-74.76% with carbon addition. The total lipid/TAG yields of urea-N treatment varied with C/N ratios. Overall, the highest TAG yield (TAG yield: 38.75 ± 5.21 mg/l; TAG content: 44.16 ± 4.35%) was achieved under NO₂-N treatment without carbon addition (C/N = 0), the condition that had merit for biofuel production.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.468-470
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• 1999

One of the most critical problem in etching of platinum was generally known that the etch slope was gradual. therefore, the addition of $N_2$ gas into the Ar/C1$_2$ gas mixture, which has been proposed the optimized etching gas combination for etching of platinum in our previous article, was performed. The selectivity of platinum film to oxide film as an etch mask increased with the addition of N2 gas, and the steeper etch slope over 75 $^{\circ}$ could be obtained. These phenomena were interpreted the results the results of a blocking layer such as Si-N or Si-O-N on the oxide mask. Compostional analysis was carried out by X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). Moreover, it could be obtained the higher etch rate of Pt film and steeper profile without residues such as p.-Cl and Pt-Pt ant the addition N\ulcorner of 20 % gas in Ar(90)/Cl$_2$(10) Plasma. The Plasma characteristic was extracted from optical emissionspectroscopy (OES).