Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1999.11a
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- Pages.468-470
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- 1999
$N_2$ Gas roles on Pt thin film etching using Ar/$C1_2/N_2$ Plasma
Ar/$C1_2/N_2$ 플라즈마를 이용한 Pt 박막 식각에서 $N_2$ Gas의 역할
Abstract
One of the most critical problem in etching of platinum was generally known that the etch slope was gradual. therefore, the addition of
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