• Title/Summary/Keyword: N saturation

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Analytical modeling for the short-channel MOSFET (Short-Channel MOSFET의 해석적 모델링)

  • 홍순석
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.17 no.11
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    • pp.1290-1298
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    • 1992
  • In this paper, the Poisson's equation is solved two-dimensionally without employing any fitting parameters, and the model formulation of a short-channel MOSFET is accomplished fully analytically. It automatically derives a very accurate drain current expression that can be used simultaneously for strong inversion, subthreshold, and saturation regions. Furthermore, this model gives a unified explanation for the short-channel effect, the body effect, the DIBL effect, and even the variation of the effective carrier mobility. The obtained expression of the threshold voltage also includes the dependence on the oxide thickness, the n+ junction depth, and temperature.

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Electrical properties of SOI n-MOSFET's under nonisothermal lattice temperature (격자온도 불균일 조건에서 SOI n-MOSFET의 전기적 특성)

  • 김진양;박영준;민홍식
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.3
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    • pp.89-95
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    • 1996
  • In this ppaer, temeprature dependent transport and heat transport models have been incorperated to the two dimensional device simulator SNU-2D provides a solid bse for nonisothermal device simulation. As an example to study the nonisothermal problem. we consider SOI MOSFET's I-V characteristics have been simulated and compared with the measurements. It is shown that negative slopes in the Ids-Vds characteristics are casused by the temperature dependence of the saturation velocity and the degradation of the temperature dependence mobility. Also it is shown that the kink effect occurs when impact ionization near the drain produces a buildup of holes in this isolated device island, and the hysteresis is caused by the creation of holes in the channel and their flow to the source.

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ADDITIONAL EFFECTS OF NITRUOS OXIDE TO OTHER SEDATIVE DRUGS FOR BEHAVIOR MANAGEMENT. (약물을 이용한 행동조절시 부가적인 아사화질소 흡입진정의 효과)

  • Jean, Young-Yim;Yang, Kyu-Ho
    • Journal of the korean academy of Pediatric Dentistry
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    • v.23 no.4
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    • pp.937-945
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    • 1996
  • Nitrous oxide has acquired widespread use as a tool for management of anxious and comprehensive pediatric dental patients. Clinical impressions have suggested that inhalation sedation with $N_2O/O_2$ reinforces the effect of other sedatives. Fifteen uncooperative children, mean age of 37months, who were regarded as fail in the first treatment using chloral hydrate-hydroxyzine orally, midazolam orally or intranasally, were sedated with the same sedatives in conjunction with $N_2O/O_2$. All the children were restrained in a pediwrap and were monitored with pulse oximeter for their heart rate and oxygen saturation. Degree of sleep, crying and movement were evaluated. The clinical results indicated that a satisfactory level of sedation was achieved in approximately two thirds of the cases (about 66 %) under those sedation manner. Complications were rare and those of treatments were successfully completed without difficulty.

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Gate 산화막으로 $HfO_2$ 박막을 이용하여 제작한 NFET 특성 고찰

  • 박재후;조문주;박홍배;이석우;박태주;이치훈;황철성
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.12a
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    • pp.86-88
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    • 2003
  • Gate 산화막을 high-k 물질인 $HfO_2$ 박막을 이용하여 N-type MOS field effect transistor를 제작하였다. 전극은 poly-Si 전극을 사용하였다. Gate 산화막은 ALD 로 $Hf(N(CH_3)_2)_4$ 원료를 이용하여 $HfO_2$ 박막을 형성하였다. 산화제는 $H_{2}O$$O_3$ 를 사용하였는데, $H_{2}O$ 가 약간 우수하였으나 그 차이는 크지 않았다. $HfO_2$ 를 증착하기 전에 in-situ 로 $O_3$ 를 흘려 줌으로써 $SiO_2$를 얇게 형성하였는데, 이 결과 threshold voltage 가 약 0.2V 높아지고 saturation current 가 커지는 것이 관찰되었다. 이러한 결과는 $HfO_2$ 박막을 직접 channel 위에 증착하는 것보다 $O_3$ 를 이용 얇은 $SiO_2$ 를 형성하고 그 위에 $HfO_2$ 박막을 증착하는 방법이 transistor의 특성을 향상시키는 데 도움이 된다.

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Electrical Characteristics of Metal/n-InGaAs Schottky Contacts Formed at Low Temperature

  • 이홍주
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.5
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    • pp.365-370
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    • 2000
  • Schottky contacts on n-In$\_$0.53//Ga$\_$0.47//As have been made by metal deposition on substrates cooled to a temperature of 77K. The current-voltage and capacitance-voltage characteristics showed that the Schottky diodes formed at low temperature had a much improved barrier height compared to those formed at room temperature. The Schottky barrier height ø$\_$B/ was found to be increased from 0.2eV to 0.6eV with Ag metal. The saturation current density of the low temperature diode was about 4 orders smaller than for the room temperature diode. A current transport mechanism dominated by thermionic emission over the barrier for the low temperature diode was found from current-voltage-temperature measurement. Deep level transient spectroscopy studies exhibited a bulk electron trap at E$\_$c/-0.23eV. The low temperature process appears to reduce metal induced surface damage and may form an MIS (metal-insulator-semiconductor)-like structure at the interface.

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Design of Rogowski coil to improve of current measurement sensitivity (전류측정감도 개선을 위한 로고우스키 코일의 설계)

  • Park, J. N.;Lee, C.;Jang, Y. M.;Kang, S. H.;Lim, K. J.;Na, D. H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.609-612
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    • 2001
  • Rogowski coil is made having no ferromagnetic material in a core. So the coil cannot be driven into saturation. This result in that Rogowski coils may be calibrated at relatively low currents, and used with confidence at very high currents. However the lowest level of current that can be measured is limited by the sensitivity of the voltage measuring instrument and system noise. Therefore, geometrical effects were investigated in order to measure high sensitivity of low level current and the significant source of error wa examined as well. n the results, the source of error was associated with coil designs, i.e. shape and uniformity of coil and a geometrical location of current source inside and outside of the Rogowski coil.

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The Hybrid Rocket Internal Ballistics with Two-phase Fluid Modeling for Self-pressurizing $N_2O$ I (자발가압 성질을 가진 아산화질소의 2상유체 모델링을 통한 하이브리드 로켓 내탄도 해석 I)

  • Lee, Jung-Pyo;Rhee, Sun-Jae;Woo, Kyoung-Jin;Oh, Ji-Sung;Jung, Sik-Hang;Moon, Hee-Jang;Sung, Hong-Gye;Kim, Jin-Kon
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2011.11a
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    • pp.45-49
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    • 2011
  • The blow-down oxidizer feed system with self-pressurizing $N_2O$ has more advantages than the regulated system. However, it is difficult to predict the exhaust flow rate because there exist two phases in the $N_2O$ tank - liquid phase and gas phase, and the properties of $N_2O$ in storage tank are varied continuously during blow-down. In this paper, a method that can analyse simply the blow-down oxidizer feed system is studied. The properties of saturated $N_2O$ are found from the NIST data base, and mass flow through the orifice is modeled as NHNE. Cold flow test with hybrid rocket combustor is performed for the comparison where the results should found from the good agreement.

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The Magnetic Properties of Co-Ni-Fe-N Soft Magnetic Thin Films

  • Kim, Y. M.;Park, D.;Kim, K. H.;Kim, J.;S. H. Han;Kim, H. J.
    • Journal of Magnetics
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    • v.5 no.4
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    • pp.120-123
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    • 2000
  • Co-Ni-Fe-N thin films were fabricated by a $N_2$ reactive rf magnetron sputtering method. The nitrogen partial pressure ($P_{N2}$) was varied in the range 0~10% . As$P_{N2}$ increases in this range, the saturation magnetization $B_s$ linearly decreases from 19.8 kG to 14 kG and the electrical resistivity ($\rho$) increases from 27 to 155 $\mu\Omegacm$. The coercivity $H_c$ exhibits the minimum value at 4% $P_{N2}$. The magnetic anisotropy fields ($H_k$) are in the range of 20$\sim$50 Oe. High frequency characteristics of $(Co_{22.2}Ni_{27.6}Fe_{50.2})_{100-x}N_x$ films are excellent in the range of 3$\sim$5% of $P_{N2}$. In particular, the effective permeability of the film fabricated at 4% $P_{N2}$ is 800, which is maintained up to 600 MHz. This film also shows Bs of 17.5 kG, $H_c$/ of 1.4 Oe, resistivity of 98$\mu\Omegacm$ and $H_k$ of about 25 Oe. Also, the corrosion resistance of $(Co_{22.2}Ni_{27.6}Fe_{50.2})_{100-x}N_x$ films was imp roved with increasing N concentration.

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Structure and magnetic properties of CrN thin films on La0.67Sr0.33MnO3

  • Zhang, Dingbo;Zhou, Zhongpo;Wang, Haiying;Wang, Tianxing;Lu, Zhansheng;Yang, Zongxian;Ai, Zhiwei;Wu, Hao;Liu, Chang
    • Current Applied Physics
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    • v.18 no.11
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    • pp.1320-1326
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    • 2018
  • High crystalline quality CrN thin films have been grown on $La_{0.67}Sr_{0.33}MnO_3$ (LSMO) templates by molecular beam epitaxy. The structure and magnetic properties of CrN/LSMO heterojunctions are investigated combining with the experiments and the first-principles simulation. The N?el temperature of the CrN/LSMO samples is found to be 281 K and the saturation magnetization of CrN/LSMO increases compared to that of LSMO templates. The magnetic property of CrN/LSMO heterostructures mainly comes from Cr atoms of (001) CrN and Mn atoms of (001) LSMO. The (001) LSMO induces and couples the spin of the CrN sublattice at CrN/LSMO interface.

THE MAGNETIC PROPERTIES OF Co-Ni-Fe-N SOFT MAGNETIC THIN FILMS

  • Kim, Y. M.;Park, D.;Kim, K. H.;Kim, J.;S. H. Han;Kim, H. J.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2000.09a
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    • pp.492-499
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    • 2000
  • Co-Ni-Fe-N thin films were fabricated by a N$\sub$2/ reactive rf magnetron sputtering method. The nitrogen partial pressure (P$\sub$N2/) was varied in the range of 0∼10%. As P$\sub$N2/ increases in this range, the saturation magnetization (B$\sub$s/) linearly decreases from 19.8 kG to 14 kG and the electrical resistivity ($\rho$) increased from 27 to 155 ${\mu}$$\Omega$cm. The coercivity (H$\sub$c/) exhibits the minimum value at 4% of P$\sub$N2/. The magnetic anisotropy (H$\sub$k/) are in the range of 20∼50 Oe. High frequency characteristics of (Co$\sub$22.2/Ni$\sub$27.6/Fe$\sub$50.2/)$\sub$100-x/N$\sub$x/ films are excellent in the range of 3∼5% of P$\sub$N2/. Especially the effective permeability of the film fabricated at 4% of P$\sub$N2/ is 800, which is maintained up to 600 MHz. This film also shows Bs of 17.5 kG, H$\sub$c/ of 1.4 Oe, resistivity of 98 $\Omega$cm and H$\sub$k/ of about 25 Oe. Also, the corrosion resistance of (Co$\sub$22.2/Ni$\sub$27.6/Fe$\sub$50.2/)$\sub$100-x/N$\sub$x/ were improved with the increase in N concentration.

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