• 제목/요약/키워드: N $O_{}$ x/

검색결과 2,140건 처리시간 0.027초

Effects of Ga Substitution in LaFe1-xGaxO3 (χ= 0, 0.1, 0.3, 0.5, and 0.7)

  • Yoon, Sung-Hyun;Park, Seung-Jin;Cha, Deok-Joon;Min, Byung-Ki;Kim, Chul-Sung
    • Journal of Magnetics
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    • 제7권2호
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    • pp.40-44
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    • 2002
  • Crystallographic and magnetic properties of ;$LaFe_{1-x}Ga_xO_3$($\chi$= 0, 0.1, 0.3, 0.5, and 0.7) were studied using XRD and Mossbauer spectroscopy. The crystal structures were found to be orthorhombic and the lattice parameters $\alpha$, b, and c were found to decrease with increasing Ga substitution. M$\ddot{o}$ssbauer spectra were obtained at various absorber temperatures ranging from 20 K to 750 K. The M$\ddot{o}$ssbauer spectra were all sextets below $T_N$ and were all singlets above $T_N$. Asymmetric broadening of the M$\ddot{o}$ssbauer spectral lines at 20 K was explained by the multitude of possible environments for an iron nucleus. As the temperature increases to $T_N$, a systematic line broadening in M$\ddot{o}$ssbauer spectra was observed and interpreted to originate from different temperature dependencies of the magnetic hyperfine fields at various iron sites.

Ferroelectric Properties of Substituted Aurivillius Phases SrBi2Nb2-xMxO9 (M=Cr, Mo)

  • Moon, S.-Y.;Choi, K. S.;Jung, K. W.;Lee, H.;Jung, D.
    • Bulletin of the Korean Chemical Society
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    • 제23권10호
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    • pp.1463-1482
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    • 2002
  • Partially doped Aurivillius phases SrBi2N$b_{2-x}M_xO_9$ (M=Cr and Mo) were successfully synthesized and characterized. The extent of the substitution was limited at ~20 mole % because of the size differences between $Nb^{5+}$ and $Cr^{6+}$, and between $Nb^{5+}$ and $Mo^{6+}$. When the amount of substitution exceeded ~20 mole%, the phases began to collapse and the second phases were made. The dielectric constants of substituted compounds were enlarged nevertheless Cr or Mo is substituted. The increment is bigger in the Mo substituted compound than in the Cr doped one although the Nb(Cr)$O_6$ octahedra could be more strongly distorted than the Nb(Mo)$O_6$ octahedra since the ionic size difference between $Nb^{5+}$ and of $Cr^{6+}$ is much bigger than that between $Nb^{5+}$ and $Mo^{6+}$. Consequently, the dielectric constant of the substituted Aurivillius phase $Bi_2$A_{n-1}B_{n-x}M_xO_{3n+1}$$ depends on the extent of distortion of the B$O_6$ octahedra and more strongly on the polarizability of the metal.

비납계 $(1-x)(Bi_{0.5}K_{0.5})TiO_3-xBiFeO_3$ 세라믹의 유전 및 압전 특성

  • 김정민;성연수;송태권;김명호
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 춘계학술발표대회
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    • pp.33.2-33.2
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    • 2009
  • Dielectric and piezoelectric properties of Lead-free $(1-x)(Bi_{0.5}K_{0.5})TiO_3-xBiFeO_3$ceramics prepared by a conventional solid state reaction method were investigated in the range of x = 0~10 mol%. Piezoelectric coefficient was increased from 31 pC/N at x = 0 mol% to 64 pC/N at x = 6 mol% then decreased with increasing x. Electromechanical coupling factor ($K_p$) was increased up to 0.18 at x = 10 mol%. On the other hand, mechanical quality factor ($Q_m$) was decreased. Grain size was not much changed with various x and a single perovskite with tetragonal symmetry was maintained at all compositions forming a solid solution between $(Bi_{0.5}K_{0.5})TiO_3$ and $BiFeO_3$. Depolarization temperature ($T_d$) was gradually decreased with increasing x from $302^{\circ}C$ at x = 0 to $245^{\circ}C$ at x = 10 mol%.

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다양한 반도체-유전체 덮개층 조합을 이용한 InGaAs/InGaAsP 양자우물의 무질서화 (Dielectric cap quantum well disordering for band gap tuning of InGaAs/InGaAsP quantum well structure using various combinations of semiconductor-dielectric capping layers)

  • 조재원;이희택;최원준;우덕하;김선호;강광남
    • 한국진공학회지
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    • 제11권4호
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    • pp.207-211
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    • 2002
  • 반도체-유전체 덮개층의 다양한 조합이 I $n_{0.53}$G $a_{0.47}$As/InGaAsP(Q1.25) 양자우물 무질서화에 미치는 영향을 PL(Photoluminescence)을 이용하여 조사하였다. 청색 편이에 대한 문턱 온도는 약 $750^{\circ}C$ 였으며 전반적으로 온도가 올라감에 따라 청색 편이도 점차 증가하였으나 $SiO_2$의 경우에는 온도가 올라감에 따라 포화되는 경향을 보였다. $SiN_{x}$$SiO_2$보다 더 큰 청색 편이를 야기하였는데 이것은 $SiN_{x}$의 낮은 성장 온도와 관계가 있는 것으로 생각된다. $SiN_{x}$의 경우 P의 확산이, 그리고 $SiO_2$의 경우 Ga의 확산이 청색 편이에 중요한 역할을 하는 것으로 여겨진다.겨진다.

유연성 소자 적용을 위한 전처리 조건에 따른 $SiO_xN_y$ 보호막 특성 평가 (Properties of $SiO_xN_y$ thin films prepared on ion beam pretreated plastic substrates for flexible devices)

  • 정유정;김도근;김종국;이건환
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2007년도 춘계학술발표회 초록집
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    • pp.159-160
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    • 2007
  • 본 연구에서는 Si 타겟과 반응성 마그네트론 스퍼터링법을 적용하여 $SiO_xN_y$ 박막을 PET 필름상에 증착하였다. PET 필름상에 밀착력 증진 및 기판 표면 거칠기 제어를 위해 이온빔을 이용한 플라즈마 전처리를 수행하였다. 플라즈마 전처리 조건과 질소 가스 유량비에 따른 $SiO_xN_y$ 박막의 광학적 특성과 수분의 투습성에 대한 영향을 관찰하였다. 광학적 투과율은 전처리 및 조성비에 관계없이 95% 이상의 높은 광투과율을 보여주었다. 수분에 대한 투습 특성은 플라즈마 전처리 조건에 따라 다소 향상됨을 확인하였고, 질소 유량비가 증가함에 따라 투습 특성이 향상되었다.

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ON A NONVANISHING OF PLURIGENUS OF A THREEFOLD OF GENERAL TYPE

  • Shin, Dong-Khan
    • 대한수학회논문집
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    • 제25권2호
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    • pp.161-165
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    • 2010
  • Even though there is a formula for $h^0$(X, $\cal{O}_X(nK_X)$) for a canonical threefold X, it is not easy to compute $h^0$(X, $\cal{O}_X(nK_X)$) because the formula has a term due to singularities. In this paper, we find a way to control the term due to singularities. We show nonvanishing of plurigenus for the case when the index r in the singularity type $\frac{1}{r}$(1, -1, b) is sufficiently large.

고전압 응용분야를 위한 GaN 쇼트키 다이오드의 산화 공정 (Oxidation Process of GaN Schottky Diode for High-Voltage Applications)

  • 하민우;한민구;한철구
    • 전기학회논문지
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    • 제60권12호
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    • pp.2265-2269
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    • 2011
  • 1 kV high-voltage GaN Schottky diode is realized using GaN-on-Si template by oxidizing Ni-Schottky contact. The Auger electron spectroscopy (AES) analysis revealed the formation of $NiO_x$ at the top of Schottky contact. The Schottky contact was changed to from Ni/Au to Ni/Ni-Au alloy/Au/$NiO_x$ by oxidation. Ni diffusion into AlGaN improves the Schottky interface and the trap-assisted tunneling current. In addition, the reverse leakage current and the isolation-leakage current are efficiently suppressed by oxidation. The isolation-leakage current was reduced about 3 orders of magnitudes. The reverse leakage current was also decreased from 2.44 A/$cm^2$ to 8.90 mA/$cm^2$ under -100 V-biased condition. The formed group-III oxides ($AlO_x$ and $GaO_x$) during the oxidation is thought to suppress the surface leakage current by passivating surface dangling bonds, N-vacancies and process damages.

졸-겔법에 의한 (YbxY1-x)MnO3강유전체 박막제조 (Preparation of Ferroelectric (YbxY1-x)MnO3 Thin Film by Sol-Gel Method)

  • 강승구;이기호
    • 한국세라믹학회지
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    • 제41권2호
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    • pp.170-175
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    • 2004
  • Y-acetate, Yb-acetate와 Mn-acetate를 출발물질로 사용하여 sol-gel 법으로 강유전성 (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ 박막을 제조하였다. Acetylaceton을 촉매로 사용하고 Reflux 법을 이용하여 안정한 (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ 전구체 용액을 얻었으며, 박막은 스핀 코팅방법으로 Si(100) 기판 위에 제조하였다 열처리 온도, 코팅용액의 Rw($H_2O$/alkoxide moi ratio)변화 등을 실험변수로 하여 박막의 결정상 변화를 연구하였다. X-선 회절분석 결과 YbMn $O_3$의 결정상을 얻기 위한 최저 열처리온도는 7$50^{\circ}C$이었으며, 최적 열처리 조건은 80$0^{\circ}C$였다 Rw를 1∼6 범위 내에서 조절하여 첨가한 결과, Rw=1의 조건에서 c-축 배향이 잘 발달된 hexagonal YbMn $O_3$ 단일 결정상을 얻었다. Si(100)기판 위에 제조된 (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ 박막은 x=0 또는 1인 경우 잔류분극(Pr)값이 약 200 nC/$ extrm{cm}^2$을 나타내었으나 0