• Title/Summary/Keyword: N $O_{}$ x/

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Effects of Ga Substitution in LaFe1-xGaxO3 (χ= 0, 0.1, 0.3, 0.5, and 0.7)

  • Yoon, Sung-Hyun;Park, Seung-Jin;Cha, Deok-Joon;Min, Byung-Ki;Kim, Chul-Sung
    • Journal of Magnetics
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    • v.7 no.2
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    • pp.40-44
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    • 2002
  • Crystallographic and magnetic properties of ;$LaFe_{1-x}Ga_xO_3$($\chi$= 0, 0.1, 0.3, 0.5, and 0.7) were studied using XRD and Mossbauer spectroscopy. The crystal structures were found to be orthorhombic and the lattice parameters $\alpha$, b, and c were found to decrease with increasing Ga substitution. M$\ddot{o}$ssbauer spectra were obtained at various absorber temperatures ranging from 20 K to 750 K. The M$\ddot{o}$ssbauer spectra were all sextets below $T_N$ and were all singlets above $T_N$. Asymmetric broadening of the M$\ddot{o}$ssbauer spectral lines at 20 K was explained by the multitude of possible environments for an iron nucleus. As the temperature increases to $T_N$, a systematic line broadening in M$\ddot{o}$ssbauer spectra was observed and interpreted to originate from different temperature dependencies of the magnetic hyperfine fields at various iron sites.

Ferroelectric Properties of Substituted Aurivillius Phases SrBi2Nb2-xMxO9 (M=Cr, Mo)

  • Moon, S.-Y.;Choi, K. S.;Jung, K. W.;Lee, H.;Jung, D.
    • Bulletin of the Korean Chemical Society
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    • v.23 no.10
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    • pp.1463-1482
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    • 2002
  • Partially doped Aurivillius phases SrBi2N$b_{2-x}M_xO_9$ (M=Cr and Mo) were successfully synthesized and characterized. The extent of the substitution was limited at ~20 mole % because of the size differences between $Nb^{5+}$ and $Cr^{6+}$, and between $Nb^{5+}$ and $Mo^{6+}$. When the amount of substitution exceeded ~20 mole%, the phases began to collapse and the second phases were made. The dielectric constants of substituted compounds were enlarged nevertheless Cr or Mo is substituted. The increment is bigger in the Mo substituted compound than in the Cr doped one although the Nb(Cr)$O_6$ octahedra could be more strongly distorted than the Nb(Mo)$O_6$ octahedra since the ionic size difference between $Nb^{5+}$ and of $Cr^{6+}$ is much bigger than that between $Nb^{5+}$ and $Mo^{6+}$. Consequently, the dielectric constant of the substituted Aurivillius phase $Bi_2$A_{n-1}B_{n-x}M_xO_{3n+1}$$ depends on the extent of distortion of the B$O_6$ octahedra and more strongly on the polarizability of the metal.

비납계 $(1-x)(Bi_{0.5}K_{0.5})TiO_3-xBiFeO_3$ 세라믹의 유전 및 압전 특성

  • Kim, Jeong-Min;Seong, Yeon-Su;Song, Tae-Gwon;Kim, Myeong-Ho
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.33.2-33.2
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    • 2009
  • Dielectric and piezoelectric properties of Lead-free $(1-x)(Bi_{0.5}K_{0.5})TiO_3-xBiFeO_3$ceramics prepared by a conventional solid state reaction method were investigated in the range of x = 0~10 mol%. Piezoelectric coefficient was increased from 31 pC/N at x = 0 mol% to 64 pC/N at x = 6 mol% then decreased with increasing x. Electromechanical coupling factor ($K_p$) was increased up to 0.18 at x = 10 mol%. On the other hand, mechanical quality factor ($Q_m$) was decreased. Grain size was not much changed with various x and a single perovskite with tetragonal symmetry was maintained at all compositions forming a solid solution between $(Bi_{0.5}K_{0.5})TiO_3$ and $BiFeO_3$. Depolarization temperature ($T_d$) was gradually decreased with increasing x from $302^{\circ}C$ at x = 0 to $245^{\circ}C$ at x = 10 mol%.

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Dielectric cap quantum well disordering for band gap tuning of InGaAs/InGaAsP quantum well structure using various combinations of semiconductor-dielectric capping layers (다양한 반도체-유전체 덮개층 조합을 이용한 InGaAs/InGaAsP 양자우물의 무질서화)

  • 조재원;이희택;최원준;우덕하;김선호;강광남
    • Journal of the Korean Vacuum Society
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    • v.11 no.4
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    • pp.207-211
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    • 2002
  • Band gap tuning by quantum well disordering in $In_{0.53}Ga_{0.47}As/InGaAsP(Q1.25)$ quantum well structure has been investigated using photoluminescence. The threshold temperature for the blue shift was about $750^{\circ}C$ , and the blue shift became larger as the annealing temperature increased. $SiO_2$ showed saturation as the annealing temperature increased. $SiN_x$caused larger blue shift than $SiO_2$, which is considered to be related to the low growth temperature of $SiN_x$. The diffusion of P and Ga are thought to be responsible for the blue shift of the $SiN_x$ and $SiO_2$capped quantum well disordering , respectively.

Properties of $SiO_xN_y$ thin films prepared on ion beam pretreated plastic substrates for flexible devices (유연성 소자 적용을 위한 전처리 조건에 따른 $SiO_xN_y$ 보호막 특성 평가)

  • Jeong, Yu-Jeong;Kim, Do-Geun;Kim, Jong-Guk;Lee, Geon-Hwan
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.159-160
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    • 2007
  • 본 연구에서는 Si 타겟과 반응성 마그네트론 스퍼터링법을 적용하여 $SiO_xN_y$ 박막을 PET 필름상에 증착하였다. PET 필름상에 밀착력 증진 및 기판 표면 거칠기 제어를 위해 이온빔을 이용한 플라즈마 전처리를 수행하였다. 플라즈마 전처리 조건과 질소 가스 유량비에 따른 $SiO_xN_y$ 박막의 광학적 특성과 수분의 투습성에 대한 영향을 관찰하였다. 광학적 투과율은 전처리 및 조성비에 관계없이 95% 이상의 높은 광투과율을 보여주었다. 수분에 대한 투습 특성은 플라즈마 전처리 조건에 따라 다소 향상됨을 확인하였고, 질소 유량비가 증가함에 따라 투습 특성이 향상되었다.

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ON A NONVANISHING OF PLURIGENUS OF A THREEFOLD OF GENERAL TYPE

  • Shin, Dong-Khan
    • Communications of the Korean Mathematical Society
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    • v.25 no.2
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    • pp.161-165
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    • 2010
  • Even though there is a formula for $h^0$(X, $\cal{O}_X(nK_X)$) for a canonical threefold X, it is not easy to compute $h^0$(X, $\cal{O}_X(nK_X)$) because the formula has a term due to singularities. In this paper, we find a way to control the term due to singularities. We show nonvanishing of plurigenus for the case when the index r in the singularity type $\frac{1}{r}$(1, -1, b) is sufficiently large.

Oxidation Process of GaN Schottky Diode for High-Voltage Applications (고전압 응용분야를 위한 GaN 쇼트키 다이오드의 산화 공정)

  • Ha, Min-Woo;Han, Min-Koo;Hahn, Cheol-Koo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.60 no.12
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    • pp.2265-2269
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    • 2011
  • 1 kV high-voltage GaN Schottky diode is realized using GaN-on-Si template by oxidizing Ni-Schottky contact. The Auger electron spectroscopy (AES) analysis revealed the formation of $NiO_x$ at the top of Schottky contact. The Schottky contact was changed to from Ni/Au to Ni/Ni-Au alloy/Au/$NiO_x$ by oxidation. Ni diffusion into AlGaN improves the Schottky interface and the trap-assisted tunneling current. In addition, the reverse leakage current and the isolation-leakage current are efficiently suppressed by oxidation. The isolation-leakage current was reduced about 3 orders of magnitudes. The reverse leakage current was also decreased from 2.44 A/$cm^2$ to 8.90 mA/$cm^2$ under -100 V-biased condition. The formed group-III oxides ($AlO_x$ and $GaO_x$) during the oxidation is thought to suppress the surface leakage current by passivating surface dangling bonds, N-vacancies and process damages.

Preparation of Ferroelectric (YbxY1-x)MnO3 Thin Film by Sol-Gel Method (졸-겔법에 의한 (YbxY1-x)MnO3강유전체 박막제조)

  • 강승구;이기호
    • Journal of the Korean Ceramic Society
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    • v.41 no.2
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    • pp.170-175
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    • 2004
  • The ferroelectric (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ thin films were fabricated by sol-gel method using Y-acetate, Yb-acetate, and Mn-acetate as raw materials. The stable (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ precursor solution (sol) was prepared through the reflux process with acetylaceton as a catalyst and coated on Si(100) substrate by spin coating. The heat treatment temperature and, Rw ($H_2O$/alkoxide moi ratio) dependence on crystallinity of thin films were studied. The lowest temperature for obtaining YbMn $O_3$phase and the optimum heat-treatment conditions were proved as at 7$50^{\circ}C$ and 80$0^{\circ}C$, respectively. The hexagonal YbMn $O_3$with c-axis preferred orientation could be obtained at Rw=1 condition. The remanent polarization for the thin films of x=0 or 1 was about 200 nC/㎤ while, for the specimens ot 0< x< 1, were 50∼100 nC/$\textrm{cm}^2$.