• 제목/요약/키워드: Modified Chemical Vapor Deposition

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화학증착용 천연가스버너 개발 (Development of the Natural Gas Burner for Modified Chemical Deposition Processes)

  • 유현석;이중성;한정옥;최동수
    • 한국연소학회:학술대회논문집
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    • 한국연소학회 2001년도 제22회 KOSCI SYMPOSIUM 논문집
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    • pp.75-81
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    • 2001
  • MCVD(modified chemical vapor deposition) used in making optical-fiber currently utilizes the hydrogen-oxygen burner as a energy supply source. To improve the productivity and to reduce the manufacturing cost of optical-fiber, a natural gas-oxygen burner has been developed. The manufacturing processes of optical-fiber consist of vapor deposition, collapse and drawing processes. Among these processes, the vapor deposition and the collapse processes are important in terms of improving the productivity and saving the production cost. The vapor deposition and collapse processes are performed by combustion heat and flame force supplied by a burner. So the flame force of the burner used in these processes is required to have an optimal and consistent value in order to allow uniform heating and collapse of quartz tube. In this regard, the momentum ratio of natural gas and oxygen has been optimally determined by modification of a burner and the inlet flow pass also has been modified.

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수정된 화학증착(MCVD)에 관한 실험적 연구 - 온도분포와 입자부착 측정 (An Experimental Study of the Modified Chemical Vapor Deposition Process -Temperature Distribution and Particle Deposition Measurements-)

  • 조재걸;최만수
    • 대한기계학회논문집
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    • 제18권11호
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    • pp.3057-3065
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    • 1994
  • An experimental study has been made for heat transfer and particle deposition during the Modified Chemical Vapor Deposition process which is currently utilized to manufacture high quality optical waveguides. The distributions of tube wall temperatures, rates and efficiencies of particle deposition were measured. Results indicate that the temperature distributions of the tube wall in the axial direction yield the quasi-steady form in which temperature distributions fit in one curve if the relative distance from the moving torch is used as an axial coordinate. Due to the repeated heatings from the traversing torch, the wall temperatures are shown to reach the minimum ahead of torch and it is shown that the two torch formulation suggested by Park and Choi is valid to predict this minimum temperature. Measured wall temperatures, particle deposition efficiencies and tapered entry length are compared with the previous modelling results and shown to be in agreement.

수정된 화학증착과정에서 토치이송과 고체층이 열전달과 입자부착에 미치는 영향 (Effect of Torch Speed and Solid Layer Thickness on Heat Transfer and Particle Deposition During modified Chemical Vapor Deposition Process)

  • 박경순;최만수
    • 대한기계학회논문집
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    • 제18권5호
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    • pp.1301-1309
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    • 1994
  • A study of heat transfer and thermophoretic particle deposition has been carried out for the Modified Chemical Vapor Deposition(MCVD) process. A new concept utilizing two torches is suggested to simulate the heating effects from repeated traversing torches. Calculation results for the wall temperatures and deposition efficiency are in good agreement with experimental data. The effects of variable properties are included and heat flux boundary condition is used to simulate the moving torch heating. A conjugate heat transfer which includes heat conduction through solid layer and heat teansfer in a gas in a tube is analyzed. Of particular interests are the effects of torch speeds and solid layer thicknesses on the deposition efficiency, rate and the tapered entry length.

수정된 화학증착공정에서 에어로졸 역학, 열전달 및 물질전달 해석 (Analysis of Aerosol Dynamics, Heat and Mass Transfer in the Modified Chemical Vapor Deposition)

  • 박경순;이방원;최만수
    • 대한기계학회논문집B
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    • 제23권2호
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    • pp.262-271
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    • 1999
  • A study of aerosol dynamics has been done to obtain axially and radially varying size distributions of particles generated in the Modified Chemical Vapor Deposition process. Heat and mass transfer have also been studied since particle generation and deposition strongly depend on the temperature field in a tube. Bimodal size distributions of particles have been obtained both in the particulate flow and in the deposited particle layer for the first time using the sectional method to solve aerosol dynamics. Variations of geometric mean diameter, geometric standard deviation have been studied for various parameters; flow rates and maximum wall temperature. The comparison between one-dimensional and two-dimensional approaches has also been made.

환상형원관을 사용하는 수정된 화학증착(MCVD)방법에서 내부 제트분사가 입자부착에 미치는 영향 (Effects of Inner Jet Injection on Particle Deposition in the Annular Modified Chemical Vapor Deposition Process Using Concentric Tubes)

  • 최만수;박경순
    • 대한기계학회논문집
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    • 제18권1호
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    • pp.212-222
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    • 1994
  • In the annular Modified Chemical Vapor Deposition process using two concentric tubes, the inner tube is heated to maintain high temperature gradients to have high thermophoretic force which can increase particle deposition efficiency. However, higher axial velocity in a narrow gap between inner and outer tubes can result in a longer tapered entry length. In the present paper, a new concept using an annular jet from the inner tube is presented and shown to significantly reduce the tapered entry length with maintaining high efficiency. Effects of a jet injection on heat transfer, fluid flow and particle deposition have been studied. Of particular interests are the effects of jet velocity, jet location and temperature on the deposition efficiency and tapered length . Torch heating effects from both the previous and present passes are included and the effect of surface radiation between inner and outer tubes is also considered.

Characterization of Chemical Vapor Condensation Reactor for Parylene-N Thin Film Deposition

  • Lee, Jong-Seung;Yeo, Seok-Ki;Park, Chin-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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    • pp.897-900
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    • 2003
  • Chemical vapor condensation (CVC) reactor was investigated for the deposition of Parylene-N thin films as the passivation layer for organic light emitting diodes (OLEDs). Several gas inlet manifold designs were tested to improve the deposition rate and its uniformity, and it was found that proper inlet design is crucial to get the desired film properties. Process characterization was also performed with the modified inlets to optimize the process variables.

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수정된 화학증착방법에서 비정상 열 및 물질전달 해석 (A study of unsteady heat and mass transfer in the modified chemical vapor deposition process)

  • 박경순;최만수
    • 대한기계학회논문집B
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    • 제21권1호
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    • pp.79-88
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    • 1997
  • An analysis of unsteady heat and mass transfer in the Modified Chemical Vapor Deposition has been carried out including the effects of chemical reaction and variable properties. It was found that commonly used quasi-steady state assumption could be used to predict overall efficiency of deposition, however, the assumption would not provide detailed deposition profile. The present unsteady calculations of wall temperature profile and deposition profile have been compared with the existing experimental data and were in good agreement. The effects of variable torch speed were studied. Linearly varying torch speed case until time=120s resulted in much shorter tapered entry than the constant torch speed case.

상압 플라즈마를 이용한 무기박막의 화학기상 증착법에 대한 연구동향 (Chemical Vapor Deposition of Inorganic Thin Films using Atmospheric Plasma : A Review of Research Trend)

  • 김경남;이승민;염근영
    • 한국표면공학회지
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    • 제48권5호
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    • pp.245-252
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    • 2015
  • In recent years, the cleaning and activation technology of surfaces using atmospheric plasma as well as the deposition technology for coating using atmospheric plasma have been demonstrated conclusively and drawn increasing industrial attention. Especially, due to the simplicity, the technology using atmospheric plasma enhanced chemical vapor deposition has been widely studied from many researchers. The plasma source type commonly used as the stabilization of diffuse glow discharges for atmospheric pressure plasma enhanced chemical vapor deposition pressure is the dielectric barrier discharge. In this review paper, some kinds of modified dielectric barrier discharge type will be presented. And, the characteristics of silicon based compound such as SiOx and SiNx deposited using atmospheric plasma enhanced chemical vapor system will be discussed.

수정된 화학증착공정에서 다종 성분 입자 생성 및 성장 해석 (An Analysis of Generation and Growth of Multicomponent Particles in the Modified Chemical Vapor Deposition)

  • 이방원;박경순;최만수
    • 대한기계학회논문집B
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    • 제23권5호
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    • pp.670-677
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    • 1999
  • An analysis of generation and growth of multicomponent particles has been carried out to predict the size and composition distributions of particles generated in the Modified Chemical Vapor Deposition(MCVD) process. In MCVD process. scale-up of sintering and micro-control of refractive index may need the Information about the size and composition distributions of $SiO_2-GeO_2$ particles that are generated and deposited. The present work solved coupled steady equations (axi-symmetric two dimensions) for mass conservation, momentum balance. energy and species(such as $SiCl_4$, $GeCl_4$, $O_2$, $Cl_2$) conservations describing fluid flow. heat and mass transfer in a tube. Sectional method has been applied to obtain multi-modal distributions of multicomponent aerosols which vary in both radial and axial directions. Chemical reactions of $SiCl_4$ and $GeCl_4$ were included and the effects of variable properties have also been considered.