Electrochemical Corrosion and Chemical Mechanical Polishing(CMP) Characteristics of Tungsten Film using Mixed Oxidizer (혼합 산화제를 사용한 텅스텐 막의 전기화학적 부식 및 CMP 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.18 no.4
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- pp.303-308
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- 2005