• Transactions on Electrical and Electronic Materials
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• 제10권4호
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• pp.111-115
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• 2009

We present a study on the reflection of optically controlled microwave pulses from non uniform plasma layers in semiconductors. The transient response of the microwave pulses in different plasma layers has been evaluated by means of the reflection function of dielectric microstrip lines. The lines were used with an open-ended termination containing an optically induced plasma region, which was illuminated by a light source. The reflection characteristics impedance resulting from the presence of plasma is evaluated by means of the equivalent transmission line model. We have analyzed the variation of the transient response in a 0.01 cm layer with a surface frequency in the region of 128 GHz. In the reflection the variation of the diffusion length $L_D$ is large compared with the absorption depth $1/{\alpha}_l$. The variation of the characteristic response of the plasma layer with differentially localized pulses has been evaluated analytically. The change of the reflection amplitude has been observed at depths of 0.1 cm, 0.01 cm and $0.1{\times}10^{-5}$ cm respectively.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.152-152
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• 2012

In this work we measured electron temperature and electron density of a microplasma by optical emission spectroscopy. The plasma is generated from a small discharge gap of a microwave parallel stripline resonator (MPSR) in Helium at atmospheric pressure. The microwave power supplied for this plasma source from 0.5 to 5 watts at a frequency close to 800 MHz. The electron temperature and electron density were estimated through Collisional-radiative model combined with Corona-equilibrium model. The results show that the electron density and temperature of this plasma in the case small discharge gap width are higher than that in larger gap width. The diagnostic techniques and associated challenges will be presented and discussed.

• 대한화학회지
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• 제35권6호
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• pp.699-706
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• 1991

헬륨 기체를 사용하여 중급 출력(500W) 마이크로파 유도 플라즈마(Microwave Induced Plasma:MIP)를 헬륨 기체를 사용하여 만든 뒤 직접 수용액 시료 분석에 사용하였다. Beenakker의 cavity를 변형시켜 얻은 안정된 헬륨 플라즈마는 실린더 형태의 모양을 하고 있고 기체의 흐름량을 조절하여 "toroidal"형태의 플라즈마도 얻을 수 있으나 분석학적 능력은 오히려 감소되었다. Glass Frit Nebuliser를 이용하여 분석하였을 때 금속 원소는 10~100 ppb 근처의 검출한계를 보였고 비금속원소인 염소의 경우는 50ppm근처의 검출한계를 보였다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권8호
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• pp.591-597
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• 1999

The propagation characteristics of high power microwave pulse in an air-breakdown environment are examined. The maximum electron density produced by microwave air-breakdown is limited to $10^6cm^{-3}$ by the tail-erosion effect. Inorder to increase the electron density, the scheme using two pulses intersecting at a desired height is considered. Increasing the carrier frequency, it is shown that microwave pulse can be transferred without the serious erosion in the numerical simulation. This result is useful for the above scheme. Also, an experiment is conducted to show the tail-erosion effect and confirm that a rapidly generated lossy plasma can cause spectral breaking and frequency shift of a high-power microwave pulse. The experimental results are presented by comparing the frequency spectrum of an incident pulse with that of the pulse transmitted through a self-induced air-breakdown environment. The experimental results show that the amount of frequency upshift is co-related with the ionization rate, whereas that of frequency downshift is correlated with the energy losses from the pulse in the self-generated plasma.

• Journal of Korean Vacuum Science & Technology
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• 제3권1호
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• pp.59-65
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• 1999

There has been an interest to develop an efficient, compact microwave device using field-emitter-arrays (FEA)-based cathode. Toe valuate the optimum device-efficiency in a compact size, the propagation properties of the premodulated electron beam for the FEA-based cathode is studied in detail by the computer simulation using a PIC code, MAGIC. For the premodulated electron beam whose phase of the energy leads the phase of the current by $\pi$/2, the amplitude of the downstream current modulation can be kept as high as the initial modulation level. Using the beam parameters with the beam voltage of 6kV and the current of 2.0A, 30% of efficiency is predicted when the quality factor of 800 is chosen. the device length is reduced about twice compared with that of the conventional device. The design of practical planar cathode is carried out to meet the minimum diameter of the electron beam as 0.5 mm.

• 한국진공학회지
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• 제17권5호
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• pp.408-418
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• 2008

본 논문에서는 집속이온빔의 플라즈마원을 위한 간단한 직육면체형태의 공진 공동을 설계하고 특성연구를 수행하였다. 공진에 최적인 공동 구조는 HFSS(High Frequency Structure Simulator)를 이용한 전기장 분포를 통해 구체적으로 계산하였다. 공진 공동은 내부 석영관 및 플라즈마 등의 유전체의 영향을 받기 때문에 공동의 한축 길이를 변화시킬 수 있는 구조로 설계되었다. 실험적으로 관찰되는 마이크로웨이브 방전시작전압을 통해 방전에 최적인 공동 길이를 측정하여 HFSS 계산된 값과 비교하였다. 공동은 석영관으로 인한 내부 유효유전율의 변화에 의해 석영관을 고려하지 않았던 길이에 비해 10cm가 감소된 길이에서 최적화됨을 공통적으로 확인할 수 있었다. 또한 압력변화에 따른 방전시작전압은 Paschen Curve와 유사한 결과를 나타내었다. 방전이 발생한 후에는 입력전력에 따라 플라즈마 밀도가 증가하였고 플라즈마의 영향으로 감소한 유효유전율에 의해 10cm가 증가한 길이에서 최적화가 되었다. 하지만 300W이상의 높은 입력 전력에서는 마이크로웨이브가 투과할 수 없는 고밀도 플라즈마 경계층(cut off layer)이 확장하여 더 이상 공동길이 조절을 통한 공동 최적화가 불가능함을 확인하였다. 따라서 고밀도 플라즈마를 만들기 위한 마이크로웨이브 공동의 정확한 설계를 위해 마이크로웨이브가 통과할 수 없는 고밀도 플라즈마 영역을 도체로 가정하고 그 외의 저밀도 플라즈마 영역을 밀도에 고유한 특정 유전율을 가지는 유전체로 설정하여 공동 내부의 전기장 분포를 해석하는 과정이 꼭 필요하다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.142-142
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• 2011

Microwave diagnostics method for plasma science and engineering is vigorous research area for its good characteristics such as high sensitivity, reliability, and broad measurement spectrum from low density plasma to high density. We investigate mechanism of microwave probes (hairpin, impedance and absorbtionf probe) and apply it for interpretation of full transmitted spectrum of cutoff probe. Mechanism of the spectrum having same key roles of I-V curve of Langmuir probe is not exactly revealed yet in spite of its importance. This study elucidates physics behind it using a circuit model and E/M wave simulation. Circuit model reveals exact cut-off peak frequency taking account of a collision frequency and a plasma frequency and it enable precise diagnostics of plasma densty from low pressure to high pressre. Cut-off like peaks have been obstacle for choosing cut-off peak is analyzed by E/M simulation and one of cutoff like peaks made by probe holder used for acquire plasma density with cutoff peak applying the hairpin relation. Furthermore, phase difference method for plasma density is conducted. This method uses a single microwave frequency source and it is low-priced.

• 대한전자공학회논문지
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• 제5권3호
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• pp.31-39
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• 1968

외부자계가 가해진 냉프라즈마에서의 마이크로파 전파 특성을 측정하였다. 직류방전프라즈마는 두 전극판을 구형도파관에 삽입한것과, 또한 유리시설관을 구형도파관에 삽입한 것에서 이루어졌다. 마이크로파 전파방향, 방전관축, 외부자계는 각각 수직이고, 자속밀도, 방전유기, 기체압등이 증가할때 프라즈마를 전파하는 마이크로파의 감쇠 및 흡수는 증가함을 보았다.

• 한국표면공학회지
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• 제29권5호
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• pp.487-493
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• 1996

Diamond films were grown at lower temperatures (630-813K) on Si, Al (1100P), and Al-Si(8A, 8B, BC) alloy substrates using improved microwave plasma CVD apparatus in a mixed methane and hydrogen plasma. Improved microwave plasma CVD apparatus equipped water cooled substrate holder and the substrates were set up lower position than bottom line of the applicator waveguide. When the methane concentration was high and growth was conducted at lower pressures the diamond films were synthesized. Moreover the deposits on the scratched substrates formed flat surfaces consisting of fine grains. XRD results, the deposits were identified to cubic diamond. An analysis using Raman spectroscopy, further confirmed that diamond films deposited on the Si substrates were high quality. The deposits on the Al substrates, in contrast, contained amorphous carbon. While the quality of the deposits on the Al-Si substrates were differed with the substrate alloys.

• 한국세라믹학회지
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• 제26권3호
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• pp.331-340
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• 1989

In this study, it was tried to deposit diamond films from a mixture of CH4 and H2 by the microwave plasma chemical vapor deposition(MWCVD). The MWCVD process was designed and set up from the 2.45GHz microwave generator. And the diamond film was successfully deposited on silicon wafers from the mixture of methane and hydrogen. The microstructures of the deposited diamond films were studied by using the following deposition variables : (a) methane concentration(0.6-10%), (b) reaction pressure(10-100torr), and (c) the substrate temperature(450-76$0^{\circ}C$).