• 제목/요약/키워드: Micro mechanical machining

검색결과 282건 처리시간 0.031초

W·Co의 함유량이 방전가공에 미치는 영향에 관한 연구 (A Study of Effect W·Co Content of Electrode in EDM)

  • 김용명;김희남
    • Design & Manufacturing
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    • 제2권5호
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    • pp.39-42
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    • 2008
  • The Paper discussed the effects of working electric current and pulse when using super hardend alloy drill as corona electrode. The discharge effect can be obtained very precisely in the ranges of 1A - 2A in working current. $12{\mu}s-14{\mu}s$ in dis charge pulse on time width and $8{\mu}s-10{\mu}s$ in discharge pulse off time.

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미세 펄스전원을 이용한 스테인레스강의 전기화학연마 (Study on Electrochemical Polishing for Stainless Steel using Micro Pulse Current)

  • 이동활;박정우;문영훈
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 춘계학술대회논문집
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    • pp.127-130
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    • 2003
  • Electrolytic polishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusions and improves mechanical and corrosion resistance of stainless steel. Electrolytic polishing is normally used to remove a very thin layer of material from the surface of a metal object. An electrolyte of phosphoric, sulfuric and distilled water has been used in this study. In the low current density region, there can be found plateau region and material removal process and leveling process occur successively. In this study, an electrochemical polishing process using pulse current is adopted as a new electrochemical polishing process. In electrochemical machining processes, it has been found that pulse electrochemical processes provide an attractive alternative to the electrochemical processes using continuous current. Hence, this study will discuss the electrochemical polishing processes in low current density region and pulse electrochemical polishing.

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미세성형공정에서의 폴리머 레올로지의 정량화 (Quantitative rheology of polymers in high resolution structuring)

  • 김병희;김헌영;김호;김광순;강신일
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.1036-1042
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    • 2003
  • The hot embossing process has been mentioned as one of major nanoreplication techniques. This is due to its simple process, low cost, high replication fidelity and relatively high throughput. As the initial step of quantitating the embossing process , simple parametric study about embossing time have been carried out using high-resolution masters which patterned by the DRIE process and laser machining. Under the various embossing time, the viscous flow of thin PMMA films into microcavities during compression force has been investigated. Also, a study about simulating the viscous flow during embossing process has planned and continuum scale FDM analysis was applied on this simulation. With currently available test data and condition, simple FDM analysis using FLOW3D was made attempt to match simulation and experiment.

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보로실리케이트 표면의 나노/마이크로 패터닝을 위한 식각 시간, 하중에 따른 유기 힐록의 성장거동 관찰 (Observation of Growth Behavior of Induced Hillock for Nano/Micro Patterning on Surface of Borosilicate with Etching Time and Load)

  • 조상현;윤성원;강충길
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 추계학술대회 논문집
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    • pp.182-185
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    • 2005
  • Indentation pattern and line pattern were machined on borosilicate(Pyrex 7740 glass) surface using the combination of mechanical machining by $Nanoi-indenter\circledR$ XP and HF wet etching, and a etch-mask effect of the affected layer of the nano-scratched and indented Pyrex 7740 glass surface was investigated. In this study, effects of indentation and scratch process with etching time on the morphologies of the indented and scratched surfaces after isotropic etching were investigated from an angle of deformation energies.

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미세 펄스전원을 이용한 스테인레스강 300 계열의 전기화학연마 (Study on Electrochemical Polishing for Stainless Steel 300 Series using Micro Pulse Current)

  • 이동활;박정우;문영훈
    • 소성∙가공
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    • 제12권4호
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    • pp.388-393
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    • 2003
  • Electrolytic polishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusions and improves mechanical and corrosion resistance of stainless steel. Electrolytic polishing is normally used to remove a very thin layer of material from the surface of a metal object. An electrolyte of phosphoric acid 50% in vol., sulfuric acid 20% in vol. and distilled water 30% in vol. has been used in this study. In the low current density region, there can be found plateau region and material removal process and leveling process occur successively. In this study, an electrochemical polishing process using pulse current is adopted as a new electrochemical polishing process. In electrochemical machining processes, it has been found that pulse electrochemical processes provide an attractive alternative to the electrochemical processes using continuous current. Hence, this study will discuss the electrochemical polishing processes in low current density region and pulse electrochemical polishing.

Dynamic Load를 이용한 박막 금속 분리판 성형기술 (Forming of Metallic Bipolar Plates by Dynamic Loading)

  • 구자윤;강충길
    • 소성∙가공
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    • 제21권1호
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    • pp.5-12
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    • 2012
  • The weight of the bipolar plate is one of the crucial aspects of improving power density in PEMFC stacks. Aluminum alloys have good mechanical properties such as density, electrical resistivity, and thermal conductivity. Furthermore, using aluminum in a bipolar plate instead of graphite reduces the bipolar plate cost and makes machining easier. Therefore in this study, an aluminum alloy was selected as the appropriate material for a bipolar plate. Results from feasibility experiments with the aim of developing fuel cells consisting of Al bipolar plates with multiple channels are presented. Dynamic loading was applied and the formability of micro channels was estimated as a function of punch pressure and die radius. Sheets of Al5052 with a thickness of 0.3mm were used. For a die radius of 0.1mm the formability was optimized with a sine wave dynamic load of 90kN at maximum pressure and 5 cycles of a sine wave punch travel. The experimental results demonstrate the feasibility of the proposed manufacturing technique for producing bipolar plates.

Dislocation densities of CMP processed sapphire wafers for GaN epitaxy

  • 황성원;남정환;신귀수;김근주;서남섭
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2003년도 춘계학술대회 발표 논문집
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    • pp.18-22
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    • 2003
  • The sapphire wafers for blue light emitting devices were manufactured by the implementation of the surface machining technology based on micro-tribology. This process has been performed by grinding, lapping and polishing. The surfaces of sapphire wafers were mechanically affected by residual stress and surface default. This mechanical stress and strain can be cured by thermal anneal ing process. The sapphire crystalline wafers were annealed at $1100~1400^{\circ}C$ and then characterized by double crystal X-ray diffraction. The sample showed good quality of crystalline wafer surface wi th full width at hal f maximum of 16 arcsec for the 4-hour heat-treatment at $1300^{\circ}C$.

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네오디뮴 영구자석을 이용한 미세칩 제거장치의 개발 (Development of Microchip Removal Equipment Using Neodymium Permanent Magnets)

  • 최성윤;왕준형;왕덕현
    • 한국기계가공학회지
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    • 제20권3호
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    • pp.122-128
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    • 2021
  • Machining operations require removal of chips to keep the coolant clean and fresh throughout the operation time. In this study, microchip removal equipment was developed using AutoCAD and CATIA programs for 3D modeling and 2D draft. In addition, the flow analysis and electromagnetic field analysis of the equipment were performed using the COMSOL Multiphysics program. The flow design of the coolant oil tank was realized on the basis of fluid analysis results. Further, on the basis of magnetic density analysis, a conveyer was designed for effectively removing metal microchips in the tank by using arrays of neodymium permanent magnets.

Pentacene Thin Film Transistors Fabricated by High-aspect Ratio Metal Shadow Mask

  • Jin, Sung-Hun;Jung, Keum-Dong;Shin, Hyung-Chul;Park, Byung-Gook;Lee, Jong-Duk;Yi, Sang-Min;Chu, Chong-Nam
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.881-884
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    • 2004
  • The robust and large-area applicable metal shadow masks with a high aspect ratio more than 20 are fabricated by a combination of micro-electro-discharge machining (${\mu}$-EDM) and electro chemical etching (ECE). After defining S/D contacts using a 100 ${\mu}m$ thick stainless steel shadow mask, the top-contact pentacene TFTs with channel length of 5 ${\mu}m$ showed routinely the results of mobility of 0.498 ${\pm}$ 0.05 $cm^2$/Vsec, current on/off ratio of 1.6 ${times}$ $10^5$, and threshold voltage of 0 V. The straightly defined atomic force microscopy (AFM) images of channel area demonstrated that shadow effects caused by the S/D electrode deposition were negligible. The fabricated pentacene TFTs have an average channel length of 5 ${\pm}$ 0.25 ${\mu}m$.

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빔 위치 관련 제어인자가 집속이온빔 패턴 증착공정에 미치는 영향 (The Influence of Parameters Controlling Beam Position On-Sample During Deposition Patterning Process with Focused Ion Beam)

  • 김준현;송춘삼;김윤제
    • 대한기계학회논문집A
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    • 제32권3호
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    • pp.209-216
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    • 2008
  • The application of focused ion beam (FIB) depends on the optimal interaction of the operation parameters between operating parameters which control beam and samples on the stage during the FIB deposition process. This deposition process was investigated systematically in C precursor gas. Under the fine beam conditions (30kV, 40nm beam size, etc), the effect of considered process parameters - dwell time, beam overlap, incident beam angle to tilted surface, minimum frame time and pattern size were investigated from deposition results by the design of experiment. For the process analysis, influence of the parameters on FIB-CVD process was examined with respect to dimensions and constructed shapes of single and multi- patterns. Throughout the single patterning process, optimal conditions were selected. Multi-patterning deposition were presented to show the effect of on-stage parameters. The analysis have provided the sequent beam scan method and the aspect-ratio had the most significant influence for the multi-patterning deposition in the FIB processing. The bitmapped scan method was more efficient than the one-by-one scan type method for obtaining high aspect-ratio (Width/Height > 1) patterns.