• Journal of Bio-Environment Control
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• v.31 no.3
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• pp.246-254
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• 2022

Domestic facility agriculture grows rapidly, such as modernization and large-scale. And the production scale increases significantly compared to the area, accounting for about 60% of the total agricultural production. Greenhouses require energy input to create an appropriate environment for stable mass production throughout the year, but the energy load per unit area is large because of low insulation properties. Through the rooftop greenhouse, one of the types of urban agriculture, energy that is not discarded or utilized in the building can be used in the rooftop greenhouse. And the cooling and heating load of the building can be reduced through optimal greenhouse operation. Dynamic energy analysis for various environmental conditions should be preceded for efficient operation of rooftop greenhouses, and about 40% of the solar energy introduced in the greenhouse is energy exchange for crops, so it should be considered essential. A major analysis is needed for each sensible heat and latent heat load by leaf surface temperature and evapotranspiration, dominant in energy flow. Therefore, an experiment was conducted in a rooftop greenhouse located at the Korea Institute of Machinery and Materials to analyze the energy exchange according to the growth stage of crops. A micro-meteorological and nutrient solution environment and growth survey were conducted around the crops. Finally, a regression model of leaf temperature and evapotranspiration according to the growth stage of leafy vegetables was developed, and using this, the dynamic energy model of the rooftop greenhouse considering heat transfer between crops and the surrounding air can be analyzed.

• Journal of the Korean Vacuum Society
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• v.17 no.1
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• pp.16-22
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• 2008

We studied plasma etching of polycarbonate in $O_2/SF_6$, $O_2/N_2$ and $O_2/CH_4$. A capacitively coupled plasma system was employed for the research. For patterning, we used a photolithography method with UV exposure after coating a photoresist on the polycarbonate. Main variables in the experiment were the mixing ratio of $O_2$ and other gases, and RF chuck power. Especially, we used only a mechanical pump for in order to operate the system. The chamber pressure was fixed at 100 mTorr. All of surface profilometry, atomic force microscopy and scanning electron microscopy were used for characterization of the etched polycarbonate samples. According to the results, $O_2/SF_6$ plasmas gave the higher etch rate of the polycarbonate than pure $O_2$ and $SF_6$ plasmas. For example, with maintaining 100W RF chuck power and 100 mTorr chamber pressure, 20 sccm $O_2$ plasma provided about $0.4{\mu}m$/min of polycarbonate etch rate and 20 sccm $SF_6$ produced only $0.2{\mu}m$/min. However, the mixed plasma of 60 % $O_2$ and 40 % $SF_6$ gas flow rate generated about $0.56{\mu}m$ with even low -DC bias induced compared to that of $O_2$. More addition of $SF_6$ to the mixture reduced etch of polycarbonate. The surface roughness of etched polycarbonate was roughed about 3 times worse measured by atomic force microscopy. However examination with scanning electron microscopy indicated that the surface was comparable to that of photoresist. Increase of RF chuck power raised -DC bias on the chuck and etch rate of polycarbonate almost linearly. The etch selectivity of polycarbonate to photoresist was about 1:1. The meaning of these results was that the simple capacitively coupled plasma system can be used to make a microstructure on polymer with $O_2/SF_6$ plasmas. This result can be applied to plasma processing of other polymers.