• Title/Summary/Keyword: Micro Fabrication Technology

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Effects of Beam Pulse Width and Power Density in Silver Nanowire Welding Using Pulsed IR Laser (적외선 레이저 공정을 통한 실버나노와이어 접합에서의 빔 펄스폭과 출력의 영향)

  • Kim, Joohan;Yoon, Sang Woo
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.38 no.8
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    • pp.893-898
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    • 2014
  • A direct pulsed laser process for welding and networking silver nanowires was developed. The welded nanowire network demonstrated modified electrical properties in a transparent substance. In particular, the welding points on the nanowires were investigated to measure the resistance at the connections. The level of networking in nanowires was explored with respect to various laser pulse widths and average power densities. In particular, the influence of laser beam density was investigated in detail. Selective laser treatment can be advantageous in imparting customized local property changes in transparent conducting materials. Various applications of the process are also discussed in this paper.

Fabrication of SOI Structures with Buried Cavities for Microsystems SDB and Electrochemical Etch-stop (SDB와 전기화학적 식각정지에 의한 마이크로 시스템용 매몰 공동을 갖는 SOI 구조의 제조)

  • Chung, Gwiy-Sang;Kang, Kyung-Doo;Choi, Sung-Kyu
    • Journal of Sensor Science and Technology
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    • v.11 no.1
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    • pp.54-59
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    • 2002
  • This paper describes a new process technique for batch process of SOI(Si-on-Insulator) structures with buried cavities for MEMS(Micro Electro Mechanical System) applications by SDB(Si-wafer Direct Bonding) technology and electrochemical etch-stop. A low-cost electrochemical etch-stop method is used to control accurately the thickness of SOI. The cavities were made on the upper handling wafer by Si anisotropic etching. Two wafers are bonded with an intermediate insulating oxide layer. After high-temperature annealing($1000^{\circ}C$, 60 min), the SDB SOI structure with buried cavities was thinned by electrochemical etch-stop. The surface of the fabricated SDB SOI structure have more roughness that of lapping and polishing by mechanical method. This SDB SOI structure with buried cavities will provide a powerful and versatile substrate for novel microsensors arid microactuators.

Fabrication of Nanopatterns for Biochip by Nanoimprint Lithography (나노임프린트를 이용한 바이오칩용 나노 패턴 제작)

  • Choi, Ho-Gil;Kim, Soon-Joong;Oh, Byung-Ken;Choi, Jeong-Woo
    • KSBB Journal
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    • v.22 no.6
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    • pp.433-437
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    • 2007
  • A constant desire has been to fabricate nanopatterns for biochip and the Ultraviolet-nano imprint lithography (UV-NIL) is promising technology especially compared with thermal type in view of cost effectiveness. By using this method, nano-scale to micro-scale structures also called nanopore structures can be fabricated on large scale gold plate at normal conditions such as room temperature or low pressure which is not possible in thermal type lithography. One of the most important methods in fabricating biochips, immobilizing, was processed successfully by using this technology. That means immobilizing proteins only on the nanopore structures based on gold, not on hardened resin by UV is now possible by utilizing this method. So this selective nano-patterning process of protein can be useful method fabricating nanoscale protein chip.

MEMS Fabrication of Microchannel with Poly-Si Layer for Application to Microchip Electrophoresis (마이크로 칩 전기영동에 응용하기 위한 다결정 실리콘 층이 형성된 마이크로 채널의 MEMS 가공 제작)

  • Kim, Tae-Ha;Kim, Da-Young;Chun, Myung-Suk;Lee, Sang-Soon
    • Korean Chemical Engineering Research
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    • v.44 no.5
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    • pp.513-519
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    • 2006
  • We developed two kinds of the microchip for application to electrophoresis based on both glass and quartz employing the MEMS fabrications. The poly-Si layer deposited onto the bonding interface apart from channel regions can play a role as the optical slit cutting off the stray light in order to concentrate the UV ray, from which it is possible to improve the signal-to-noise (S/N) ratio of the detection on a chip. In the glass chip, the deposited poly-Si layer had an important function of the etch mask and provided the bonding surface properly enabling the anodic bonding. The glass wafer including more impurities than quartz one results in the higher surface roughness of the channel wall, which affects subsequently on the microflow behavior of the sample solutions. In order to solve this problem, we prepared here the mixed etchant consisting HF and $NH_4F$ solutions, by which the surface roughness was reduced. Both the shape and the dimension of each channel were observed, and the electroosmotic flow velocities were measured as 0.5 mm/s for quartz and 0.36 mm/s for glass channel by implementing the microchip electrophoresis. Applying the optical slit with poly-Si layer provides that the S/N ratio of the peak is increased as ca. 2 times for quartz chip and ca. 3 times for glass chip. The maximum UV absorbance is also enhanced with ca. 1.6 and 1.7 times, respectively.

Fabrication and characterization of 3-D porous scaffold by polycaprolactone (폴리카프로락톤을 이용한 3차원 다공성 지지체 제조 및 특성 분석)

  • Kim, Jin-Tae;Bang, Jung Wan;Hyun, Chang-Yong;Choi, Hyo Jeong;Kim, Tae-Hyung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.17 no.2
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    • pp.58-65
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    • 2016
  • This study was a preparatory experiment aimed the development of membrane scaffolds for tissue engineering. A PCL composite solution contained sodium chloride(NaCl). PCL porous membrane scaffolds were formed on a glass casting plate using a film applicator and immersed in distilled water to remove the NaCl reaching after drying. NaCl was used as a pore former for a 3 dimensional pore net-work. The dry condition parameters were $4^{\circ}C$, room temperature (RT) and $40^{\circ}C$ for each different temperatures in the drying experiment. SEM revealed the morphology of the pores in the membrane after drying and evaluated the in vitro cytotoxicity for basic bio-compatibility. The macro and micro pores existed together in the scaffold and showed a 3-dimensional pore net-working morphology at RT. The in vitro cytotoxicity test result was "grade 2" in accordance with the criterion for cytotoxicity by ISO 10993-5. The dry condition affected the formation of a 3 dimensional pore network and micro and macro pores. Therefore, these results are expected provide the basic process for the development of porous membrane scaffolds to control degradation and allow drug delivery.

Optimization of preform mold injection molding process for hemispheric plastic structure fabrication (반구형 플라스틱 구조체 성형을 위한 프리폼 몰드 사출성형공정 최적화)

  • Park, Jeong-Yeon;Ko, Young-Bae;Kim, Dong-Earn;Ha, Seok-Jae;Yoon, Gil-Sang
    • Design & Manufacturing
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    • v.13 no.2
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    • pp.30-36
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    • 2019
  • Traditional cell culture(2-dimensional) is the method that provide a nutrient and environment on a flat surface to cultivate cells into a single layer. Since the cell characteristics of 2D culture method is different from the characteristics of the cells cultured in the body, attempts to cultivate the cells in an environment similar to the body environment are actively proceeding in the industry, academy, and research institutes. In this study, we will develop a technology to fabricate micro-structures capable of culturing cells on surfaces with various curvatures, surface shapes, and characteristics. In order to fabricate the hemispheric plastic structure(thickness $50{\mu}m$), plastic preform mold (hereinafter as "preform mold") corresponding to the hemisphere was first prepared by injection molding in order to fabricate a two - layer structure to be combined with a flat plastic film. Then, thermoplastic polymer dissolved in an organic solvent was solidified on a preform mold. As a preliminary study, we proposed injection molding conditions that can minimize X/Y/Z axis deflection value. The effects of the following conditions on the preform mold were analyzed through injection molding CAE, [(1) coolant inlet temperature, (2) injection time, (3) packing pressure, (4) volume-pressure (V/P). As a result, the injection molding process conditions (cooling water inlet temperature, injection time, holding pressure condition (V / P conversion point and holding pressure size)) which can minimize the deformation amount of the preform mold were derived through CAE without applying the experimental design method. Also, the derived injection molding process conditions were applied during actual injection molding and the degree of deformation of the formed preform mold was compared with the analysis results. It is expected that plastic film having various shapes in addition to hemispherical shape using the preform mold produced through this study will be useful for the molding preform molding technology and cast molding technology.

Fabrication and sintering of nano $TiN_x$ and its composites (Nano $TiN_x$와 그 복합체의 제조 및 소결)

  • Kim, Dong-Sik;Kim, Sung-Jin;Rahno, Khamidova;Park, Sung-Bum;Park, Seung-Sik;Lee, Hye-Jeong;Lee, Sang-Woo;Cho, Kyeong-Sik;Woo, Heung-Sik;Ahn, Joong-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.16 no.3
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    • pp.101-105
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    • 2006
  • We fabricated the nano $TiN_x$ by making of reaction between titanium powder and $Si_3N_4$ during planetary milling. The $TiN_x$ powder was sintered by spark plasma sintering machine after mixing with 50 wt% of titanium powder, and the sintered body was heat-treated at $850^{\circ}C$ in order to investigate its hardness property at the elevated temperature. We analyzed crystal structure by XRD. We observed the peaks of $TiN_{0.26}$ and TiN after 10 hours milling, and we observed TiN peak mainly after 20 hours milling. The reacted particle size distribution was investigated by FE-SEM. Increase of milling time, the size of reacted particles was decreased and the $10{\sim}20nm$ size of $TiN_x$ on the surface of titanium and $TiN_x$ was observed after 20 hours milling. The micro-Vickers hardness of mixed sintered body was about $1050kgf/mm^2$.

Characterization and Formation Mechanism of Zr-Cu and Zr-Cu-Al Metallic Glass Thin Film by Sputtering Process

  • Lee, Chang-Hun;Sun, Ju-Hyun;Moon, Kyoung-Il;Shin, Seung-Yong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.271-272
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    • 2012
  • Bulk Metallic Glasses (BMGs or amorphous alloy) exhibit high strength and good corrosion resistance. Applications of thin films and micro parts of BMGs have been used a lot since its inception in the research of BMGs. However, Application and fabrication of BMGs are limited to make structural materials. Thin films of BMGs which is sputtered on the surface of structural materials by sputtering process is used to improve limits about application of BMGs. In order to investigate the difference of properties between designed alloys and thin films, we identified that thin films deposited on the surface that have the characteristic of the amorphous films and the composition of designed alloys. Zr-Cu (Cu=30, 35, 38, 40, 50 at.%) and Zr-Cu-Al (Al=10 at.% fixed, Cu=26, 30, 34, 38 at.%) alloys were fabricated with Zr (99.7% purity), Cu (99.997% purity), and Al (99.99% purity) as melting 5 times by arc melting method before rods 2mm in diameter was manufactured. In order to analyze GFA (Glass Forming Ability), rods were observed by Optical Microscopy and SEM and $T_g$, $T_x$, ($T_x$ is crystallization temperature and $T_g$ is the glass transition temperature) and Tm were measured by DTA and DSC. Powder was manufactured by Gas Atomizer and target was sintered using powder in large supercooled liquid region ($=T_x-T_g$) by SPS(Spark Plasma Sintering). Amorphous foil was prepared by RSP process with 5 gram alloy button. The composition of the foil and sputtered thin film was analyzed by EDS and EPMA. In the result of DSC curve, binary alloys ($Zr_{62}Cu_{38}$, $Zr_{60}Cu_{40}$, $Zr_{50}Cu_{50}$) and ternary alloys ($Zr_{64}Al_{10}Cu_{26}$, $Zr_{56}Al_{10}Cu_{34}$, $Zr_{52}Al_{10}Cu_{38}$) have $T_g$ except for $Zr_{70}Cu_{30}$ and $Zr_{60}Al_{10}Cu_{30}$. The compositions with $T_g$ made into powders. Figure shows XRD data of thin film showed similar hollow peak.

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Hybrid Fabrication of Screen-printed Pb(Zr,Ti)O3 Thick Films Using a Sol-infiltration and Photosensitive Direct-patterning Technique (졸-침투와 감광성 직접-패턴 기술을 이용하여 스크린인쇄된 Pb(Zr,Ti)O3 후막의 하이브리드 제작)

  • Lee, J.-H.;Kim, T.S.;Park, H.-H.
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.4
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    • pp.83-89
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    • 2015
  • In this paper, we propose a fabrication technique for enhanced electrical properties of piezoelectric thick films with excellent patterning property using sol-infiltration and a direct-patterning process. To achieve the needs of high-density and direct-patterning at a low sintering temperature (< $850^{\circ}C$), a photosensitive lead zirconate titanate (PZT) solution was infiltrated into a screen-printed thick film. The direct-patterned PZT films were clearly formed on a locally screen-printed thick film, using a photomask and UV light. Because UV light is scattered in the screen-printed thick film of a porous powder-based structure, there are needs to optimize the photosensitive PZT sol infiltration process for obtaining the enhanced properties of PZT thick film. By optimizing the concentration of the photosensitive PZT sol, UV irradiation time, and solvent developing time, the hybrid films prepared with 0.35 M of PZT sol, 4 min of UV irradiation and 15 sec solvent developing time, showed a very dense with a large grain size at a low sintering temperature of $800^{\circ}C$. It also illustrated enhanced electrical properties (remnant polarization, $P_r$, and coercive field, $E_c$). The $P_r$ value was over four times higher than those of the screen-printed films. These films integrated on silicon wafer substrate could give a potential of applications in micro-sensors and -actuators.

Design and fabrication of paper microfluidic channel (종이기반 미세유체 채널의 설계 및 제작기술)

  • Lee, Jung-Hyun;Hwang, Yoo-Sun;Jung, Hyo-Il
    • Science of Emotion and Sensibility
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    • v.14 no.4
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    • pp.525-530
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    • 2011
  • Emotion is composed of various feelings such as pleasure, sorrow, comfortability, and so on. The complicated process of the measurement has long been recognized as a major hindrance for the studies of emotion. Previously, individuals' emotion has mainly been measured by means of self-report, interview, EEG (electroencephalogram), ECG (electrocardiogram), EOG (electroculography), and body temperature. With thanks to nano/micro technologies, the possibility in the development of emotion-on-a-chip (EOC) has begun to be proposed. EOC will make it possible to analyze one's psychological status by taking a drop of blood. Discovery of emotional biomarkers in body fluids, understanding of the correlation between those biomarkers and the results from brain science are prerequisites to validate the EOC technology. In this paper, paper microfluidics are introduced as a good candidate for the EOC. As paper microfluidics is cost-effective and easy to use it is expected to be a useful device for the emotion measurement. We present the design and fabrication process for the simple paper-based microfluidic device and discuss the possible application in the field of measuring the human emotion.

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