• Progress in Superconductivity
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• v.9 no.2
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• pp.177-182
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• 2008

[ $MgB_2$ ] thin films were fabricated using hybrid physical-chemical vapor deposition (HPCVD) method on silicon substrates with buffers of alumina grown by using atomic layer deposition method. The growth war in a range of temperatures $500\;{\sim}\;600^{\circ}C$ and under the reactor pressures of $25\;{\sim}\;50\;Torr$. There are some interfacial reactions in the as-grown films with impurities of mostly $Mg_2Si$, $MgAl_2O_4$, and other phases. The $T_c$'s of $MgB_2$ films were observed to be as high as 39 K, but the transition widths were increased with growth temperatures. The magnetization was measured as a function of temperature down to the temperature of 5 K, but the complete Meissner effect was not observed, which shows that the granular nature of weak links is prevailing. The formation of mostly $Mg_2Si$ impurity in HPCVD process is discussed, considering the diffusion and reaction of Mg vapor with silicon substrates.

• Journal of Magnetics
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• v.19 no.2
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• pp.140-145
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• 2014

The electrical transport properties of YBCO single layers thin film have been investigated using different physical techniques. For the purpose, the physical properties are probed numerically with help of simulation modelling. The physical transport properties were also estimated with temperature and magnetic fields limits using thermally-activated flux flow model with some modifications. The result of present simulation modelling indicated that the magnitude of activation energy depends on temperature and magnetic field. The simulations revealed thickness dependent physical transport properties including electrical and magnetic properties of deposited YBCO single layers thin films. Furthermore, it shows the temperature dependence of the pinning energy. In the nutshell, the result can be used to improve the Superconducting Properties ($T_c$) of the YBCO single layers thin films.

• Proceedings of the Korean Magnestics Society Conference
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• 2011.06a
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• pp.36-36
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• 2011

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2002.05a
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• pp.227-229
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• 2002

In this paper, we report on a microstrip line voltage controlled tunable bandpass filter. We used the characteristic the relative dielectric constant of thin film ferroelectrics depends on the applied dr voltage. we designed using Au/BSTO/MgO/Au structure. We cascaded many resonators for large furling range sustaining 1 GHz renter frequency, narrow band, low IL ($\leq$4 dB). We could design the BPF of which center frequency is 16 GHz, 1.9 GHz tuning range, the narrow bandwidth within 800 MHz, low insertion loss less than 3 dB by adjusting the gap of 3 cascaded resonators.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.13 no.8
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• pp.819-826
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• 2002

In this paper, the performance of Au / $Ba_{0.5}Sr_{0.5}TiO_3$ (BST) / Magnesium oxide (MgO) two-layered electrically tunable band-pass Filters (BPFs) is demonstrated. The devices consist of microstrip, coplanar waveguide (CPW), and conductor-backed coplanar waveguide (CBCPW) structures. These BST thin film band-pass filters have been designed by the 2.5 D field simulator, IE3D, Zeland Inc., and fabricated by thin film process. The simulation results, using the 2-pole microstrip, CPW, and CBCPW band-pass filters, show the center frequencies of 5.89 GHz, 5.88 GHz, and 5.69 GHz, and the corresponding insertion losses are 2.67 dB, 1.14 dB, and 1.60 dB, with 3 %, 9 %, and 7 % bandwidth, respectively. The measurement results show the center frequencies of 6.4 GHz, 6.14 GHz, and 6.04 GHz, and their corresponding insertion losses are 6 dB, 4.41 dB, and 5.41 dB, respectively, without any bias voltage. With the bias voltage of 40 V, the center frequencies for the band-pass filters are measured to be 6.61 GHz, 6.31 GHz, and 6.21 GHz, and their insertion losses are observed to be 7.33 dB, 5.83 dB, and 6.83 dB, respectively. From the experiment, the tuning range for the band-pass filters are determined as about 3 % ~ 8 %.

• Proceedings of the Korean Magnestics Society Conference
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• 2009.12a
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• pp.204-205
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• 2009

The magnetic properties and structure of FeRh thin film pitaxially grown onto MgO(001) substrate were studied by MPMS(Magnetic Properties Measure System) and in-situ temperature synchrotron XRD(X-ray Diffraction). The transition temperature of FeRh thin films was around 380K. Both M-T curve and d-spacing changes correspond to each other very closely.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.05a
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• pp.59-62
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• 1996

Plasma displays (PDP) as a large area wall-hanging display device are rabidly developed with flat CRT, TPT LCD and etc. Especially, AC Plasma Display Panels(AC PDPs) have the inherent memory function which is effective for large area displays. The memory function in AC PDPs is caused by the accumulation of the electrical charge on the protecting layer formed on the dielectric layer. This MgO protective layer prevents the dielectric layer from sputtering by ion in discharge plasma and also has the additional important roll in lowering the firing voltage due to the large secondary electron emission coefficient). Until now, the MgO Protective layer is mainly formed by E-Beam evaporation. With increasing the panel size, this process is difficult to attain cost reduction, and are not suitable for large quantity of production. To the contrary, the methode of shuttering are easy to apply on mass production and to enlarge the size of the panel and shows the superior adhesion and uniformity of thin film. In this study, we have prepared MgO protective layer on AC PDP Cell by reactive magnetron sputtering and studied the effect of MgO layer on the surface discharge characteristics of ac PDP.

• Journal of the Korean Magnetics Society
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• v.22 no.5
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• pp.162-166
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• 2012

V-I characteristics of Fe(100)/MgO(100)/Cu-phthalocyanine (CuPc)/Co hybrid magnetic tunnel junctions were investigated at different temperatures. Fe(100) and Co ferromagnetic layers were separated by an organic-inorganic hybrid barrier consisting of different thickness of CuPc thin film grown on a 2 nm thick epitaxial MgO(100) layer. As the CuPc thickness increases from 0 to 10 nm, a bistable switching behavior due to strong charging effects was observed, while a very large magenetoresistance was shown at 77 K for the junctions without the CuPc barrier. This switching behavior decreases with the increase in temperature, and finally disappears beyond 240 K. In this work, high-potential future applications of the MgO(100)/CuPc bilayer were discussed for hybrid spintronic devices as well as polymer random access memories (PoRAMs).

• Journal of the Korean Vacuum Society
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• v.4 no.1
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• pp.40-45
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• 1995

직경 2인치의 YBa2Cu3O7-y 타겟을 사용하여 높은 스퍼터링 기체 압력 하에서 off-axis DC-마그네트론 스퍼터링 방법으로 MgO(100) 단결정 기판 위에 YBa2Cu3O7-y 박막을 c축 방향으로 in-냐셔 성장시킬 때 기판의 접지 여부와 인가전류의 양이 박막 성장에 미치는 여향을 연구하였다. 그 결과 접지 여부는 박막의 초전도 변환온도, 전기수송 특성, 결정 구조적 특성에는 영향을 거의 주지 않는 반면 표면상태에는 상당한 영향을 미치며, 인가전류의 양은 초전도 특성에 많은 영향을 미침을 발견하였다. 기판온도 $670^{\circ}C$, 스퍼터링 기체압력 300mTorr, 아르곤 대 산소 분압비 5:1의 조건에서 인가전류의 최적량은 300-500 mA이었으며 평균 박막 성장속도는 $0.11-0.14AA$/s로 매우 낮았다. 기판의 접지 효과와 낮은 성장속도의 원인에 대해 고찰해 본다.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.122-122
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• 2000

Magnesium oxide is thermodynamically very stable, has a low dielectric constant and a low refractive index, and has been widely used as substrate for growing various thin film materials, particulary oxides of the perovskite structure. There has been a considerable interest in integrating the physical properties of these oxides with semiconductor materials such as GaAs and Si. In this regard, it is considered very important to be able to grow MgO buffer layers epitaxially on the semiconductors. Various oxide films can then be grown on such buffer layers eliminating the need for using MgO single crystal substrates. Vapor phase epitaxy of magnesium oxide has been accomplished on Si(001) substrates in a high vacuum chamber using the single precursor methylmagnesium tert-butoxide in the temperature range 750-80$0^{\circ}C$. For the epitaxy of the MgO films, SiC buffer layers had to be grown on Si(001). The films were characterized by reflection high energy electron diffraction (RHEED) in situ in the growth chamber, and x-ray diffraction (XRD), x-ray pole figure analysis, scanning electron microscopy (SEM), and x-ray photoelectron spectroscopy (XPS) after the growth.