• International Journal of Precision Engineering and Manufacturing
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• v.5 no.3
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• pp.19-25
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• 2004

Pitch measurements of 150 nm one-dimensional grating standards were carried out using a contact mode atomic force microscopy with a high resolution three-axis laser interferometer. This measurement technique was named as the 'nano-metrological AFM'. In the nano-metrological AFM, three laser interferometers were aligned precisely to the end of an AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$ stabilized He-Ne laser at a wavelength of 633 nm. Therefore, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM could be used to directly measure the length standard. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement (GUM). The primary source of uncertainty in the pitch-measurements was derived from the repeatability of the pitch-measurements, and its value was about 0.186 nm. The average pitch value was 146.65 nm and the combined standard uncertainty was less than 0.262 nm. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.264-267
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• 2003

Pitch measurements of 150 nm pitch one-dimensional grating standards were carried out using an contact mode atomic force microscopy(C-AFM) with a high resolution three-axis laser interferometer. It was called as 'Nano-metrological AFM' In Nano-metrological AFM, Three laser interferometers were aligned well to the end of AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$-stablilzed He-Ne laser at a wavelength of 633 nm. So, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM has a traceability to the length standard directly. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement(GUM). The Primary source of uncertainty in the pitch-measurements was derived from repeatability of pitch-measurement, and its value was approx 0.186 nm. Expanded uncertainty(k=2) of less than 5.23 nm was obtained. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.11
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• pp.75-82
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• 2004

A metrological atomic force microscope (M-AFM) was developed fur the length measurements of nanometer range, through the modification of a commercial AFM. To eliminate nonlinearity and crosstalk of the PZT tube scanner of the commercial AFM, a two-axis flexure hinge scanner employing built-in capacitive sensors is used for X-Y motion instead of PZT tube scanner. Then two-dimensional displacement of the scanner is measured using two-axis heterodyne laser interferometer to ensure the meter-traceability. Through the measurements of several specimens, we could verify the elimination of nonlinearity and crosstalk. The uncertainty of length measurements was estimated according to the Guide to the Expression of Uncertainty in Measurement. Among several sources of uncertainty, the primary one is the drift of laser interferometer output, which occurs mainly from the variation of refractive index of air and the thermal stability. The Abbe error, which is proportional to the measured length, is another primary uncertainty source coming from the parasitic motion of the scanner. The expanded uncertainty (k =2) of length measurements using the M-AFM is √(4.26)$^2$+(2.84${\times}$10$^{-4}$ ${\times}$L)$^2$(nm), where f is the measured length in nm. We also measured the pitch of one-dimensional grating and compared the results with those obtained by optical diffractometry. The relative difference between these results is less than 0.01 %.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.9
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• pp.68-75
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• 2007

The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.2
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• pp.18-22
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• 2008

The pitch and orthogonality of two-dimensional (2-D) gratings were measured using a metrological atomic force microscope (MAFM), and the measurement uncertainty was analyzed. Gratings are typical standard devices for the calibration of precision microscopes, Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2-D gratings, it is important to certify the pitch and orthogonality of such gratings accurately for nanometrology. In the measurement of 2-D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme is required to overcome limitations such as thermal drift and slow scan speed. Two types of 2-D gratings with nominal pitches of 300 and 1000 nm were measured using line scans to determine the pitch measurement in each direction. The expanded uncertainties (k = 2) of the measured pitch values were less than 0.2 and 0.4 nm for each specimen, and the measured orthogonality values were less than $0.09^{\circ}$ and $0.05^{\circ}$, respectively. The experimental results measured using the MAFM and optical diffractometer agreed closely within the expanded uncertainty of the MAFM. We also propose an additional scheme for measuring 2-D gratings to increase the accuracy of calculated peak positions, which will be the subject of future study.

• Journal of the Korean Society for Precision Engineering
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• v.15 no.12
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• pp.169-179
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• 1998

Plane mirror type laser interferometers are popularly being used in many modern ultraprecision machines, as they can perform simultaneous measurements of multiple axis positions with nanometer resolution capabilities. One important issue in this application of laser interferometers is to provide a good level of alignment between the reflecting mirrors and the laser beams so that measurement errors due to undesirable coupling effects can be avoided in multiple axis measurements In this investigation, a thorough metrological analysis is given to develop an suitable mathematical model for a precision x-y stage in which the orthogonality misalignment between the reflecting mirrors significantly affects overall x-y mea-surement results. Then a noble calibration method is suggested in which two-dimensional displacement sensors of moire gratings of concentric circles are used to realize the reversal principle of orthogonality evaluation in situ. Finally, actual experimental results are discussed to verify that the suggested method can effectively calibrate the orthogonality error with an uncertainty of 0.2667 arcsec.

• Journal of Information Display
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• v.5 no.3
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• pp.35-40
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• 2004

In this study, we collected data used to formulate the relationship between quantitative metrological parameters in CRT display and the perceived focus quality. Human perception of the focusing quality was evaluated in terms of user feedback scores regarding the character legibility from four highly trained inspectors. Thirteen CRT monitors from five different manufacturers were compared relatively with respect to the norm monitor. The profile of electron beam such as spot size and the shape of distribution made by electron beam, contrast, convergence of RGB beams, and luminance characteristics were measured using a precision measurement system. Linear regression analysis and artificial neural network models were used to formulate the relationship between human perception and the quantitative measurements. The accuracy of the formulated linear regression model ($R^2$=0.515) was not satisfactory but the nonlinear neural network model ($R^2$=0.716) was fairly convincing and robust even the utilized data included subjective differences.

• Journal of Astronomy and Space Sciences
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• v.40 no.3
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• pp.93-100
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• 2023

A study of uncertainty analysis was conducted on four key thermophysical properties of molten Platinum using a noncontacting levitation technique. More specifically, this work demonstrates a detailed reporting of the uncertainties associated with the density, volumetric thermal expansion coefficient, surface tension and viscosity measurements at higher temperatures for a widely used refractory metal, Platinum using electrostatic levitation (ESL). The microgravity experiments were conducted using JAXA's Electrostatic Levitation Furnace (ELF) facility on the International Space Station and the terrestrial experiments were conducted using NASA's Marshal Space Flight Center's ESL facility. The performance of these two facilities were then quantified based on the measurement precision and accuracy using the metrological International Standards Organization's Guide to the Expression of Uncertainty Measurement (GUM) principles.

• Journal of the Korean Society for Precision Engineering
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• v.34 no.2
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• pp.107-114
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• 2017

In this investigation, we describe a metrological technique for surface and thickness profiles of a silicon (Si) wafer by using a 6 degree of freedom (DOF) stitching method. Low coherence scanning interferometry employing near infrared light, partially transparent to a Si wafer, is adopted to simultaneously measure the surface and thickness profiles of the wafer. For the large field of view, a stitching method of the sub-aperture measurement is added to the measurement system; also, 6 DOF parameters, including the lateral positioning errors and the rotational error, are considered. In the experiment, surface profiles of a double-sided polished wafer with a 100 mm diameter were measured with the sub-aperture of an 18 mm diameter at $10\times10$ locations and the surface profiles of both sides were stitched with the sub-aperture maps. As a result, the nominal thickness of the wafer was $483.2{\mu}m$ and the calculated PV values of both surfaces were $16.57{\mu}m$ and $17.12{\mu}m$, respectively.

• Journal of Wind Energy
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• v.9 no.4
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• pp.24-31
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• 2018

Wind lidar application is increasing and its calibration method is required to use wind lidar as an alternative to the meteorological mast. A nacelle lidar calibration method is now being discussed in IEC 61400-50-3 (Wind energy generation systems - Part 50-3: Use of nacelle-mounted lidars for wind measurements), and the method is mainly based on the wind lidar beam line of sight (LOS) wind speed calibration suggested by DTU as DTU E-0020 (Calibrating Nacelle Lidars). In this paper, a LOS wind speed calibration method is introduced and a calibration example performed on Jeju island is presented. The results showed a slope of 1.011 and R2 of 0.997, which means that the LOS wind speed is highly correlated with the reference wind speed and is comparable. But LOS wind speed calibration requires a very long time due to its principle and environmental conditions, and a calibration method that can overcome this problem of uncontrollable environments needs to be developed.