• Title/Summary/Keyword: Metal doping.

Search Result 315, Processing Time 0.024 seconds

The Analysis of Breakdown Voltage for the Double-gate MOSFET Using the Gaussian Doping Distribution

  • Jung, Hak-Kee
    • Journal of information and communication convergence engineering
    • /
    • v.10 no.2
    • /
    • pp.200-204
    • /
    • 2012
  • This study has presented the analysis of breakdown voltage for a double-gate metal-oxide semiconductor field-effect transistor (MOSFET) based on the doping distribution of the Gaussian function. The double-gate MOSFET is a next generation transistor that shrinks the short channel effects of the nano-scaled CMOSFET. The degradation of breakdown voltage is a highly important short channel effect with threshold voltage roll-off and an increase in subthreshold swings. The analytical potential distribution derived from Poisson's equation and the Fulop's avalanche breakdown condition have been used to calculate the breakdown voltage of a double-gate MOSFET for the shape of the Gaussian doping distribution. This analytical potential model is in good agreement with the numerical model. Using this model, the breakdown voltage has been analyzed for channel length and doping concentration with parameters such as projected range and standard projected deviation of Gaussian function. As a result, since the breakdown voltage is greatly changed for the shape of the Gaussian function, the channel doping distribution of a double-gate MOSFET has to be carefully designed.

In Co-Doping Effect on the Optical Properties of P-Type GaN Epilayers (In 코도핑 된 p-GaN의 광학적 특성)

  • An, Myung-Hwan;Chung, Ho-Yong;Chung, Sang-Jo
    • Korean Journal of Materials Research
    • /
    • v.18 no.8
    • /
    • pp.450-453
    • /
    • 2008
  • Mg-doped and In-Mg co-doped p-type GaN epilayers were grown in a low-pressure metal organic chemical vapor deposition technique. The effect of In doping on the p-GaN layer was studied through photoluminescence (PL), persistent photoconductivity (PPC), and transmission electron microscopy (TEM) at room temperature. For the In-doped p-GaN layer, the PL intensity increases significantly and the peak position shifts to 3.2 eV from 2.95 eV of conventional p-GaN. Additionally, In doping greatly reduces the PPC, which was very strong in conventional p-GaN. A reduction in the dislocation density is also evidenced upon In doping in p-GaN according to TEM images. The improved optical properties of the In-doped p-GaN layer are attributed to the high crystalline quality and to the active participation of incorporated Mg atoms.

Effect of Calcium Doping in Low Angle Grain Boundaries of $YBa_2Cu_3O_{7-\delta}$ on Textured Metal Substrates

  • Kang, B.W.;A. Goyal;F.A. List;D.K. Christen;H. R. Kerchner;S. Sathyamurthy;Lee, D.F.;Martin, P.M.;Koreger, D.M.
    • Progress in Superconductivity
    • /
    • v.4 no.1
    • /
    • pp.10-13
    • /
    • 2002
  • We report the effect of Ca doping in $YBa_2Cu_3O_{7-\delta}$ (YBCO) thin films grown on the Rolling- Assisted, Biaxially Textured Substrates (RABiTS) with the architecture of $CeO_2/YSZ/CeO_2/Ni$. Critical currents of bilayer and trilayer structures of $YBCO/Y_{0.7}Ca_{0.3}Ba_2Cu_3O_{7-\delta}$/(YCaBCO) as well as undoped YBCO for comparison have been measured in a wide range of temperatures and fields. For $6-8^{\circ}$ grain boundaries, 30% Ca-doping in bilayer structure enhances $J_c$ as high as 35%. The enhancement is larger at low temperatures and at magnetic fields. On the other hand, 30% Ca-doping in trilayer structure reduces $J_c$ as high as 60%. Combined with slightly lower $T_c$, this indicates that Ca is overdoped in this structure and degrades GBs.

  • PDF

Gate All Around Metal Oxide Field Transistor: Surface Potential Calculation Method including Doping and Interface Trap Charge and the Effect of Interface Trap Charge on Subthreshold Slope

  • Najam, Faraz;Kim, Sangsig;Yu, Yun Seop
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.13 no.5
    • /
    • pp.530-537
    • /
    • 2013
  • An explicit surface potential calculation method of gate-all-around MOSFET (GAAMOSFET) devices which takes into account both interface trap charge and varying doping levels is presented. The results of the method are extensively verified by numerical simulation. Results from the model are used to find qualitative and quantitative effect of interface trap charge on subthreshold slope (SS) of GAAMOSFET devices. Further, design constraints of GAAMOSFET devices with emphasis on the effect of interface trap charge on device SS performance are investigated.

UV Light Induced Photocatalytic Degradation of Cyanides in Aqueous Solution over Modified $TiO_2$

  • Kim, Hyeong Ju;Kim, Jae Hyeon;Lee, Cheong Hak;Hyeon, Taek Hwan;Choe, Won Yong;Lee, Ho In
    • Bulletin of the Korean Chemical Society
    • /
    • v.22 no.12
    • /
    • pp.1371-1374
    • /
    • 2001
  • Metal doping was adopted to modify TiO2 (P-25) and enhance the photocatalytic degradation of harmful cyanides in aqueous solution. Ni, Cu, Co, and Ag doped TiO2 were found to be active photocatalysts for UV light induced degradation of aqueous cyanides generating cyanate, nitrate and ammonia as main nitrogen-containing products. The photoactivity of Ni doped TiO2 was greatly affected by the state of Ni, that is, the crystal size and the degree of reduction of Ni. The modification effects of some mixed oxides, that is, Ni-Cu/TiO2 were also studied. The activity of Ni-Cu/TiO2 for any ratio of Cu/Ni was higher than that of Ni- or Cu-doped TiO2, and the catalyst at the Cu/Ni ratio of 0.3 showed the highest activity for cyanide conversion.

The synthesis of ultrathin Nb-doped TiOx nanosheets (초박막 두께의 Nb-TiOx 나노시트 합성)

  • Lee, Sang Eun;Seo, Jun;Park, Hee Jung
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.30 no.5
    • /
    • pp.194-199
    • /
    • 2020
  • By controlling the composition of the metal-oxide nanosheet having a two-dimensional layered crystal structure, material properties and application can be extended. In this study, the composition of the nanosheet could be expanded from pure composition to doping composition by successfully synthesizing the TiO2 nanosheet doped with Nb. Specifically, the doping composition was designed when synthesizing the layered metal oxide as a starting material (K0.8Ti1.73-xNbxLi0.27O4, x = 0, 0.03, 0.07) and chemical exfoliation was performed. By doing this, it was possible to obtain the Nb-doped TiOy ultrathin nanosheet. The size of the nano sheet was 2 ㎛ or less based on the long length in the x-y direction, and the thickness was about 1 nm. Nb-doping was confirmed by XRD and SEM-EDS analysis.

Fluorine and Heavy Metal Oxide Effects on Spectral Properties of Tm3+ in Silicate Glasses

  • Cho, Doo-Hee;Seo, Hong-Seok;Park, Bong-Je;Park, Yong-Gyu
    • Journal of the Korean Ceramic Society
    • /
    • v.40 no.8
    • /
    • pp.725-729
    • /
    • 2003
  • The fluorine doping along with heavy metal oxides remarkably raised the $^3$H$_4$ lifetime and the quantum efficiency in Tm$^{3+}$-doped silicate glasses. 29 mol% of fluorine substitution for oxygen in 70SiO$_2$-15Pbo-12ZnO-3KO$_{1}$2/ glass raised $^3$H$_4$ lifetime to 193 $mutextrm{s}$. Refractive indices were raised by heavy metal oxide substitution, but hardly changed by fluorine substitution. The fluorine doping changed the local structure around Tm$^{3+}$ions, then low energy vibrations related to fluorine are considered to largely reduce the multi-phonon relaxation rates in the oxyfluoride silicate glasses. The $^3$H$_4$ lifetimes and absorption and emission spectra of Tm$^{3+}$doped silicate and oxyfluoride silicate glasses are reported, and Judd-Ofelt calculation results are discussed in this paper.

Design Optimization of Silicon-based Junctionless Fin-type Field-Effect Transistors for Low Standby Power Technology

  • Seo, Jae Hwa;Yuan, Heng;Kang, In Man
    • Journal of Electrical Engineering and Technology
    • /
    • v.8 no.6
    • /
    • pp.1497-1502
    • /
    • 2013
  • Recently, the junctionless (JL) transistors realized by a single-type doping process have attracted attention instead of the conventional metal-oxide-semiconductor field-effect transistors (MOSFET). The JL transistor can overcome MOSFET's problems such as the thermal budget and short-channel effect. Thus, the JL transistor is considered as great alternative device for a next generation low standby power silicon system. In this paper, the JL FinFET was simulated with a three dimensional (3D) technology computer-aided design (TCAD) simulator and optimized for DC characteristics according to device dimension and doping concentration. The design variables were the fin width ($W_{fin}$), fin height ($H_{fin}$), and doping concentration ($D_{ch}$). After the optimization of DC characteristics, RF characteristics of JL FinFET were also extracted.