• The Journal of the Korea Contents Association
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• v.15 no.4
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• pp.9-16
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• 2015

On modern operating systems such as Linux, virtual memory is a general way to provide a large address space to applications by using main memory and storage devices. Recently, storage devices have been improved in terms of latency and bandwidth, and it is expected that applications with large memory show high-performance if next-generation storage devices are considered. However, due to the overhead of virtual memory subsystem, the paging system can not exploit the performance of next-generation storage devices. In this study, we propose several optimization techniques to extend memory with next-generation storage devices. The techniques are to allocate block addresses of storage devices for write-back operations as well as to configure the system parameters, and we implement the techniques on Linux 3.14.3. Our evaluation through using multiple benchmarks shows that our system has 3 times (/24%) better performance on average than the baseline system in the micro(/macro)-benchmark.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.31-32
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• 2010

In our previous reports [1-3], electron transport for the switching and memory devices using alkyl thiol-tethered Ru-terpyridine complex compounds with metal-insulator-metal crossbar structure has been presented. On the other hand, among organic memory devices, a memory based on the OFET is attractive because of its nondestructive readout and single transistor applications. Several attempts at nonvolatile organic memories involve electrets, which are chargeable dielectrics. However, these devices still do not sufficiently satisfy the criteria demanded in order to compete with other types of memory devices, and the electrets are generally limited to polymer materials. Until now, there is no report on nonvolatile organic electrets using nano-interfaced organic monomer layer as a dielectric material even though the use of organic monomer materials become important for the development of molecularly interfaced memory and logic elements. Furthermore, to increase a retention time for the nonvolatile organic memory device as well as to understand an intrinsic memory property, a molecular design of the organic materials is also getting important issue. In this presentation, we report on the OFET memory device built on a silicon wafer and based on films of pentacene and a SiO2 gate insulator that are separated by organic molecules which act as a gate dielectric. We proposed push-pull organic molecules (PPOM) containing triarylamine asan electron donating group (EDG), thiophene as a spacer, and malononitrile as an electron withdrawing group (EWG). The PPOM were designed to control charge transport by differences of the dihedral angles induced by a steric hindrance effect of side chainswithin the molecules. Therefore, we expect that these PPOM with potential energy barrier can save the charges which are transported to the nano-interface between the semiconductor and organic molecules used as the dielectrics. Finally, we also expect that the charges can be contributed to the memory capacity of the memory OFET device.[4]

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.17-20
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• 2001

Nonvolatile semiconductor memory devices with reoxidized nitrided oxide(RONO) gate dielectrics were fabricated, and nitrogen distribution and bonding species which contribute to memory characteristics were analyzed. Also, memory characteristics of devices depending on the anneal temperatures were investigated. The devices were fabricated by retrograde twin well CMOS processes with $0.35{\mu}m$ Nonvolatile semiconductor memory devices with reoxidized nitrided oxide(RONO) gate dielectric were fabricated, and nitrogen distribution and bonding species which contributing memory characteristics were analyzed. Also, memory characteristics of devices according to anneal temperatures were investigated. The devices were fabricated by $0.35{\mu}m$ retrograde twin well CMOS processes. The processes could be simple by in-situ process of nitridation anneal and reoxidation. The nitrogen distribution and bonding state of gate dielectric were investigated by Dynamic Secondary Ion Mass Spectrometry(D-SIMS), Time-of-Flight Secondary Ion Mass Spectrometry(ToF-SIMS), and X-ray Photoelectron Spectroscopy(XPS). Nitrogen concentrations are proportional to nitridation anneal temperatures and the more time was required to form the same reoxidized layer thickness. ToF-SIMS results show that SiON species are detected at the initial oxide interface and $Si_{2}NO$ species near the new $Si-SiO_{2}$ interface that formed after reoxidation. As the anneal temperatures increased, the device showed worse retention and degradation properties. These could be said that nitrogen concentration near initial interface is limited to a certain quantity, so excess nitrogen are redistributed near the $Si-SiO_{2}$ interface and contributed to electron trap generation.

• Proceedings of the IEEK Conference
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• 2003.07c
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• pp.2637-2640
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• 2003

In this paper, we propose a simple and efficient data input/output block with high speed between Motorola MPC8XX microprocessor and memory devices. Proposed method is capable of high speed data read and write using the address decoder and the burst cycle between Motorola PowerPC based MPC8XX microprocessor and fixed address locating memory devices such as FIFO, PCMCIA card, and so on. Experimental results are given our findings and discussions.

• ETRI Journal
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• v.29 no.1
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• pp.124-126
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• 2007

In this letter, we study the impact of single event upsets (SEUs) in space or defense electronic systems which use memory devices such as EEPROM, and SRAM. We built a microcontroller test board to measure the effects of protons on electronic devices at various radiation levels. We tested radiation hardening at beam current, and energy levels, measured the phenomenon of SEUs, and addressed possible reasons for SEUs.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.427-427
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• 2012

Ferroelectric-gate field effect transistor based memory using a nanowire as a conducting channel offers exceptional advantages over conventional memory devices, like small cell size, low-voltage operation, low power consumption, fast programming/erase speed and non-volatility. We successfully fabricated ferroelectric nonvolatile memory devices using both n-type and p-type Si nanowires coated with organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) [P(VDF-TrFE)] via a low temperature fabrication process. The devices performance was carefully characterized in terms of their electrical transport, retention time and endurance test. Our p-type Si NW ferroelectric memory devices exhibit excellent memory characteristics with a large modulation in channel conductance between ON and OFF states exceeding $10^5$; long retention time of over $5{\times}10^4$ sec and high endurance of over 105 programming cycles while maintaining ON/OFF ratio higher $10^3$. This result offers a viable way to fabricate a high performance high-density nonvolatile memory device using a low temperature fabrication processing technique, which makes it suitable for flexible electronics.

• Journal of the Korea Society of Computer and Information
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• v.21 no.5
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• pp.1-10
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• 2016

Magnetic disks have been used for decades in auxiliary storage devices of computer systems. In recent years, the use of NAND flash memory, which is called SSD, is increased as auxiliary storage devices. However, NAND flash memory, unlike traditional magnetic disks, necessarily performs the erase operation before the write operation in order to overwrite data and this leads to degrade the system lifetime and performance of overall NAND flash memory system. Moreover, NAND flash memory has the lower endurance, compared to traditional magnetic disks. To overcome this problem, this paper proposes EPET (Enhanced Prediction and Elapsed Time) wear leveling technique, which is especially efficient to portable devices. EPET wear leveling uses the advantage of PET (Prediction of Elapsed Time) wear leveling and solves long-term system failure time problem. Moreover, EPET wear leveling further improves space efficiency. In our experiments, EPET wear leveling prolonged the first bad time up to 328.9% and prolonged the system lifetime up to 305.9%, compared to other techniques.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.20.1-20.1
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• 2011

The nano-sized quantum structure has been an attractive candidate for investigations of the fundamental physical properties and potential applications of next-generation electronic devices. Metal nano-particles form deep quantum wells between control and tunnel oxides due to a difference in work functions. The charge storage capacity of nanoparticles has led to their use in the development of nano-floating gate memory (NFGM) devices. When compared with conventional floating gate memory devices, NFGM devices offer a number of advantages that have attracted a great deal of attention: a greater inherent scalability, better endurance, a faster write/erase speed, and more processes that are compatible with conventional silicon processes. To improve the performance of NFGM, metal nanocrystals such as Au, Ag, Ni Pt, and W have been proposed due to superior density, a strong coupling with the conduction channel, a wide range of work function selectivity, and a small energy perturbation. In the present study, bismuth metal nanocrystals were self-assembled within high-k $Bi_2Mg_{2/3}Nb_{4/3}O_7$ (BMN) films grown at room temperature in Ar ambient via radio-frequency magnetron sputtering. The work function of the bismuth metal nanocrystals (4.34 eV) was important for nanocrystal-based nonvolatile memory (NVM) applications. If transparent NFGM devices can be integrated with transparent solar cells, non-volatile memory fields will open a new platform for flexible electron devices.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.35-38
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• 2002

In this paper, the characteristics of channel hot electron (CHE) injection for the write operation in a NOR-type SONOS flash memory with common source line were investigated. The thicknesses of he tunnel oxide, the memory nitride， and the blocking oxide layers for the gate insulator of the fabricated SONOS devices were $34{\AA}$, $73{\AA}$, and $34{\AA}$, respectively. The SONOS devices compared to floating gate devices have many advantages, which are a simpler cell structure, compatibility with conventional logic CMOS process and a superior scalability. For these reasons, the introduction of SONOS device has stimulated. In the conventional SONOS devices, Modified Folwer-Nordheim (MFN) tunneling and CHE injection for writing require high voltages, which are typically in the range of 9 V to 15 V. However CHE injection in our devices was achieved with the single power supply of 5 V. To demonstrate CHE injection, substrate current (Isub) and one-shot programming curve were investigated. The memory window of about 3.2 V and the write speed of $100{\mu}s$ were obtained. Also, the disturbance and drain turn-on leakage during CHE injection were not affected in the SONOS array. These results show that CHE injection can be achieved with a low voltage and single power supply, and applied for the high speed program of the SONOS memory devices.

• Smart Structures and Systems
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• v.4 no.2
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• pp.261-278
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• 2008

The results of the application of shape memory alloy (SMA) prestressing devices on an aqueduct are presented in this paper. The aqueduct was built in 1747 to provide water to the city of Larnaca and to its port. Because of its importance to the cultural heritage of Cyprus, the aqueduct has been selected as one of the case-study monuments in the project Wide-Range Non-Intrusive devices toward Conservation of Historical Monuments in the Mediterranean Area (WIND-CHIME). The Department of Antiquities of Cyprus, acting in a pioneering way, have given their permission to apply the devices in order to investigate their effectiveness in providing protection to the monument against probable catastrophic effects of earthquake excitation. The dynamic characteristics of the structure were determined in two separate occasions and computational models were developed that matched very closely the dynamic characteristics of the structure. In this paper the experimental setup and the measured changes in the dynamic characteristics of the monument after the application of the SMA devices are described.