• Title/Summary/Keyword: Masking Process

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Improvement of Reproducibility in Selective Electrodeposition Using Laser Masking and DC Voltage (레이저 마스킹과 직류전원을 이용한 선택적 전해도금의 재현성 개선)

  • Shin, Hong Shik
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.25 no.1
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    • pp.36-41
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    • 2016
  • A method is proposed for the improvement of deposition reproducibility in the selective electrodeposition process using laser masking and DC voltage. Selective electrodeposition using laser masking and DC voltage can achieve a deposited layer with micro patterns. However, selective electrodeposition using laser masking and DC voltage have a critical problem: the lack of reproducibility in selective deposition. The reproducibility of selective electrodeposition can be improved by a new process that consists of laser masking, two-step electro-deposition, laser scribing, and ultrasonic cleaning. The experiments in this study show that the reproducibility of selective deposition can be successfully improved by the combination of two-step electrodeposition and laser scribing.

Laser Stream Patterning Improvement for Gravure Printing (그라비아 인쇄를 위한 Laser Stream Patterning 개선)

  • Ahn T. Y.;Kim H. G.;Lee D. H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2001.10a
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    • pp.186-189
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    • 2001
  • The main method in micro-etching process, used in manufacturing semiconductors, electronic components, circuits, is Photo Masking method that exposes and develops on the photo-sensitivity solutions or films. This method enables one to process highly precisely, $\pm$0.03 mm in end line location area. But this has limits in a high speed / wide width process, difficulties in endless masking, and the problem of high price. We have developed the direct masking method to make use of Gravure printing, widely used in grocery packing sheet printing. We made cylinder tools to influence the masking quality by laser stream process. We have confirmed that the end line location accuracy in the line width of the product is improved from 0.12 mm to $\pm$0.07 mm level, after etching process.

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Effects of Port Masking on Part Load Performance: Part I - Lean Misfire Limit (포트 마스킹이 엔진의 부분부하 성능에 미치는 영향: Part I - 희박연소 한계)

  • 이원근;엄인용
    • Transactions of the Korean Society of Automotive Engineers
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    • v.9 no.5
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    • pp.17-22
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    • 2001
  • This paper is the first of companion papers, which investigate port-masking effects on lean misfire limit. Port-masking was applied to commercial SOHC 3-valve and DOHC 4-valve engine by inserting masking plates between manifold and port. To induce various conditions of stratification, six types of masking plates were applied. The masking plates were placed in the upstream of injector to prevent wall wetting and two ports were not separated to permit both fuel and air entering through masked port. The results were compared with those by conventional port throttling. The results show that lean misfire limit mainly depends on masking direction, that is, high lean misfire limit is achieved when the port near the spark plug is masked. The mechanism of stratification by masking is different from axial stratification by port throttling. In this case, the rich mixture entering through masked port plays a very important role in the stratification process.

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Selective Electrodeposition Using Laser Masking and DC Voltage (레이저 마스킹과 직류전원을 이용한 선택적 전해도금)

  • Shin, Hong Shik;Kim, Sung Yong
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.1
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    • pp.75-80
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    • 2015
  • This paper proposes a selective electrodeposition process that uses laser masking and a DC voltage. Selective electrodeposition using laser masking and a DC voltage is more efficient than that using laser masking and a pulse voltage. In other words, electrodeposition with a DC voltage allows for precise selective deposition without the limitation of the deposition region. Also, a selective electrodeposition method that uses laser masking and DC voltage can reduce the electrodeposition time. The characteristics of a copper layer deposited by laser masking and DC voltage were examined under various conditions. A selective copper layer with various micro patterns of $2{\mu}m$ thickness was successfully fabricated.

Design of Unsharp Mask Filter based on Retinex Theory for Image Enhancement

  • Kim, Ju-young;Kim, Jin-heon
    • Journal of Multimedia Information System
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    • v.4 no.2
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    • pp.65-73
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    • 2017
  • This paper proposes a method to improve the image quality by designing Unsharp Mask Filter (UMF) based on Retinex theory which controls the frequency pass characteristics adaptively. Conventional unsharp masking technique uses blurring image to emphasize sharpness of image. Unsharp Masking(UM) adjusts the original image and sigma to obtain a high frequency component to be emphasized by the difference between the blurred image and the high frequency component to the original image, thereby improving the contrast ratio of the image. In this paper, we design a Unsharp Mask Filter(UMF) that can process the contrast ratio improvement method of Unsharp Masking(UM) technique with one filtering. We adaptively process the contrast ratio improvement using Unsharp Mask Filter(UMF). We propose a method based on Retinex theory for adaptive processing. For adaptive filtering, we control the weights of Unsharp Mask Filter(UMF) based on the human visual system and output more effective results.

Study on the Masking Effect of the Nanoscratched Si (100) Surface and Its Application to the Maskless Nano Pattern fabrication (마스크리스 나노 패턴제작을 위한 나노스크래치 된 Si(100) 표면의 식각 마스크 효과에 관한 연구)

  • 윤성원;강충길
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.5
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    • pp.24-31
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    • 2004
  • Masking effect of the nanoscratched silicon (100) surface was studied and applied to a maskless nanofabrication technique. First, the surface of the silicon (100) was machined by ductile-regime nanomachining process using the scratch option of the Nanoindenter${ \circledR}$ XP. To clarify the possibility of the nanoscratched silicon surfaces for the application to wet etching mask, the etching characteristic with a KOH solution was evaluated at room temperature. After the etching process, the convex nanostructures were made due to the masking effect of the mechanically affected layer. Moreover, the height and the width of convex structures were controlled with varying normal loads during nanoscratch.

Effects of Port Masking on Emission (포트 마스킹이 엔진의 배기에 미치는 영향)

  • Kim, Hyeong-Sig;Park, Chan-Jun;Ohm, In-Yong
    • Transactions of the Korean Society of Automotive Engineers
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    • v.19 no.3
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    • pp.23-28
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    • 2011
  • To secure basic data for intake port design, effects of a port masking on the part load performance were investigated in a 4 valve SI engine. For this purpose, 9 kinds of masking, which have different shapes and masking ratio, are applied to the engine intake system. The characteristics of the performance were estimated through mixture response test at various engine load and speed. The results show that NOx emission, one of indexes for stratification, increases considerably in spite of retarded spark timing due to the stratification which is caused by unequal flow distribution between the two intake ports. The mechanism of stratification by masking is different from axial stratification and the fuel entering through masked port plays a very important role in this stratification process. In conclusion, the port masking method could be easily applied to engine intake system and be very effective for inducing the stratified charging without the change of port design.

Acoustic Masking Effect That Can Be Occurred by Speech Contrast Enhancement in Hearing Aids (보청기에서 음성 대비 강조에 의해 발생할 수 있는 마스킹 현상)

  • Jeon, Y.Y.;Yang, D.G.;Bang, D.H.;Kil, S.K.;Lee, S.M.
    • Journal of rehabilitation welfare engineering & assistive technology
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    • v.1 no.1
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    • pp.21-28
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    • 2007
  • In most of hearing aids, amplification algorithms are used to compensate hearing loss, noise and feedback reduction algorithms are used and to increase the perception of speeches contrast enhancement algorithms are used. However, acoustic masking effect is occurred between formants if contrast is enhanced excessively. To confirm the masking effect in speeches, the experiment are composed of 6 tests; test pure tone test, speech reception test, word recognition test, pure tone masking test, formant pure tone masking test and speech masking test, and for objective evaluation, LLR is introduced. As a result of normal hearing subjects and hearing impaired subjects, more making is occurred in hearing impaired subjects than normal hearing subjects when using pure tone, and in the speech masking test, speech reception is also lower in hearing impaired subjects than in normal hearing subjects. This means that acoustic masking effect rather than distortion influences speech perception. So it is required to check the characteristics of masking effect before wearing a hearing aid and to apply this characteristics to fitting curve.

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Spectral subtraction based on speech state and masking effect

  • 김우일;강선미;고한석
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.599-602
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    • 1998
  • In this paper, a speech enhancement method based on phonemic properties and masking effect is propsoed. It is a modified type of spectral subtraction wherein the spectral sharpening process is exploited in unvoiced state considering the phonemic properties. The masking threshold is used to remove the residual noise. The proposed spectral subtraction shows similar performance as that of the classical spectral subtraction method in view of the SNR. But by the prposed scheme, the unvoiced sound region is shown to exhibit relatively less signal distortion in the enhanced speech.

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A Study on the Development of Masking Models for the Improvement of Amenity at Urban Small Green Spaces (도시 소녹지공간 어메니티 증진을 위한 교통소음 Masking Models 개발에 관한 연구)

  • 안득수;정태섭;박영민
    • Journal of the Korean Institute of Landscape Architecture
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    • v.26 no.3
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    • pp.19-33
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    • 1998
  • The primary objective of this research was to develop optimal models for masking the road traffic noise with the sound of a waterfall at urban small green spaces. Noise levels were measured at 8 roadside green spaces in SEOUL and questionnaires were randomly distributed to 40 users for evaluating the noise at each site at the same time. College students participated in the experiment for the development of masking models and the developed models were tested by users at 2 green spaces. The major results are as follows ; 1. Traffic noises ranged from 65dBto 70 dB. Users' satisfaction with the noise became considerably low on the basis of 60 dB and it was highly related to noise level. 2. Noise was a main factor to depreciate the amenity of green spaces where its level was more than 60 dB and so it neds to be excluded or reduced the traffic noise at the process of design. 3. Masking effects kept constant independent of the spatial location of masker on condition that masker levels were equal. It was effective when masker was 5-10dB greater than noise level which was masked. 4. As noise level went up, satisfaction ratings about the masked noise became low but masking effects increased in proportion to its level. 5. It was proved that the models were valid through the field experiment.

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