• 제목/요약/키워드: Magnetic sputtering

검색결과 407건 처리시간 0.024초

나노유체 열전도도 특성 연구 (A Study on Thermal Conductivity Characteristics of Nanofluids)

  • 황유진;박재홍;김홍석;이재근
    • 대한설비공학회:학술대회논문집
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    • 대한설비공학회 2006년도 하계학술발표대회 논문집
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    • pp.162-167
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    • 2006
  • Nanofluid is a kind of new engineering material consisting of nanoparticles dispersed in base fluid. Nanofluids could have various applications such as magnetic fluids, heat exchanger working fluids, lubricants, drug delivery and so on in present study, various nanoparticles, such as MWCNT (Multi-walled Carbon Nanotube), fullerene, copper oxide, and silicon dioxide are used to produce nanofluids. As base fluids, DI-water, ethylene glycol, oil, and silicon oil are used. To investigate the thermo-physical properties of nanofluids, thermal conductivity and kinematic viscosity are measured. Stability estimation of nanofluid is conducted with UV-vis spectrophoto-meter. In this study, the high pressure homogenizer is the most effective method to produce nanofluid with the prepared nanoparticle and base fluid. Excellently stable nanofluids are produced with the magnetron sputtering system. Thermal conductivity of nanofluid increases with increasing particle volume fraction except water-based fullerene nanofluid which has lower thermal conductivity than base fluid due to its lower thermal conductivity, 0.4 W/mK. The experimental results can't be predicted by Jang and Choi model.

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Interlayer Coupling of CoFe/Cu/NiFe Trilayer Films

  • Baek, Jong-Sung;Lim, Woo-Woung;Lee, Soo-Hyung;Kim, Mee-Yang;Rhee, Jang-Roh
    • Journal of Magnetics
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    • 제5권4호
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    • pp.139-142
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    • 2000
  • The interlayer coupling between adjacent ferromagnetic layers was examined for CoFe/Cu/NiFe trilayer systems. A series of films of CoFe (20 nm)/Cu($t_{cu}$)/NiFe (20 nm) trilayers with Cu spacer thickness, $t_{cu}$, in the range of 1~10 m was deposited on Si(100) wafers at room temperature by DC magnetron sputtering. In order to understand the dependence of the magnetic interaction between ferromagnetic $Co_{90}Fe_{10}$ (wt.%) and $Ni_{81}Fe_{19}$ (wt.%) layers separated by a nonmagnetic Cu spacer on the Cu layer thickness, we investigated the derivative ferromagnetic resonance (FMR) spectra. The FMR results were analyzed using the model of Layadi and Art-man for interlayer interaction. The interlayer coupling constant decreases in an oscillatory manner as the Cu spacer thickness increases up to 10 nm and approaches zero above 10 nm. The interlayer coupling constant is positive for all samples. Hence, it seems that the exchange coupling between adjacent CoFe and NiFe layers separated by a Cu layer is ferromagnetic.

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Reactive Ion Etching of NiFe Film with Organic Resist Mask and Metal Mask by Inductively Coupled Plasma

  • Kanazawa, Tomomi;Motoyama, Shin-Ichi;Wakayama, Takayuki;Akinaga, Hiroyuki
    • Journal of Magnetics
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    • 제12권2호
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    • pp.81-83
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    • 2007
  • Etching of NiFe films covered with an organic photo-resist or Ti was successfully performed by an inductively coupled plasma-reactive ion etching (ICP-RIE) system using $CHF_3/O_2/NH_3$ discharges exchanging $CHF_3$ for $CH_4$ gas gradually. Experimental results showed that the organic photo-resist mask can be applied to the NiFe etching. In the case of the Ti metal mask, it was found that the etching-selectivity Ti against NiFe was significantly varied from 7.3 to ${\sim}0$ by changing $CHF_3/CH_4/O_2/NH_3$ to $CH_4/O_2/NH_3$ discharges used in the ICP-RIE system. These results show that the present RIE of NiFe was dominated by a chemical reaction rather than a physical sputtering.

Stress-induced the enhancement of magnetoresistance in La0.75Ca0.25MnO3 thin films grown on Si (100) substrates

  • Lee, J.C.;D.G, Yu;S.Y. Ie;K.H. Jeong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.131-131
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    • 2000
  • We witnessed the enhancement of mangetoresistance (MR) in La0.75Ca0.25MnO3 thin films grown on Si (100) substrates by RF magnetron sputtering. The films are polycrystalline with (100) and (110) orientations. The lattice constants of films are reduced as much as 0.9% compared to the one of the bulk sample, which proves that the compressive stress on films was imposed by Si sbustrate. It is found that the MR value (Δ$\rho$/$\rho$0) of films are 0.33, 0.29 and 0.27 under a magnetic field of 1.5T for each films with deposition temperature of $700^{\circ}C$, 75$0^{\circ}C$ and 80$0^{\circ}C$, respectively. The correlation between the MR values and lattice constants of films is discussed. It is concluded that the compressive stress on films cause the enhancement of MR values of thin films grown on Si (1000 substrates. Some mechanism of compressive stress induced by Si substrate is suggested.

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LARGE MAGNETORESISTANCE OF SPUTTERED BI THIN FILMS AND APPLICATION OF SPIN DEVICE

  • M. H. Jeun;Lee, K. I.;Kim, D. Y.;J. Y. Chang;K. H. Shin;S. H. Han;J. G. Ha;Lee, W. Y.
    • 한국자기학회:학술대회 개요집
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    • 한국자기학회 2003년도 하계학술연구발표회 및 한.일 공동심포지엄
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    • pp.66-67
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    • 2003
  • Bismuth (Bi) has been an attractive materials for studying spin dependent transport properties because it shows very large magnetoresistance (MR) resulting from its highly anisotropic Fermi surface, low carrier concentrations, long carrier mean free path 1 and small effective carrier mass m*[1-3]. With all the intriguing properties, difficulty in fabrication of high quality Bi thin films may have prevented extensive application of Bi in magnetic field sensing and spin-injection devices. Previous works found that the surface roughness and small grain size in 100-200 nm of Bi thin film made by evaporation and sputtering are major causes of low MR. Although relatively higher MR in electrodeposited Bi followed by annealing was reported, it still suffers from rough sulfate roughness which is so severs that it is hardly able to make a field sensing and spin-injection device using conventional photolithography process.

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Comparison of carbon nanotube growth mode on various substrate

  • I.K. Song;Y.S. Cho;Park, K.S.;Kim, D.J.
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.44-44
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    • 2003
  • Growth mechanism of carbon nanotubes(CNTs) synthesized by chemical vapor deposition is abided by two growth modes. These growth modes are classified by the position of activated catalytic metal particle in the CNTs. Growth mode can be also affected by interaction between substrate and catalytic metal and induced energy such as thermal and plasma. We studied the reaction of catalytic metal to the substrate and growth mode of CNTs. Various substrates such as Si(100), graphite plate, coming glass, sapphire and AAO membrane are used to study the relation between catalytic metal and substrate in the synthesis of CNTs. For catalytic metal, thin film was deposited on various substrate via sputtering technique with a thickness of ∼20nm and magnetic fluids with none-sized particles were dispersed on AAO membrane. After laying process on AAO membrane, it was dried at 80$^{\circ}C$ for 8 hour. Synthesizing of CNTs was carried out at 900$^{\circ}C$ in NH3/C2H2 mixture gases flow for 10minutes.

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NiFe/FeMn/NiFe 스핀밸브 구조의 다층박막에서 상 하부 NiFe 두께에 따른 교환바이어스 조사 (Anomalous Exchange Bias of the Top and Bottom NiFe Layers in NiFe/FeMn/NiFe Based Spin Valve Multilayers)

  • S.M. Yoon;J.J. Lim;V.K. Sankar;Kim, C.G.;Kim, C.O.
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.212-212
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    • 2003
  • Many of the spin valve multilayer structures with FeMn as antiferromagnetic layer consist of a NiFe/FeMn/NiFe trilayer where the bottom NiFe layer is the seed layer to facilitate the growth of (111) gama-FeMn antiferromagnetic phase and the top NiFe layer forms the pinned layer[1], In this study, exchange bias of bottom NiFe layer has been investigated as functions of thicknesses of top and bottom NiFe in NiFe/FeMn/NiFe, prepared by rf magnetron sputtering, MH-loop was measured by vibration sample magnetometer (VSM). Two hysteresis loops are corresponded to bottom and top layers, similar to reported loops in spin valve structure. Exchange bias of bottom NiFe could be induced by the interfacial coupling between bottom NiFe and FeMn. But those coupling are strongly dependent on the top and bottom NiFe thicknesses, revealing anomalous character ul exchange bias of bottom NiFe layer.

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자기저항헤드용 $Ni_{81}Fe_{19}$ 박막의 구조 및 전자기적 특성에 미치는 자장중 열처리의 영향 (The Effect of Magnetic Field Annealing on the Structual and Electromagnetic Properties of $Ni_{81}Fe_{19}$ thin Films for Magnetoresistaknce Heads)

  • 김용성;이경섭;서수정;박현순;김기출;송용진
    • 한국자기학회지
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    • 제6권4호
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    • pp.242-250
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    • 1996
  • RF-마그네트론 스퍼터법으로 제조된 $400\;{\AA}$$Ni_{81}Fe_{19}$ 박막을 자장중에서 열처리할 때 박막의 미세구조 및 표면형상의 변화에 따른 전자기적 특성을 조사하였다. 보자력은 열처리 온가 $300^{\circ}C$까지 증가함에 따라 박막내부 잔류응력의 감소 및 재결정에 의해 감소하였고, $400^{\circ}C$에서는 결정립성장 및 표면조도의 증가에 의해 증가에 의해 증가하였다. $4{\pi}M_{s}$는 열처리온도에 따라 큰 변화를 보이지 않고, 9.2 kG 수준의 거의 일정한 값을 보였다. 열처리 온도가 증가 함에 따라 전기비저항은 $37\;{\mu}{\Omega}cm$에서 $24\;{\mu}{\Omega}cm$로 감소하였으며, 자기저항값은 $0.6\;{\mu}{\Omega}cm$ 수준으로 거의 일정한 값을 보였고, 자기저항비 1.5 %에서 3.1 %로 증가 하였다. 따라서 자기저항비의 증가는 주로 전기비저항의 감소에 기인한 것으로 나타났다. 이상에서 박막을 실제적인 자기저항 헤드에 응용을 고려시, 최적 열처리조건은 400 Oe의 일방향 자장중 $300^{\circ}C$에서 1시간 열처리할 때로 나타났다.

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NiFe/Cu/Co 삼층막의 자기이방성과 자기저항 특성에 관한 연구 (A Study on the Magnetic Anisotrpy and Magnetoresistive Characteristics of NiFe/Cu/Co Trilayers)

  • 김형준;이병일;주승기
    • 한국자기학회지
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    • 제6권5호
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    • pp.323-328
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    • 1996
  • $4^{\circ}$ 기울어진 Si(111) 웨이퍼를 기판으로 사용해 Cu($50\;{\AA}$) 바닥층 위에 외부 자장의 인가없이 NiFe($60\;{\AA}$)/Cu($60\;{\AA}$)/Co($30\;{\AA}$) 삼층막을 형성하여 자기이방성과 자기저항 특성을 연구하였다. NiFe($60\;{\AA}$) 층과 Co($30\;{\AA}$) 층을 Cu($50\;{\AA}$) 바닥층 위에 각각 단층막으로 형성할 경우에 면내 일축자기이방성이 유도되었으며, 기판을 기준으로 NiFe 층과 Co 층의 자화용이축은 면내에서 상호 수직임이 관찰되었다. NiFe($60\;{\AA}$)/Cu($60\;{\AA}$)/Co($30\;{\AA}$) 삼층막을 동일한 기판과 바닥층 위에 형성할 경우, NiFe층과 Co층의 자기이방성은 단층박에서의 자기이방성이 재현되어, 자화용이축이 면내에서 상호 수직으로 놓임이 처음으로 발견되었으며 ~2.2%의 자기 저항비가 측정되었다. 이를 자기이방성이 유도되지 않은, 유리 기판위에 형성한 NiFe($60\;{\AA}$)/Cu($60\;{\AA}$)/Co($30\;{\AA}$) 삼층막과 비교할 때 ~1.2% 큰 자기저항비를 보이며, 두 자성층의 자화 상태가 반평행을 유지해 자기저항비가 일정하게 유지되는 구간도 현저히 증하가였다. 위의 결과는 적절한 기판의 선택을 통해 삼층막을 이루는 두 자성층 내의 자기이방성 유도와 자화용이축 방향의 조절이 가능함을 나타내며, 이는 헤드 또는 메모리 소자 응용에 매우 유용할 것으로 판단된다.

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버퍼층 Ta에 의존하는 코네틱 박막의 연자성 자기저항 특성 (Soft Magnetoresistive Properties of Conetic Thin Film Depending on Ta Buffer Layer)

  • 최종구;황도근;이상석;최진협;이기암;이장로
    • 한국자기학회지
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    • 제19권6호
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    • pp.197-202
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    • 2009
  • 코닝유리(Corning glass) 기판 위에 이온빔 증착법으로 제작한 버퍼(Ta)/코네틱(Conetic; NiFeCuMo) 박막에 대해 버퍼층에 의존하는 결정성장과 열처리 효과를 조사하였다. 또한 코네틱층을 증착할 때에 인가한 자기장 방향으로 용이축과 곤란축의 자기저항 곡선으로부터 얻은 보자력과 포화자기장값을 버퍼층 유무에 따라 서로 비교하였다. Ta 박막의 두께가 5 nm이고 코네틱 박막의 두께가 50 nm일 때에 보자력은 0.12 Oe으로 작았으며, MH 히스테리시스 곡선에서 얻은 자화율($\chi$)은 1.2 ${\times}\;10^4$으로 우수한 연자성의 특성을 가졌다. 저자기장에 민감한 거대자기저항 스핀밸브(GMR-SV; giant magneoresistance-spin valve)나 자기터널링접합(MTJ; megnetic tunnel junction) 박막구조에서 자유층으로 연자성의 특성이 우수한 코네틱 박막을 사용할 수 있는 가능성을 확인하였다.