• Tribology and Lubricants
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• 제18권6호
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• pp.396-401
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• 2002

ln this paper, the fuction of molybdenum dialkyl dithiophosphate (MoDTP) as an oxidation inhibitor of mineral oils was investigated and compared with 2,6-Di-tert-Butyl-4-Methylphenol (DBMP). Oxidation tests were conducted using an oxygen absorption apparatus. MoDTP showed anti-oxidation property, and length of induction time prolonged by increasing MoDTP concentration. However the induction time of DBMP was longer than those of MoDTP. The anti-oxidation property of MoDTP was found to be inferior to that of DBMP The capability of hydroperoxide decomposition ability with MoDTP was much greater than that with DBMP. However the rate constant of radical scavenging with MoDTP was much better than that with DBMP. It was found that the performance of MoDTP is exellent with respect to hydroperoxide decomposition but it is susceptible to chemical decomposition. From the fact that formation of phenol was observed when MoDTP was added to hexane solution of cumene hydroperoxide (CHPO), it is indicated that the decomposition of hydroperoxide with MoDTP occurs by means of ionic mechanism.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.205-207
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• 2009

아크이온플래이팅 기술과 스퍼터링 기술이 결합된 하이브리드 코팅 시스템을 이용하여 STS 304와 Si 기판에 4성분계 Cr-Al-Mo-N 코팅을 증착하였다. $N_2$/Ar 혼합가스 분위기하에 아크 타겟은 Cr을 사용하였고 스퍼터링 타겟은 Al과 Mo를 사용하였으며 합성된 Cr-Al-Mo-N 코팅은 주로 치환고용된 (Cr, Al, Mo)N으로 구성되었다. 최고 경도값은 Mo 함량이 24.2 at.%일 때 35 GPa을 나타냈으며 마찰계수는 Mo의 함량이 0에서 33.2 at.%로 증가함에 따라 0.9에서 0.48로 감소하였다. 이는 $MoO_3$가 코팅면과 스틸볼 계면에서 고체 윤활제로 작용한 것으로 사료된다. 그러나 Cr-Al-Mo-N 코팅은 MoN의 낮은 내산화온도로 인하여 Cr-Al-N에 비하여 더 낮은 온도에서 산화되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.343-343
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• 2014

We reported on the electrical, optical, structural and morphological properties fabricated by co-sputtering for use as an anode for organic solar cells (OSCs). By adjusting RF and DC power of $MoO_3$ and IZO targets during co-sputtering, we fabricated the $MoO_3$-IZO electrode with graded content of the $MoO_3$ on the IZO films. At optimized $MoO_3$ thickness of 20 nm, the $MoO_3$ graded IZO electrode showed a higher mobility ($33cm^2/V-Sec$) than directly deposited $MoO_3$ on IZO film ($26cm^2/V-Sec$). At visible range (400nm~800nm), optical transmittance of the $MoO_3$ graded IZO electrode is higher than that of directly deposited $MoO_3$ on IZO film. High mobility of $MoO_3$ graded on IZO is attributed to less interface scattering between $MoO_3$ and IZO. To investigate the feasibility of $MoO_3$ graded IZO films, we fabricated conventional P3HT:PCBM based OSCs with $MoO_3$ graded IZO as a function of MoO3 thickness. The OSC fabricated on the $MoO_3$ graded IZO anode showed a fill factor of 66.53%, a short circuit current of $8.121mA/cm^2$, an open circuit voltage of 0.592 V, and a power conversion efficiency of 3.2% comparable to OSC fabricated on ITO anode and higher than directly deposited $MoO_3$ on IZO film. We suggested possible mechanism to explain the high performance of OSCs with a $MoO_3$ graded IZO.

• 분석과학
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• 제5권3호
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• pp.319-325
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• 1992

플라즈마 아크 용해법으로 이론밀도비 99% 이상인 Mo-1.17 Ti-0.18 Zr-0.06 C 잉고트를 제조하였다. 이때 산소함량은 초기 830ppm에서 40ppm으로 감소하였다. 열간단조 후, 50% 냉간 압연하여 두께 2mm의 판재를 만들어 시편으로 사용하였다. Mo 합금판재의 재결정거동을 조사하기 위하여 $800{\sim}2100^{\circ}C$ 구간에서 1시간 동안 등시열처리하였고, $1400^{\circ}C$, $1500^{\circ}C$, $1600^{\circ}C$에서 0~10800sec 동안 등온열처리하였다. 완전한 재결정은 Mo의 경우 $1400^{\circ}C$에서 종료되었으나 Mo 합금의 경우 $1700^{\circ}C$에서 완료되었다. 또한 Mo 합금의 50%-1시간 재결정온도는 약 $1500^{\circ}C$로서 Mo에 비하여 $300^{\circ}C$ 이상 증가된 것을 알 수 있었다. Mo 합금의 재결정에 필요한 활성화에너지는 508kJ/mol이었다.

• 한국결정성장학회지
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• 제7권4호
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• pp.665-672
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• 1997

Molybdenum silicides $MoSi_2$ 및 $Mo_5Si_3$를 제조하기 위하여 순금속 Mo과 Si의 혼합분말을 볼밀법으로 실온에서 기계적 합금화시켰다. $MO_{33}Si_{67}$조성의 혼합분말을 100시간 볼밀처리한 결과 금속간화합물 $MoSi_2$가 생성되었으며 $725^{\circ}C$까지 후열처리시킴으로써 단상의 $MoSi_2$로 상변태함을 알 수 있었다. 얻어진 분말의 결정립 크기는 19 nm로 시판 $MoSi_2$분말보다 약 1/4로 매우 미세하였다. 또한 $Mo_{62}Si_{38}$ 조성의 혼합분말도 300시간 볼밀처리를 함으로써 금속간화합물 $Mo_5Si_3$가 생성되었는데 $1000^{\circ}C$까지의 후열처리로 단상 $Mo_5/Si_3$의 미세 결정립 분말을 얻었다. 이와같이 볼밀처리에 의한 기계적 합금화시 $Mo_5Si_3$상이 형성되기 어려운 것은 금속간화합물 $Mo_5Si_3$이 가지고 있는 복잡한 결정구조와 매우 큰 단위격자에 기인하는 것으로 판단하였다. 볼밀법에 의해 제조한 초미세 결정립 분말재료는 기계적 성질을 향상시켜 초고온 구조재료에 응용이 기대된다.

• Korean Chemical Engineering Research
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• 제60권1호
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• pp.159-168
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• 2022

MoO₃ 비율을 10-50 중량비로 변화하여 제조한 Mo-Al 복합 산화물 상에서 소성 후 승온 질화반응을 통하여 얻은 Mo-Al 질화물 상에서 암모니아 분해반응에서의 촉매 활성을 검토하였다. 제조된 촉매의 물리·화학적 특성을 알아보기 위하여 N₂ 흡착분석, X-선 회절분석(XRD), X-선 광전자분석법(XPS), 수소 승온환원(H₂-TPR), 투과전자현미경(TEM) 분석을 수행하였다. 600 ℃에서 소성 후 Mo-Al 복합산화물은 γ-Al₂O₃와 Al₂(MoO₄)₃ 결정상을 나타냈으며 질화반응 후의 질화물은 비정형 형태를 보여주었다. 질화반응 후의 비표면적은 MoO₃의 위상전환반응에 의해 Mo 질화물 형성으로 인해 증가하였으며, Mo 질화물이 γ-Al₂O₃에 담지된 형태를 보여주었다. 암모니아 분해반응에서의 촉매 활성은 40 wt% MoO₃가 가장 좋은 활성을 보여주었고, 질화반응 시간이 증가함에 따라 활성이 증가하였으며 이에 따라 활성화에너지 감소 효과를 나타냈다.

• 환경위생공학
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• 제20권1호
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• pp.76-83
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• 2005

The process of reusing the treated water generated during this process and that of recovery of molybdenum from the excessive water were studied. The results were as follows. Molybdenum recollection 1. Reusing processing water generated after dissolving process on FL/20 type, the following were the remaining Mo.'s weights after the 1st, 2nd, 3rd, 4th, 5th, & 6th dissolutions respectively. 1) The result of measuring the quantity of Mo. in processing water(the 1st solving water) generated after the 1st dissolving Mo. process was $369g/\ell$ 2) The result of measuring the quantity of Mo. in processing water(the 2nd solving water) generated after the 1st dissolving Mo. process reusing the 1st solving water was $627.3g/\ell$ 3) The result of measuring the quantity of Mo. in processing water(the 3rd solving water) generated after the dissolving Mo. process reusing the 2nd solving water was $808.11g/\ell$ 4) The result of measuring the quantity of Mo. in processing water(the 4th solving water) generated after the dissolving Mo. process reusing the 3rd solving water was $934.68g/\ell$ 5) The result of measuring the quantity of Mo. in processing water(the 5th solving water) generated after the dissolving Mo. process reusing the 4th solving water was $1023.27g/\ell$ 6) The result of measuring the quantity of Mo. in processing water(the 6th solving water) generated after the dissolving Mo. process reusing the 5th solving water was $1085.29g/\ell$ 2. The followings were the results of recollectings Mo. in processing water respectively generated after dissolving Mo. to produce complete goods df FL/20 type filament. 1) the percentage of recollecting Mo. in the 1st solving water was $93.0\%$ 2) the percentage of recollecting Mo. in the 2nd solving water was $94.5\%$ 3) the percentage of recollecting Mo. in the 3rd solving water was $95.5\%$ 4) the percentage of recollecting Mo. in the 4th solving water was $96.0\%$ 5) the percentage of recollecting Mo. in the 5th solving water was $96.2\%$ 6) the percentage of recollecting Mo. in the 6th solving water was $96.4\%$ 3. The followings were the results of analyzing, with ICP, holding quantities of Mo. in the 6 processing waters to produce FL/20 type filament after passing a 3 staged solid-liquid separator through, dehydrating and drying for more than 3 hours in a dryer to recollect solving Mo. in them 1) the Mo. holding percentage in the 1st solving water was $76.6\%$ 2) the Mo. holding percentage in the 2nd solving water was $76.6\%$ 3) the Mo. holding percentage in the 3rd solving water was $76.6\%$ 4) the Mo. holding percentage in the 4th solving water was $76.6\%$ 5) the Mo. holding percentage in the 5th solving water was $76.6\%$ 6) the Mo. holding percentage in the 6th solving water was $76.6\%$ It was noted that with the number of times the recollecting Mo. percentage become higher, and in spite of much recollecting, without any large effect on the goods the solving water could be reused as the processing water. Because the collected Mo. holding percentages were more than $76\%$, it is considered they are very good one than Chinese Mo. ores with $50\%$ degrees of purity, worthy of recollecting Mo.

• 한국재료학회지
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• 제23권9호
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• pp.495-500
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• 2013

Mo-based thin films are frequently used as back electrode materials because of their low resistivity and high crystallinity in CIGS chalcopyrite solar cells. Mo:Na/Mo bilayer thin films with $1{\mu}m$ thickness were deposited on soda lime glass by varying the thickness of each layer using dc-magnetron sputtering. The effects of the Mo:Na layer on morphology and electrical property in terms of resistivity were systematically investigated. The resistivity increased from $159{\mu}{\Omega}cm$ to $944{\mu}{\Omega}cm$; this seemed to be caused by increased surface defects and low crystallinity as the thickness of Mo:Na layer increased from 100 nm to 500 nm. The surface morphologies of the Mo thin films changed from a somewhat coarse fibrous structures to irregular and fine celled structures with increased surface cracks along the cell boundaries as the thickness of Mo:Na layer increased. Na contents varied drastically from 0.03 % to 0.52 % according to the variation of Mo:Na layer thickness. The change in Na content may be ascribed to changes in surface morphology and crystallinity of the thin films.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.535-536
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• 2013

본 연구에서는 DC/RF co-sputtering공법을 통해 제작한 In-Mo-O 투명 Mo doping 농도 및 열처리 온도에 따른 전기적, 광학적, 구조적 특성을 분석하고, 최적화된 In-Mo-O 투명전극을 유기태양전지(OPVs)와 유기발광다이오드(OLED)에 적용하여 그 가능성을 평가하였다. Mo doping 농도는 co-sputtering 공정 중 MoO3에 인가되는 radio-frequency (RF) power를 변화시켜 조절되었으며, 투명전극의 광학적 특성 및 전기적 특성 향상을 위해 성막 공정 후 급속 열처리 공정을 온도 별로 진행하였다. In-Mo-O 투명 전극은 Mo 도핑 농도에 영향을 받음을 확인할 수 있었고, 최적화된 Mo doping 파워에서 성막한 In-Mo-O 박막은 급속 열처리 공정 후 면저항 24.57 Ohm/square, 투과도 81.57% (400~1,200 nm wavelength)를 나타내었다. Bulk hetero-junction 기반의 고효율 유기태양전지와 유기발광다이오드 적용하기 위해 본 연구에서 제작된 IMO 투명전극의 구조적 특성, 결정성 및 표면특성은 x-ray diffraction (XRD), atomic force microscopy(AFM), field effect scanning electron microscopy (FE-SEM), High-resolution transmission electron microscopy (HRTEM) 분석을 통해 진행하였다. In-Mo-O 투명 전극상에 제작된 OLEDs와 OPV는 reference ITO 전극에 제작된 OLEDs/OPV와 비교할 때 유사하거나 향상된 특성을 나타내었으며 이는 In-Mo-O 박막이 OLED/OPV용 투명 전극으로 적용이 가능함을 말해준다.

• 통합자연과학논문집
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• 제13권3호
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• pp.87-91
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• 2020

Molybdenum carbide (MoC_x) thin films (TFs) were deposited by reactive radio frequency (rf) magnetron co-sputtering in high vacuum chamber. We compared the properties of MoC_x thin films as the rf power changed on C target. The result of alpha step measurement showed that the thickness of the MoC_x TFs varied from163.3 to 194.86 nm as C power was increased from 160 to 200 W. The crystallinity of MoC_x such as b-Mo₂C, Mo₂C, and diamond like carbon (DLC) structures were observed by XRD. The oxidation states of Mo and C were determined using high resolution XPS spectra of Mo 3d and C 1s were deconvoluted. Molybdenum was consisted of Mo, Mo⁴⁺, and Mo⁶⁺ species. And C was deconvoluted to C-Mo, C, C-O, and C=O species.