• 제목/요약/키워드: MEMS Fabrication Process

검색결과 189건 처리시간 0.026초

MEMS 공정을 이용한 탐침형 정보저장장치 제어용 초정밀 구동기 제작 (Ultra precise actuator fabrication for probe-based data storage by MEMS process)

  • 조진우;이경일;김성현;최영진
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 하계학술대회 논문집 C
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    • pp.1903-1905
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    • 2003
  • 전자기력을 이용하여 탐침형 정보저장장치의 미디어를 제어할 수 있는 초정밀 구동기를 제작하였다. 탐침형 정보저장장치는 데이터 비트의 크기가 10nm 수준이고, 단일 캔틸레버가 점유하는 영역의 크기가 수십 ${\mu}m$${\times}$수십${\mu}m$ 수준이므로, 미디인 구동기는 수 nm의 위치 정확도 및 수십 ${\mu}m$ 수준의 변위 그리고 100Hz이상의 공진 주파수를 확보하여야한다. 본 연구에서 제작한 탐침형 정보저장장치의 미디어 구동기는 고저항 Si wafer 표면을 Deep RIE로 patterning한 후 그 내부를 도금으로 채워 구리 코일을 형성하고 이를 영구자석과 결합시킨 후, 구리 코일에 전류를 흘려 미디어를 구동하는 방식이다. 사용된 영구자석은 SmCo 자석이며 코일의 폭은 $100{\mu}m$이고 간격은 $20{\mu}m$, 높이는 $70{\mu}m$로 결정하였으며, 100Hz 이상의 공진 주파수를 확보하기 위하여 스프링 재질은 구리보다 상대적으로 stiff한 Si을 사용하였다. 미디어의 크기는 $20{\times}20mm^2$, 전체 구동기의 크기는 $30{\times}30mm^2$이며 측정결과 최대변위는 140mA 인가 시 약 ${\pm}127{\mu}m$이다.

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광조형을 이용한 마스크리스 패턴형성에 관한 연구 (A Study of Mastless Pattern Fabrication using Stereolithography)

  • 정영대;조인호;손재혁;임용관;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 춘계학술대회 논문집
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    • pp.503-507
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    • 2002
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.

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바이오 멤스 및 마이크로 시스템 적용을 위한 3차원 마이크로 유로 제작 (Fabrication of 3-D microchannel for biomems and micro systems application)

  • 윤광석
    • 센서학회지
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    • 제15권5호
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    • pp.357-361
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    • 2006
  • This paper reports a new technology to implement complex PDMS microchannels, which are simply constructed using three-dimensional photoresist structures as mold for PDMS replica process. The process utilizes LOR resist as a sacrificial layer to levitate the structural photoresist and multi-step exposure to control the thicknesses of photoresist structures. Various shapes of photoresist structures were successfully fabricated. Using the PDMS replica method, the three-dimensional photoresist structures are demonstrated to be applicable for implementing complex microchannels in PDMS. In addition, more complex multilevel microchannels are constructed by bonding two PDMS layers with just single PDMS alignment.

마이크로채널 전사성 향상을 위한 사출성형공정 최적화 기초연구 (An Experimental Study on the Transcription Characteristics of Injection-Molded Micro Channel)

  • 김종선;고영배;민인기;유재원;김종덕;윤경혼;황철진
    • 소성∙가공
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    • 제15권9호
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    • pp.692-696
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    • 2006
  • Micro fabrication of polymeric materials becomes increasingly important. And it is considered as a low-cost alternative to the silicon or glass-based Micro Electro-Mechanical System(MEMS) technologies. In the present study, micro channels were fabricated via LiGA(Lithographie, Galvanoformung, Abformung) process used for Capillary Electrophoresis(CE) chip. Taguchi method was applied to investigate the effects of process conditions in injection molding(melt temperature, injection speed, mold temperature and packing pressure) on the transcription characteristics of the micro channel. It was found that the skin layer disturbs a formation of micro channel. Furthermore, mold temperature and injection speed were two important factors to affect the replication characteristics of micro channel.

초음파 측정용 레이저 도플러 진동계의 제작에 관한 연구 (Basic Study for the fabrication of Laser Doppler Vibrometer for the Detection of Ultrasonic)

  • 김승종;김명선;김호성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.2195-2197
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    • 2000
  • In order to detect the ultrasonic that is generated by the partial discharge of the heavy electric machinery a Laser Doppler Vibrometer (LDV) is developed. A Michelson type interferometer which employed heterodyne signal process technique is built to measure the frequency and amplitude of vibration. The output signal of the fast photodetector is a frequency modulated signal centered at 40 MHz. The signal from the detector is amplified and converted to intermediate frequency centered at 1 MHz after mixing process. The voltage output that is proportional to the velocity of the moving surface(PZT) is obtained using PLL. The spectrum of the FM signal is analyzed and integration method was introduced to obtain amplitude information. This LDV can be used to measure the vibration of MEMS devices, automobiles, HDD and CDP.

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전해 방전법을 이용한 유리 미세 구멍가공 (Micro-hole Fabrication of Glass Using Electro-chemical Discharge Method)

  • 이왕훈;이영태
    • 센서학회지
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    • 제13권1호
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    • pp.72-77
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    • 2004
  • In this paper, we fabricated an apparatus of the electro-chemical discharge drilling for boring narrow through-hole into a glass. In the electrolyte, electro-chemical discharge creates high temperature condition by the electro-discharge energy. Therefore, glass are removed by the accelerated chemical reaction with glasses and chemicals in the high temperature condition. For optimization of the electro-chemical discharge drilling, the process condition was studied experimentally as a function of the electrolyte concentration, supply voltage and process time. The optimum condition was from DC25V to DC30V of applied voltage, 35 wt% NaOH solution.

변위센서응용을 위한 피라미드형 실리콘 턴널링소자의 제조 (Fabrication of the pyramid-type silicon tunneling devices for displacement sensor applications)

  • 마대영;박기철;김정규
    • 센서학회지
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    • 제9권3호
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    • pp.177-181
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    • 2000
  • 턴널링 전류는 전극사이의 거리에 지수적으로 비례한다. 따라서 턴널링 전류의 변화측정을 통하여 전극간격의 미세변위를 측정할 수 있다. 본 실험에서는 micro-tip과 membrane사이에 턴널링 전류가 흐르는 피라미드형 실리콘 턴널링소자를 micro-electro-mechanical systems (MEMS) 공정을 이용하여 제조하였다. 단결정 실리콘을 KOH 용액안에서 이방성 에칭 시켜 micro-tip을 제조하였으며, 이때 $SiO_2$막을 마스크로 사용하였다 $Si_3N_4$막으로 membrane을 형성하였다. 마스크 방향에 따른 에칭 진행과정의 차이를 조사하였으며 membrane으로 사용한 $Si_3N_4$막의 stiffness를 측정하였다. 실험으로 측정하기 어려운 영역의 $Si_3N_4$막 stiffness 예측을 위한 모델식을 제시하였다.

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The Fabrication by using Surface MEMS of 3C-SiC Micro-heaters and RTD Sensors and their Resultant Properties

  • Noh, Sang-Soo;Seo, Jeong-Hwan;Lee, Eung-Ahn
    • Transactions on Electrical and Electronic Materials
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    • 제10권4호
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    • pp.131-134
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    • 2009
  • The electrical properties and the microstructure of nitrogen-doped poly 3C-SiC films used for micro thermal sensors were studied according to different thicknesses. Poly 3C-SiC films were deposited by LPCVD (low pressure chemical vapor deposition) at $900^{\circ}C$ with a pressure of 4 torr using $SiH_2Cl_2$ (100%, 35 sccm) and $C_2H_2$ (5% in $H_2$, 180 sccm) as the Si and C precursors, and $NH_3$ (5% in $H_2$, 64 sccm) as the dopant source gas. The resistivity of the poly SiC films with a 1,530 ${\AA}$ thickness was 32.7 ${\Omega}-cm$ and decreased to 0.0129 ${\Omega}-cm$ at 16,963 ${\AA}$. The measurement of the resistance variations at different thicknesses were carried out within the $25^{\circ}C$ to $350^{\circ}C$ temperature range. While the size of the resistance variation decreased when the films thickness increased, the linearity of the resistance variation improved. Micro heaters and RTD sensors were fabricated on a $Si_3N_4$ membrane by using poly 3C-SiC with a 1um thickness using a surface MEMS process. The heating temperature of the SiC micro heater, fabricated on 250 ${\mu}m$${\times}$250 ${\mu}m$ $Si_3N_4$ membrane was $410^{\circ}C$ at an 80 mW input power. These 3C-SiC heaters and RTD sensors, fabricated by surface MEMS, have a low power consumption and deliver a good long term stability for the various thermal sensors requiring thermal stability.

광픽업 스캔 장치를 이용한 미소 구조물의 표면 측정 (Surface Measurement of Microstructures Using Optical Pick-up Based Scanner)

  • 김재현;박정열;이승엽
    • 대한기계학회논문집B
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    • 제34권1호
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    • pp.73-76
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    • 2010
  • MEMS 기술이 발전함에 따라 MEMS 공정으로 제작된 미소 구조물들의 검사 및 특성 분석이 매우 중요한 문제로 떠오르고 있다. 그러나 주사 전자현미경(SEM)이나 원자현미경(AFM) 그리고 기계적 표면측정장치 등은 가격적인 측면에서나 방법적인 측면에서 많은 단점을 안고 있다. 본 논문에서는 DVD 광 픽업 장치를 이용하여 미소구조물을 높이를 측정하였다. 미소구조물 시편에서 반사된 빛의 강도를 측정하여 시편의 영상을 만들어냈고 미소구조물의 높이는 포토다이오드에서 측정된 포커스에러신호(FES)을 통해 구할 수 있었다. 제시된 광 픽업 스캐너는 기존 측정 장치와 비교하여 저렴한 비용으로 정밀한 측정이 가능함을 보여주었고, 기존의 기술을 대체할 수 있는 시스템으로 사용될 수 있을 것이다.

글루코오스 농도 측정을 위한 볼로미터 타입의 적외선 센서 제작 (The fabrication of bolometric IR detector for glucose concentration detection)

  • 최주찬;정호;박건식;박종문;구진근;강진영;공성호
    • 센서학회지
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    • 제17권4호
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    • pp.250-255
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    • 2008
  • A vanadium pentoxide ($V_2O_5$)-based bolometric infrared (IR) sensor has been designed and fabricated using micro electro mechanical systems (MEMS) technology for glucose detection and its resistive characteristics has been illustrated. The proposed bolometric infrared sensor is composed of the vanadium pentoxide array that shows superior temperature coefficient of resistance (TCR) and standard silicon micromachining compatibility. In order to achieve the best performance, deposited $V_2O_5$ thin film is optimized by adequate rapid thermal annealing (RTA) process. Annealed vanadium oxide thin film has demonstrated a linear characteristic and relatively high TCR value (${-4}%/^{\circ}C$). The resistance of vanadium oxide is changed by IR intensity based on glucose concentration.