• Title/Summary/Keyword: M-V plane

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Analysis of SMPS Characteristics applying Ground Plane Layer (Ground Plane레이어를 적용한 SMPS 특성분석)

  • Park, Jin-Hong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.15 no.1
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    • pp.436-440
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    • 2014
  • To verity the effect of PCB plane layer to the output characteristics of the Switched Mode Power Supply (SMPS), this paper compared with a generic one-layer PCB and a double-side PCB. This paper specially focused on the voltage, the current and the high frequency noise of the output characteristic of the SMPS, using a double-side PCB which has same layout and was installed a ground plane on the opposite side. This double-side PCB was assembled by all same components which used on the SMPS using the single-side PCB. The experiment results show the SMPS using the ground plan PCB can efficiently reduce the high frequency noise to 50mV at 100MHz from 150mV in the single-side PCB. And the results also show the high harmonics frequency was reduced as well.

Effects of the V/III ratio on a-plane GaN epitaxial layer on r-plane sapphire grown by HVPE (r-Plane sapphire 위에 HVPE에 의해 성장한 a-plane GaN에피텍셜층의 V/III족 ratio에 따른 특성 변화)

  • Ha, Ju-Hyung;Park, Mi-Seon;Lee, Won-Jae;Choi, Young-Jun;Lee, Hae-Yong
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.3
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    • pp.89-93
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    • 2014
  • In this study, effects of the V/III ratio on a-plane GaN epitaxial on r-plane grown by HVPE have been investigated. According to increasing of V/III ratio, the value of FWHM of a-plane (11-20) GaN and the value of surface roughness (Ra) were decreased. Growth rate of a-plane GaN epitaxial layer were increased until V/III ratio = 7 as the increasing of V/III ratio, but it was reduced at V/III ratio = 10. At V/III ratio = 10, the FWHM of a-plane (11-20) GaN RC and the surface roughness (Ra) were 829 arcsec and 1.58 nm, respectively, as the lowest value in this study. Also for V/III ratio = 10, cracks under surface or voids were observed the lowest values in images of optical microscope. An M-shaped azimuthal dependence over $360^{\circ}$ angle range was observed for all samples. At V/III ratio = 10, the difference of FWHM of a-plane GaN between $0^{\circ}$ and $90^{\circ}$ was 439 arcsec revealed as the lowest value in the 4 samples.

Fabrication Process and Sensing Characteristics of the In-plane Thermoelectric Sensor Consisting of the Evaporated p-type Sb-Te and n-type Bi-Te Thin Films (n형 Bi-Te와 p형 Sb-Te 증착박막으로 구성된 in-plane 열전센서의 형성공정 및 감지특성)

  • Bae, Jae-Man;Kim, Min-Young;Oh, Tae-Sung
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.1
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    • pp.33-38
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    • 2012
  • An in-plane thermoelectric sensor was processed on a glass substrate by evaporation of the n-type Bi-Te and p-type Sb-Te thin films, and its sensing characteristics were evaluated. The n-type Bi-Te thins film used to fabricate the inplane sensor exhibited a Seebeck coefficient of -165 ${\mu}V$/K and a power factor of $80{\times}10^{-4}W/K^2-m$. The p-type Sb-Te thin film used to fabricate the in-plane sensor exhibited a Seebeck coefficient of 142 ${\mu}V$/K and a power factor of $51.7{\times}10^{-4}W/K^2-m$. The in-plane thermoelectric sensor consisting of 15 pairs of the n-type Bi-Te and the p-type Sb-Te evaporated thin films exhibited a sensitivity of 2.8 mV/K.

Characterizations of GaN polarity controlled by substrate using the hydride vapor phase epitaxy (HVPE) technique (HVPE법으로 성장시킨 GaN 박막의 기판에 따른 극성 특성)

  • Oh, Dong-Keun;Lai, Van Thi Ha;Choi, Bong-Geun;Yi, Seong;Chung, Jin-Hyun;Lee, Seong-Kuk;Shim, Kwang-Bo
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.18 no.3
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    • pp.97-100
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    • 2008
  • Polar and non-polar GaN was grown by the HVPE on various substrates and influence of polarity has been investigated. The $10\;{\mu}m$ thickness GaN were grown by HVPE is along A-plane ($11{\bar{2}}0$), C-plane (0001) and M-Plane ($10{\bar{1}}0$) sapphire substrate respectively. Surface properties were observed by optical microscope and atomic force microscopy. High resolution X-ray diffraction (HR-XRD) confirms the wurtzite structure. The donor band exciton peak located at ${\sim}3.4\;eV$ and also located yellow luminescence peak at 2.2 eV. The polarity of the GaN film has a strong influence on the morphology and the optical properties.

Ohmic Contact Properties of Nonpolar GaN Grown on r-plane Sapphire Substrate with Different Miscut Angle

  • Shin, Dongsu;Park, Jinsub
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.314.1-314.1
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    • 2014
  • The properties of Ni/Au Ohmic contacts formed on nonpolar a-plane GaN grown on r-plane sapphire substrate with different tilt angles are investigated using current-voltage (I-V) measurements. To investigate the effects of pattern direction and size on Ohmic contact properties of a-plane GaN, transmission line method (TLM) patterns are formed either along c-axis and m-axis on nonpolar GaN surface with different size. I-V measurement results show that the size of TLM pattern and formation direction of electrode have an effect on the electrical properties of a-plane GaN. The large sized patterns show the relatively lower sheet resistance compared to the small sized patterns. In addition, the sheet resistance of a-plane GaN along m-axis shows lower values than that along the c-axis. Finally, the effects of miscut angle of r-sapphire substrate ($0.2^{\circ}$, 0.4oand $0.6^{\circ}$) on electrical properties of a-plane GaN will be discussed.

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A new size plane for design of BiCMOS buffers and comparison with CMOS (BiCMOS버퍼의 설계를 위한 새로운 size plane 및 CMOS와의 비교)

  • 김진태;정덕진
    • Electrical & Electronic Materials
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    • v.8 no.2
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    • pp.204-210
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    • 1995
  • The characteristics of the internal circuits and the load capacitance should be included to optimize the size of BiCMOS buffer. In order to get the optimum size and delay time of the BiCMOS buffer, new size plane is suggested. By using the size plane, the optimum characteristics of CMOS buffer according to the number of stages can be obtained. From this method, delaytime, .tau.$_{D}$, is obtained 2.39 nsec with $V_{\var}$=5V, $C_{L}$=5pF, W=30.mu.m and $A_{e}$=135.mu. $m^{2}$.>..>...>.

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The formation of Si V-groove for optical fiber alignment in optoelectronic devices (광전소자 패키징에서 광섬유 정렬을 위한 Si V-groove 형성)

  • 유영석;김영호
    • Journal of the Microelectronics and Packaging Society
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    • v.6 no.3
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    • pp.65-71
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    • 1999
  • The effects of mask materials and etching solutions on the dimensional accuracy of V-groove were studied for the alignment between optoelectronic devices and optical fibers in optical packaging. PECVD nitride, LPCVD nitride, or thermal oxide($SiO_2$) was used as a mask material. The anisotropic etching solution was KOH(40wt%) or the mixture of KOH and IPA. LPCVB nitride has the best etching selectivity and thermal oxide was etched most rapidly in KOH(40wt%) at $85^{\circ}C$ among the mask materials studied here. The V-groove size enlarged than the designed value. This phenomenon was due to the undercutting benearth the mask layer from the etching toward Si (111) plane. The etch rate of (111) plane wart 0.034 - 0.037 $\mu\textrm{m}$/min in KOH(40wt%). This rate was almost same regardless of mask materials. When IPA added to KOH(40wt%), the etch rate of (100) plane and (111) plane decreased, but etching ratio of (100) to (111) plane increased. Consequently, the undercutting phenomenon due to etching toward (111) plane decreased and the size of V-groove could be controlled more accurately.

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A Study About Electrical Properties and Fabrication Schottky Barrirer Diode Prepared on Polar/Non-Polar of 6H-SiC (극성/무극성 6H-SiC 쇼트키 베리어 다이오드 제조 및 전기적 특성 연구)

  • Kim, Kyung-Min;Park, Sung-Hyun;Lee, Won-Jae;Shin, Byoung-Chul
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.8
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    • pp.587-592
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    • 2010
  • We have fabricated schottky barrier diode (SBDs) using polar (c-plane) and non polar (a-, m-plane) n-type 6H-SiC wafers. Ni/SiC ohmic contact was accomplished on the backside of the SiC wafers by thermal evaporation and annealed for 20minutes at $950^{\circ}C$ in mixture gas ($N_2$ 90% + $H_2$ balanced). The specific contact resistance was $3.6{\times}10^{-4}{\Omega}cm^2$ after annealing at $950^{\circ}C$. The XRD results of the alloyed contact layer show that formation of $NiSi_2$ layer might be responsible for the ohmic contact. The active rectifying electrode was formed by the same thermal evaporation of Ni thin film on topside of the SiC wafers and annealed for 5 minutes at $500^{\circ}C$ in mixture gas ($N_2$ 90% + $H_2$ balanced). The electrical properties of SBDs have been characterized by means of I-V and C-V curves. The forward voltage drop is about 0.95 V, 0.8 V and 0.8 V for c-, a- and m-plane SiC SBDs respectively. The ideality factor (${\eta}$) of all SBDs have been calculated from log(I)-V plot. The values of ideality factor were 1.46, 1.46 and 1.61 for c-, a- and m-plane SiC SBDs, respectively. The schottky barrier height (SBH) of all SBDs have been calculated from C-V curve. The values of SBH were 1.37 eV, 1.09 eV and 1.02 eV for c-, a- and m-plane SiC SBDs, respectively.

Optical technique of precision measurement using Electronic Speckle Pattern Interferometry (ESPI를 이용한 광학식 정밀 계측 기술)

  • 은재정;정영환;최평석;박해수
    • Journal of the Institute of Convergence Signal Processing
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    • v.4 no.4
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    • pp.40-46
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    • 2003
  • In this research, we accomplished the interpreting about the vibration of the object, which is the out of plane displacement in the Electronic Speckle Pattern Interferometry(ESPI), one of the optical measuring technique. The vibrating object has a inherent nodal line, therefore we can get the information about the vibration of the object by interpreting it. we used a speaker and a cantilever plate for a measurement object, and interpreted it qualitatively by using the Time-Average ESPI. In this experimental result, the speaker has the lower mode of fringe at 550Hz, 570mV, and the higher mode of fringe at 950Hz, 570mV This ESPI is a non-destructive test, and because of using the laser at measuring, it has a high resolution. The ESPI can test vibration mode regardless of the test object size, because the area which illuminated laser is the test area.

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Observation of SWCNT Stretching in homogeneously aligned nematic liquid Crystal medium (수평 배향된 양의 액정 내에서의 단일벽 탄소 나노튜브 Stretching 관찰)

  • Yang, Gyu-Hyung;Kang, Byeong-Gyun;Lee, Seung-Hee;Lee, Kyu;Lee, Young-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.170-170
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    • 2010
  • In this paper, we observed stretching of single-wall carbon nanotubes (SWCNTs) aggregates driven by the in-plane field in a homogeneously aligned nematic liquid crystal (LC) medium. Aggregates of SWCNTs started to stretch above the 0.5 V/${\mu}m$ and stretched up to $1.83\;{\mu}m$ from original size with $0.74\;{\mu}m$ at 3.5 V/${\mu}m$.

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