• 제목/요약/키워드: Low-temperature bonding

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Heat Processing and Dyeing Properties of Fabrics by Using Composite Fancy Yarn Containing Low Melting PET Yarn (저온융착 폴리에스테르사 함유 팬시사 직물의 열처리 특성 및 염색성)

  • Sung, Woo Kyung
    • Fashion & Textile Research Journal
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    • v.14 no.6
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    • pp.1024-1031
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    • 2012
  • The thermal bonding PET fabrics were produced through high temperature steaming (HTS) of low melting PET yarn as warp and composite fancy yarn containing low melting PET yarn as weft. The low melting PET yarn of sheath-core structure consisted of a regular PET in core portion and low melting PET in sheath portion. The composite fancy yarn consisted of regular PET yarn as inner part and effect part and low melting PET yarn as binding part. This study was carried out to investigate the melting behavior of thermal bonded PET fabric, the effect of HTS on the thermal bonding, mechanical properties, and dyeing properties. The melting peak of low melting PET yarn showed two melting peaks caused by sheath-core structure. Almost the entire thermal bonding of the fancy PET fabrics containing low melting PET yarn has formed at $200^{\circ}C{\times}3min$ of HTS. The tensile strength in warp and weft direction of the fancy PET fabrics slightly decreased as temperature of HTS increased. The total K/S value of the fancy PET fabrics decreased slightly to $180^{\circ}C{\times}3min$ of HTS, while increased slightly above $200^{\circ}C{\times}3min$ of HTS. The changes in the hue angle ($H^{\circ}$) of the thermal bonded fancy PET fabrics dyed with disperse dyes hardly ever happened.

The Influence of CuO on Bonding Behaviors of Low-Firing-Substrate and Cu Conductor (저온소성 기판과 Cu와의 동시소성에 미치는 CuO의 첨가효과)

  • 박정현;이상진
    • Journal of the Korean Ceramic Society
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    • v.31 no.4
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    • pp.381-388
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    • 1994
  • A new process which co-fires the low-firing-substrate and copper conductor was studied to achieve good bond strength and low sheet resistance of conductor. Cupric oxide is used as the precursor of conductive material in the new method and the firing atmosphere of the new process is changed sequently in air H2N2. The addition of cupric oxide and variations of firing atmosphere permited complete binder-burnout in comparison with the conventional method and contributed to the improvement of resistance and bonding behaviors. The potimum conditions of this experiment to obtain the satisfactory resistance and bond strength are as follows (binder-burnout temperature in air; 55$0^{\circ}C$, reducing temperature in H2; 40$0^{\circ}C$ for 30 min, ratio of copper and cupric oxide; 60:40~30:70 wt%). The bonding mechanism between the substrate and metal was explained by metal diffusion layer in the interface and the bond strength mainly depended on the stress caused by the difference of shrinkage and thermal expansion coefficient between the substrate and metal.

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Analysis of Effects on Concrete Beam Strengthened with CFRP Plate according to Temperature Change (CFRP로 보강된 콘크리트 보의 온도 변화에 따른 영향 분석)

  • 조홍동;한상훈;이승수;신진환
    • Journal of the Korean Society of Safety
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    • v.18 no.2
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    • pp.79-85
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    • 2003
  • In this study, the behavior characteristics of specimen strengthened with CFRP plate were analyzed according to the change of temperature. CFRP plate itself has a good resistance at the high temperature, but epoxy used as a adhesive is lost its bonding strength at the relatively low temperature. Therefore, this study carries out experiment on the beams slot-bonded with CFRP plates in order to maintain the successful bonding strength of epoxy at high temperature. It is presented that the range of glass transition temperature is 60-8$0^{\circ}C$ and RC beams slot-bonded with CFRP plate shows more increasing resistance and failure load than that of interface bonded at the high temperature.

Transient Liquid Phase Diffusion Bonding Technology for Power Semiconductor Packaging (전력반도체 접합용 천이액상확산접합 기술)

  • Lee, Jeong-Hyun;Jung, Do-hyun;Jung, Jae-Pil
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.9-15
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    • 2018
  • This paper shows the principles and characteristics of the transient liquid phase (TLP) bonding technology for power modules packaging. The power module is semiconductor parts that change and manage power entering electronic devices, and demand is increasing due to the advent of the fourth industrial revolution. Higher operation temperatures and increasing current density are important for the performance of power modules. Conventional power modules using Si chip have reached the limit of theoretical performance development. In addition, their efficiency is reduced at high temperature because of the low properties of Si. Therefore, Si is changed to silicon carbide (SiC) and gallium nitride (GaN). Various methods of bonding have been studied, like Ag sintering and Sn-Au solder, to keep up with the development of chips, one of which is TLP bonding. TLP bonding has the advantages in price and junction temperature over other technologies. In this paper, TLP bonding using various materials and methods is introduced. In addition, new TLP technologies that are combined with other technologies such as metal powder mixing and ultrasonic technology are also reviewed.

Effect of Plasma Treatment on the Bond Strength of Sn-Pb Eutectic Solder Flip Chip (Sn-Pb 공정솔더 플립칩의 접합강도에 미치는 플라즈마 처리 효과)

  • 홍순민;강춘식;정재필
    • Journal of Welding and Joining
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    • v.20 no.4
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    • pp.498-504
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    • 2002
  • Fluxless flip chip bonding process using plasma treatment instead of flux was investigated. The effect of plasma process parameters on tin-oxide etching characteristics were estimated with Auger depth profile analysis. The die shear test was performed to evaluate the adhesion strength of the flip chip bonded after plasma treatment. The thickness of oxide layer on tin surface was reduced after Ar+H2 plasma treatment. The addition of H2 improved the oxide etching characteristics by plasma. The die shear strength of the plasma-treated Sn-Pb solder flip chip was higher than that of non-treated one but lower than that of fluxed one. The difference of the strength between plasma-treated specimen and non-treated one increased with increase in bonding temperature. The plasma-treated flip chip fractured at solder/TSM interface at low bonding temperature while the fracture occurred at solder/UBM interface at higher bonding temperature.

Influences of Casting Conditions and Constituent Materials on the Production of Duo-castings (이중복합 주조체의 제조에 미치는 구성 재질과 주조 조건의 영향)

  • Jung, Jae-Young
    • Journal of Korea Foundry Society
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    • v.38 no.1
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    • pp.16-26
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    • 2018
  • In this study, the effects of the pouring temperature, preheating temperature, surface condition and fraction of the wear resistant part on the production of duo-castings were investigated using a high Cr white cast iron with excellent abrasion resistance and a low Cr alloy steel with good toughness. The constituent materials of the duo-castings were designed to have high hardness, fracture toughness and abrasive wear resistance for the replacement of high Mn alloy steels with low abrasive wear resistance. In particular, the amount of abrasive wear of 17% Cr white cast iron was about 1/20 of that of high Mn alloy steel. There was an intermediate area of about 3mm due to local melting at the bonding interface of the duo-castings. These intermediate regions were different from those of the constituent materials in chemical composition and microstructure. This region led to fracture within the wear resistant part rather than at the bonding interface in the bending strength test. The bending fracture strengths were 516-824 MPa, which were equivalent to the bending proof strength of high Mn steel. The effects of various casting conditions on the duo-cast behavior were studied by simple pouring of low Cr alloy steel melt, but the results proved practically impossible to manufacture duo-castings with a sound bonding interface. However, the external heating method was suitable for the production of duo-castings with a sound bonding interface.

Bonding of Different Mate using Common Glass in Zero Shrinkage LTCC (공통의 Glass를 이용한 LTCC 이종소재의 무수축 접한)

  • Jang, Ui-Kyeong;Shin, Hyo-Soon;Yeo, Dong-Hun;Kim, Jong-Hee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.12
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    • pp.1106-1111
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    • 2006
  • To improve warpage, delamination and the chemical reaction between 2 different co-fired materials, the bonding behavior with common glass was studied. As shown in the previous paper, the phenomenon of the infiltration is different with the composition of the glass. In particular, in the case of low temperature melting glass, infiltration is experimented in this study. GA-1 glass is infiltrated among $BaTiO_3$ particles below $800^{\circ}C$ and is made by glass/ceramic composite. Until the laminate is fired under $850^{\circ}C$, provskite phase is observed. Although in the case of GA-12 glass, the temperature of the glass infiltration is lower than it of GA-l glass, the perovskite phase already disappears at $800^{\circ}C$. As a result, GA-1 and GA-12 glasses are infiltrated among particles at low temperature, however, the chemical reactivity of the glass/ceramic and sintering temperature should be considered.

H2 Plasma Pre-treatment for Low Temperature Cu-Cu Bonding (수소 플라즈마 처리를 이용한 구리-구리 저온 본딩)

  • Choi, Donghoon;Han, Seungeun;Chu, Hyeok-Jin;Kim, Injoo;Kim, Sungdong
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.4
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    • pp.109-114
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    • 2021
  • We investigated the effects of atmospheric hydrogen plasma treatment on Cu-Cu direct bonding. Hydrogen plasma was effective in reducing the surface oxide layer of Cu thin film, which was confirmed by GIXRD analysis. It was observed that larger plasma input power and longer treatment time were effective in terms of reduction and surface roughness. The interfacial adhesion energy was measured by DCB test and it was observed to decrease as the bonding temperature decreased, resulting in bonding failure at bonding temperature of 200℃. In case of wet treatment, strong Cu-Cu bonding was observed above bonding temperature of 250℃.

Low Temperature Cure Film Adhesive

  • Liang, Bin;Zhao, Shenglong
    • Journal of Adhesion and Interface
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    • v.5 no.2
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    • pp.1-7
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    • 2004
  • A novel carboxyl terminated butadiene-acrylonitrile (CTBN) modified, low temperature cure epoxy film adhesive was developed in this paper. It can be cured at as low as $75^{\circ}C$ for 4 hours with a pressure of 0.1MPa. After post cure at $120^{\circ}C$ for 2 hours, the bonding strengths of Phosphoric Acid Anodizing(PAA) surface treated aluminum adherend were similar to those of structural film adhesives curing at $120^{\circ}C$. It is suitable to bond both metal/composite laminate-to-laminate and laminate to honeycomb structure.

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