• 제목/요약/키워드: Local Thermodynamic Equilibrium

검색결과 25건 처리시간 0.028초

아크플라즈마와 유동간의 상호작용을 고려한 열가스 유동 해석 (Analysis of Hot Gas Flew Considering Arc-Flow Interaction)

  • 김홍규;박경엽;배채윤;조경연;정현교
    • 대한전기학회논문지:전기기기및에너지변환시스템부문B
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    • 제51권3호
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    • pp.107-115
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    • 2002
  • This parer presents the analysis of hot gas flow in puffer-type circuit breakers using FVFLIC method. For the analysis of arc-flow interaction, the flow field is analyzed from the equations of conservation for mass, momentum and energy with the assumption of local thermodynamic equilibrium state. The arc is represented as the energy source term composed of ohmic heating and radiation term in the energy conservation equation. Ohmic heating is computed by the electric field analysis only within the conducting plasma region. An approximate radiation transport model is employed for the evaluation of emission and absorption of the radiation. The analysis method was applied to the real circuit breaker model and simulation results such as pressure rise and arc voltage were compared with the experimental ones.

It is surface gravity

  • Lee, Jae-Woo
    • 천문학회보
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    • 제41권1호
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    • pp.77.3-77.3
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    • 2016
  • In our previous study, we showed that the peculiar globular cluster M22 contains two distinct stellar populations with different physical properties, having different chemical compositions, spatial distributions and kinematics. We proposed that M22 is most likely formed via a merger of two GCs with heterogeneous metallicities in a dwarf galaxy environment and accreted later to our Galaxy. In their recent study, Mucciarelli et al. claimed that M22 is a normal mono-metallic globular cluster without any perceptible metallicity spread among the two groups of stars, which challenges our results and those of others. We devise new strategies for the local thermodynamic equilibrium abundance analysis of red giant branch stars in globuar clusters and show there exists a spread in the iron abundance distribution in M22.

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캡슬에 고정화된 흡착제에의 Berberine의 흡착에 관한 수학적 모델 (Mathematical Model for Adsorption of Berberine on Encapsulated Adsorbent)

  • 최정우;조상원이원홍
    • KSBB Journal
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    • 제10권4호
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    • pp.358-369
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    • 1995
  • A mathematical model using local thermodynamic equilibrium isotherms for adsorption in encapsulated adsorbent is proposed in order to optimize the design parameters in situ bioproduct separation process. The model accurately follows the experimental data on the adsorption of berberine, secondary metabolite produced in Thaictrum rugosum plant cell culture. The adsorption rate on encapsulated adsorbent is compared with that on alginate-entrapped adsorbent. The result shows that the higher loading capacity in encapsulated adsorbent is mainly due to the increase in the maximum solid phase concentration. Based on the adsorption rate and loading capacity, the encapsulated adsorbent would be more useful than the entrapped adsorbent when used in situ bioproduct separation process. Design parameters in situ bioproduct separation process, such as the size of the capsule, membrane thickness, the ratio of capsule volume to bulk volume, the ratio of single capsule volume to total capsule volume and the adsorbent content in the capsule, are evaluated by using the model. The ratio of single capsule volume to total capsule volume is the most effective parameter for adsorption of berberine on encapsulated adsorbent.

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차세대 리소그래피 빛샘 발생을 위한 플라스마 집속 장치의 제작과 아르곤 아크 플라스마의 발생에 따른 회로 분석 및 전기 광학적 특성 연구 (Fabrication of the Plasma Focus Device for Advanced Lithography Light Source and Its Electro Optical Characteristics in Argon Arc Plasma)

  • 이수범;문민욱;오필용;송기백;임정은;홍영준;이원주;최은하
    • 한국진공학회지
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    • 제15권4호
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    • pp.380-386
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    • 2006
  • 본 연구에서는 극자외선 (Extreme Ultra Violet) 리소그래피의 빛샘원 발생을 위한 플라스 마 집속장치 (Plasma Focus Device)를 설계, 제작하였으며, 이를 이용하여 단펄스 집속 플라스마의 전류, 전압 방전 특성 및 장비의 저항, 인덕턴스의 중요 기초 연구를 수행하였다. 전압, 전류는 C-dot probe 와 B-dot probe를 이용하여 측정하였다. Anode 전극에 1.5, 2, 2.5, 3 kV의 전압을 인가하고 Diode chamber 내의 Ar 기체압력을 1 mTorr-100 Torr 로 변화시켰을 때 발생되는 전압, 전류는 300 mTorr 에서 가장 큰 값을 보였으며, 이때 측정된 LC 공진에 의한 전류 파형으로부터 계산된 시스템 내의 인덕턴스와 임피던스값은 각각 73 nH, $35 m{\Omega}$ 였다. 300 mTorr, 2.5 kV 일 때 Emission spectroscopy를 이용하여 계산한 단펄스 집속 Ar 플라스마내의 전자온도는 Local Thermodynamic Equilibrium(LTE) 가정으로부터 T=13600 K 이었고 이온밀도 및 이온화율은 각각 $N_i = 8.25{\times}10^{15}/ cc,\;{\delta}= 77.8%$ 이었다.

차세대 리소그래피 빛샘 발생을 위한 플라스마 집속장치의 아르곤 아크 플라스마의 방출 스펙트럼 진단 (Emission spectroscopic diagnostics of argon arc Plasma in Plasma focus device for advanced lithography light source)

  • 홍영준;문민욱;이수범;오필용;송기백;홍병희;서윤호;이원주;신희명;최은하
    • 한국진공학회지
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    • 제15권6호
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    • pp.581-586
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    • 2006
  • 차세대 리소그래피 기술인 극자외선(EUV : Extreme Ultraviolet) 빛샘 연구의 기초단계로써, 동축타입의 전극구조가 설치된 다이오드 챔버를 통해 Ar 플라스마를 생성하였으며, 방출 분광기술(emission spectroscopy)를 이용하여 방출된 가시광선 영역의 빛을 조사하였다. 장치의 입력 전압을 0.5kV씩 변화를 주어 $2\sim3.5kV$까지 인가를 했으며 이극챔버의 최적 압력인 330mTorr 일 때 각 전압에 따른 방출 분광선 데이터를 얻었다. 이때 Ar I과 Ar II 방출선을 관측하였으며 국소적인 열적평형 (LTE ; Local Thermodynamic Equilibrium) 상태의 가정 하에 볼츠만 도표(Boltzmann plot)와 사하(Saha) 방정식을 이용해 Ar I 및 Ar II의 전자온도와 이온 밀도를 각각 계산하였다. 각 입력전압에 대해 이온밀도는 Ar I과 Ar II에서 각각 $\sim10^{15}/cc$$\sim10^{13}/cc$의 값으로 계산되었다.

Measurement of EUV (Extreme Ultraviolet) and electron temperature in a hypocycloidal pinch device for EUV lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.108-108
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    • 2010
  • We have generated Ne-Xe plasma in dense plasma focus device with hypocycloidal pinch for extreme ultraviolet (EUV) lithography and investigated an electron temperature. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ne-Xe(30%) gas in accordance with pressure. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature of the hypocycloidal pinch plasma focus could be obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by Boltzmann plot. The light intensity is proportion to the Bolzman factor. We have been measured the electron temperature by observation of relative Ne-Xe intensity. The EUV emission signal whose wavelength is about 6~16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD) and the line intensity has been detected by using a HR4000CG Composite-grating Spectrometer.

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Ionization of Hydrogen in the Solar Atmosphere

  • Chae, Jongchul
    • Journal of Astronomy and Space Sciences
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    • 제38권2호
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    • pp.83-92
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    • 2021
  • The ionization degree of hydrogen is crucial in the physics of the plasma in the solar chromosphere. It specifically limits the range of plasma temperatures that can be determined from the Hα line. Given that the chromosphere greatly deviates from the local thermodynamic equilibrium (LTE) condition, precise determinations of hydrogen ionization require the solving of the full set of non-LTE radiative transfer equations throughout the atmosphere, which is usually a formidable task. In many cases, it is still necessary to obtain a quick estimate of hydrogen ionization without having to solve for the non-LTE radiative transfer. Here, we present a simple method to meet this need. We adopt the assumption that the photoionizing radiation field changes little over time, even if physical conditions change locally. With this assumption, the photoionization rate can be obtained from a published atmosphere model and can be used to determine the degree of hydrogen ionization when the temperature and electron density are specified. The application of our method indicates that in the chromospheric environment, plasma features contain more than 10% neutral hydrogen at temperatures lower than 17,000 K but less than 1% neutral hydrogen at temperatures higher than 23,000 K, implying that the hydrogen temperature determined from the Hα line is physically plausible if it is lower than 20,000 K, but may not be real, if it is higher than 25,000 K. We conclude that our method can be readily exploited to obtain a quick estimate of hydrogen ionization in plasma features in the solar chromosphere.

증기폭발 전파과정 해석을 위한 다상유동 모델 개발 (Multi-phase Flow Modeling of Vapor Explosion Propagation)

  • Park, I. K.;Park, G. C.;K. H. Bang
    • Nuclear Engineering and Technology
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    • 제28권2호
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    • pp.103-117
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    • 1996
  • 본 논문에서는 증기폭발의 전파과정을 해석하기 위한 수학적 모델을 제시하였다. 이 모델은 용융물, 용융파편, 그리고 냉각재 기상과 액상 등 4상 유체의 2차원적인 천이거동을 지배방정식 및 관련상관식의 수치적 해를 구함으로서 예측할 수 있다. 모델에 사용된 주요 상관식은 용융물 분쇄, 냉각재 상변화, 에너지 교환, 그리고 운동량 교환항으로 구성되어 있다. 그리고, 냉각재(물)의 상태방정식은 냉각재의 기상과 액상 사이의 열역학적 인 비평형을 허용할 수 있는 독특한 형태로 구성되었다. 주석 /물의 중기폭발에 대한 예제계산을 수행한 결과 본 모델이 폭발의 전파속도 및 압력 -비록 그 정량적인 값은 관련상관식의 인자들에 좌우되지마는- 등의 증기폭발 전파과정의 주요현상을 적절히 모사할 수 있음을 알 수 있었다. 또한 중요한 초기변수(중기 분율, 용융물 분율) 및 관련상관식에 대한 민감도 분석도 수행되었다.

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Influence of Ne-Xe Gas Mixture Ratio on the Extreme Ultraviolet (EUV) Emission Measurement from the Coaxially Focused Plasma

  • Lee, Sung-Hee;Hong, Young-June;Choi, Duk-In;Uhm, Han-Sup;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.220-220
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    • 2011
  • The Ne-Xe plasmas in dense plasma-focus device with coaxial electrodes were generated for extreme ultraviolet (EUV) lithography. The influence of gas mixture ratio, Ne-Xe (1, 10, 15, 20, 25, 30, 50%) mixture gas, on EUV emission measurement, EUV intensity and electron temperature in the coaxially focused plasma were investigated. An input voltage of 4.5 kV was applied to the capacitor bank of 1.53mF and the diode chamber was filled with Ne-Xe mixture gas at a prescribed pressure. The inner surface of the cylindrical cathode was lined by an acetal insulator. The anode was made of tin metal. The EUV emission signal of the wavelength in the range of 6~16 nm has been detected by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission line was also detected by the composite-grating spectrometer of the working wavelength range of 200~1100 nm (HR 4000CG). The electron temperature is obtained by the optical emission spectroscopy (OES) and measured by the Boltzmann plot with the assumption of local thermodynamic equilibrium (LTE).

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Measurement of EUV Emission and its Plasma Parameters Generated from the Coaxial Plasma Focus of Mather and Hypocycloidal Pinched Electrodes

  • Lee, Sung-Hee;Lee, Kyung-Ae;Hong, Young-June;Uhm, Han-Sup;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.332-332
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    • 2011
  • The extreme ultraviolet (EUV) radiation, whose wavelength is from 120 nm down to 10 nm, and the energy from 10 eV up to 124 eV, is widely utilized such as in photoelectron spectroscopy, solar imaging, especially in lithography and soft x-ray microscopy. In this study, we have investigated the plasma diagnostics as well as the debris characteristics between the two types of dense plasma focusing devices with coaxial electrodes of Mather and hypocycloidal pinch (HCP), respectively. The EUV emission intensity, electron temperature and plasma density have been investigated in these cylindrical focused plasma along with the debris characteristics. An input voltage of 5 kV has been applied to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas at pressure ranged from 1 mTorr and 180 mTorr. The inner surface of the cathode was covered by polyacetal insulator. The central anode electrode has been made of tin. The wavelength of the EUV emission has been measured to be in the range of 6~16 nm by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission has also been measured by the spectrometer with the wavelength range of 200~1,100 nm. The electron temperature and plasma density have been measured by the Boltzmann plot and Stark broadening methods, respectively, under the assumption of local thermodynamic equilibrium (LTE).

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