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Emission spectroscopic diagnostics of argon arc Plasma in Plasma focus device for advanced lithography light source  

Hong, Y.J. (Department of Electrophysics/PDP research center, Kwangwoon University)
Moon, M.W. (Department of Electrophysics/PDP research center, Kwangwoon University)
Lee, S.B. (Department of Electrophysics/PDP research center, Kwangwoon University)
Oh, P.Y. (Department of Electrophysics/PDP research center, Kwangwoon University)
Song, K.B. (Department of Electrophysics/PDP research center, Kwangwoon University)
Hong, B.H. (Department of Electrophysics/PDP research center, Kwangwoon University)
Seo, Y.H. (Department of Electrophysics/PDP research center, Kwangwoon University)
Yi, W.J. (Samsung SDI Central Research)
Shin, H.M. (Department of Electrophysics/PDP research center, Kwangwoon University)
Choi, E.H. (Department of Electrophysics/PDP research center, Kwangwoon University)
Publication Information
Journal of the Korean Vacuum Society / v.15, no.6, 2006 , pp. 581-586 More about this Journal
Abstract
We have generated the argon plasma in the diode chamber based on the established coaxial electrode type and investigated the emitted visible light for emission spectroscopy. We applied various voltages $2\sim3.5kV$ to the device by 0.5kV, and obtained the emission spectrum data for the focused plasma in the diode chamber on the argon pressure of 330 mTorr. The Ar I and Ar II emission line are observed. The electron temperature and ion density have been measured by the Boltzmann plot and Saha equation from assumption of local thermodynamic equilibrium (LTE) The Ar I and Ar II ion densities have been calculated to be $\sim10^{15}/cc\;and\;~10^{13}/cc$, respectively, from Saha equation.
Keywords
EUV; Lithography; Plasma focus; Emission spectroscopy; Boltzmann plot;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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