• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.9
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• pp.42-47
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• 1998

We have fabricated electron-optical lens for micro E-beam system that can overcome the limitation of current E-beam lithography. Our electron-optical lens consists of multiple silicon electrodes which were fabricated by micromachining technology and assembled by anodic bonding. The assembled system was installed in UHV chamber to observe the emission characteristics of focused electrons by the electro-optical lens. We used STM(Scanning Tunneling Microscope) tip for electron source. By performing lithography with the focused electrons with PMMA(poly-methylmethacrylate) as E-beam resist. We could draw 0.13${\mu}{\textrm}{m}$ nano-scale lines.

• Journal of the Microelectronics and Packaging Society
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• v.22 no.3
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• pp.73-77
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• 2015

This paper presents integrated polymeric spectrometer module which offers compact size, easily-fabricated structure and low cost. The proposed spectrometer module includes the nano diffraction grating with non-uniform pitch and planar optical waveguide with concave mirror to be fabricated by UV imprint lithography. To increase the reflection efficiency, we designed the nano diffraction grating with triangular profiles. The polymeric planar spectrometer includes a spectral bandwidth of 700 nm, resolution of 10 nm and precision below 5 nm. This polymeric planar spectrometer is well-suited for sensor system.

• Korean Journal of Optics and Photonics
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• v.4 no.4
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• pp.373-380
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• 1993

A five mirror system with a reduction magnification(M=+1/5) is designed for DUV optical lithography. Initially, numerical solutions of all zero 3rd order aberrations and zero 5th order spherical aberration are obtained for the spherical mirror system. Next, by the optimization method, the aspherization is carried out to the two spherical mirrors to obtain a system that has as less residual aberrations, higher NA and improved MTF as possible. We have finally obtained the system of which NA is 0.45 and the resolution is about 500 cycles/mm at the 50% MTF value criterion and the depth of focus of $1.0{\mu}m$ for the nearly incoherent illumination$({\sigma}=1.0)$ and the wavelength of 0.248 m(KrF excimer laser line).

• Journal of the Korean Society for Precision Engineering
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• v.20 no.2
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• pp.33-39
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• 2003

A new microlens fabrication technique, the excimer laser lithography is developed. This bases on the pulsed laser irradiation and the transfer of a chromium-on-quartz reticle on to the polymer surface with a proper projection optics system. An excimer laser lithography system with 1/4 and 1/20 demagnification ratios was constructed first, and the photoablation characteristics of the PMMA and Polyimide were experimentally examined using this system. For two different shapes of microlenses, a spherical lens and a cylindrical lens, fabrication techniques were investigated. One for the spherical lens is a combination of the mask pattern projection and fraction effect. The other for the cylindrical lens is a combination of the mask pattern projection and the relative movement of a specimen. The result shows that various shapes of micro optical components can be easily fabricated by the excimer laser lithography.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.19 no.6
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• pp.834-840
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• 2010

Photo lithography process is very important technology to fabricate highly integrated micro patterns with high precision for semiconductor and display industries. Up to now, mask type lithography process has been generally used for this purpose; however, it is not efficient for small quantity and/or frequently changing products. Therefore, in order to obtain higher productivity and lower manufacturing cost, the mask type lithography process should be replaced. In this study, a maskless lithography system using the DMD(Digital Micromirror Device) is developed, and the exposure condition and optical properties are analyzed and simulated for a single beam case. From the proposed experimental conditions, required exposure experiments were preformed, and the results were investigated. As a results, 10${\mu}m$ spots can be generated at optimal focal length.

• Current Optics and Photonics
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• v.5 no.1
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• pp.8-15
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• 2021

An elliptical zone plate (EZP) array is important in off-axis optical systems because it provides two advantages. First, the residual beam and the main source are not focused in the same direction and second, the light from the observation plane is not reflected back towards the beam source. However, the fill factor of the previous EZP array was about 76% which was a little low. Hence, this EZP array could not collect the maximum amount of illumination light, which affected the overall optical performance of the lens array. In this study, we propose a new EZP array design with a 97.5% fill factor used in off-axis imaging system for enhancement of brightness and contrast. Then, direct laser lithography was used to fabricate the high fill factor EZP array by moving the XY linear stage of the system in a zigzag motion. The imaging properties of the proposed EZP array were experimentally verified at the focal plane and compared with the previous model.

• Current Optics and Photonics
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• v.6 no.1
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• pp.44-50
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• 2022

An off-axis zone plate is able to focus on a single order while neglecting the zeroth order in a visible imaging system. This allows one to enhance the contrast quality in diffractive images, which is the major advantage of this type of zone plate. However, most previous reflection zone plates are used in focusing X-rays with a small grazing incident angle and are intricately designed with the use of a local grating period. In this study, we suggest the design of an off-axis elliptical zone plate (EZP) that is used to focus a monochromatic light beam with separation between the first and unfocused orders under a large grazing incident angle of 45°. An assumption using the total grating period, which depends on the average and constant grating period, is proposed to calculate the desired distance between the first and zeroth order and to simplify the construction of a novel model off-center EZP. Four diffractive optical elements (DOEs) with different parameters were subsequently fabricated by direct laser lithography and then verified using a performance evaluation system to compare the results from the assumption with the experimental results.

• Vacuum Magazine
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• v.2 no.1
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• pp.10-16
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• 2015

With the recognition of nanotechnology as one of the future strategic technologies, the R&D efforts have been performed under exclusive supports of governments and private sectors. At present, nanotechnology is at the focus of research and public attention in almost every advanced country including USA, Japan, and many others in EU. Keeping tracks of such technical trends, center for nanoscale mechatronics and manufacturing (CNMM) was established in 2002 as a part of national nanotechnology promotion policy led by ministry of science and technology (MOST) in Korea. It will hold widespread potential applications in electronics, optical electronics, biotechnology, micro systems, etc, with the promises of commercial visibility and competitiveness. In this paper, wafer scale multilayer nanoimprint lithography technology which is well-known the next generation lithography, roll-typed nanoimprint lithography (R-NIL), roll-typed liquid transfer imprint lithography (R-LTIL), the key technology for nanomanufacturing and nanoscale measurement technology will be introduced. Additionally, its applications and some achievements such as solar cell, biosensor, hard disk drive, and MOSFET, etc by means of the developed multilayer nanoimprint lithography system are introduced.

• Korean Journal of Optics and Photonics
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• v.16 no.3
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• pp.235-238
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• 2005

A Multiple electron beam lithography system with arrayed microcolumns has been developed for high throughput applications. The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. The arrayed microcolumns based on of Single Column Module (SCM) concept has been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 250 eV to 300 eV for the generation of nano patterns. Probe beam current at the sample was measured about >1 nA at a total beam current of $0.5\;{\mu}A$ and a working distance of $\~1\;mm$. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.

• Journal of the Semiconductor & Display Technology
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• v.12 no.4
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• pp.15-20
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• 2013

Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.