• 한국광학회지
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• 제8권2호
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• pp.169-173
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• 1997

가로.세로의 비가 큰 광도파로 소자 제작용 마스크 제작에는 레이저 리소그래피 장치가 기존의 리소그래피 장치에 비해 비용면 등을 고려하면 많은 장점을 가지고 있다. 레이저 리소그래피 장치를 이용 보편적인 양극형 마스크는 물론 기존의 레이저 리소그래피 장치로는 제작하기에 많은 어려움이 있는 음극형 마스크를 포토레지스트의 인위적 변화를 이용 제작할 수 있었다. 제안된 방법은 주변환경 즉 먼지, 장치의 진동 그리고 레이저 입사광 변화 등에 기존의 장치 보다 덜 민감함을 실험적으로 확인하였다. 이 방법을 이용 광도파로 소자의 기본을 이루는 S형태 곡선으로 구성된 광분배기 패턴을 제작하였으며, 제작된 패턴의 대비 및 재현성에 있어서 그 특성이 매우 우수함을 실험적으로 확인하였다.

• Advances in nano research
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• 제1권2호
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• pp.105-109
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• 2013

We report dry thermal development of negative resist polystyrene with low molecular weight. When developed on a hotplate at $350^{\circ}C$ for 30 min, polystyrene showed reasonable high contrast and resolution (30 nm half-pitch), but low sensitivity. Resist sensitivity was greatly improved at lower development temperatures, though at the cost of reduced contrast. In addition, we observed the thickness reduction due to thermal development was higher for larger remaining film thickness, implying the thermal development process is not just a surface process and the more volatile chains below the top surface may diffuse to the surface and get evaporated.

• 한국정밀공학회지
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• 제22권12호
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• pp.16-21
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• 2005

Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for the manipulation of light. The existence of a photonic bandgap, a frequency range in which the propagation of light is prevented in all directions, makes photonic crystal very useful in application where the spatial localization of light is required, for example waveguide, beam splitter, and cavity. However, the fabrication of 3 dimensional photonic crystals is still difficult process. A concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air and perforated with two dimensional lattice of hole. The fabrication of Si master with pillar structure using hot embossing process is investigated for two dimensional, low-index-contrast photonic crystal waveguide. From our research we show that the multiple stamp copy process proved to be feasible and useful.

• 반도체디스플레이기술학회지
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• 제15권3호
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• pp.35-39
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• 2016

Extreme Ultraviolet Lithography (EUVL) is the most promising technique in the field of Next Generation Lithography (NGL) expected to be used in the 1x-nm node for High Volume Manufacturing (HVM). But there exits remaining challenges for proper defect control of EUV mask. It was considered development of EUV pellicle for protecting the EUV mask has many obstacles due to high extinction coefficient of EUV wavelength. Recently researchers in the industry of semiconductor argue about the necessity of EUV pellicle and make effort to achieve it. In this paper, we investigated that the relationship between imaging performance and transmittance of EUV pellicle quantitatively. We made in-house EUV pellicle and analyzed its imaging performance of the dependence of pellicle transmittance using Coherent Scattering Microscopy(CSM). The imaging performance of EUV mask with pellicle is affected by its transmittance and we found that the performance of EUV mask improved with higher transmittance pellicle.

• Current Optics and Photonics
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• 제5권1호
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• pp.8-15
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• 2021

An elliptical zone plate (EZP) array is important in off-axis optical systems because it provides two advantages. First, the residual beam and the main source are not focused in the same direction and second, the light from the observation plane is not reflected back towards the beam source. However, the fill factor of the previous EZP array was about 76% which was a little low. Hence, this EZP array could not collect the maximum amount of illumination light, which affected the overall optical performance of the lens array. In this study, we propose a new EZP array design with a 97.5% fill factor used in off-axis imaging system for enhancement of brightness and contrast. Then, direct laser lithography was used to fabricate the high fill factor EZP array by moving the XY linear stage of the system in a zigzag motion. The imaging properties of the proposed EZP array were experimentally verified at the focal plane and compared with the previous model.

• Current Optics and Photonics
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• 제6권1호
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• pp.44-50
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• 2022

An off-axis zone plate is able to focus on a single order while neglecting the zeroth order in a visible imaging system. This allows one to enhance the contrast quality in diffractive images, which is the major advantage of this type of zone plate. However, most previous reflection zone plates are used in focusing X-rays with a small grazing incident angle and are intricately designed with the use of a local grating period. In this study, we suggest the design of an off-axis elliptical zone plate (EZP) that is used to focus a monochromatic light beam with separation between the first and unfocused orders under a large grazing incident angle of 45°. An assumption using the total grating period, which depends on the average and constant grating period, is proposed to calculate the desired distance between the first and zeroth order and to simplify the construction of a novel model off-center EZP. Four diffractive optical elements (DOEs) with different parameters were subsequently fabricated by direct laser lithography and then verified using a performance evaluation system to compare the results from the assumption with the experimental results.

• Journal of the Optical Society of Korea
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• 제11권1호
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• pp.40-43
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• 2007

We propose a taper-underlaid spot-size converter (TU-SSC) with an offset which consists of two vertically stacked taper layers. The designed TU-SSC reduces coupling loss of a high index-contrast waveguide with $1.5%{\Delta}$ to a single mode fiber from 1.5 dB to 0.27 dB. We also considered the effects of mask misalignment in the fabrication process of TU-SSC, and optimized the design of TU-SSC so that the additional loss of TU-SSC for the mask misalignment of $3{\mu}m$ in the photo-lithography process was as low as 0.13 dB.

• Advances in nano research
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• 제13권2호
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• pp.199-206
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• 2022

We present the high-brightness large-area 10.1" in-cell polarizer display panel integrated with a wire grid polarizer (WGP) and metal reflector, from the initial design to final system development in a commercially feasible level. We have modeled and developed the WGP architecture integrated with the metal reflector in a single in-cell layer, to achieve excellent polarization efficiency as well as brightness enhancement through the light recycling effect. After the optimization of key experimental parameters via Taguchi method, the roll nanoimprint lithography employing a flexible large-area tiled mold has been utilized to create the 90 nm-pitch polymer resist pattern with the 54.1 nm linewidth and 5.1 nm residual layer thickness. The 90 nm-pitch Al gratings with the 51.4 nm linewidth and 2150 Å height have been successfully fabricated after subsequent etch process, providing the in-cell WGPs with high optical performance in the entire visible light regime. Finally we have integrated the WGP in a commercial 10.1" display device and demonstrated its actual operation, exhibiting 1.24 times enhancement of brightness compared to a conventional film polarizer-based one, with the contrast ratio of 1,004:1. Polarization efficiency and transmittance of the developed WGPs in an in-cell polarizer panel achieve 99.995 % and 42.3 %, respectively.

• 한국레이저가공학회지
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• 제13권4호
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• pp.7-13
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• 2010

Today, the most common process for generating Through Silicon Vias (TSVs) for 3D ICs is Deep Reactive Ion Etching (DRIE), which allows for high aspect ratio blind holes with low surface roughness. However, the DRIE process requires a vacuum environment and the use of expensive masks. The advantage of using lasers for TSV drilling is the higher flexibility they allow during manufacturing, because neither vacuum nor lithography or masks arc required and because lasers can be applied even to metal and to dielectric layers other than silicon. However, conventional nanosecond lasers have the disadvantage of causing heat affection around the target area. By contrast, the use of a picosecond laser enables the precise generation of TSVs with less heat affected zone. In this study, we conducted a comparison of thermalization effects around laser-drilled holes when using a picosecond laser set for a high pulse energy range and a low pulse energy range. Notably, the low pulse energy picosecond laser process reduced the experimentally recast layer, surface debris and melts around the hole better than the high pulse energy process.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.228-228
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• 2006

Conjugated oligomers, used as models for fluorene-thiophene copolymers, are compared in terms of the microscopic morphology of thin deposits and the optical properties. The AFM images and the solid-state absorption and emission spectra are interpreted in line with the structural data, in terms of the assembly of the conjugated molecules. The compound with a terthiophene central unit and fluorene end-groups shows well-defined monolayer-by-monolayer assembly into micrometer-long strip-like structures, with a crystalline herringbone-type organization within the monolayers. Polarized confocal microscopy indicates a strong orientation of the crystalline domains within the stripes. In contrast, the compound with a terfluorene central unit and thiophene end groups forms no textured aggregates. The difference in behavior between the two compounds most probably originates from their different capability of forming densely-packed assemblies of ${\pi-pi}$ interacting molecules. These assemblies are used as active elements in organic field effect transistors designed by using soft lithography technique.