• Journal of the Optical Society of Korea
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• v.16 no.2
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• pp.127-132
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• 2012

This study discusses photoresist forming using a composite grayscale to fabricate a Fresnel lens. Grayscale lithography is a common production method used to facilitate the forming of lenses with different curvatures and depths. However, this approach is time consuming and expensive. This study proposes a method for overcoming these obstacles by integrating a digital micromirror device and microscope to supplant the traditional physical grayscale mask. This approach provides a simple and practical maskless optical lithography system. According to the results, the two adjacent grayscales displayed substantial differences between the high grayscale and influence the low grayscale that ultimately affected photoresist formation. Furthermore, we show that change of up to 150% in the slope can be achieved by changing the grayscale gradient in the central zone and the ring profile. The results of the optical experiment show a focus change with different gray gradients.

• Journal of the Semiconductor & Display Technology
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• v.15 no.3
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• pp.1-5
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• 2016

In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.6
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• pp.138-145
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• 2007

Among various rapid prototyping processes, stereo-lithography process which can manufacture transparent prototype is known to be the greatest in the form & dimensional accuracy and surface roughness. In this paper, bench mark tests of 4 stereo-lithography-type rapid prototyping apparatus were carried out using transparent materials. The test includes measurement of mechanical properties, form accuracy, building speed and manufacturing cost. It was observed that ViperPRO of 3D systems is advantageous in the mechanical properties and building speed, RM600011 of CMET in sub-milli scale form accuracy and manufacturing cost, and relatively economical Eden500V of Objet is great in tensile strength at room temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.162-163
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• 2007

In this paper, we fabrication of 2-D photonic crytal using holographic lithography. We used Ag doped chalcogenide AsGeSeS film and He-Ne (632.8nm) (P:P) Polarized laser beam. The thickness of Ag thin film was varied from 60nm and the thickness of chalcogenide thin film was varied from 2um. Frist, holographic lithography with 1-D photonic crystal on Ag/AsGeSeS film. And than revolved the sample $90^{\circ}$ to fabricate 2-D photonic crystal with holographic lithography.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.64-65
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• 2003

Stereo-lithography using the two photon absorption(TPA) makes micro structures with great resolution. The technique is applied to correcting photomask, 3-D photonic crystal, 3-D optical storage, 3-D lithography and so on. In contrast to a conventional stereo-lithography with single-photon absorption which has a size problem caused by the geometrical diffraction limit, the stereo-lithography with TPA has no size limit. (omitted)

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.2
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• pp.188-194
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• 2024

This paper introduces an optimized oxygen (O₂) plasma surface treatment technique to enhance sphere lithography on hydrophobic photoresist surfaces. The focus is on semiconductor manufacturing, particularly the creation of finer structures beyond the capabilities of traditional photolithography. The key breakthrough is a method that makes substrate surfaces hydrophilic without altering photoresist patterns. This is achieved by meticulously controlling the O₂ plasma treatment duration. The result is the consistent formation of nano and microscale patterns across large areas. From an academic perspective, the study deepens our understanding of surface treatments in pattern formation. Industrially, it heralds significant progress in semiconductor and precision manufacturing sectors, promising enhanced capabilities and efficiency.

• Proceedings of the Materials Research Society of Korea Conference
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• 2008.11a
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• pp.18.1-18.1
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• 2008

• Proceedings of the KSME Conference
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• 2005.11a
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• pp.233.2-233.2
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• 2005

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.339-340
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.93-94
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• 2012