Proceedings of the Optical Society of Korea Conference (한국광학회:학술대회논문집)
- 2003.07a
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- Pages.64-65
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- 2003
Three-Dimensional Microfabrication with Nano Resolution Using Two-Photon Absorption of Femto-Second Laser
극초단 펄스 레이저의 이광자흡수를 이용한 나노분해능의 3차원 마이크로 구조 제작
- Yi, Shin-Wook (Dept. Physics, KAIST) ;
- Lee, Seong-Ku (Dept. Physics, KAIS) ;
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Kong, Hong-Jin
(Dept. Physics, KAIS)
;
- Park, Sang-Hu (Dept. Mechanical Engineering, KAIS) ;
- Jeong, Chang-Gyun (Dept. Mechanical Engineering, KAIS) ;
- Taewoo Lim (Dept. Mechanical Engineering, KAIS) ;
- Yang, Dong-Yol (Dept. Mechanical Engineering, KAIST)
- Published : 2003.07.01
Abstract
Stereo-lithography using the two photon absorption(TPA) makes micro structures with great resolution. The technique is applied to correcting photomask, 3-D photonic crystal, 3-D optical storage, 3-D lithography and so on. In contrast to a conventional stereo-lithography with single-photon absorption which has a size problem caused by the geometrical diffraction limit, the stereo-lithography with TPA has no size limit. (omitted)
Keywords