• Korean Journal of Psychosomatic Medicine
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• v.32 no.1
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• pp.10-23
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• 2024

This study examines the changes in attractiveness and social perception of mask wearers during the COVID-19 pandemic. Before COVID-19, masks were seen as a sign of infection, decreasing the wearer's attractiveness. However, with the widespread normalization of mask-wearing during the pandemic, the perception mechanisms have become more complex. The attractiveness and social perception of mask wearers now vary based on factors such as the wearer's baseline attractiveness, race, and attitudes toward masks. Consequently, research findings on perception changes due to mask-wearing have been inconsistent. This inconsistency is due to the lack of standardized experimental methods and the failure to account for individual differences among participants, as well as insufficient theoretical background in the studies. From a psychiatric perspective, it is essential to formulate and test new hypotheses centered around the psychological mechanisms related to the human behavioral immune system when studying attractiveness perception during a pandemic. Notably, attention should be given to how differences in the activation of individuals' behavioral immune systems influence perceptions of mask wearers. Understanding these dynamics can provide crucial insights into how social perceptions and aversions impact mental health, thereby shedding light on various psychiatric issues that arise during infectious disease outbreaks.

• Korean Journal of Materials Research
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• v.8 no.9
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• pp.871-875
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• 1998

High aspect ratio microstructures were fabricated by photolithography. The material for the microstructure was photosensitive glass which has good mechanical and electrical insulation properties. The photosensitive glass was exposed to ultraviolet light at 312nm through a chromium mask in which the structures are drawn. After heat treatment process over $500^{\circ}C$, the photosensitive glass was etched in a 10% hydrofluoric acid solution with ultrasonic conditions. Final dimension of the micro-framework was greatly dependent on the thickness of photosensitive glass, mask pattern, ultraviolet light exposure and etching conditions. The maximum aspect ratio of the micro-framework obtained from this work was over 30.

• Microbiology and Biotechnology Letters
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• v.50 no.1
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• pp.95-101
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• 2022

Due to the pandemic caused by COVID-19, the demand for face masks is soaring and has often caused a shortage. The aim of this study was to evaluate the effect of ultraviolet (UV) and drying treatments on microbial contaminants in facial masks. To conduct this study, standard procedures were designed to develop samples contaminated by the control bacteria Escherichia coli, Staphylococcus aureus, and Pseudomonas aeruginosa. The contamination level of the standard samples was approximately 6.30 × 10⁶ CFU/ml, and the UV light treatment was performed 1, 3, 5, and 7 times. To evaluate the effect of the UV and drying treatments, the masks were first treated with UV 1, 2, and 3 times, followed by the drying process. As a result, the mask contaminated with E. coli and P. aeruginosa showed a bacterial rate of approximately 99.9% after 1 UV irradiation, and in the case of the S. aureus-contaminated mask, it exhibited a bactericidal rate of approximately 99.9% after 7 UV irradiations. However, when the drying process was included after UV irradiation, all the samples contaminated with E. coli, S. aureus, and P. aeruginosa showed a bactericidal rate of 99.9% or more. The results of this study suggest that UV and drying treatments can effectively reduce the bacterial contaminants in facial masks. In addition, these results provide fundamental data and appropriate sterilization methods for reusing masks.

• Current Photovoltaic Research
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• v.5 no.3
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• pp.75-82
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• 2017

High efficiency thin film solar cells require an absorber layer with high absorption and low defect, a transparent conductive oxide (TCO) film with high transmittance of over 80% and a high conductivity. Furthermore, light can be captured through the glass substrate and sent to the light absorbing layer to improve the efficiency. In this paper, morphology formation on the surface of glass substrate was investigated by using HF, mainly classified as random etching and periodic etching. We discussed about the etch mechanism, etch rate and hard mask materials, and periodic light trapping structure.

• Proceedings of the Korean Institute of Building Construction Conference
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• 2018.11a
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• pp.16-17
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• 2018

A few years ago, the rapid degradation of domestic air quality has led to the efforts of exhaust gas policy and fine dust mask, but it is not a fundamental measure. In Korea, photocatalyst will be applied to residential and multi-use facilites to purify indoor and outdoor air. Also, in this study, it is tried to produce exposed concrete that is aesthetically pleasing as well as air purification of indoor by combining with light transparent concrete according to the increasing interest in human indoor living environment. For this purpose, we have developed a block formwork for photocatalysis light transparent concrete and established a suitable manufacturing method for on-site construction.

• KSII Transactions on Internet and Information Systems (TIIS)
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• v.15 no.2
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• pp.786-799
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• 2021

Road damage detection is important for road maintenance. With the development of deep learning, more and more road damage detection methods have been proposed, such as Fast R-CNN, Faster R-CNN, Mask R-CNN and RetinaNet. However, because shallow and deep layers cannot be extracted at the same time, the existing methods do not perform well in detecting objects with fewer samples. In addition, these methods cannot obtain a highly accurate detecting bounding box. This paper presents a Multi-level Feature Pyramids method based on M2det. Because the feature layer has multi-scale and multi-level architecture, the feature layer containing more information and obvious features can be extracted. Moreover, an attention mechanism is used to improve the accuracy of local boundary boxes in the dataset. Experimental results show that the proposed method is better than the current state-of-the-art methods.

• JSTS:Journal of Semiconductor Technology and Science
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• v.15 no.4
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• pp.454-461
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• 2015

Light enhancement of GaN based light emitting diodes (LEDs) have been investigated by texturing the top p-GaN surface. Nano-textured LEDs have been fabricated using self-assembled Ni nano mask during dry etching process. Experimental results were further compared with simulation data. Three types of LEDs were fabricated: Conventional (planar LED), Surface nano-porous (porous LED) and Surface nano-cluster (cluster LED). Compared to planar LED there were about 100% and 54% enhancement of light output power for porous and cluster LED respectively at an injection current of 20 mA. Moreover, simulation result showed consistency with experimental result. The increased probability of light scattering at the nano-textured GaN-air interface is the major reason for increasing the light extraction efficiency.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.14 no.10
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• pp.4685-4693
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• 2013

Present work deals with a shape optimal design to minimize the weight of the mask-frame used in the process of OLED vapor deposition by the fine metal mask. A design concept for an optimal shape of the frame to increase the stiffness and to reduce the weight is derived using the topology optimization, shape design variables of the frame by adopting slots being defined. An optimal shape is determined by solving the shape optimization problem to minimize the weight of the frame under constraints of the maximum displacement. Weight of the optimal design is 117.6 kg, which is reduced by 138.4 kg(54.1%) of that of the first design, 256 kg.

• Journal of IKEEE
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• v.17 no.3
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• pp.221-228
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• 2013

About functional parameters of a LED/UVLED (Light Emitting Diode/Ultra Violet LED), one of the most important parameters is the I-V characteristic. By researching factors affect to the I-V characteristic of uvled, we found that beside of the structure of the device itself, there is the influence of the electrode materials, electrode shapes, the process of wiring and packaging. In this work, we want to improve the performance of UVLED to find out the optimal mask design principles. The study is based on theoretical mathematical models, as well as the use of simulation software tool Comsol. From all results obtained, the team has improved mask design to manufacture electrodes for GaN-based UVLED. Electrode masks are designed by three softwares, which are Intellisuite, Klayout and AutoCad. Intellisuite masks would be used in fabrication simulation while Klayout and AutoCad are used to fabricate electrodes in experiments. As well as, we silmulated the structure of an uvled 355nm emission wavelength by TCAD software, in order to compare with uvled sample that has the same emission wavelength.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.136-136
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• 1999

박막의 탄성특성을 평가하는 방법으로 nano-indentation, Brillouin light scattering measurement, ultrasonic surface wave measurement, bulge test, vibration membrane method 등 여러 가지가 제시되어 왔다. 최근에는 탄성특성을 평가할 수 있는 간단한 방법으로 기판 식각 기법을 이용한 freehang, bridge 방법이 제시되었다. 이중에서 bridge 방법은 간단한 식각 기법을 이용하여 얇은 박막에서도 탄성 특성을 평가할 수 있는 방법으로 제시되었다. 그러나 식각 과정에서 발생하는 patch 부분의 under-cut으로 인해 정확한 bridge의 길이를 측정할 수 없게 되어 오차가 발생하고 있다. 본 연구에서는 bridge 방법에서 발생하는 오차를 줄이기 위한 방법으로, patch 부분에 etch-stop을 제작해 줌으로서 식각 과정에서 발생하는 under-cut을 효과적으로 제거시켰다. Etch-stop은 2장의 mask를 align key를 이용하여 제작하였다. 먼저 산화막이 형성되어 있는 Si 기판위에 mask 1을 이용하여 patch 부분을 lithography 작업하고, 습식 식각 공정을 한 뒤 DLC 필름을 증착시킨다. 다음으로 mask 2를 이용하여 bridge pattern을 제작하고, DLC 필름을 증착시킨 후 lift-off 기술과 산화막 등방식각 공정을 통해 bridge를 제작하였다. 이렇게 제작된 bridge를 통해 필름이 기판에 부착되기 위해 필요한 변형률을 측정하고, 독립적으로 측정된 필름의 잔류응력과 함께 박막의 응력-변형률 관계식에 적용시켜 biaxial elastic modulus, E/(1-v)를 구할 수 있었다. Sidl 첨가된 DLC 필름은 rf-PACVD 장비를 이용하여 증착하였다. 이때 전극과 플라즈마 사이의 바이어스 음전압은 -400V로 합성압력은 10mTorr로 고정하였다. 사용한 반응가스는 벤젠(C6H6)과 희석된 실렌(SiH4:2H=10:90)이며, 희석된 실렌의 첨가량을 조절하여 필름 내에 함유된 Si의 양을 조절하였다. 각각의 조건에서 증착시간을 조절하여 필름의 두께를 조절하였다. 필름의 잔류응력은 압축잔류 응력에 의해 발생한 필름/기판 복합체의 곡률을 laser 반사법을 이용하여 측정하고, 이 결과를 Brenner 등에 의해 유도된 식을 대입하여 계산하였다.