• Title/Summary/Keyword: Light absorber

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A Study on the UV-cut Properties of Cotton Fabrics Treated with UV-absorber (자외선 흡수제 처리 면직물의 소비성능 개선(제1보) - 자외선 차단성능에 관한 연구 -)

  • 강미정;권영아
    • Journal of the Korean Society of Clothing and Textiles
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    • v.25 no.5
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    • pp.925-932
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    • 2001
  • The influence of ultraviolet(UV)-ray in sun light on human skin has been noted. Textiles can provide protection against harmful UV-radiation. Normally UV-absorbing finishes are used to get better protection. The purpose of this study is to evaluate the UV-cut properties of cotton fabrics treated with UV-absorber. 2,2-dihydroxy-4,4-dimethoxbenzophenone, as UV-absorber was applied to 100% cotton fabric. Reagents added in finishing solution were Triton X-100, polyethylene glycol 400, and $MgCl_2{\cdot}6H_2O$, and C.I. Direct Red 81. Both untreated and treated cotton fabrics were exposed to a xenon arc lamp for 20 and 80 hours. UV absorption spectra of finishing solutions and UV transmission spectra of fabrics were measured by the UV/VIS spectrophotometer. The results of this study can be summarized as follows. The results of this study can be summarized as follows. Absorption and the related transmission spectra were modified in a controlled way with UV-absorber. Absorption effect of UV-absorber was improved by adding Triton X-100, PEG 400, and $MgCl_2{\cdot}6H_2O$ in finishing solution. The UV absorption of finishing solution was in the following order: U/D/T/P/M>D/T/P/M> D/T> D/P, D>U/T/P/M>U/T>T/P/M>T. The UV transmittance of cotton fabrics was remarkably decreased by the application of UV-absorber and additives. The UV-cut properties were most improved by the application of U/D/T/P/M.

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Effective Light Management of Three-Dimensionally Patterned Transparent Conductive Oxide Layers

  • Kim, Joon-Dong;Kim, Min-Geon;Kim, Hyun-Yub;Yi, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.85-85
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    • 2012
  • For effective light harvesting, a design weighting should be implemented in a front geometry, in which the incident light transmits from a surface into a light-active layer. We designed a three-dimensionally patterned transparent conductor layer for effective light management. A transparent conductive oxide (TCO) film was formed as three-dimensional structures. This efficiently drives the incident light at the front surface into a Si absorber to yield a reduction in reflection and an enhancement of current. This indicates that an optimum architecture for a front TCO surface will provide an effective way for light management in solar cells.

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Improving Light Stability of Natural Rubber Latex Foam

  • Shim, Chang Su;Oh, Jeong Seok;Hong, Chang Kook
    • Elastomers and Composites
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    • v.50 no.2
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    • pp.81-86
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    • 2015
  • In this study, natural rubber latex foam was prepared in order to replace commercialized polyurethane foams as a car seat material. Physical properties of the latex foam were investigated and the light stability was improved. The latex foam was mixed in an aqueous solution state, and the degree of foaming and the accelerator ratios were appropriately controlled. Tensile properties, hysteresis and dynamic mechanical properties of the latex foam were measured to compare with those of polyurethane foams. UV light absorbers and radical scavengers were added for improving light stability of the latex foam. Xenon lamp test was conducted to investigate the effects of the reagents on light stability. Our results revealed that the prepared latex foam including a light absorber with an antioxidant showed excellent light stable performances.

Polymer Eyeglass Lens with Ultraviolet & High-Energy Visible Light Blocking Function for Eye Health (자외선 및 고에너지 가시광 차단 기능을 갖는 눈 건강을 위한 폴리머 안경렌즈)

  • Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.21 no.12
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    • pp.10-15
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    • 2020
  • Ultraviolet rays, which have wavelengths smaller than 400 nm, are very harmful to the eyes. Recently, high-energy visible light was also revealed to be harmful to retinal cells. Therefore, polymer eyeglass lenses that can block UV and high-energy visible light are needed for eye health. In this study, high-refractive-index polymer eyeglass lens, n=1.67, were manufactured using the injection-mold method with the m-xylene diisocyanate monomer, 2,3-bis((2-mercaptoethyl)thio)-1-propanethiol monomer, benzotriazole UV absorber, release of alkyl phosphoric ester, dye mixture of CI solvent violet 13, and catalyst of dibutyltin dichloride mixture. A multi-layer anti-reflection coating was applied to manufactured polymer eyeglass lenses for both sides using an E-beam evaporation system. The optical properties of the manufactured lenses with the UV and high-energy visible light-blocking function were analyzed by UV-visible spectrophotometry. As a result, the polymer eyeglass lens with a UV absorber of 0.5 wt. % blocked 99% of UV and high-energy visible light shorter than 411 nm. The average transmittance of the polymer eyeglass lens with a UV absorber of 0.5wt.% was 97.9% in the range of 460 ~ 660 nm for photopic eye sensitivity higher than 10%. Therefore, clear image acquisition in photopic vision is possible.

A Study on Monte Carlo Simulation by beam scattering in Resin of New Austria Tunnel Method for Safety of Industrial Disaster (산업재해 방지를 위한 New Austria Tunnel Method 수지에서 빔산란에 의한 Monte Carlo 시뮬레이션에 관한 연구)

  • Nam, Sang-Sung;Lee, Joo-Youb
    • Journal of the Korean Applied Science and Technology
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    • v.30 no.3
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    • pp.444-450
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    • 2013
  • The influences of scatterer and absorber in turbid material by light scattering on silica fume of additive were interpreted for the scattered intensity and wavelength. The molecular properties have been studied by Monte Carlo simulation in resin of New Austria Tunnel Method. It has been found that the effects of optical properties in scattering media could be investigated by the optical parameters(${\mu}_s$, ${\mu}_a$,${\mu}_t$). Monte Carlo Simulation method for modelling of light transport in the civil engineering and construction field was applied. The results using a phantom were discussed that the distance from source to detector is closer, and scattering intensity is stronger with those obtained through Monte Carlo Simulation. It may also aid in designing the best model for coatings and corrosion for the durability of metal constructions.

Vector Passive Harmonic Mode-locking Fiber Laser Based on Topological Insulator Bi2Se3 Interacting with Fiber Taper

  • Li, Jian Ping
    • Journal of the Optical Society of Korea
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    • v.20 no.1
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    • pp.135-139
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    • 2016
  • I propose a vector passive harmonic mode-locked fiber laser based on topological insulator Bi2Se3 interacting with a fiber taper with a diameter of 7 μm. The particles of topological insulator are deposited uniformly onto the fiber taper with light pressure effect. By incorporating the fabricated saturable absorber into an Er-doped fiber laser cavity, stable mode-locked fiber is obtained. Due to the intense evanescent field of the fiber taper, strong confinement of light enhances the nonlinearity of the laser cavity, and passive harmonic mode-locking is performed. I observe a maximum harmonic mode-locking of 356th, corresponding to a frequency of 3.57 GHz. The pulse duration is 824 fs, and the full width at half maximum of the spectrum is about 8.2 nm. The polarization dependent loss of the saturable absorber is ~ 2.5 dB in the wavelength range of the C band. As the cavity contains no other polarization dependent device, the mode-locked laser is functioning in the vector state. The harmonic order vs pump power is investigated. To the best of our knowledge, this report is the highest frequency mode-locked fiber laser based on Bi2Se3. Experimental results indicate that the topological insulator Bi2Se3 functioning with a thin fiber taper is effective for vector harmonic mode-locking.

Refilled mask structure for Minimizing Shadowing Effect on EUV Lithography

  • Ahn, Jin-Ho;Shin, Hyun-Duck;Jeong, Chang-Young
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.4
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    • pp.13-18
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    • 2010
  • Extreme ultraviolet (EUV) lithography using 13.5 nm wavelengths is expected to be adopted as a mass production technology for 32 nm half pitch and below. One of the new issues introduced by EUV lithography is the shadowing effect. Mask shadowing is a unique phenomenon caused by using mirror-based mask with an oblique incident angle of light. This results in a horizontal-vertical (H-V) biasing effect and ellipticity in the contact hole pattern. To minimize the shadowing effect, a refilled mask is an available option. The concept of refilled mask structure can be implemented by partial etching into the multilayer and then refilling the trench with an absorber material. The simulations were carried out to confirm the possibility of application of refilled mask in 32 nm line-and-space pattern under the condition of preproduction tool. The effect of sidewall angle in refilled mask is evaluated on image contrast and critical dimension (CD) on the wafer. We also simulated the effect of refilled absorber thickness on aerial image, H-V CD bias, and overlapping process window. Finally, we concluded that the refilled absorber thickness for minimizing shadowing effect should be thinner than etched depth.

Nanodome-patterned Transparent Conductor for Highly Responsive Photoelectric Device

  • Hong, Seung-Hyeok;Yun, Ju-Hyeong;Park, Hyeong-Ho;Gang, Gil-Mo;Seo, Cheol-Won;Kim, Jun-Dong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.458.1-458.1
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    • 2014
  • An effective light-managing structure has been achieved by using a nano-imprint method. A transparent conductor of indium-tin-oxide (ITO) was periodically nanodome-shaped to have a height of 200 nm with a diameter of 340 nm on a p-type Si substrate. This spontaneously formed a heterojunction between the ITO layer and Si substrate and effectively reduced the light-reflection. The ITO nanodome device response was significantly enhanced to 6010 from the value of 72.9 of a planar ITO film. The transparent conducting ITO nanodome structure efficiently manipulates the incident light driving into the light-absorber and can be applied in various photoelectric applications.

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A Review of Wet Chemical Etching of Glasses in Hydrofluoric Acid based Solution for Thin Film Silicon Solar Cell Application

  • Park, Hyeongsik;Cho, Jae Hyun;Jung, Jun Hee;Duy, Pham Phong;Le, Anh Huy Tuan;Yi, Junsin
    • Current Photovoltaic Research
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    • v.5 no.3
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    • pp.75-82
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    • 2017
  • High efficiency thin film solar cells require an absorber layer with high absorption and low defect, a transparent conductive oxide (TCO) film with high transmittance of over 80% and a high conductivity. Furthermore, light can be captured through the glass substrate and sent to the light absorbing layer to improve the efficiency. In this paper, morphology formation on the surface of glass substrate was investigated by using HF, mainly classified as random etching and periodic etching. We discussed about the etch mechanism, etch rate and hard mask materials, and periodic light trapping structure.