• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.11
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• pp.91-99
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• 1998

A 5Gbps LiNbO$_3$ optical phase modulator was designed, packaged and it's properties were characterized for optical communications. The APE(annealed proton exchange) method was employed for the optical waveguide and the electrode of ACPS (asymmetric coplanar strip) type was formed by electro-plating on LiNbO$_3$ for applying microwave signal with a dimension of width 18${\mu}{\textrm}{m}$, gap 9${\mu}{\textrm}{m}$ and length 50mm. The fabricated single-moded modulator operated at a 1550nm wavelength exhibits its modulation bandwidth, insertion loss and driving voltage of 7㎓, 3.0dB and 6V, respectively.

• Korean Journal of Materials Research
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• v.2 no.1
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• pp.52-57
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• 1992

The macro defects of $LiNbO_3$ crystals grown by the Czochralski method were strongly influenced by the single crystal growth parameters such as growth rate, thermal gradient and crystal rotation rate. The optimum growth conditions of a $LiNbO_3$ single crystal with 1" in diameter were $70~100^{circ}C/cm$ temperature gradient, 5~10 mm/hr growth rate and 40 rpm crystal rotation rate. In these conditions, we could grow crystals which had no cellular structure with easy diameter control, and any crack was not formed after the crystal was cooled.oled.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.138-138
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• 2003

광대역 LiNbO$_3$ 광변조기의 초고속 광 변조 구현을 위해서는 RF/ optical 속도 정합 및 임피던스 매칭 조건 하에서 낮은 구동전압을 얻을 수 있는 ridge 구조의 제작이 필수적이며 이런 구조 제작하기 위해서는 식각 속도와 식각면 거칠기 식각 profile 및 식각 과정에서의 반응물의 감소 등과 같은 개선을 위한 연구가 필요하다. 본 연구에서는 LiNbO$_3$ 기판 위에 메탈 마스크를 형성한 후 비등방성 (anisotropic) 건식 식각 방법인 NLD (Neutral Loop Discharge)로 플라즈마 식각을 하였다. NLD plasma 식각은 1Pa 이하의 압력에서 낮은 전자 온도를 갖는 고밀도 플라즈마를 생성하고 이온 플라즈마를 형성하여 LiNbO$_3$ 표면의 원자와 분자를 이온충돌효과를 이용하여 물리적인 식각과 discharge로 형성된 레디칼 (radical)과의 상호작용에 의한 화학적 식각 메커니즘에 의한 방법으로 plasma에 의한 시편의 손상이 적으며 식각 속도가 또한 높은 것이 특징이다. 본 논문에서는 안테나 파워와 가스의 유량에 따른 LiNbO$_3$ 식각 profile 특성에 관하여 연구 하고자 한다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.12
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• pp.1283-1288
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• 2004

Metal-ferroelectric-insulator-semiconductor(WFIS) capacitors using rapid thermal annealed LiNbO$_3$/AlN/Si(100) structure were fabricated and demonstrated nonvolatile memory operations. The capacitors on highly doped Si wafer showed hysteresis behavior like a butterfly shape due to the ferroelectric nature of the LiNbO$_3$ films. The typical dielectric constant value of LiNbO$_3$ film in the MFIS device was about 27, The gate leakage current density of the MFIS capacitor was 10$^{-9}$ A/cm$^2$ order at the electric field of 500 kV/cm. The typical measured remnant polarization(2P$_{r}$) and coercive filed(Ec) values were about 1.2 $\mu$C/cm$^2$ and 120 kV/cm, respectively The ferroelectric capacitors showed no polarization degradation up to 10$^{11}$ switching cycles when subjected to symmetric bipolar voltage pulses of 1 MHz. The switching charges degraded only by 10 % of their initial values after 4 days at room temperature.e.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.06a
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• pp.235-238
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• 1998

Ferroelectric $LiNbO_3$ thin films were grown directly on Si(100) substrates by 13.55MHz RF magnetron sputtering system using a ceramic target ($Nb_2O_5/Li_2C0_3$ = 51.4/48.6). Because high temperature process have to avoided to prevent degradation of the interface (insulator/Si), $LiNbO_3$ thin films were deposited below $300^{\circ}C$. After as-deposited films were performed RTA treatments in an oxygen ambient at $600^{\circ}C$ for 60s, electrical measurements performed films before and after anneal treatment. In high field region, the leakage current density of the films after annealing was deceased about 4order and the resistivity of these was increased to about 5\times 10^{11} \Omega \cdot cm$ at 500kV/cm. In accumulation region of C-V curve, we calculated dielectric constant of thin film $LiNbO_3$ as 27.9 which is close to that of bulk value.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.139-142
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• 2003

Microwave dielectric properties of $Ca(Li_{1/4}Nb_{3/4})O_3-CaTiO_3$ ceramic systems were investigated with calcination temperatures and amounts of $CaTiO_3$ in the range of 0.2 to 0.4mol. $Ca(Li_{1/4}Nb_{3/4})O_3$ ceramics having orthorhombic crystal structure could be synthesized at $750^{\circ}C$ and sintered well at $1250^{\circ}C$. They showed the dielectric constant of 26, quality factor($Q{\times}f_o$) of 13,000 and temperature coefficient of resonant frequency(${\tau}_f$) of $-49{\pm}2ppm/^{\circ}C$ With adding the $CaTiO_3$ amount the dielectric constant and ${\tau}_f$ increased due to the solute of $CaTiO_3$ but the quality factor decreased. The 0.7$Ca(Li_{1/4}Nb_{3/4})O_3-0.3CaTiO_3$ ceramic showed the dielectric constant of 44, quality factor($Q{\times}f_o$) of 12,000 and ${\tau}_f$ of $-9{\pm}1ppm/^{\circ}C$.

• Journal of the Korean Ceramic Society
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• v.40 no.8
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• pp.746-750
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• 2003

Using the Czochralski method, Er$_2$O$_3$ doped near stoichiometric LiNbO$_3$ single crystals were grown 15~20 mm in diameter and 30-35 mm in length for Z-axis. Lattice constants were inspected by the X-Ray Diffractometer (XRD) and through Fourier Transform-Infrared Spectrophotometer (FT-IR), it observed absorption band. Also, the distributions of Er concentration were confirmed by the Electron Probe Micro Analysis (EPMA).

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.6 no.3
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• pp.368-376
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• 1996

$LiNbO_{3}$ single crystals (undoped, 5 mol% MgO-doped and 5 mol% ZnO-doped) were grown by the floating zone method which has the characteristics of a compositional homogeneity and uniform distribution of the dopants. The optimum growth condition was established experimentally and the defect structures such as domain structure, dislocation structure, slip band, and microtwins were characterized using a microscopic method.

• Korean Journal of Optics and Photonics
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• v.17 no.5
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• pp.430-436
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• 2006

Polarization-independent $Ti:LiNbO_3\;2{\times}2$ optical add/drop multiplexer for the 1550nm wavelength region is fabricated. The device consists of two input waveguides, two polarization beam splitters. two polarization conversion/electrooptic tuning waveguide sections, and two output waveguides. The single mode channel waveguides for both TE and TM polarizations are fabricated on a x-cut $Ti:LiNbO_3$substrate by Ti diffusion. Spectral section is based on phase-matched polarization conversion due to shear strain induced by a thick $SiO_2$ grating overlay film. An applied voltage tunes the device by changing the waveguide birefringence, hence the optical wavelength at which most efficient polarization conversion occurs. Tuning rate of 0.094nm/V with a maximum range of 17nm has been obtained. The nearest side-lobe is about 8.2dB. The FWHM is 3.72nm.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.3
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• pp.267-272
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• 1999

Micro-defects in the undoped and MgO-doped $LiNbO_3$ single crystals, which were grown from a congruent melting composition (48.6 mol% $Li_2$O) by the CZ (Czochralski) method, were analyzed using microscopic techniques such as optical microscopy (OM), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Effects of the dopant and g value (the fraction solidfied) on the domain structure and micro-defect were investigated to build a corelationship with a growth condition of crystal. It was observed that the micro-defect concentrated near the domain wall is caused by high stress. Especially, the micro-defect was observed to be biased toward a certain side of the domain wall.