• 한국결정성장학회지
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• 제12권1호
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• pp.27-30
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• 2002

Liquid phase epitaxy(LPE)법을 이용하여 ZnO co-doped Er:$LiNbO_3$, 단결정 박막을 $LiNbO_3$ (001) 기판 위에 성장시켰다. ZnO co-doped Er:$LiNbO_3$박막 성장의 초기 융액은 첨가제 $Er_2O_3$ 농도를 1 mol%로 고정시키고 ZnO 농도를 3,5 mol%로 조절하였다. ZnO co-doped Er :$LiNbO_3$박막의 결정성은 $LiNbO_3$ 기판보다 더 우수하였다. ZnO 5mol% 첨가한 경우 박막의 표면에는 수직한 방향과 평행한 방향으로 모두 압축응력이 작용하고 있었다. 또한 ZnO 3mol% 첨가된 Er :$LiNbO_3$박막의 표면은 원래의 $LiNbO_3$기판보다 더 평탄하였다

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.209-209
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• 2009

Fabrication of p-type ZnO has already proven difficult and usually inconsistent despite numerous worldwide efforts. Many research groups studied electrical and optical properties P, Li, As, N single doped ZnO thin film. In P-doped ZnO thin film, the reproducibility of p-type conduction with $P_2O_5$ as a dopant source was shown to be relatively poor. In this study, we made P single doped and Li & P co-doped ZnO target. To investigate electrical and optical properties of P single doped and Li & P co-doped ZnO thin film using $P_2O_5$ and $Li_3PO_4$ dopant source respectively was deposited by PLD. The growth temperature was changed 500, $700^{\circ}C$ and various oxygen partial pressure and post-annealing conditions was changed temperature, different gas ambient($O_2,N_2$). We investigate that how to change electrical and optical properties as function of growth temperature, oxygen partial pressure and post-annealing(RTA).

• 한국세라믹학회지
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• 제43권9호
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• pp.527-531
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• 2006

In order to study the influence of post-annealing treatment on the frequency characteristics of the Li doped ZnO(Li:ZnO) FBAR(Film Bulk Acoustic Resonator) device, we investigated the material and electrical properties of Li:ZnO films in the annealing temperature range from 300 to $500^{\circ}C$. In our samples, as annealing temperature was increased, Li:ZnO films showed the improvement of high c-axis orientation and resistance value with relieved stress and low surface roughness. In addition to, the return loss in the frequency property of fabricated FBAR was improved by annealing treatment from 24.9 to 29.8dB. From experimental results, the optimum post-annealing temperature for FBAR is $500^{\circ}C$ and it can obtain excellent Li:ZnO FBAR performance with stronger c-axis orientation, smoother surface, relieved stress, and lower loss factor.

• 한국결정성장학회지
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• 제6권4호
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• pp.532-542
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• 1996

Floating zone(FZ)법으로 육성하고 annealing한 undoped $LiNbO_3$ 단결정 및 MgO 또는 ZnO를 첨가한 $LiNbO_3$ 단결정의 전기적,광학적 특성을 조사하였다. 전기전도도, 유전율 및 전이온도, 전기.기계결합계수등의 전기적 특성과 광투과율, 굴절율 등의 광학적 특성을 측정하였으며, 비선형 광학특성의 척도라 할 수 있는 비선형 굴절율을 이론적으로 계산하였다. Undoped $LiNbO_3$ 단결정과 MgO 또는 ZnO를 첨가한 $LiNbO_3$ 단결정의 전기적, 광학적 특성을 비교함으로서 MgO 또는 ZnO의 첨가가 $LiNbO_3$ 단결정의 전기적 및 광학적 특성에 미치는 영향을 조사하였다.

• 한국결정성장학회지
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• 제15권3호
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• pp.120-123
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• 2005

[ $Li_2CO_3-V_2O_5$ ], flux를 사용한 liquid phase epitaxy(LPE) 법을 사용하여 $LiNbO_3$ (001) 기판위에 5 mol% ZnO가 첨가된 $LiNbO_3$, 박막과 2 mol% MgO가 첨가된 $LiNbO_3$, 박막을 성장시켰다. $Zn:LiNbO_3$, 막과 $Mg:LiNbO_3$, 막과의 결정성과 격자 부정합은 x-ray rocking curve(XRC)로 분석되었다. 그리고 다층 박막의 단면에서의 ZnO와 MgO의 분포가 electron probe micro analyzer(EPMA)를 사용하여 관측되었다.

• The Korean Journal of Ceramics
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• 제3권2호
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• pp.110-115
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• 1997

Li-doped ZnO films were prepared on Corning 1737 glass substrate by an rf magnetron sputtering technique using ZnO targets with various $Li_2CO_3$ contents ranging from 0 to 10 mol%. The effects of Li doping on the crystallinity and electrical properties of ZnO films were studied for their SAW filter applications. The film resistivity largely increased without suppressing the c-axis orientation and crystallinity with a small addition of Li. Heat treatment of the film at 40$0^{\circ}C$ induced that the film resistivity, c-axis orientation and crystallinity slightly increased. However, heat treatment of the film at 50$0^{\circ}C$ resulted in much lower resistivity than that of as-deposited film due to the increase of electron concentration caused by the evaporationof Li atoms from the ZnO film. Large addition of Li into the ZnO film rather diminished the film resistivity and suppressed the c-axis growth. It was concluded that a small doping of Li into the ZnO film and heat treatment at 40$0^{\circ}C$ caused the film resistivity to be high enough for SAW filter applications without suppression of the c-axis orientation and crystallinity.

• 센서학회지
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• 제9권2호
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• pp.146-152
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• 2000

고주파 마그네트론 스퍼터링법으로 Li이 도핑된 ZnO(ZnO:Li) 박막을 코닝 7059 글라스 기판상에 증착하였다. 도핑량은 스퍼터링용 ZnO타겟내의 $Li_2CO_3$의 첨가량을 달리하여 조절하였다. 타겟내의 $Li_2CO_3$의 첨가량에 따른 구조적 특성을 XRD, AFM 및 SEM으로 조사하였으며 기판온도, 고주파출력 및 $O_2/Ar$ 가스비에 따른 Li이 도핑된 ZnO박막의 전기적 특성을 조사하였다. 타겟내의 $Li_2CO_3$의 첨가량과 증착조건이 막의 구조적 및 전기적 특성에 미치는 영향을 조사하였다. $Li_2CO_3$의 첨가량이 1wt%이하인 타겟으로 기판온도 $200^{\circ}C$, $O_2$/Ar 가스비 100%, 고주파 출력 100W에서 스퍼터된 ZnO:Li 박막이 표면거칠기가 낮은 우수한 표면형상, 강한 c-축 우선배향성 및 $10^8{\Omega}cm$ 이상의 큰 비저항을 보였다.

• 한국결정성장학회지
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• 제6권3호
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• pp.368-376
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• 1996

균일한 조성과 doping 효과를 얻을 수 있는 floating zone(FZ)법으로 조화용융조성의 undoped $LiNbO_{3}$ 및 5 mol%의 MgO 또는 ZnO를 각각 첨가한 $LiNbO_{3}$ 단결정을 육성하였다. 결정성장시 최적성장조건을 실험적으로 확립하였으며, 결정내에 존재하는 domain 구조, 전위구조, slip band, 미세쌍정등의 결함구조를 조사 및 분석하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.242-242
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• 2012

Transparent oxide semiconductors are increasingly becoming one of good candidates for high efficient channel materials of thin film transistors (TFTs) in large-area display industries. Compare to the conventional hydrogenated amorphous silicon channel layers, solution processed ZnO-TFTs can be simply fabricated at low temperature by just using a spin coating method without vacuum deposition, thus providing low manufacturing cost. Furthermore, solution based oxide TFT exhibits excellent transparency and enables to apply flexible devices. For this reason, this process has been attracting much attention as one fabrication method for oxide channel layer in thin-film transistors (TFTs). But, poor electrical characteristic of these solution based oxide materials still remains one of issuable problems due to oxygen vacancy formed by breaking weak chemical bonds during fabrication. These electrical properties are expected due to the generation of a large number of conducting carriers, resulting in huge electron scattering effect. Therefore, we study a novel technique to effectively improve the electron mobility by applying environmental annealing treatments with various gases to the solution based Li-doped ZnO TFTs. This technique was systematically designed to vary a different lithium ratio in order to confirm the electrical tendency of Li-doped ZnO TFTs. The observations of Scanning Electron Microscopy, Atomic Force Microscopy, and X-ray Photoelectron Spectroscopy were performed to investigate structural properties and elemental composition of our samples. In addition, I-V characteristics were carried out by using Keithley 4,200-Semiconductor Characterization System (4,200-SCS) with 4-probe system.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.297-297
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• 2007

The $(B_{0.5},Sr_{0.5})TiO_3$ ceramics, which added with low sintering materials $Li_2CO_3$ and ZnBO, was investigated for LTCC(low temperature co-fired ceramic) applications. To compare sintering temperature of $(B_{0.5},Sr_{0.5})TiO_3$ respectively, we added 1, 2, 3, 4, and 5wt% of $Li_2CO_3$ and ZnBO to $(B_{0.5},Sr_{0.5})TiO_3$. For confirming the sintering temperature, the respective specimens were sintered from $750^{\circ}C$ to $1200^{\circ}C$ by $50^{\circ}C$. The case of $Li_2CO_3$ greatly lowered the sintering temperature of $(B_{0.5},Sr_{0.5})TiO_3$ ($1350^{\circ}C$) below $900^{\circ}C$. The addition of ZnBO improved the loss tangent of $(B_{0.5},Sr_{0.5})TiO_3$. The crystalline structure of $LiCO_3$ doped $(B_{0.5},Sr_{0.5})TiO_3$ and ZnBO doped $(B_{0.5},Sr_{0.5})TiO_3$ was analyzed with the X-ray diffraction (XRD) analysis. The dielectric permittivity and loss tangent of $Li_2CO_3$ doped BST and ZnBO doped BST were measured with the HP 4284A precision. From the electrical characterization, we respectively obtained the dielectric permittivity 1361, loss tangent $6.94{\times}10^{-3}$ at $Li_2CO_3$ doped $(B_{0.5},Sr_{0.5})TiO_3$ (3wt%) and the dielectric constant 1180, loss tangent $3.70{\times}10^{-3}$ at ZnBO doped $(B_{0.5},Sr_{0.5})TiO_3$(5wt%).